Info
- Utilizzare la checkbox di selezione a fianco di ciascun documento per attivare le funzionalità di stampa, invio email, download nei formati disponibili del (i) record.
Design for Manufacturability with Advanced Lithography / / by Bei Yu, David Z. Pan
| Design for Manufacturability with Advanced Lithography / / by Bei Yu, David Z. Pan |
| Autore | Yu Bei |
| Edizione | [1st ed. 2016.] |
| Pubbl/distr/stampa | Cham : , : Springer International Publishing : , : Imprint : Springer, , 2016 |
| Descrizione fisica | 1 online resource (173 p.) |
| Disciplina | 620 |
| Soggetto topico |
Electronic circuits
Microprocessors Electronics Microelectronics Circuits and Systems Processor Architectures Electronics and Microelectronics, Instrumentation |
| ISBN | 3-319-20385-1 |
| Formato | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto | Introduction -- Layout Decomposition for Triple Patterning -- Layout Decomposition for Other Patterning Techniques -- Standard Cell Compliance and Placement Co-Optimization -- Design for Manufacturability with E-Beam Lithography -- Conclusions and Future Works.-. |
| Record Nr. | UNINA-9910254227003321 |
Yu Bei
|
||
| Cham : , : Springer International Publishing : , : Imprint : Springer, , 2016 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
A Synergistic Framework for Hardware IP Privacy and Integrity Protection / / by Meng Li, David Z. Pan
| A Synergistic Framework for Hardware IP Privacy and Integrity Protection / / by Meng Li, David Z. Pan |
| Autore | Li Meng |
| Edizione | [1st ed. 2020.] |
| Pubbl/distr/stampa | Cham : , : Springer International Publishing : , : Imprint : Springer, , 2020 |
| Descrizione fisica | 1 online resource (IX, 139 p. 74 illus., 67 illus. in color.) |
| Disciplina | 005.8 |
| Soggetto topico |
Electronic circuits
Computer engineering Internet of things Embedded computer systems Microprocessors Circuits and Systems Cyber-physical systems, IoT Processor Architectures |
| ISBN | 3-030-41247-4 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto | Introduction -- Practical Split Manufacturing Optimization -- IC Camouflaging Optimization and Evaluation -- Fault Attack Protection and Evaluation -- Conclusion. |
| Record Nr. | UNINA-9910392741003321 |
|
Li Meng
|
||
| Cham : , : Springer International Publishing : , : Imprint : Springer, , 2020 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||