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1: Principles / J. Reece Roth
| 1: Principles / J. Reece Roth |
| Autore | Roth, J. Reece |
| Descrizione fisica | XVI, 538 p. : ill. ; 24 cm. |
| Disciplina | 621.044 |
| Soggetto topico | Ingegneria del plasma |
| ISBN |
0750303174
0750303182 |
| Formato | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNICAS-PUV0233182 |
Roth, J. Reece
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| Materiale a stampa | ||
| Lo trovi qui: Univ. di Cassino e del Lazio Meridionale | ||
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2.: Applications to nonthermal plasma processing / J. Reece Roth
| 2.: Applications to nonthermal plasma processing / J. Reece Roth |
| Autore | Roth, J. Reece |
| Pubbl/distr/stampa | Bristol and Philadelphia, : Institute of Physics, 2001 |
| Descrizione fisica | XI, 645 p. : ill. ; 23 cm |
| Disciplina | 621.044 |
| Soggetto topico | Ingegneria del plasma |
| ISBN | 0750305452 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNICAS-RMS0136143 |
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Roth, J. Reece
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| Bristol and Philadelphia, : Institute of Physics, 2001 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. di Cassino e del Lazio Meridionale | ||
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2005 IEEE 32nd International Conference on Plasma Sciences
| 2005 IEEE 32nd International Conference on Plasma Sciences |
| Pubbl/distr/stampa | [Place of publication not identified], : I E E E, 2005 |
| Descrizione fisica | 1 online resource (377 pages) : illustrations |
| Disciplina | 621.044 |
| Soggetto topico | Plasma engineering |
| ISBN | 1-5090-9713-9 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNINA-9910146818403321 |
| [Place of publication not identified], : I E E E, 2005 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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2005 IEEE 32nd International Conference on Plasma Sciences
| 2005 IEEE 32nd International Conference on Plasma Sciences |
| Pubbl/distr/stampa | [Place of publication not identified], : I E E E, 2005 |
| Descrizione fisica | 1 online resource (377 pages) : illustrations |
| Disciplina | 621.044 |
| Soggetto topico | Plasma engineering |
| ISBN | 1-5090-9713-9 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNISA-996203241603316 |
| [Place of publication not identified], : I E E E, 2005 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. di Salerno | ||
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2012 IEEE 39th International Conference on Plasma Sciences
| 2012 IEEE 39th International Conference on Plasma Sciences |
| Pubbl/distr/stampa | [Place of publication not identified], : IEEE, 2012 |
| Descrizione fisica | 1 online resource (1 volume (734 pages)) : illustrations (black and white) |
| Disciplina | 621.044 |
| Soggetto topico | Plasma engineering |
| ISBN |
1-4577-2129-5
1-4577-2128-7 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNISA-996217918403316 |
| [Place of publication not identified], : IEEE, 2012 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. di Salerno | ||
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2012 IEEE 39th International Conference on Plasma Sciences
| 2012 IEEE 39th International Conference on Plasma Sciences |
| Pubbl/distr/stampa | [Place of publication not identified], : IEEE, 2012 |
| Descrizione fisica | 1 online resource (1 volume (734 pages)) : illustrations (black and white) |
| Disciplina | 621.044 |
| Soggetto topico | Plasma engineering |
| ISBN |
1-4577-2129-5
1-4577-2128-7 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNINA-9910141366503321 |
| [Place of publication not identified], : IEEE, 2012 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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Advanced plasma spray applications / / Hamidreza Salimi Jazi, editor
| Advanced plasma spray applications / / Hamidreza Salimi Jazi, editor |
| Pubbl/distr/stampa | Rijeka, Croatia : , : InTech, , [2012] |
| Descrizione fisica | 1 online resource (x, 238 pages) : illustrations |
| Disciplina | 621.044 |
| Soggetto topico | Plasma spraying |
| ISBN | 953-51-6160-1 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNINA-9910138282903321 |
| Rijeka, Croatia : , : InTech, , [2012] | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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Advanced plasma technology / / edited by Riccardo d'Agostino [and five others]
| Advanced plasma technology / / edited by Riccardo d'Agostino [and five others] |
| Pubbl/distr/stampa | Weinheim, Germany : , : Wiley-VCH Verlag GmbH & Co. KGaA, , 2008 |
| Descrizione fisica | 1 online resource (481 p.) |
| Disciplina |
621.044
660.004 |
| Soggetto topico | Plasma engineering |
| Soggetto genere / forma | Electronic books. |
| ISBN |
1-281-94675-3
9786611946753 3-527-62218-7 3-527-62219-5 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Advanced Plasma Technology; Contents; Preface; List of Contributors; 1 Basic Approaches to Plasma Production and Control; 1.1 Plasma Production; 1.1.1 Under Low Gas Pressure (10 torr); 1.2 Energy Control; 1.2.1 Electron-Temperature Control; 1.2.2 Ion-Energy Control; 1.3 Dust Collection and Removal; References; 2 Plasma Sources and Reactor Configurations; 2.1 Introduction; 2.2 Characteristics of ICP; 2.2.1 Principle; 2.2.2 Transformer Model; 2.2.3 Technological Aspects; 2.2.3.1 Matching
2.2.3.2 Capacitive Coupling2.2.3.3 Standing Wave Effects; 2.3 Sources and Reactor Configuration; 2.3.1 Substrate Shape; 2.3.1.1 Flat Substrates; 2.3.1.2 Complex Three-Dimensional Shapes; 2.3.1.3 Large Area Treatment; 2.4 Conclusions; References; 3 Advanced Simulations for Industrial Plasma Applications; 3.1 Introduction; 3.2 PIC Simulations; 3.2.1 Capacitively Coupled O(2)/Ar Plasmas; 3.2.1.1 Gas Composition; 3.2.1.2 Pressure Effect in Ar/O(2) Plasmas; 3.2.2 Three-Dimensional (3D) Charge-up Simulation; 3.2.2.1 Description of 3D Charge-up Simulations 3.2.2.2 Effects of Secondary Electron Emission3.2.2.3 Negative Ion Extraction; 3.3 Fluid Simulations; 3.3.1 Capacitively Coupled Discharges; 3.3.2 Large Area Plasma Source; 3.4 Summary; References; 4 Modeling and Diagnostics of He Discharges for Treatment of Polymers; 4.1 Introduction; 4.2 Experimental; 4.3 Model Description; 4.4 Results and Discussion; 4.4.1 Electrical Properties; 4.4.2 Gas-Phase Chemistry; 4.4.3 Plasma-Surface Interactions; 4.5 Conclusions; References; 5 Three-Dimensional Modeling of Thermal Plasmas (RF and Transferred Arc) for the Design of Sources and Industrial Processes 5.1 Introduction5.2 Inductively Coupled Plasma Torches; 5.2.1 Modeling Approach; 5.2.1.1 Modeling Assumptions; 5.2.1.2 Governing Equations of the Continuum Phase; 5.2.1.3 Governing Equations of the Discrete Phase; 5.2.1.4 Computational Domain and Boundary Conditions; 5.2.2 Selected Simulation Results; 5.2.2.1 High-Definition Numerical Simulation of Industrial ICPTs; 5.2.2.2 Numerical Simulation of the Trajectories and Thermal Histories of Powders Injected in Industrial ICPTs; 5.3 DC Transferred Arc Plasma Torches; 5.3.1 Modeling Approach; 5.3.1.1 Modeling Assumptions 5.3.1.2 Governing Equations5.3.1.3 Computational Domain and Boundary Conditions; 5.3.2 Selected Simulation Results; 5.3.2.1 Magnetically Deflected Transferred Arc; 5.3.2.2 The Twin Torch; 5.3.2.3 The Cutting Torch; References; 6 Radiofrequency Plasma Sources for Semiconductor Processing; 6.1 Introduction; 6.2 Capacitively Coupled Plasmas; 6.2.1 Dual-Frequency CCPs; 6.3 Inductively Coupled Plasmas; 6.3.1 General Description; 6.3.2 Anomalous Skin Depth; 6.3.3 Magnetized ICPs; 6.4 Helicon Wave Sources; 6.4.1 General Description; 6.4.2 Unusual Features; 6.4.3 Extended Helicon Sources; References 7 Advanced Plasma Diagnostics for Thin-Film Deposition |
| Record Nr. | UNINA-9910144100803321 |
| Weinheim, Germany : , : Wiley-VCH Verlag GmbH & Co. KGaA, , 2008 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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Advanced plasma technology / / edited by Riccardo d'Agostino [and five others]
| Advanced plasma technology / / edited by Riccardo d'Agostino [and five others] |
| Pubbl/distr/stampa | Weinheim, Germany : , : Wiley-VCH Verlag GmbH & Co. KGaA, , 2008 |
| Descrizione fisica | 1 online resource (481 p.) |
| Disciplina |
621.044
660.004 |
| Soggetto topico | Plasma engineering |
| ISBN |
1-281-94675-3
9786611946753 3-527-62218-7 3-527-62219-5 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Advanced Plasma Technology; Contents; Preface; List of Contributors; 1 Basic Approaches to Plasma Production and Control; 1.1 Plasma Production; 1.1.1 Under Low Gas Pressure (10 torr); 1.2 Energy Control; 1.2.1 Electron-Temperature Control; 1.2.2 Ion-Energy Control; 1.3 Dust Collection and Removal; References; 2 Plasma Sources and Reactor Configurations; 2.1 Introduction; 2.2 Characteristics of ICP; 2.2.1 Principle; 2.2.2 Transformer Model; 2.2.3 Technological Aspects; 2.2.3.1 Matching
2.2.3.2 Capacitive Coupling2.2.3.3 Standing Wave Effects; 2.3 Sources and Reactor Configuration; 2.3.1 Substrate Shape; 2.3.1.1 Flat Substrates; 2.3.1.2 Complex Three-Dimensional Shapes; 2.3.1.3 Large Area Treatment; 2.4 Conclusions; References; 3 Advanced Simulations for Industrial Plasma Applications; 3.1 Introduction; 3.2 PIC Simulations; 3.2.1 Capacitively Coupled O(2)/Ar Plasmas; 3.2.1.1 Gas Composition; 3.2.1.2 Pressure Effect in Ar/O(2) Plasmas; 3.2.2 Three-Dimensional (3D) Charge-up Simulation; 3.2.2.1 Description of 3D Charge-up Simulations 3.2.2.2 Effects of Secondary Electron Emission3.2.2.3 Negative Ion Extraction; 3.3 Fluid Simulations; 3.3.1 Capacitively Coupled Discharges; 3.3.2 Large Area Plasma Source; 3.4 Summary; References; 4 Modeling and Diagnostics of He Discharges for Treatment of Polymers; 4.1 Introduction; 4.2 Experimental; 4.3 Model Description; 4.4 Results and Discussion; 4.4.1 Electrical Properties; 4.4.2 Gas-Phase Chemistry; 4.4.3 Plasma-Surface Interactions; 4.5 Conclusions; References; 5 Three-Dimensional Modeling of Thermal Plasmas (RF and Transferred Arc) for the Design of Sources and Industrial Processes 5.1 Introduction5.2 Inductively Coupled Plasma Torches; 5.2.1 Modeling Approach; 5.2.1.1 Modeling Assumptions; 5.2.1.2 Governing Equations of the Continuum Phase; 5.2.1.3 Governing Equations of the Discrete Phase; 5.2.1.4 Computational Domain and Boundary Conditions; 5.2.2 Selected Simulation Results; 5.2.2.1 High-Definition Numerical Simulation of Industrial ICPTs; 5.2.2.2 Numerical Simulation of the Trajectories and Thermal Histories of Powders Injected in Industrial ICPTs; 5.3 DC Transferred Arc Plasma Torches; 5.3.1 Modeling Approach; 5.3.1.1 Modeling Assumptions 5.3.1.2 Governing Equations5.3.1.3 Computational Domain and Boundary Conditions; 5.3.2 Selected Simulation Results; 5.3.2.1 Magnetically Deflected Transferred Arc; 5.3.2.2 The Twin Torch; 5.3.2.3 The Cutting Torch; References; 6 Radiofrequency Plasma Sources for Semiconductor Processing; 6.1 Introduction; 6.2 Capacitively Coupled Plasmas; 6.2.1 Dual-Frequency CCPs; 6.3 Inductively Coupled Plasmas; 6.3.1 General Description; 6.3.2 Anomalous Skin Depth; 6.3.3 Magnetized ICPs; 6.4 Helicon Wave Sources; 6.4.1 General Description; 6.4.2 Unusual Features; 6.4.3 Extended Helicon Sources; References 7 Advanced Plasma Diagnostics for Thin-Film Deposition |
| Record Nr. | UNINA-9910830298803321 |
| Weinheim, Germany : , : Wiley-VCH Verlag GmbH & Co. KGaA, , 2008 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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Atmospheric pressure plasma for surface modification [[electronic resource] /] / Rory A. Wolf
| Atmospheric pressure plasma for surface modification [[electronic resource] /] / Rory A. Wolf |
| Autore | Wolf Rory A |
| Pubbl/distr/stampa | Hoboken, N.J., : John Wiley & Sons, 2013 |
| Descrizione fisica | 1 online resource (260 p.) |
| Disciplina | 621.044 |
| Soggetto topico |
Low temperature plasmas - Industrial applications
Surfaces (Technology) |
| ISBN |
1-118-54755-1
1-118-54751-9 1-283-83524-X 1-118-54769-1 |
| Classificazione | TEC009060 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto | Machine generated contents note: Preface xi 1. Plasma - The Fourth State of Matter 1 1.1 Fundamentals of Plasmas 1 1.2 Thermal vs. Nonthermal Plasmas 6 1.3 Mechanisms for Surfaces Reactions 22 2. Plasmas for Surface Modification 27 2.1 Low-Pressure Plasmas 28 2.2 Microwave Systems 31 2.3 Physical Vapor Deposition Systems 33 2.4 Atmospheric Plasma Systems 42 2.5 Atmospheric Plasma Precursor Deposition Systems 51 3. Atmospheric Plasma Surface Modification Effects 55 3.1 Surface Cleaning 56 3.2 Surface Etching 63 3.3 Surface Functionalization 66 3.4 Grafting and Surface Polymerization Effects 75 4. Characterization Methods of Atmospheric Plasma Surface Modifications 81 4.1 Surface Characterization Techniques 81 4.2 X-Ray Photoelectron Spectroscopy (XPS) 82 4.3 Static Secondary Ion Mass Spectrometry by Time-of-Flight (TOF-SIMS) 86 4.4 Atomic Force Microscopy 89 4.5 Scanning Electron Microscopy (TEM) 97 4.7 Visual Methodologies 98 5. Atmospheric Plasma Modification of Roll-to-Roll Polymeric Surfaces 109 5.1 Material Classifications and Applications 110 5.2 Atmospheric Plasma Processing Surface Effects 116 5.3 Assessments of Surface Modification Effects 117 6. Atmospheric Plasma Modification of Three-Dimensional Polymeric Surfaces 121 6.1 Material Classifications and Applications 125 6.2 Atmospheric Plasma Processing Surface Effects 129 6.3 Assessments of Surface Modification Effects 135 7. Atmospheric Plasma Modification of Textile Surfaces 139 7.1 Material Classifications and Applications 141 7.2 Atmospheric Plasma Processing Surface Effects 145 7.3 Assessments of Surface Modification Effects 151 8. Atmospheric Plasma Modification of Paper Surfaces 155 8.1 Material Classifications and Applications 157 8.2 Atmospheric Plasma Processing Surface Effects 162 8.3 Assessments of Surface Modification Effects 164 9. Atmospheric Plasma Modification of Metal Surfaces 167 9.1 Material Classifications and Applications 168 9.2 Atmospheric Plasma Processing Surface Effects 173 9.3 Assessments of Surface Modification Effects 177 10. Atmospheric Plasma Surface Antimicrobial Effects 181 10.1 Antimicrobial Surface Effects 183 10.2 Inactivation and Sterilization Methods - Medical 187 10.3 Inactivation and Sterilization Methods - Food 189 11. Economic and Ecological Considerations 195 11.1 Operating Cost Comparison of Atmospheric Plasma Systems 196 11.2 Environmental/Sustainable Advantages 201 12. Emerging and Future Atmospheric Plasma Applications 205 12.1 Solar and Other Alternative Energy Systems 205 12.2 Energy Storage Technologies 211 12.3 Aviation and Aerospace Applications 215 12.4 Electronic Device Fabrication 216 12.5 Air Purification Applications 220 12.6 Medical Engineering 221 13. Economic and Environmental Assessment 225 13.1 Goal and Scope 226 13.2 Functional Units 227 13.3 System Boundaries 230 13.4 Data Documentation 232 13.5 Lifecycle Interpretation 233. |
| Record Nr. | UNINA-9910141367803321 |
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Wolf Rory A
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| Hoboken, N.J., : John Wiley & Sons, 2013 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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