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IEEE transactions on radiation and plasma medical sciences
| IEEE transactions on radiation and plasma medical sciences |
| Pubbl/distr/stampa | Piscataway, NJ : , : IEEE, , 2017- |
| Disciplina | 530.442 |
| Soggetto topico |
Plasma (Ionized gases)
Medical sciences Radiation |
| Soggetto genere / forma | Periodicals. |
| ISSN | 2469-7303 |
| Formato | Materiale a stampa  |
| Livello bibliografico | Periodico |
| Lingua di pubblicazione | eng |
| Altri titoli varianti |
Transactions on radiation and plasma medical sciences
Institute of Electrical and Electronics Engineers transactions on radiation and plasma medical sciences IEEE TRPMS ITRPMS |
| Record Nr. | UNINA-9910625191403321 |
| Piscataway, NJ : , : IEEE, , 2017- | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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IEEE transactions on radiation and plasma medical sciences
| IEEE transactions on radiation and plasma medical sciences |
| Pubbl/distr/stampa | Piscataway, NJ : , : IEEE, , 2017- |
| Disciplina | 530.442 |
| Soggetto topico |
Plasma (Ionized gases)
Medical sciences Radiation |
| Soggetto genere / forma | Periodicals. |
| ISSN | 2469-7303 |
| Formato | Materiale a stampa |
| Livello bibliografico | Periodico |
| Lingua di pubblicazione | eng |
| Altri titoli varianti |
Transactions on radiation and plasma medical sciences
Institute of Electrical and Electronics Engineers transactions on radiation and plasma medical sciences IEEE TRPMS ITRPMS |
| Record Nr. | UNISA-996280810303316 |
| Piscataway, NJ : , : IEEE, , 2017- | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. di Salerno | ||
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Low temperature plasmas : fundamentals, technologies, and techniques / edited by Rainer Hippler ... [et al.]
| Low temperature plasmas : fundamentals, technologies, and techniques / edited by Rainer Hippler ... [et al.] |
| Edizione | [2nd, rev. and enl. ed.] |
| Pubbl/distr/stampa | Weinheim : Wiley-VCH |
| Descrizione fisica | 2 v. (xxxiii, 891 p.) : ill. (some col.) ; 25 cm. |
| Disciplina | 530.442 |
| Altri autori (Persone) | Hippler, R. |
| Soggetto topico |
Low temperature plasmas
Plasma (Ionized gases) |
| ISBN |
9783527406739 (hbk.)
3527406735 (hbk.) |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNISALENTO-991002122189707536 |
| Weinheim : Wiley-VCH | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. del Salento | ||
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Magnetogasdynamics and plasma dynamics( by Shih-i Pai
| Magnetogasdynamics and plasma dynamics( by Shih-i Pai |
| Autore | Pai, Shih-i |
| Pubbl/distr/stampa | Vienna : Springer-Verlag, 1962 |
| Descrizione fisica | 197 p. : ill. ; 25 cm. |
| Disciplina | 530.442 |
| Soggetto topico |
Magnetohydrodynamics
Plasma dynamics |
| Classificazione |
AMS 76W05
AMS 82D |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNISALENTO-991001099349707536 |
Pai, Shih-i
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| Vienna : Springer-Verlag, 1962 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. del Salento | ||
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Physics of collisionless shocks : space plasma shock waves / / Andre Balogh, Rudolf A. Treumann
| Physics of collisionless shocks : space plasma shock waves / / Andre Balogh, Rudolf A. Treumann |
| Autore | Balogh Andre |
| Edizione | [1st ed. 2013.] |
| Pubbl/distr/stampa | New York, : Springer, 2013 |
| Descrizione fisica | 1 online resource (501 p.) |
| Disciplina | 530.442 |
| Altri autori (Persone) | TreumannRudolf A |
| Collana | ISSI scientific report series |
| Soggetto topico |
Plasma waves
Shock waves Space plasmas |
| ISBN |
1-4614-6099-9
1-283-94573-8 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto | pt. 1. Collisionless shock theory -- pt. 2. Applications : two kinds of collisionless shocks in the heliosphere. |
| Record Nr. | UNINA-9910437979703321 |
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Balogh Andre
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| New York, : Springer, 2013 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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Plasma cathode electron sources [[electronic resource] ] : physics, technology, applications / / Efim Oks
| Plasma cathode electron sources [[electronic resource] ] : physics, technology, applications / / Efim Oks |
| Autore | Oks E. M |
| Pubbl/distr/stampa | Weinheim, : Wiley-VCH, 2006 |
| Descrizione fisica | 1 online resource (183 p.) |
| Disciplina | 530.442 |
| Soggetto topico |
Plasma (Ionized gases)
Ionized gases |
| ISBN |
1-280-92154-4
9786610921546 3-527-60941-5 3-527-60924-5 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Plasma Cathode Electron Sources; Contents; Preface; 1 Low-Pressure Discharges for Plasma Electron Sources; 1.1 Hollow-Cathode Discharge; 1.2 Discharges in Crossed Electric and Magnetic Fields; 1.3 Arc Discharges; 1.3.1 Vacuum-Arc Discharge; 1.3.2 Constricted Low-Pressure Arc Discharge; References; 2 Electron Emission from Plasma; 2.1 General Features of Electron Emission from Plasma; 2.1.1 Ion Extraction from Plasma; 2.1.2 Processes Associated with Electron Extraction from Plasma; 2.2 Control of Plasma Electron Emission Current; 2.2.1 Control of Steady-State Electron Current
2.2.2 Control of Electron Emission in Pulsed Mode2.3 Emission Characteristics of the Plasma of a Constricted Arc Discharge with an Extended Anode Section; 2.4 Electron Emission from Plasma at Fore-Vacuum Pressures; 2.5 Special Features of Electron Emission from Nonstationary Plasma; References; 3 Plasma Sources for Axially Symmetric Electron Beams; 3.1 Cylindrical Electron-Beam Sources Based on Hollow-Cathode Discharges; 3.2 Sources of Steady-State Focused Electron Beams; 3.3 Sources of Tubular Electron Beams; References; 4 Generation of Large-Cross-Section Beams in Plasma-Cathode Systems 4.1 Electron Sources with High Pulsed Energy Density4.2 Plasma Cathode Accelerators and Electron Sources with Microsecond Low-Pressure Arc Discharge; 4.3 Sub-Microsecond Pulsed Electron-Beam Sources; 4.4 Plasma-Cathode Large-Cross-Section Electron Sources Based on Hollow-Cathode Glow; 4.5 Pulsed Low-Energy Electron Sources; 4.6 Plasma-Cathode Electron Source for Ribbon Beam Production in the Fore-Vacuum Pressure Range; 4.6.1 Design of the Electron Source; 4.6.2 Characteristics of the Electron Source; 4.6.3 Parameters of the Plasma Sheet Generated by a Ribbon Electron Beam; References 5 Some Applications of Plasma-Cathode Electron Sources5.1 Electron-Beam Welding; 5.2 Electron-Beam Cladding of Wear-Resistant Materials; 5.3 Use of Low-Energy, High-Current Electron Beams for Surface Treatment; 5.4 Production of Carbon Coatings by Plasma Produced by a Ribbon Electron Beam at Fore-Vacuum Pressure; References; Conclusion; Subject Index |
| Record Nr. | UNINA-9910830622303321 |
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Oks E. M
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| Weinheim, : Wiley-VCH, 2006 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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Plasma cathode electron sources : physics, technology, applications / / Efim Oks
| Plasma cathode electron sources : physics, technology, applications / / Efim Oks |
| Autore | Oks E. M |
| Pubbl/distr/stampa | Weinheim, : Wiley-VCH, 2006 |
| Descrizione fisica | 1 online resource (183 p.) |
| Disciplina | 530.442 |
| Soggetto topico |
Plasma (Ionized gases)
Ionized gases |
| ISBN |
1-280-92154-4
9786610921546 3-527-60941-5 3-527-60924-5 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Plasma Cathode Electron Sources; Contents; Preface; 1 Low-Pressure Discharges for Plasma Electron Sources; 1.1 Hollow-Cathode Discharge; 1.2 Discharges in Crossed Electric and Magnetic Fields; 1.3 Arc Discharges; 1.3.1 Vacuum-Arc Discharge; 1.3.2 Constricted Low-Pressure Arc Discharge; References; 2 Electron Emission from Plasma; 2.1 General Features of Electron Emission from Plasma; 2.1.1 Ion Extraction from Plasma; 2.1.2 Processes Associated with Electron Extraction from Plasma; 2.2 Control of Plasma Electron Emission Current; 2.2.1 Control of Steady-State Electron Current
2.2.2 Control of Electron Emission in Pulsed Mode2.3 Emission Characteristics of the Plasma of a Constricted Arc Discharge with an Extended Anode Section; 2.4 Electron Emission from Plasma at Fore-Vacuum Pressures; 2.5 Special Features of Electron Emission from Nonstationary Plasma; References; 3 Plasma Sources for Axially Symmetric Electron Beams; 3.1 Cylindrical Electron-Beam Sources Based on Hollow-Cathode Discharges; 3.2 Sources of Steady-State Focused Electron Beams; 3.3 Sources of Tubular Electron Beams; References; 4 Generation of Large-Cross-Section Beams in Plasma-Cathode Systems 4.1 Electron Sources with High Pulsed Energy Density4.2 Plasma Cathode Accelerators and Electron Sources with Microsecond Low-Pressure Arc Discharge; 4.3 Sub-Microsecond Pulsed Electron-Beam Sources; 4.4 Plasma-Cathode Large-Cross-Section Electron Sources Based on Hollow-Cathode Glow; 4.5 Pulsed Low-Energy Electron Sources; 4.6 Plasma-Cathode Electron Source for Ribbon Beam Production in the Fore-Vacuum Pressure Range; 4.6.1 Design of the Electron Source; 4.6.2 Characteristics of the Electron Source; 4.6.3 Parameters of the Plasma Sheet Generated by a Ribbon Electron Beam; References 5 Some Applications of Plasma-Cathode Electron Sources5.1 Electron-Beam Welding; 5.2 Electron-Beam Cladding of Wear-Resistant Materials; 5.3 Use of Low-Energy, High-Current Electron Beams for Surface Treatment; 5.4 Production of Carbon Coatings by Plasma Produced by a Ribbon Electron Beam at Fore-Vacuum Pressure; References; Conclusion; Subject Index |
| Record Nr. | UNINA-9910877430703321 |
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Oks E. M
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| Weinheim, : Wiley-VCH, 2006 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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