Nanoscale processes on insulating surfaces [[electronic resource] /] / Enrico Gnecco, Marek Szymonski |
Autore | Gnecco Enrico |
Pubbl/distr/stampa | Singapore ; ; Hackensack, N.J., : World Scientific, c2009 |
Descrizione fisica | 1 online resource (201 p.) |
Disciplina | 530.4/275 |
Altri autori (Persone) | SzymońskiMarek |
Soggetto topico |
Scanning probe microscopy
Nanoelectronics Ionic crystals Thin films - Surfaces |
Soggetto genere / forma | Electronic books. |
ISBN |
1-282-75749-0
9786612757495 981-283-763-9 |
Formato | Materiale a stampa ![]() |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Nota di contenuto |
Contents; About the authors; Preface; 1. Crystal Structures of Insulating Surfaces; 1.1 Halide Surfaces; 1.1.1 Alkali halide surfaces; 1.1.2 Alkaline earth halide surfaces; 1.2 Oxide Surfaces; 1.2.1 True insulating oxide surfaces; 1.2.1.1 Aluminum oxide; 1.2.1.2 Magnesium oxide; 1.2.1.3 Silicon dioxide; 1.2.2 Mixed conducting oxide surfaces; 1.2.2.1 Titanium dioxide; 1.2.2.2 Zinc oxide; 1.2.2.3 Tin dioxide; 1.2.2.4 Cerium dioxide; 1.2.2.5 Strontium titanate; 2. Preparation Techniques of Insulating Surfaces; 2.1 Ultra High Vacuum.; 2.2 Preparation of Bulk Insulating Surfaces
2.2.1 Halide surfaces2.2.2 Oxide surfaces; 2.2.3 Nanostructuring of insulating surfaces; 2.2.3.1 Evaporation spirals on alkali halides; 2.2.3.2 Faceting of halide and oxide surfaces; 2.3 Deposition of Insulating Films, Metals and Organic Molecules; 2.3.1 Thin insulating films; 2.3.2 Metal adsorbates on insulators; 2.3.3 Organic molecules on insulators; 3. Scanning Probe Microscopy in Ultra High Vacuum; 3.1 Atomic Force Microscopy; 3.1.1 Relevant forces in AFM; 3.1.2 Contact AFM; 3.1.3 Non-contact AFM; 3.1.3.1 Tuning fork sensors; 3.1.4 Kelvin probe force microscopy 3.2 Scanning Tunneling Microscopy 3.2.1 Scanning tunneling microscopy; 3.2.2 Scanning tunneling spectroscopy; 3.3 Atomistic Modeling of SPM; 4. Scanning Probe Microscopy on Bulk Insulating Surfaces; 4.1 Halide Surfaces; 4.1.1 Alkali halide surfaces; 4.1.2 Alkaline earth halide surfaces; 4.2 Oxide Surfaces; 4.2.1 True insulating oxide surfaces; 4.2.1.1 Aluminum oxide; 4.2.1.2 Magnesium oxide; 4.2.1.3 Silicon dioxide; 4.2.2 Mixed conducting oxide surfaces; 4.2.2.1 Titanium dioxide; 4.2.2.2 Zinc oxide; 4.2.2.3 Tin dioxide; 4.2.2.4 Cerium dioxide; 4.2.2.5 Strontium titanate 4.3 Modeling AFM on Bulk Insulating Surfaces4.3.1 Halide surfaces; 4.3.2 Oxide surfaces; 5. Scanning Probe Microscopy on Thin Insulating Films; 5.1 Halide Films on Metals; 5.1.1 Carpet-like growth.; 5.1.2 Restructuring and patterning of vicinal surfaces; 5.1.3 Fractal growth at low temperatures; 5.2 Halide Films on Semiconductors; 5.3 Heteroepitaxial Growth of Alkali Halide Films; 5.4 Oxide Films; 5.5 Modeling AFM on Thin Insulating Films; 6. Interaction of Ions, Electrons and Photons with Halide Surfaces; 6.1 Ion Bombardment of Alkali Halides; 6.2 Electron and Photon Stimulated Desorption 6.2.1 Electron stimulated desorption 6.2.2 Photon stimulated desorption; 6.2.2.1 Desorption by excitation at threshold energies; 6.2.2.2 Desorption due to band-band excitation; 7. Surface Patterning with Electrons and Photons; 7.1 Surface Topography Modification by Electronic Excitations; 7.1.1 Layer-by-layer desorption; 7.1.2 Coexcitation with visible light; 7.2 Nanoscale Pits on Alkali Halide Surfaces; 7.2.1 Diffusion equation for F-centers; 8. Surface Patterning with Ions; 8.1 Ripple Formation by Ion Bombardment; 8.1.1 Linear continuum theory for ripple formation 8.1.2 Beyond the continuum theory |
Record Nr. | UNINA-9910455864303321 |
Gnecco Enrico
![]() |
||
Singapore ; ; Hackensack, N.J., : World Scientific, c2009 | ||
![]() | ||
Lo trovi qui: Univ. Federico II | ||
|
Nanoscale processes on insulating surfaces [[electronic resource] /] / Enrico Gnecco, Marek Szymonski |
Autore | Gnecco Enrico |
Pubbl/distr/stampa | Singapore ; ; Hackensack, N.J., : World Scientific, c2009 |
Descrizione fisica | 1 online resource (201 p.) |
Disciplina | 530.4/275 |
Altri autori (Persone) | SzymońskiMarek |
Soggetto topico |
Scanning probe microscopy
Nanoelectronics Ionic crystals Thin films - Surfaces |
ISBN |
1-282-75749-0
9786612757495 981-283-763-9 |
Formato | Materiale a stampa ![]() |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Nota di contenuto |
Contents; About the authors; Preface; 1. Crystal Structures of Insulating Surfaces; 1.1 Halide Surfaces; 1.1.1 Alkali halide surfaces; 1.1.2 Alkaline earth halide surfaces; 1.2 Oxide Surfaces; 1.2.1 True insulating oxide surfaces; 1.2.1.1 Aluminum oxide; 1.2.1.2 Magnesium oxide; 1.2.1.3 Silicon dioxide; 1.2.2 Mixed conducting oxide surfaces; 1.2.2.1 Titanium dioxide; 1.2.2.2 Zinc oxide; 1.2.2.3 Tin dioxide; 1.2.2.4 Cerium dioxide; 1.2.2.5 Strontium titanate; 2. Preparation Techniques of Insulating Surfaces; 2.1 Ultra High Vacuum.; 2.2 Preparation of Bulk Insulating Surfaces
2.2.1 Halide surfaces2.2.2 Oxide surfaces; 2.2.3 Nanostructuring of insulating surfaces; 2.2.3.1 Evaporation spirals on alkali halides; 2.2.3.2 Faceting of halide and oxide surfaces; 2.3 Deposition of Insulating Films, Metals and Organic Molecules; 2.3.1 Thin insulating films; 2.3.2 Metal adsorbates on insulators; 2.3.3 Organic molecules on insulators; 3. Scanning Probe Microscopy in Ultra High Vacuum; 3.1 Atomic Force Microscopy; 3.1.1 Relevant forces in AFM; 3.1.2 Contact AFM; 3.1.3 Non-contact AFM; 3.1.3.1 Tuning fork sensors; 3.1.4 Kelvin probe force microscopy 3.2 Scanning Tunneling Microscopy 3.2.1 Scanning tunneling microscopy; 3.2.2 Scanning tunneling spectroscopy; 3.3 Atomistic Modeling of SPM; 4. Scanning Probe Microscopy on Bulk Insulating Surfaces; 4.1 Halide Surfaces; 4.1.1 Alkali halide surfaces; 4.1.2 Alkaline earth halide surfaces; 4.2 Oxide Surfaces; 4.2.1 True insulating oxide surfaces; 4.2.1.1 Aluminum oxide; 4.2.1.2 Magnesium oxide; 4.2.1.3 Silicon dioxide; 4.2.2 Mixed conducting oxide surfaces; 4.2.2.1 Titanium dioxide; 4.2.2.2 Zinc oxide; 4.2.2.3 Tin dioxide; 4.2.2.4 Cerium dioxide; 4.2.2.5 Strontium titanate 4.3 Modeling AFM on Bulk Insulating Surfaces4.3.1 Halide surfaces; 4.3.2 Oxide surfaces; 5. Scanning Probe Microscopy on Thin Insulating Films; 5.1 Halide Films on Metals; 5.1.1 Carpet-like growth.; 5.1.2 Restructuring and patterning of vicinal surfaces; 5.1.3 Fractal growth at low temperatures; 5.2 Halide Films on Semiconductors; 5.3 Heteroepitaxial Growth of Alkali Halide Films; 5.4 Oxide Films; 5.5 Modeling AFM on Thin Insulating Films; 6. Interaction of Ions, Electrons and Photons with Halide Surfaces; 6.1 Ion Bombardment of Alkali Halides; 6.2 Electron and Photon Stimulated Desorption 6.2.1 Electron stimulated desorption 6.2.2 Photon stimulated desorption; 6.2.2.1 Desorption by excitation at threshold energies; 6.2.2.2 Desorption due to band-band excitation; 7. Surface Patterning with Electrons and Photons; 7.1 Surface Topography Modification by Electronic Excitations; 7.1.1 Layer-by-layer desorption; 7.1.2 Coexcitation with visible light; 7.2 Nanoscale Pits on Alkali Halide Surfaces; 7.2.1 Diffusion equation for F-centers; 8. Surface Patterning with Ions; 8.1 Ripple Formation by Ion Bombardment; 8.1.1 Linear continuum theory for ripple formation 8.1.2 Beyond the continuum theory |
Record Nr. | UNINA-9910780727703321 |
Gnecco Enrico
![]() |
||
Singapore ; ; Hackensack, N.J., : World Scientific, c2009 | ||
![]() | ||
Lo trovi qui: Univ. Federico II | ||
|
Nanoscale processes on insulating surfaces / / Enrico Gnecco, Marek Szymonski |
Autore | Gnecco Enrico |
Edizione | [1st ed.] |
Pubbl/distr/stampa | Singapore ; ; Hackensack, N.J., : World Scientific, c2009 |
Descrizione fisica | 1 online resource (201 p.) |
Disciplina | 530.4/275 |
Altri autori (Persone) | SzymońskiMarek |
Soggetto topico |
Scanning probe microscopy
Nanoelectronics Ionic crystals Thin films - Surfaces |
ISBN |
1-282-75749-0
9786612757495 981-283-763-9 |
Formato | Materiale a stampa ![]() |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Nota di contenuto |
Contents; About the authors; Preface; 1. Crystal Structures of Insulating Surfaces; 1.1 Halide Surfaces; 1.1.1 Alkali halide surfaces; 1.1.2 Alkaline earth halide surfaces; 1.2 Oxide Surfaces; 1.2.1 True insulating oxide surfaces; 1.2.1.1 Aluminum oxide; 1.2.1.2 Magnesium oxide; 1.2.1.3 Silicon dioxide; 1.2.2 Mixed conducting oxide surfaces; 1.2.2.1 Titanium dioxide; 1.2.2.2 Zinc oxide; 1.2.2.3 Tin dioxide; 1.2.2.4 Cerium dioxide; 1.2.2.5 Strontium titanate; 2. Preparation Techniques of Insulating Surfaces; 2.1 Ultra High Vacuum.; 2.2 Preparation of Bulk Insulating Surfaces
2.2.1 Halide surfaces2.2.2 Oxide surfaces; 2.2.3 Nanostructuring of insulating surfaces; 2.2.3.1 Evaporation spirals on alkali halides; 2.2.3.2 Faceting of halide and oxide surfaces; 2.3 Deposition of Insulating Films, Metals and Organic Molecules; 2.3.1 Thin insulating films; 2.3.2 Metal adsorbates on insulators; 2.3.3 Organic molecules on insulators; 3. Scanning Probe Microscopy in Ultra High Vacuum; 3.1 Atomic Force Microscopy; 3.1.1 Relevant forces in AFM; 3.1.2 Contact AFM; 3.1.3 Non-contact AFM; 3.1.3.1 Tuning fork sensors; 3.1.4 Kelvin probe force microscopy 3.2 Scanning Tunneling Microscopy 3.2.1 Scanning tunneling microscopy; 3.2.2 Scanning tunneling spectroscopy; 3.3 Atomistic Modeling of SPM; 4. Scanning Probe Microscopy on Bulk Insulating Surfaces; 4.1 Halide Surfaces; 4.1.1 Alkali halide surfaces; 4.1.2 Alkaline earth halide surfaces; 4.2 Oxide Surfaces; 4.2.1 True insulating oxide surfaces; 4.2.1.1 Aluminum oxide; 4.2.1.2 Magnesium oxide; 4.2.1.3 Silicon dioxide; 4.2.2 Mixed conducting oxide surfaces; 4.2.2.1 Titanium dioxide; 4.2.2.2 Zinc oxide; 4.2.2.3 Tin dioxide; 4.2.2.4 Cerium dioxide; 4.2.2.5 Strontium titanate 4.3 Modeling AFM on Bulk Insulating Surfaces4.3.1 Halide surfaces; 4.3.2 Oxide surfaces; 5. Scanning Probe Microscopy on Thin Insulating Films; 5.1 Halide Films on Metals; 5.1.1 Carpet-like growth.; 5.1.2 Restructuring and patterning of vicinal surfaces; 5.1.3 Fractal growth at low temperatures; 5.2 Halide Films on Semiconductors; 5.3 Heteroepitaxial Growth of Alkali Halide Films; 5.4 Oxide Films; 5.5 Modeling AFM on Thin Insulating Films; 6. Interaction of Ions, Electrons and Photons with Halide Surfaces; 6.1 Ion Bombardment of Alkali Halides; 6.2 Electron and Photon Stimulated Desorption 6.2.1 Electron stimulated desorption 6.2.2 Photon stimulated desorption; 6.2.2.1 Desorption by excitation at threshold energies; 6.2.2.2 Desorption due to band-band excitation; 7. Surface Patterning with Electrons and Photons; 7.1 Surface Topography Modification by Electronic Excitations; 7.1.1 Layer-by-layer desorption; 7.1.2 Coexcitation with visible light; 7.2 Nanoscale Pits on Alkali Halide Surfaces; 7.2.1 Diffusion equation for F-centers; 8. Surface Patterning with Ions; 8.1 Ripple Formation by Ion Bombardment; 8.1.1 Linear continuum theory for ripple formation 8.1.2 Beyond the continuum theory |
Record Nr. | UNINA-9910811307303321 |
Gnecco Enrico
![]() |
||
Singapore ; ; Hackensack, N.J., : World Scientific, c2009 | ||
![]() | ||
Lo trovi qui: Univ. Federico II | ||
|