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Handbook of nitride semiconductors and devices . Vol. 1 Materials properties, physics and growth [[electronic resource] /] / Hadis Morkoc ʹ
| Handbook of nitride semiconductors and devices . Vol. 1 Materials properties, physics and growth [[electronic resource] /] / Hadis Morkoc ʹ |
| Autore | Morkoc ʹ Hadis |
| Pubbl/distr/stampa | Weinheim, : Wiley-VCH, 2008 |
| Descrizione fisica | 1 online resource (1323 p.) |
| Disciplina | 621.38152 |
| Altri autori (Persone) | Morkoc ʹHadis |
| Collana | Handbook of Nitride Semiconductors and Devices (VCH) |
| Soggetto topico |
Semiconductors - Materials
Nitrides |
| ISBN |
1-282-27935-1
9786612279355 3-527-62843-6 3-527-62846-0 |
| Formato | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Handbook of Nitride Semiconductors and Devices; Contents; Preface; Color Tables; 1 General Properties of Nitrides; Introduction; 1.1 Crystal Structure of Nitrides; 1.2 Gallium Nitride; 1.2.1 Chemical Properties of GaN; 1.2.2 Mechanical Properties of GaN; 1.2.3 Thermal Properties of GaN; 1.3 Aluminum Nitride; 1.3.1 Mechanical Properties of AlN; 1.3.2 Thermal and Chemical Properties of AlN; 1.3.3 Electrical Properties of AlN; 1.3.4 Brief Optical Properties of AlN; 1.4 Indium Nitride; 1.4.1 Crystal Structure of InN; 1.4.2 Mechanical Properties of InN; 1.4.3 Thermal Properties of InN
1.4.4 Brief Electrical Properties of InN1.4.5 Brief Optical Properties of InN; 1.5 Ternary and Quaternary Alloys; 1.5.1 AlGaN Alloy; 1.5.2 InGaN Alloy; 1.5.3 InAlN Alloy; 1.5.4 InAlGaN Quaternary Alloy; 1.5.5 Dilute GaAs(N); References; 2 Electronic Band Structure and Polarization Effects; Introduction; 2.1 Band Structure Calculations; 2.1.1 Plane Wave Expansion Method; 2.1.2 Orthogonalized Plane Wave (OPW) Method; 2.1.3 Pseudopotential Method; 2.1.4 Augmented Plane Wave (APW) Method; 2.1.5 Other Methods and a Review Pertinent to GaN; 2.2 General Strain Considerations 2.3 Effect of Strain on the Band Structure of GaN2.4 k·p Theory and the Quasi-Cubic Model; 2.5 Quasi-Cubic Approximation; 2.6 Temperature Dependence of Wurtzite GaN Bandgap; 2.7 Sphalerite (Zinc blende) GaN; 2.8 AlN; 2.8.1 Wurtzite AlN; 2.8.2 Zinc Blende AlN; 2.9 InN; 2.9.1 Wurtzitic InN; 2.9.2 Zinc Blende InN; 2.10 Band Parameters for Dilute Nitrides; 2.10.1 GaAsN; 2.10.2 InAsN; 2.10.3 InPN; 2.10.4 InSbN; 2.10.5 GaPN; 2.10.6 GaInAsN; 2.10.7 GaInPN; 2.10.8 GaAsSbN; 2.11 Confined States; 2.11.1 Conduction Band; 2.11.2 Valence Band; 2.11.3 Exciton Binding Energy in Quantum Wells 2.12 Polarization Effects2.12.1 Piezoelectric Polarization; 2.12.2 Spontaneous Polarization; 2.12.3 Nonlinearity of Polarization; 2.12.3.1 Origin of the Nonlinearity; 2.12.3.2 Nonlinearities in Spontaneous Polarization; 2.12.3.3 Nonlinearities in Piezoelectric Polarization; 2.12.4 Polarization in Heterostructures; 2.12.4.1 Ga-Polarity Single AlGaN/GaN Interface; 2.12.4.2 Ga-Polarity Single Al(x)In(1-x)N/GaN Interface; 2.12.5 Polarization in Quantum Wells; 2.12.5.1 Nonlinear Polarization in Quantum Wells; 2.12.5.2 InGaN/GaN Quantum Wells 2.12.6 Effect of Dislocations on Piezoelectric Polarization2.12.7 Thermal Mismatch Induced Strain; References; 3 Growth and Growth Methods for Nitride Semiconductors; Introduction; 3.1 Substrates for Nitride Epitaxy; 3.1.1 Conventional Substrates; 3.1.2 Compliant Substrates; 3.1.3 van der Waals Substrates; 3.2 A Primer on Conventional Substrates and their Preparation for Growth; 3.2.1 GaAs; 3.2.1.1 A Primer on GaAs; 3.2.1.2 Surface Preparation of GaAs for Epitaxy; 3.2.2 Si; 3.2.2.1 A Primer on Si; 3.2.2.2 Surface Preparation of Si for Epitaxy; 3.2.3 SiC; 3.2.3.1 A Primer on SiC 3.2.3.2 Surface Preparation of SiC for Epitaxy |
| Record Nr. | UNINA-9910139751203321 |
Morkoc ʹ Hadis
|
||
| Weinheim, : Wiley-VCH, 2008 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Handbook of nitride semiconductors and devices . Vol. 2 Electronic and optical processes in nitrides [[electronic resource] /] / Hadis Morkoc ʹ
| Handbook of nitride semiconductors and devices . Vol. 2 Electronic and optical processes in nitrides [[electronic resource] /] / Hadis Morkoc ʹ |
| Autore | Morkoc ʹ Hadis |
| Pubbl/distr/stampa | Weinheim, : Wiley-VCH |
| Descrizione fisica | 1 online resource (885 p.) |
| Disciplina | 621.38152 |
| Altri autori (Persone) | Morkoc ʹHadis |
| Collana | Handbook of Nitride Semiconductors and Devices (VCH) |
| Soggetto topico |
Semiconductors - Materials
Nitrides |
| ISBN |
1-282-27952-1
9786612279522 3-527-62841-X 3-527-62842-8 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Handbook of Nitride Semiconductors and Devices; Contents; Preface; Color Tables; 1 Metal Contacts to GaN and Processing; Introduction; 1.1 A Primer for Semiconductor-Metal Contacts; 1.2 Current Flow in Metal-Semiconductor Junctions; 1.2.1 The Regime Dominated by Thermionic Emission; 1.2.2 Thermionic Field Emission Regime; 1.2.3 Direct Tunneling Regime; 1.2.4 Leakage Current; 1.3 GaN Schottky Barriers for High-Voltage Rectifiers; 1.4 Ohmic Contact Resistance; 1.4.1 Specific Contact Resistivity; 1.4.2 Semiconductor Resistance; 1.5 Determination of the Contact Resistivity
1.6 Ohmic Contacts to GaN1.6.1 Nonalloyed Ohmic Contacts; 1.6.2 Alloyed Ohmic Contacts on n-Type GaN; 1.6.3 Contacts to p-Type GaN and Transparent Conducting Oxides; 1.6.4 Effect of Surface Treatment on Ohmic Contacts; 1.6.5 Case of a Forward-Biased p-n Junction in Conjunction with Nonohmic Contacts to p-GaN; 1.7 Structural Analysis of Ohmic Contacts on GaN; 1.8 Etching Techniques for III Nitrides; 1.8.1 Dry (Plasma) Etching; 1.8.1.1 Electron Cyclotron Resonance Etching; 1.8.1.2 Ion Milling; 1.8.1.3 Reactive Ion Etching; 1.8.1.4 Inductively Coupled Plasma Etching 1.8.1.5 Selective Etching of GaN/AlGaN1.8.1.6 Dry Etching of p-GaN; 1.8.1.7 Dry Etching on Ga- and N-Face of Freestanding GaN Substrate; 1.8.1.8 Magnetron Reactive Ion Etching; 1.8.1.9 Chemically Assisted Ion Beam Etching (CAIBE); 1.8.1.10 RF Plasma Etching of GaN; 1.8.2 Laser Ablation Etching of GaN; 1.8.3 Wet Etching; 1.8.4 Photochemical Etching; 1.9 Implant Isolation; 1.10 Process Damage; References; 2 Determination of Impurity and Carrier Concentrations; Introduction; 2.1 Impurity Binding Energy; 2.2 Conductivity Type: Hot Probe and Hall Measurements; 2.2.1 Measurement of Mobility 2.3 Semiconductor Statistics, Density of States, and Carrier Concentration2.3.1 Degeneracy Factor; 2.3.2 Charge Balance Equation and Carrier Concentration; 2.3.2.1 n-Type Semiconductor; 2.3.2.2 p-Type Semiconductor; 2.3.2.3 Multiple Occupancy of the Valence Bands; 2.4 Capacitance-Voltage Measurements; Appendix 2.A. Fermi Integral; Appendix 2.B. Density of States in 3D, 2D, and 1D Systems; 2.B.1. Three-Dimensional Structure; 2.B.2. Two-Dimensional Structure; 2.B.3. One-Dimensional Structure; References; 3 Carrier Transport; 3.1 Prelude; 3.2 Carrier Scattering 3.2.1 Boltzmann Transport Equation3.2.2 Impurity Scattering; 3.2.2.1 Ionized Impurity Scattering; 3.2.2.2 Neutral Impurity Scattering; 3.2.3 Acoustic Phonon Scattering; 3.2.3.1 Deformation Potential Scattering; 3.2.3.2 Piezoelectric Scattering; 3.2.4 Optical Phonon Scattering; 3.2.4.1 Nonpolar Optical Phonon Scattering; 3.2.4.2 Polar Optical Phonon Scattering; 3.2.5 Short-Range Potential-Induced Scattering; 3.2.5.1 Alloy Potential-Induced Scattering; 3.2.5.2 Potential Barrier Scattering; 3.2.5.3 Potential Well Scattering; 3.2.5.4 Space Charge Scattering; 3.2.5.5 Dipole Scattering 3.2.6 Carrier-Carrier Scattering |
| Record Nr. | UNINA-9910139771403321 |
|
Morkoc ʹ Hadis
|
||
| Weinheim, : Wiley-VCH | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Handbook of nitride semiconductors and devices . Vol. 1 Materials properties, physics and growth [[electronic resource] /] / Hadis Morkoc ʹ
| Handbook of nitride semiconductors and devices . Vol. 1 Materials properties, physics and growth [[electronic resource] /] / Hadis Morkoc ʹ |
| Autore | Morkoc ʹ Hadis |
| Pubbl/distr/stampa | Weinheim, : Wiley-VCH, 2008 |
| Descrizione fisica | 1 online resource (1323 p.) |
| Disciplina | 621.38152 |
| Altri autori (Persone) | Morkoc ʹHadis |
| Collana | Handbook of Nitride Semiconductors and Devices (VCH) |
| Soggetto topico |
Semiconductors - Materials
Nitrides |
| ISBN |
1-282-27935-1
9786612279355 3-527-62843-6 3-527-62846-0 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Handbook of Nitride Semiconductors and Devices; Contents; Preface; Color Tables; 1 General Properties of Nitrides; Introduction; 1.1 Crystal Structure of Nitrides; 1.2 Gallium Nitride; 1.2.1 Chemical Properties of GaN; 1.2.2 Mechanical Properties of GaN; 1.2.3 Thermal Properties of GaN; 1.3 Aluminum Nitride; 1.3.1 Mechanical Properties of AlN; 1.3.2 Thermal and Chemical Properties of AlN; 1.3.3 Electrical Properties of AlN; 1.3.4 Brief Optical Properties of AlN; 1.4 Indium Nitride; 1.4.1 Crystal Structure of InN; 1.4.2 Mechanical Properties of InN; 1.4.3 Thermal Properties of InN
1.4.4 Brief Electrical Properties of InN1.4.5 Brief Optical Properties of InN; 1.5 Ternary and Quaternary Alloys; 1.5.1 AlGaN Alloy; 1.5.2 InGaN Alloy; 1.5.3 InAlN Alloy; 1.5.4 InAlGaN Quaternary Alloy; 1.5.5 Dilute GaAs(N); References; 2 Electronic Band Structure and Polarization Effects; Introduction; 2.1 Band Structure Calculations; 2.1.1 Plane Wave Expansion Method; 2.1.2 Orthogonalized Plane Wave (OPW) Method; 2.1.3 Pseudopotential Method; 2.1.4 Augmented Plane Wave (APW) Method; 2.1.5 Other Methods and a Review Pertinent to GaN; 2.2 General Strain Considerations 2.3 Effect of Strain on the Band Structure of GaN2.4 k·p Theory and the Quasi-Cubic Model; 2.5 Quasi-Cubic Approximation; 2.6 Temperature Dependence of Wurtzite GaN Bandgap; 2.7 Sphalerite (Zinc blende) GaN; 2.8 AlN; 2.8.1 Wurtzite AlN; 2.8.2 Zinc Blende AlN; 2.9 InN; 2.9.1 Wurtzitic InN; 2.9.2 Zinc Blende InN; 2.10 Band Parameters for Dilute Nitrides; 2.10.1 GaAsN; 2.10.2 InAsN; 2.10.3 InPN; 2.10.4 InSbN; 2.10.5 GaPN; 2.10.6 GaInAsN; 2.10.7 GaInPN; 2.10.8 GaAsSbN; 2.11 Confined States; 2.11.1 Conduction Band; 2.11.2 Valence Band; 2.11.3 Exciton Binding Energy in Quantum Wells 2.12 Polarization Effects2.12.1 Piezoelectric Polarization; 2.12.2 Spontaneous Polarization; 2.12.3 Nonlinearity of Polarization; 2.12.3.1 Origin of the Nonlinearity; 2.12.3.2 Nonlinearities in Spontaneous Polarization; 2.12.3.3 Nonlinearities in Piezoelectric Polarization; 2.12.4 Polarization in Heterostructures; 2.12.4.1 Ga-Polarity Single AlGaN/GaN Interface; 2.12.4.2 Ga-Polarity Single Al(x)In(1-x)N/GaN Interface; 2.12.5 Polarization in Quantum Wells; 2.12.5.1 Nonlinear Polarization in Quantum Wells; 2.12.5.2 InGaN/GaN Quantum Wells 2.12.6 Effect of Dislocations on Piezoelectric Polarization2.12.7 Thermal Mismatch Induced Strain; References; 3 Growth and Growth Methods for Nitride Semiconductors; Introduction; 3.1 Substrates for Nitride Epitaxy; 3.1.1 Conventional Substrates; 3.1.2 Compliant Substrates; 3.1.3 van der Waals Substrates; 3.2 A Primer on Conventional Substrates and their Preparation for Growth; 3.2.1 GaAs; 3.2.1.1 A Primer on GaAs; 3.2.1.2 Surface Preparation of GaAs for Epitaxy; 3.2.2 Si; 3.2.2.1 A Primer on Si; 3.2.2.2 Surface Preparation of Si for Epitaxy; 3.2.3 SiC; 3.2.3.1 A Primer on SiC 3.2.3.2 Surface Preparation of SiC for Epitaxy |
| Record Nr. | UNINA-9910830413403321 |
|
Morkoc ʹ Hadis
|
||
| Weinheim, : Wiley-VCH, 2008 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Handbook of nitride semiconductors and devices . Vol. 2 Electronic and optical processes in nitrides [[electronic resource] /] / Hadis Morkoc ʹ
| Handbook of nitride semiconductors and devices . Vol. 2 Electronic and optical processes in nitrides [[electronic resource] /] / Hadis Morkoc ʹ |
| Autore | Morkoc ʹ Hadis |
| Pubbl/distr/stampa | Weinheim, : Wiley-VCH |
| Descrizione fisica | 1 online resource (885 p.) |
| Disciplina | 621.38152 |
| Altri autori (Persone) | Morkoc ʹHadis |
| Collana | Handbook of Nitride Semiconductors and Devices (VCH) |
| Soggetto topico |
Semiconductors - Materials
Nitrides |
| ISBN |
1-282-27952-1
9786612279522 3-527-62841-X 3-527-62842-8 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Handbook of Nitride Semiconductors and Devices; Contents; Preface; Color Tables; 1 Metal Contacts to GaN and Processing; Introduction; 1.1 A Primer for Semiconductor-Metal Contacts; 1.2 Current Flow in Metal-Semiconductor Junctions; 1.2.1 The Regime Dominated by Thermionic Emission; 1.2.2 Thermionic Field Emission Regime; 1.2.3 Direct Tunneling Regime; 1.2.4 Leakage Current; 1.3 GaN Schottky Barriers for High-Voltage Rectifiers; 1.4 Ohmic Contact Resistance; 1.4.1 Specific Contact Resistivity; 1.4.2 Semiconductor Resistance; 1.5 Determination of the Contact Resistivity
1.6 Ohmic Contacts to GaN1.6.1 Nonalloyed Ohmic Contacts; 1.6.2 Alloyed Ohmic Contacts on n-Type GaN; 1.6.3 Contacts to p-Type GaN and Transparent Conducting Oxides; 1.6.4 Effect of Surface Treatment on Ohmic Contacts; 1.6.5 Case of a Forward-Biased p-n Junction in Conjunction with Nonohmic Contacts to p-GaN; 1.7 Structural Analysis of Ohmic Contacts on GaN; 1.8 Etching Techniques for III Nitrides; 1.8.1 Dry (Plasma) Etching; 1.8.1.1 Electron Cyclotron Resonance Etching; 1.8.1.2 Ion Milling; 1.8.1.3 Reactive Ion Etching; 1.8.1.4 Inductively Coupled Plasma Etching 1.8.1.5 Selective Etching of GaN/AlGaN1.8.1.6 Dry Etching of p-GaN; 1.8.1.7 Dry Etching on Ga- and N-Face of Freestanding GaN Substrate; 1.8.1.8 Magnetron Reactive Ion Etching; 1.8.1.9 Chemically Assisted Ion Beam Etching (CAIBE); 1.8.1.10 RF Plasma Etching of GaN; 1.8.2 Laser Ablation Etching of GaN; 1.8.3 Wet Etching; 1.8.4 Photochemical Etching; 1.9 Implant Isolation; 1.10 Process Damage; References; 2 Determination of Impurity and Carrier Concentrations; Introduction; 2.1 Impurity Binding Energy; 2.2 Conductivity Type: Hot Probe and Hall Measurements; 2.2.1 Measurement of Mobility 2.3 Semiconductor Statistics, Density of States, and Carrier Concentration2.3.1 Degeneracy Factor; 2.3.2 Charge Balance Equation and Carrier Concentration; 2.3.2.1 n-Type Semiconductor; 2.3.2.2 p-Type Semiconductor; 2.3.2.3 Multiple Occupancy of the Valence Bands; 2.4 Capacitance-Voltage Measurements; Appendix 2.A. Fermi Integral; Appendix 2.B. Density of States in 3D, 2D, and 1D Systems; 2.B.1. Three-Dimensional Structure; 2.B.2. Two-Dimensional Structure; 2.B.3. One-Dimensional Structure; References; 3 Carrier Transport; 3.1 Prelude; 3.2 Carrier Scattering 3.2.1 Boltzmann Transport Equation3.2.2 Impurity Scattering; 3.2.2.1 Ionized Impurity Scattering; 3.2.2.2 Neutral Impurity Scattering; 3.2.3 Acoustic Phonon Scattering; 3.2.3.1 Deformation Potential Scattering; 3.2.3.2 Piezoelectric Scattering; 3.2.4 Optical Phonon Scattering; 3.2.4.1 Nonpolar Optical Phonon Scattering; 3.2.4.2 Polar Optical Phonon Scattering; 3.2.5 Short-Range Potential-Induced Scattering; 3.2.5.1 Alloy Potential-Induced Scattering; 3.2.5.2 Potential Barrier Scattering; 3.2.5.3 Potential Well Scattering; 3.2.5.4 Space Charge Scattering; 3.2.5.5 Dipole Scattering 3.2.6 Carrier-Carrier Scattering |
| Record Nr. | UNINA-9910830095503321 |
|
Morkoc ʹ Hadis
|
||
| Weinheim, : Wiley-VCH | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||