Info
- Utilizzare la checkbox di selezione a fianco di ciascun documento per attivare le funzionalità di stampa, invio email, download nei formati disponibili del (i) record.
Fundamental principles of engineering nanometrology / / by Richard K. Leach
| Fundamental principles of engineering nanometrology / / by Richard K. Leach |
| Autore | Leach R. K |
| Edizione | [1st ed.] |
| Pubbl/distr/stampa | Oxford, : Wlliam Andrew |
| Descrizione fisica | 1 online resource (349 p.) |
| Disciplina |
620.5
620.50287 |
| Collana | Micro and nano technologies |
| Soggetto topico |
Nanotechnology
Microtechnology Metrology |
| ISBN |
1-282-38196-2
9786612381966 1-4377-7832-1 |
| Formato | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Front Cover; Fundamental Principles ofEngineering Nanometrology; Copyright; Contents; Acknowledgements; Figures; Tables; CHAPTER 1Introduction to metrology for micro- and nanotechnology; 1.1 What is engineering nanometrology?; 1.2The contents of this book; 1.3References; CHAPTER 2 -Some basics of measurement; 2.1Introduction to measurement; 2.2Units of measurement and the SI; 2.3Length; 2.4Mass; 2.5Force; 2.6Angle; 2.7Traceability; 2.8Accuracy, precision, resolution, error and uncertainty; 2.10References; CHAPTER 3 -Precision measurement instrumentation - some design principles
3.1Geometrical considerations3.2Kinematic design; 3.3Dynamics; 3.4The Abbe Principle; 3.5Elastic compression; 3.6Force loops; 3.7Materials; 3.8Symmetry; 3.9Vibration isolation; 3.10References; CHAPTER 4Length traceability using interferometry; 4.1Traceability in length; 4.2Gauge blocks - both a practical and traceable artefact; 4.3Introduction to interferometry; 4.4Interferometer designs; 4.5Gauge block interferometry; 4.6References; CHAPTER 5Displacement measurement; 5.1Introduction to displacement measurement; 5.2Displacement interferometry; 5.3Capacitive displacement sensors 5.4Inductive displacement sensors5.5Optical encoders; 5.6Optical fibre sensors; 5.7Calibration of displacement sensors; 5.8References; CHAPTER 6 Surface topography measurement instrumentation; 6.1Introduction to surface topography measurement; 6.2Spatial wavelength ranges; 6.3Historical background of classical surface texture measuring instrumentation; 6.4Surface profile measurement; 6.5Areal surface texture measurement; 6.6Surface topography measuring instrumentation; 6.7Optical instruments; 6.8Capacitive instruments; 6.9Pneumatic instruments 6.10Calibration of surface topography measuring instruments6.11Uncertainties in surface topography measurement; 6.12Comparisons of surface topography measuring instruments; 6.13Software measurement standards; 6.14References; CHAPTER 7Scanning probe and particle beam microscopy; 7.1Scanning probe microscopy; 7.2Scanning tunnelling microscopy; 7.3Atomic force microscopy; 7.4Scanning probe microscopy of nanoparticles; 7.5Electron microscopy; 7.6Other particle beam microscopy techniques; 7.7References; CHAPTER 8Surface topography characterization 8.1Introduction to surface topography characterization8.2Surface profile characterization; 8.3Areal surface texture characterization; 8.4Fractal methods; 8.5Comparison of profile and areal characterization; 8.6References; CHAPTER 9Coordinate metrology; 9.1Introduction to CMMs; 9.2Sources of error on CMMs; 9.3Traceability, calibration and performance verification of CMMs; 9.4Miniature CMMs; 9.5Miniature CMM probes; 9.6Calibration of miniature CMMs; 9.7References; CHAPTER 10Mass and force measurement; 10.1Traceability of traditional mass measurement; 10.2Low-mass measurement 10.3Low-force measurement |
| Record Nr. | UNINA-9911004822103321 |
Leach R. K
|
||
| Oxford, : Wlliam Andrew | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Nanoscale calibration standards and methods [[electronic resource] ] : dimensional and related measurements in the micro- and nanometer range / / edited by Günter Wilkening, Ludger Koenders
| Nanoscale calibration standards and methods [[electronic resource] ] : dimensional and related measurements in the micro- and nanometer range / / edited by Günter Wilkening, Ludger Koenders |
| Pubbl/distr/stampa | Weinheim ; ; [Chichester?], : Wiley-VCH, c2005 |
| Descrizione fisica | 1 online resource (543 p.) |
| Disciplina | 620.50287 |
| Altri autori (Persone) |
KoendersLudger
WilkeningGünter |
| Soggetto topico |
Microstructure - Measurement
Nanostructured materials - Measurement Scientific apparatus and instruments - Calibration Stereology |
| Soggetto genere / forma | Electronic books. |
| ISBN |
1-280-85401-4
9786610854011 3-527-60666-1 3-527-60687-4 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Nanoscale Calibration Standards and Methods; Contents; List of Contributors; Part I Instrumentation - Overview; 1 Metrological Scanning Probe Microscopes - Instruments for Dimensional Nanometrology; 1.1 Introduction; 1.2 High-Resolution Probing Systems; 1.2.1 Sensor Objective with Beam Deflection Detection; 1.2.2 Sensor Objective with Piezolever Module; 1.2.3 Sensor Objective with Tuning Fork Module; 1.2.4 Sensor Head for Combined Scanning Probe and Interference Microscopy; 1.3 Metrology Systems Based on Scanning Probe Microscopes; 1.3.1 Scanning Force Microscopes of Type Veritekt
1.3.2 Metrological Large Range Scanning Force Microscope1.4 Summary; Acknowledgments; References; 2 Nanometrology at the IMGC; 2.1 Introduction; 2.2 Surface Metrology; 2.2.1 Scanning Probe Microscopy; 2.2.2 Optical Diffractometry; 2.2.3 Stylus Profilometry; 2.3 Atomic Scale Metrology; 2.3.1 Lattice Parameter of Silicon; 2.3.2 Combined Optical and X-Ray Interferometry (COXI); 2.4 Phase-Contrast Topograpy; 2.4.1 Detection of Small Lattice Strain; 2.4.2 Phase-Contrast Imaging; 2.5 Nanobalance; 2.6 Conclusions; References; 3 Metrological Applications of X-ray Interferometry; 3.1 Introduction 3.2 Measurement of Non-linearity in Optical Interferometers3.3 Combined Optical and X-ray Interferometry; 3.4 Measurement of Small Angles; 3.5 X-ray Interferometry and Scanning Probe Microscopy; 3.6 Conclusions; References; Part II Instrumentation - Long-range Scanning Probe Microscopes; 4 Advances in Traceable Nanometrology with the Nanopositioning and Nanomeasuring Machine; 4.1 Introduction; 4.2 Design and Operation; 4.3 Uncertainty Budget; 4.4 Focus Sensor; 4.5 Measuring Opportunities and Performance with Focus Sensor; 4.6 Focus Probe with SFM Cantilever; 4.7 Conclusion; Acknowledgements References5 Coordinate Measurements in Microsystems by Using AFM-Probing: Problems and Solutions; 5.1 Introduction; 5.2 Realizing CMMs for Microsystems; 5.3 Problems and Solutions; 5.3.1 Dynamics of Positioning System; 5.3.2 CMM: One-Millimeter Scan; 5.3.3 Measuring Strategies; 5.4 Conclusion and Outlook; References; 6 Metrological Large Range Scanning Force Microscope Applicable for Traceable Calibration of Surface Textures; 6.1 Introduction; 6.2 Instrumentation; 6.2.1 Principle; 6.2.2 Metrological Properties; 6.2.3 Traceability; 6.2.4 Specially Designed Features 6.3 Measurement Result of a 2D-Grating Standard6.3.1 Measurement Strategy; 6.3.2 Data Evaluation; 6.3.3 Measurement Result of the Mean Pitch Value; 6.3.4 Measurement of the Local Pitch Variation; 6.4 A Selected Measurement Result of a Microroughness Standard; 6.4.1 Measurement Result of a Glass Flatness Standard; 6.4.2 Measurement of a PTB Microroughness Standard; 6.4.3 Comparison of the Roughness Measurement Results Derived from SFM and Stylus Instruments Using Gaussian Filter; 6.4.4 Comparison Using Morphological Filters; 6.4.5 Evaluation Results Using PTB Reference Software 6.5 Outlook and Conclusion |
| Record Nr. | UNINA-9910144578403321 |
| Weinheim ; ; [Chichester?], : Wiley-VCH, c2005 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Nanoscale calibration standards and methods [[electronic resource] ] : dimensional and related measurements in the micro- and nanometer range / / edited by Günter Wilkening, Ludger Koenders
| Nanoscale calibration standards and methods [[electronic resource] ] : dimensional and related measurements in the micro- and nanometer range / / edited by Günter Wilkening, Ludger Koenders |
| Pubbl/distr/stampa | Weinheim ; ; [Chichester?], : Wiley-VCH, c2005 |
| Descrizione fisica | 1 online resource (543 p.) |
| Disciplina | 620.50287 |
| Altri autori (Persone) |
KoendersLudger
WilkeningGünter |
| Soggetto topico |
Microstructure - Measurement
Nanostructured materials - Measurement Scientific apparatus and instruments - Calibration Stereology |
| ISBN |
1-280-85401-4
9786610854011 3-527-60666-1 3-527-60687-4 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Nanoscale Calibration Standards and Methods; Contents; List of Contributors; Part I Instrumentation - Overview; 1 Metrological Scanning Probe Microscopes - Instruments for Dimensional Nanometrology; 1.1 Introduction; 1.2 High-Resolution Probing Systems; 1.2.1 Sensor Objective with Beam Deflection Detection; 1.2.2 Sensor Objective with Piezolever Module; 1.2.3 Sensor Objective with Tuning Fork Module; 1.2.4 Sensor Head for Combined Scanning Probe and Interference Microscopy; 1.3 Metrology Systems Based on Scanning Probe Microscopes; 1.3.1 Scanning Force Microscopes of Type Veritekt
1.3.2 Metrological Large Range Scanning Force Microscope1.4 Summary; Acknowledgments; References; 2 Nanometrology at the IMGC; 2.1 Introduction; 2.2 Surface Metrology; 2.2.1 Scanning Probe Microscopy; 2.2.2 Optical Diffractometry; 2.2.3 Stylus Profilometry; 2.3 Atomic Scale Metrology; 2.3.1 Lattice Parameter of Silicon; 2.3.2 Combined Optical and X-Ray Interferometry (COXI); 2.4 Phase-Contrast Topograpy; 2.4.1 Detection of Small Lattice Strain; 2.4.2 Phase-Contrast Imaging; 2.5 Nanobalance; 2.6 Conclusions; References; 3 Metrological Applications of X-ray Interferometry; 3.1 Introduction 3.2 Measurement of Non-linearity in Optical Interferometers3.3 Combined Optical and X-ray Interferometry; 3.4 Measurement of Small Angles; 3.5 X-ray Interferometry and Scanning Probe Microscopy; 3.6 Conclusions; References; Part II Instrumentation - Long-range Scanning Probe Microscopes; 4 Advances in Traceable Nanometrology with the Nanopositioning and Nanomeasuring Machine; 4.1 Introduction; 4.2 Design and Operation; 4.3 Uncertainty Budget; 4.4 Focus Sensor; 4.5 Measuring Opportunities and Performance with Focus Sensor; 4.6 Focus Probe with SFM Cantilever; 4.7 Conclusion; Acknowledgements References5 Coordinate Measurements in Microsystems by Using AFM-Probing: Problems and Solutions; 5.1 Introduction; 5.2 Realizing CMMs for Microsystems; 5.3 Problems and Solutions; 5.3.1 Dynamics of Positioning System; 5.3.2 CMM: One-Millimeter Scan; 5.3.3 Measuring Strategies; 5.4 Conclusion and Outlook; References; 6 Metrological Large Range Scanning Force Microscope Applicable for Traceable Calibration of Surface Textures; 6.1 Introduction; 6.2 Instrumentation; 6.2.1 Principle; 6.2.2 Metrological Properties; 6.2.3 Traceability; 6.2.4 Specially Designed Features 6.3 Measurement Result of a 2D-Grating Standard6.3.1 Measurement Strategy; 6.3.2 Data Evaluation; 6.3.3 Measurement Result of the Mean Pitch Value; 6.3.4 Measurement of the Local Pitch Variation; 6.4 A Selected Measurement Result of a Microroughness Standard; 6.4.1 Measurement Result of a Glass Flatness Standard; 6.4.2 Measurement of a PTB Microroughness Standard; 6.4.3 Comparison of the Roughness Measurement Results Derived from SFM and Stylus Instruments Using Gaussian Filter; 6.4.4 Comparison Using Morphological Filters; 6.4.5 Evaluation Results Using PTB Reference Software 6.5 Outlook and Conclusion |
| Record Nr. | UNINA-9910830318003321 |
| Weinheim ; ; [Chichester?], : Wiley-VCH, c2005 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Nanoscale calibration standards and methods : dimensional and related measurements in the micro- and nanometer range / / edited by Gunter Wilkening, Ludger Koenders
| Nanoscale calibration standards and methods : dimensional and related measurements in the micro- and nanometer range / / edited by Gunter Wilkening, Ludger Koenders |
| Pubbl/distr/stampa | Weinheim ; ; [Chichester?], : Wiley-VCH, c2005 |
| Descrizione fisica | 1 online resource (543 p.) |
| Disciplina | 620.50287 |
| Altri autori (Persone) |
KoendersLudger
WilkeningGünter |
| Soggetto topico |
Microstructure - Measurement
Nanostructured materials - Measurement Scientific apparatus and instruments - Calibration Stereology |
| ISBN |
9786610854011
9781280854019 1280854014 9783527606665 3527606661 9783527606870 3527606874 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Nanoscale Calibration Standards and Methods; Contents; List of Contributors; Part I Instrumentation - Overview; 1 Metrological Scanning Probe Microscopes - Instruments for Dimensional Nanometrology; 1.1 Introduction; 1.2 High-Resolution Probing Systems; 1.2.1 Sensor Objective with Beam Deflection Detection; 1.2.2 Sensor Objective with Piezolever Module; 1.2.3 Sensor Objective with Tuning Fork Module; 1.2.4 Sensor Head for Combined Scanning Probe and Interference Microscopy; 1.3 Metrology Systems Based on Scanning Probe Microscopes; 1.3.1 Scanning Force Microscopes of Type Veritekt
1.3.2 Metrological Large Range Scanning Force Microscope1.4 Summary; Acknowledgments; References; 2 Nanometrology at the IMGC; 2.1 Introduction; 2.2 Surface Metrology; 2.2.1 Scanning Probe Microscopy; 2.2.2 Optical Diffractometry; 2.2.3 Stylus Profilometry; 2.3 Atomic Scale Metrology; 2.3.1 Lattice Parameter of Silicon; 2.3.2 Combined Optical and X-Ray Interferometry (COXI); 2.4 Phase-Contrast Topograpy; 2.4.1 Detection of Small Lattice Strain; 2.4.2 Phase-Contrast Imaging; 2.5 Nanobalance; 2.6 Conclusions; References; 3 Metrological Applications of X-ray Interferometry; 3.1 Introduction 3.2 Measurement of Non-linearity in Optical Interferometers3.3 Combined Optical and X-ray Interferometry; 3.4 Measurement of Small Angles; 3.5 X-ray Interferometry and Scanning Probe Microscopy; 3.6 Conclusions; References; Part II Instrumentation - Long-range Scanning Probe Microscopes; 4 Advances in Traceable Nanometrology with the Nanopositioning and Nanomeasuring Machine; 4.1 Introduction; 4.2 Design and Operation; 4.3 Uncertainty Budget; 4.4 Focus Sensor; 4.5 Measuring Opportunities and Performance with Focus Sensor; 4.6 Focus Probe with SFM Cantilever; 4.7 Conclusion; Acknowledgements References5 Coordinate Measurements in Microsystems by Using AFM-Probing: Problems and Solutions; 5.1 Introduction; 5.2 Realizing CMMs for Microsystems; 5.3 Problems and Solutions; 5.3.1 Dynamics of Positioning System; 5.3.2 CMM: One-Millimeter Scan; 5.3.3 Measuring Strategies; 5.4 Conclusion and Outlook; References; 6 Metrological Large Range Scanning Force Microscope Applicable for Traceable Calibration of Surface Textures; 6.1 Introduction; 6.2 Instrumentation; 6.2.1 Principle; 6.2.2 Metrological Properties; 6.2.3 Traceability; 6.2.4 Specially Designed Features 6.3 Measurement Result of a 2D-Grating Standard6.3.1 Measurement Strategy; 6.3.2 Data Evaluation; 6.3.3 Measurement Result of the Mean Pitch Value; 6.3.4 Measurement of the Local Pitch Variation; 6.4 A Selected Measurement Result of a Microroughness Standard; 6.4.1 Measurement Result of a Glass Flatness Standard; 6.4.2 Measurement of a PTB Microroughness Standard; 6.4.3 Comparison of the Roughness Measurement Results Derived from SFM and Stylus Instruments Using Gaussian Filter; 6.4.4 Comparison Using Morphological Filters; 6.4.5 Evaluation Results Using PTB Reference Software 6.5 Outlook and Conclusion |
| Record Nr. | UNINA-9911019635603321 |
| Weinheim ; ; [Chichester?], : Wiley-VCH, c2005 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||