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Electrochemistry of semiconductors and electronics : processes and devices / / edited by John McHardy and Frank Ludwig
| Electrochemistry of semiconductors and electronics : processes and devices / / edited by John McHardy and Frank Ludwig |
| Pubbl/distr/stampa | Park Ridge, N.J., U.S.A., : Noyes Publications, c1992 |
| Descrizione fisica | 1 online resource (376 p.) |
| Disciplina | 621.381/52 |
| Altri autori (Persone) | LudwigFrank |
| Collana | Materials science and process technology series |
| Soggetto topico |
Semiconductors - Design and construction
Electrochemistry |
| ISBN |
1-282-00226-0
9786612002267 0-8155-1697-5 |
| Formato | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto | ""PREFACE""; ""CONTRIBUTORS""; ""CONTENTS""; ""1 ELECTROCHEMICAL DEPOSITION OF SEMICONDUCTORS""; ""2 CHEMICAL ETCHING: PRINCIPLES AND APPLICATIONS""; ""3 ELECTROCHEMICAL PASSIVATION OF (Hg,Cd)Te""; ""4 PHOTOELECTROCHEMICAL PROCESSING OF SEMICONDUCTORS""; ""5 PHOTOELECTROCHEMICAL CHARACTERIZATION""; ""6 ELECTROCHEMICAL MIGRATION""; ""7 ELECTROCHEMICAL CAPACITORS""; ""INDEX"" |
| Record Nr. | UNINA-9911006677203321 |
| Park Ridge, N.J., U.S.A., : Noyes Publications, c1992 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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ESSDERC 90 : 20th European Solid State Device Research Conference, Nottingham, 10-13 September 1990
| ESSDERC 90 : 20th European Solid State Device Research Conference, Nottingham, 10-13 September 1990 |
| Pubbl/distr/stampa | [Place of publication not identified], : A Hilger, 1990 |
| Disciplina | 621.381/52 |
| Soggetto topico |
Semiconductors - Congresses
Solid state electronics - Congresses Electrical & Computer Engineering Engineering & Applied Sciences Electrical Engineering |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNISA-996213275903316 |
| [Place of publication not identified], : A Hilger, 1990 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. di Salerno | ||
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ESSDERC 90 : 20th European Solid State Device Research Conference, Nottingham, 10-13 September 1990
| ESSDERC 90 : 20th European Solid State Device Research Conference, Nottingham, 10-13 September 1990 |
| Pubbl/distr/stampa | [Place of publication not identified], : A Hilger, 1990 |
| Disciplina | 621.381/52 |
| Soggetto topico |
Semiconductors
Solid state electronics Electrical & Computer Engineering Engineering & Applied Sciences Electrical Engineering |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNINA-9910873007403321 |
| [Place of publication not identified], : A Hilger, 1990 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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Handbook of semiconductor silicon technology / / edited by William C. O'Mara, Robert B. Herring, Lee P. Hunt
| Handbook of semiconductor silicon technology / / edited by William C. O'Mara, Robert B. Herring, Lee P. Hunt |
| Pubbl/distr/stampa | Park Ridge, N.J., U.S.A., : Noyes Publications, c1990 |
| Descrizione fisica | 1 online resource (816 p.) |
| Disciplina | 621.381/52 |
| Altri autori (Persone) |
O'MaraWilliam C
HerringRobert B HuntLee P (Lee Philip) |
| Collana | Materials science and process technology series |
| Soggetto topico |
Semiconductors
Silicon crystals |
| ISBN |
1-282-00281-3
9786612002816 0-8155-1771-8 1-59124-294-0 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto | ""Preface""; ""Contributors""; ""Contents""; ""1 Silicon Precursors: Their Manufacture and Properties""; ""2 Polysilicon Preparation""; ""3 Crystal Growth of Silicon""; ""4 Silicon Wafer Preparation""; ""5 Silicon Epitaxy""; ""6 Silicon Material Properties""; ""7 Oxygen, Carbon and Nitrogen in Silicon""; ""8 Carrier Lifetimes in Silicon""; ""9 Preparation and Properties of Polycrystalline-Silicon Films""; ""10 Silicon Phase Diagrams""; ""Index"" |
| Record Nr. | UNINA-9911006661203321 |
| Park Ridge, N.J., U.S.A., : Noyes Publications, c1990 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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Properties of indium phosphide
| Properties of indium phosphide |
| Pubbl/distr/stampa | [Place of publication not identified], : INSPEC, 1991 |
| Disciplina | 621.381/52 |
| Collana | EMIS datareviews series Properties of indium phosphide |
| Soggetto topico |
Electronics - Materials
Indium phosphide Semiconductors Electrical & Computer Engineering Engineering & Applied Sciences Electrical Engineering |
| ISBN | 1-59124-825-6 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNINA-9911004810303321 |
| [Place of publication not identified], : INSPEC, 1991 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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Quantum semiconductor structures : fundamentals and applications / Claude Weisbuch, Borge Vinter
| Quantum semiconductor structures : fundamentals and applications / Claude Weisbuch, Borge Vinter |
| Autore | Weisbuch, Claude |
| Pubbl/distr/stampa | Boston : Academic Press, c1991 |
| Descrizione fisica | xii, 252 p. : ill. ; 23 cm |
| Disciplina | 621.381/52 |
| Altri autori (Persone) | Vinter, Borgeauthor |
| Soggetto topico |
Semiconductors
Quantum Hall effect |
| ISBN | 9780127426808 |
| Classificazione |
LC QC611
621.3.2.4 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNISALENTO-991002855789707536 |
Weisbuch, Claude
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| Boston : Academic Press, c1991 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. del Salento | ||
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Semiconductor fabrication : technology and metrology
| Semiconductor fabrication : technology and metrology |
| Pubbl/distr/stampa | [Place of publication not identified], : ASTM, 1989 |
| Disciplina | 621.381/52 |
| Collana | STP Semiconductor fabrication |
| Soggetto topico |
Semiconductors - Design and construction
Electrical & Computer Engineering Engineering & Applied Sciences Electrical Engineering |
| ISBN |
9780803151079
0803151071 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Altri titoli varianti | Semiconductor Fabrication |
| Record Nr. | UNINA-9910164688903321 |
| [Place of publication not identified], : ASTM, 1989 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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Solid state device research 91 : proceedings of the 21st European Solid State Device Research Conference--ESSDERC '91, 16-19 September 1991, Montreux, Switzerland
| Solid state device research 91 : proceedings of the 21st European Solid State Device Research Conference--ESSDERC '91, 16-19 September 1991, Montreux, Switzerland |
| Pubbl/distr/stampa | [Place of publication not identified], : Elsevier, 1991 |
| Disciplina | 621.381/52 |
| Soggetto topico |
Semiconductors - Congresses
Electrical & Computer Engineering Engineering & Applied Sciences Electrical Engineering |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNISA-996201557003316 |
| [Place of publication not identified], : Elsevier, 1991 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. di Salerno | ||
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Solid state device research 91 : proceedings of the 21st European Solid State Device Research Conference--ESSDERC '91, 16-19 September 1991, Montreux, Switzerland
| Solid state device research 91 : proceedings of the 21st European Solid State Device Research Conference--ESSDERC '91, 16-19 September 1991, Montreux, Switzerland |
| Pubbl/distr/stampa | [Place of publication not identified], : Elsevier, 1991 |
| Disciplina | 621.381/52 |
| Soggetto topico |
Semiconductors
Electrical & Computer Engineering Engineering & Applied Sciences Electrical Engineering |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNINA-9910873008003321 |
| [Place of publication not identified], : Elsevier, 1991 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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Thin film processes . II / / edited by John L. Vossen, Werner Kern
| Thin film processes . II / / edited by John L. Vossen, Werner Kern |
| Pubbl/distr/stampa | Boston, : Academic Press, Inc., c1991 |
| Descrizione fisica | 1 online resource (881 p.) |
| Disciplina | 621.381/52 |
| Altri autori (Persone) |
VossenJohn L
KernWerner <1925-> |
| Collana | Thin film processes |
| Soggetto topico | Thin films |
| ISBN |
1-299-19290-4
0-08-052421-4 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Front Cover; Thin Film Processes II; Copyright Page; Table of Contents; List of Contributors; Preface; Part I; Chapter I-1. Introduction; I. The Organization of This Book; II. Other Film Deposition and Etching Processes; References; Part II; Chapter II-1. Glow Discharge Plasmas and Sources for Etching and Deposition; I. Introduction; II. Processing Plasmas; III. dc Diode Plasmas; IV. rf Diode Plasmas; V. Afterglow Plasmas; VI. Plasmas in the Presence of Magnetic Fields; VII. Magnetrons; VIII. Broad-Beam Ion Sources; IX. Measurements in Plasmas; X. Intrusive Diagnostics
XI. Nonintrusive DiagnosticsXII. Conclusion; References; Chapter II-2. Evaporation Processes; I. Introduction; II. Evaporation Process; III. Model of Film Growth in Evaporation Processes; IV. Theory and Mechanisms; V. Implementation of Evaporation Processes; VI. Deposition of Materials; VII. Materials Synthesized by Evaporation-Based Processes; VIII. Structure and Properties of Evaporated Films; IX. Conclusions; References; Chapter II-3. Molecular Beam Epitaxy; I. Introduction; II. Building Blocks of the MBE System; III. Basics of the Growth Process; IV. Trends and Future Development AcknowledgmentsReferences; Chapter II-4. Sputter Deposition Processes; I. Introduction; II. Sputter Sources; III. Sputter Deposition of Conducting Films; IV. Sputter Deposition of Dielectric Films; V. Sputter Coating Systems; VI. Emerging Technologies; VII. Concluding Remarks; References; Chapter II-5. The Cathodic Arc Plasma Deposition of Thin Films; I. Introduction; II. Ion Plating; III. The Cathodic Arc; IV. Emitted Material; V. Cathodic Arc Deposition; VI. Thin Film Deposition; VII. Applications; VIII. Conclusion; References; Part III; Chapter III-1. Thermal Chemical Vapor Deposition I. IntroductionII. Fundamentals of Thermal CVD; III. Production Reactor Systems; IV. CVD of Insulators and Dielectrics; V. CVD of Elemental and Compound Semiconductors; VI. CVD of Conductors; VII. Summary, Conclusions, and Future Outlook; References; Chapter III-2. OMVPE of Compound Semiconductors; I. Introduction; II. The OMVPE Technique and Growth System; III. Organometallic Compounds; IV. Gas-Phase and Surface Reaction Mechanisms; V. OMVPE Transport Phenomena and Modelling; VI. Materials Characterization and Development; VII. Fundamental Growth Issues; VIII. OMVPE Growth IX. Impurities in OMVPE-Grown Compound SemiconductorsX. Summary; References; Chapter III-3. Photochemical Vapor Deposition; I. Introduction; I. Introduction; II. Fundamental Aspects of Photochemical Vapor Deposition; III. Reactors, Optical Sources, and Associated Equipment; IV. Metal Films; V. Semiconductors; VI. Dielectrics; VII. Conclusions; Acknowledgments; References; Chapter III-4. Sol-Gel Coatings; II. The Sol-Gel Process; III. Thin Film Formation; IV. Applications; V. SUMMARY; Acknowledgment; References; Part IV; Chapter IV-1. Plasma-Enhanced Chemical Vapor Deposition; I. Introduction II. Summary of Plasma Fundamentals |
| Record Nr. | UNINA-9911006531703321 |
| Boston, : Academic Press, Inc., c1991 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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