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Plasma nanoscience : basic concepts and applications of deterministic nanofabrication / / Kostya Ostrikov
| Plasma nanoscience : basic concepts and applications of deterministic nanofabrication / / Kostya Ostrikov |
| Autore | Ostrikov K (Kostya) |
| Pubbl/distr/stampa | Weinheim : , : Wiley-VCH Verlag GmbH & Co. KGaA, , [2008] |
| Descrizione fisica | 1 online resource (566 p.) |
| Disciplina | 530.44 |
| Soggetto topico |
Low temperature plasmas
Nanostructured materials Plasma engineering |
| ISBN |
1-281-94721-0
9786611947217 3-527-62332-9 3-527-62331-0 |
| Formato | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Plasma Nanoscience; Contents; Preface; Acronyms; 1 Introduction; 1.1 Main Concepts and Issues; 1.2 Self-Organized Nanoworld, Commonsense Science of the Small and Socio-Economic Push; 1.3 Nature's Plasma Nanofab and Nanotechnology Research Directions; 1.4 Deterministic Nanofabrication and Plasma Nanoscience; 1.5 Structure of the Monograph and Advice to the Reader; 2 What Makes Low-Temperature Plasmas a Versatile Nanotool?; 2.1 Basic Ideas and Major Issues; 2.2 Plasma Nanofabrication Concept; 2.3 Useful Plasma Features for Nanoscale Fabrication
2.4 Choice and Generation of Building and Working Units2.5 Effect of the Plasma Sheath; 2.6 How Plasmas Affect Elementary Surface Processes; 2.7 Concluding Remarks; 3 Specific Examples and Practical Framework; 3.1 Semiconducting Nanofilms and Nanostructures; 3.2 Carbon-Based Nanofilms and Nanostructures; 3.3 Practical Framework - Bridging Nine Orders of Magnitude; 3.4 Concluding Remarks; 4 Generation of Building and Working Units; 4.1 Species in Methane-Based Plasmas for Synthesis of Carbon Nanostructures; 4.1.1 Experimental Details; 4.1.2 Basic Assumptions of the Model 4.1.3 Particle and Power Balance in Plasma Discharge4.1.4 Densities of Neutral and Charged Species; 4.1.4.1 Effect of RF Power; 4.1.4.2 Effect of Argon and Methane Dilution; 4.1.5 Deposited Neutral and Ion Fluxes; 4.1.6 Most Important Points and Summary; 4.2 Species in Acetylene-Based Plasmas for Synthesis of Carbon Nanostructures; 4.2.1 Formulation of the Problem; 4.2.2 Number Densities of the Main Discharge Species; 4.2.3 Fluxes of Building and Working Units; 4.3 Nanocluster and Nanoparticle Building Units; 4.3.1 Nano-Sized Building Units from Reactive Plasmas 4.3.2 Nanoparticle Generation: Other Examples4.4 Concluding Remarks; 5 Transport, Manipulation and Deposition of Building and Working Units; 5.1 Microscopic Ion Fluxes During Nanoassembly Processes; 5.1.1 Formulation and Model; 5.1.2 Numerical Results; 5.1.3 Interpretation of Numerical Results; 5.2 Nanoparticle Manipulation in the Synthesis of Carbon Nanostructures; 5.2.1 Nanoparticle Manipulation: Experimental Results; 5.2.2 Nanoparticle Manipulation: Numerical Model; 5.3 Selected-Area Nanoparticle Deposition Onto Microstructured Surfaces; 5.3.1 Numerical Model and Simulation Parameters 5.3.2 Selected-Area Nanoparticle Deposition5.3.3 Practical Implementation Framework; 5.4 Electrostatic Nanoparticle Filter; 5.5 Concluding Remarks; 6 Surface Science of Plasma-Exposed Surfaces and Self-Organization Processes; 6.1 Synthesis of Self-Organizing Arrays of Quantum Dots: Objectives and Approach; 6.2 Initial Stage of Ge/Si Nanodot Formation Using Nanocluster Fluxes; 6.2.1 Physical Model and Numerical Details; 6.2.2 Physical Interpretation and Relevant Experimental Data; 6.3 Binary Si(x)C(1-x) Quantum Dot Systems: Initial Growth Stage 6.3.1 Adatom Fluxes at Initial Growth Stages of Si(x)C(1-x) Quantum Dots |
| Record Nr. | UNINA-9910830407303321 |
Ostrikov K (Kostya)
|
||
| Weinheim : , : Wiley-VCH Verlag GmbH & Co. KGaA, , [2008] | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Plasma-aided nanofabrication [[electronic resource] ] : from plasma sources to nanoassembly / / Kostya (Ken) Ostrikov and Shuyan Xu
| Plasma-aided nanofabrication [[electronic resource] ] : from plasma sources to nanoassembly / / Kostya (Ken) Ostrikov and Shuyan Xu |
| Autore | Ostrikov K (Kostya) |
| Pubbl/distr/stampa | Weinheim, : Wiley-VCH, c2007 |
| Descrizione fisica | 1 online resource (317 p.) |
| Disciplina |
620.5
621.044 |
| Altri autori (Persone) | XuShuyan |
| Soggetto topico |
Low temperature plasmas
Manufacturing processes Nanostructured materials Plasma engineering |
| ISBN |
1-281-08802-1
9786611088026 3-527-61155-X 3-527-61156-8 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Plasma-Aided Nanofabrication; Contents; Preface; 1 Introduction; 1.1 What is a Plasma?; 1.2 Relevant Issues of Nanoscience and Nanotechnology; 1.3 Plasma-Assisted Synthesis of Nanomaterials; 1.4 How to Choose the Right Plasma for Applications in Nanotechnology?; 1.5 Structure of the Monograph and Advice to the Reader; 2 Generation of Highly Uniform, High-Density Inductively Coupled Plasma; 2.1 Low-Frequency ICP with a Flat External Spiral Coil: Plasma Source and Diagnostic Equipment; 2.1.1 Plasma Source; 2.1.2 Diagnostics of Inductively Coupled Plasmas
3 Plasma Sources: Meeting the Demands of Nanotechnology3.1 Inductively Coupled Plasma Source with Internal Oscillating Currents: Concept and Experimental Verification; 3.1.1 Configuration of the IOCPS; 3.1.2 RF Power Deposition; 3.1.3 Plasma Parameters; 3.2 IOCPS: Stability and Mode Transitions; 3.2.1 Optical Emission; 3.2.2 Self-Transitions of the IOCPS Discharge Modes; 3.3 ICP-Assisted DC Magnetron Sputtering Device; 3.3.1 Enhancement of DC Magnetron Sputtering by an Inductively Coupled Plasma Source; 3.3.2 Mode Transitions in ICP-Assisted Magnetron Sputtering Device 3.4 Integrated Plasma-Aided Nanofabrication Facility3.5 Concluding Remarks; 4 Carbon-Based Nanostructures; 4.1 Growth of Carbon Nanostructures on Unheated Substrates; 4.1.1 Process Details; 4.1.2 Synthesis, Characterization, and Growth Kinetics; 4.2 Temperature-Controlled Regime; 4.3 Single-Crystalline Carbon Nanotips: Experiment; 4.4 Single-Crystalline Carbon Nanotips: ab initio Simulations; 4.4.1 Theoretical Background and Numerical Code; 4.4.2 Geometrical Stability of Carbon Nanotip Structures; 4.4.3 Electronic Properties of Carbon Nanotips 4.5 Plasma-Assisted Doping and Functionalization of Carbon Nanostructures4.5.1 Doping of Carbon-Based Nanostructures: Density Functional Theory Considerations; 4.5.2 Postprocessing of Carbon-Based Nanostructures: Experiments; 4.6 Synthesis of Carbon Nanowall-Like Structures; 5 Quantum Confinement Structures; 5.1 Plasma-Assisted Fabrication of AlN Quantum Dots; 5.2 Nanofabrication of Al(x)In(1-x)N Quantum Dots: Plasma-Aided Bandgap Control; 5.3 Plasma-Aided Nanofabrication of SiC Quantum Dot Arrays; 5.3.1 SiC Properties and Applications; 5.3.2 SiC Growth Modes: With and Without AlN Interlayer 5.3.3 Quest for Crystallinity and Nanopattern Uniformity |
| Record Nr. | UNINA-9910144594603321 |
|
Ostrikov K (Kostya)
|
||
| Weinheim, : Wiley-VCH, c2007 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Plasma-aided nanofabrication [[electronic resource] ] : from plasma sources to nanoassembly / / Kostya (Ken) Ostrikov and Shuyan Xu
| Plasma-aided nanofabrication [[electronic resource] ] : from plasma sources to nanoassembly / / Kostya (Ken) Ostrikov and Shuyan Xu |
| Autore | Ostrikov K (Kostya) |
| Pubbl/distr/stampa | Weinheim, : Wiley-VCH, c2007 |
| Descrizione fisica | 1 online resource (317 p.) |
| Disciplina |
620.5
621.044 |
| Altri autori (Persone) | XuShuyan |
| Soggetto topico |
Low temperature plasmas
Manufacturing processes Nanostructured materials Plasma engineering |
| ISBN |
1-281-08802-1
9786611088026 3-527-61155-X 3-527-61156-8 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Plasma-Aided Nanofabrication; Contents; Preface; 1 Introduction; 1.1 What is a Plasma?; 1.2 Relevant Issues of Nanoscience and Nanotechnology; 1.3 Plasma-Assisted Synthesis of Nanomaterials; 1.4 How to Choose the Right Plasma for Applications in Nanotechnology?; 1.5 Structure of the Monograph and Advice to the Reader; 2 Generation of Highly Uniform, High-Density Inductively Coupled Plasma; 2.1 Low-Frequency ICP with a Flat External Spiral Coil: Plasma Source and Diagnostic Equipment; 2.1.1 Plasma Source; 2.1.2 Diagnostics of Inductively Coupled Plasmas
3 Plasma Sources: Meeting the Demands of Nanotechnology3.1 Inductively Coupled Plasma Source with Internal Oscillating Currents: Concept and Experimental Verification; 3.1.1 Configuration of the IOCPS; 3.1.2 RF Power Deposition; 3.1.3 Plasma Parameters; 3.2 IOCPS: Stability and Mode Transitions; 3.2.1 Optical Emission; 3.2.2 Self-Transitions of the IOCPS Discharge Modes; 3.3 ICP-Assisted DC Magnetron Sputtering Device; 3.3.1 Enhancement of DC Magnetron Sputtering by an Inductively Coupled Plasma Source; 3.3.2 Mode Transitions in ICP-Assisted Magnetron Sputtering Device 3.4 Integrated Plasma-Aided Nanofabrication Facility3.5 Concluding Remarks; 4 Carbon-Based Nanostructures; 4.1 Growth of Carbon Nanostructures on Unheated Substrates; 4.1.1 Process Details; 4.1.2 Synthesis, Characterization, and Growth Kinetics; 4.2 Temperature-Controlled Regime; 4.3 Single-Crystalline Carbon Nanotips: Experiment; 4.4 Single-Crystalline Carbon Nanotips: ab initio Simulations; 4.4.1 Theoretical Background and Numerical Code; 4.4.2 Geometrical Stability of Carbon Nanotip Structures; 4.4.3 Electronic Properties of Carbon Nanotips 4.5 Plasma-Assisted Doping and Functionalization of Carbon Nanostructures4.5.1 Doping of Carbon-Based Nanostructures: Density Functional Theory Considerations; 4.5.2 Postprocessing of Carbon-Based Nanostructures: Experiments; 4.6 Synthesis of Carbon Nanowall-Like Structures; 5 Quantum Confinement Structures; 5.1 Plasma-Assisted Fabrication of AlN Quantum Dots; 5.2 Nanofabrication of Al(x)In(1-x)N Quantum Dots: Plasma-Aided Bandgap Control; 5.3 Plasma-Aided Nanofabrication of SiC Quantum Dot Arrays; 5.3.1 SiC Properties and Applications; 5.3.2 SiC Growth Modes: With and Without AlN Interlayer 5.3.3 Quest for Crystallinity and Nanopattern Uniformity |
| Record Nr. | UNINA-9910830470903321 |
|
Ostrikov K (Kostya)
|
||
| Weinheim, : Wiley-VCH, c2007 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Plasma-aided nanofabrication : from plasma sources to nanoassembly / / Kostya (Ken) Ostrikov and Shuyan Xu
| Plasma-aided nanofabrication : from plasma sources to nanoassembly / / Kostya (Ken) Ostrikov and Shuyan Xu |
| Autore | Ostrikov K (Kostya) |
| Pubbl/distr/stampa | Weinheim, : Wiley-VCH, c2007 |
| Descrizione fisica | 1 online resource (317 p.) |
| Disciplina |
620.5
621.044 |
| Altri autori (Persone) | XuShuyan |
| Soggetto topico |
Low temperature plasmas
Manufacturing processes Nanostructured materials Plasma engineering |
| ISBN |
9786611088026
9781281088024 1281088021 9783527611553 352761155X 9783527611560 3527611568 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Plasma-Aided Nanofabrication; Contents; Preface; 1 Introduction; 1.1 What is a Plasma?; 1.2 Relevant Issues of Nanoscience and Nanotechnology; 1.3 Plasma-Assisted Synthesis of Nanomaterials; 1.4 How to Choose the Right Plasma for Applications in Nanotechnology?; 1.5 Structure of the Monograph and Advice to the Reader; 2 Generation of Highly Uniform, High-Density Inductively Coupled Plasma; 2.1 Low-Frequency ICP with a Flat External Spiral Coil: Plasma Source and Diagnostic Equipment; 2.1.1 Plasma Source; 2.1.2 Diagnostics of Inductively Coupled Plasmas
3 Plasma Sources: Meeting the Demands of Nanotechnology3.1 Inductively Coupled Plasma Source with Internal Oscillating Currents: Concept and Experimental Verification; 3.1.1 Configuration of the IOCPS; 3.1.2 RF Power Deposition; 3.1.3 Plasma Parameters; 3.2 IOCPS: Stability and Mode Transitions; 3.2.1 Optical Emission; 3.2.2 Self-Transitions of the IOCPS Discharge Modes; 3.3 ICP-Assisted DC Magnetron Sputtering Device; 3.3.1 Enhancement of DC Magnetron Sputtering by an Inductively Coupled Plasma Source; 3.3.2 Mode Transitions in ICP-Assisted Magnetron Sputtering Device 3.4 Integrated Plasma-Aided Nanofabrication Facility3.5 Concluding Remarks; 4 Carbon-Based Nanostructures; 4.1 Growth of Carbon Nanostructures on Unheated Substrates; 4.1.1 Process Details; 4.1.2 Synthesis, Characterization, and Growth Kinetics; 4.2 Temperature-Controlled Regime; 4.3 Single-Crystalline Carbon Nanotips: Experiment; 4.4 Single-Crystalline Carbon Nanotips: ab initio Simulations; 4.4.1 Theoretical Background and Numerical Code; 4.4.2 Geometrical Stability of Carbon Nanotip Structures; 4.4.3 Electronic Properties of Carbon Nanotips 4.5 Plasma-Assisted Doping and Functionalization of Carbon Nanostructures4.5.1 Doping of Carbon-Based Nanostructures: Density Functional Theory Considerations; 4.5.2 Postprocessing of Carbon-Based Nanostructures: Experiments; 4.6 Synthesis of Carbon Nanowall-Like Structures; 5 Quantum Confinement Structures; 5.1 Plasma-Assisted Fabrication of AlN Quantum Dots; 5.2 Nanofabrication of Al(x)In(1-x)N Quantum Dots: Plasma-Aided Bandgap Control; 5.3 Plasma-Aided Nanofabrication of SiC Quantum Dot Arrays; 5.3.1 SiC Properties and Applications; 5.3.2 SiC Growth Modes: With and Without AlN Interlayer 5.3.3 Quest for Crystallinity and Nanopattern Uniformity |
| Record Nr. | UNINA-9911019616703321 |
|
Ostrikov K (Kostya)
|
||
| Weinheim, : Wiley-VCH, c2007 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||