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Unconventional nanopatterning techniques and applications [[electronic resource] /] / John A. Rogers, Hong H. Lee
| Unconventional nanopatterning techniques and applications [[electronic resource] /] / John A. Rogers, Hong H. Lee |
| Autore | Rogers John A |
| Pubbl/distr/stampa | Hoboken, N.J., : Wiley, c2009 |
| Descrizione fisica | 1 online resource (616 p.) |
| Disciplina |
620
620.5 |
| Altri autori (Persone) | LeeHong H |
| Soggetto topico |
Nanoparticles
Nanostructured materials |
| ISBN |
1-281-93858-0
9786611938581 0-470-40578-3 0-470-40577-5 |
| Formato | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
UNCONVENTIONAL NANOPATTERNING TECHNIQUES AND APPLICATIONS; CONTENTS; PREFACE; I NANOPATTERNING TECHNIQUES; 1 INTRODUCTION; 2 MATERIALS; 2.1 Introduction; 2.2 Mold Materials and Mold Preparation; 2.2.1 Soft Molds; 2.2.2 Hard Molds; 2.2.3 Rigiflex Molds; 2.3 Surface Treatment and Modification; References; 3 PATTERNING BASED ON NATURAL FORCE; 3.1 Introduction; 3.2 Capillary Force; 3.2.1 Open-Ended Capillary; 3.2.2 Closed Permeable Capillary; 3.2.3 Completely Closed Capillary; 3.2.4 Fast Patterning; 3.2.5 Capillary Kinetics; 3.3 London Force and Liquid Filament Stability
3.3.1 Patterning by Selective Dewetting3.3.2 Liquid Filament Stability: Filling and Patterning; 3.4 Mechanical Stress: Patterning of A Metal Surface; References; 4 PATTERNING BASED ON WORK OF ADHESION; 4.1 Introduction; 4.2 Work of Adhesion; 4.3 Kinetic Effects; 4.4 Transfer Patterning; 4.5 Subtractive Transfer Patterning; 4.6 Transfer Printing; References; 5 PATTERNING BASED ON LIGHT: OPTICAL SOFT LITHOGRAPHY; 5.1 Introduction; 5.2 System Elements; 5.2.1 Overview; 5.2.2 Elastomeric Photomasks; 5.2.3 Photosensitive Materials; 5.3 Two-Dimensional Optical Soft Lithography (OSL) 5.3.1 Two-Dimensional OSL with Phase Masks5.3.2 Two-Dimensional OSL with Embossed Masks; 5.3.3 Two-Dimensional OSL with Amplitude Masks; 5.3.4 Two-Dimensional OSL with Amplitude/Phase Masks; 5.4 Three-Dimensional Optical Soft Lithography; 5.4.1 Optics; 5.4.2 Patterning Results; 5.5 Applications; 5.5.1 Low-Voltage Organic Electronics; 5.5.2 Filters and Mixers for Microfluidics; 5.5.3 High Energy Fusion Targets and Media for Chemical Release; 5.5.4 Photonic Bandgap Materials; References; 6 PATTERNING BASED ON EXTERNAL FORCE: NANOIMPRINT LITHOGRAPHY; 6.1 Introduction; 6.2 NIL MOLD 6.2.1 Mold Fabrication6.2.2 Mold Surface Preparation; 6.2.3 Flexible Fluoropolymer Mold; 6.3 NIL Resist; 6.3.1 Thermoplastic Resist; 6.3.2 Copolymer Thermoplastic Resists; 6.3.3 Thermal-Curable Resists; 6.3.4 UV-Curable Resist; 6.3.5 Other Imprintable Materials; 6.4 The Nanoimprint Process; 6.4.1 Cavity Fill Process; 6.5 Variations of NIL Processes; 6.5.1 Reverse Nanoimprint; 6.5.2 Combined Nanoimprint and Photolithography; 6.5.3 Roll-to-Roll Nanoimprint Lithography (R2RNIL); 6.6 Conclusion; References; 7 PATTERNING BASED ON EDGE EFFECTS: EDGE LITHOGRAPHY; 7.1 Introduction 7.2 Topography-Directed Pattern Transfer7.2.1 Photolithography with Phase-Shifting Masks; 7.2.2 Use of Edge-Defined Defects in SAMs; 7.2.3 Controlled Undercutting; 7.2.4 Edge-Spreading Lithography; 7.2.5 Edge Transfer Lithography; 7.2.6 Step-Edge Decoration; 7.3 Exposure of Nanoscale Edges; 7.3.1 Fracturing of Thin Films; 7.3.2 Sectioning of Encapsulated Thin Films; 7.3.3 Thin Metallic Films along Sidewalls of Patterned Stamps; 7.3.4 Topographic Reorientation; 7.4 Conclusion and Outlook; References; 8 PATTERNING WITH ELECTROLYTE: SOLID-STATE SUPERIONIC STAMPING; 8.1 Introduction 8.2 Solid-State Superionic Stamping |
| Record Nr. | UNINA-9910144099203321 |
Rogers John A
|
||
| Hoboken, N.J., : Wiley, c2009 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Unconventional nanopatterning techniques and applications [[electronic resource] /] / John A. Rogers, Hong H. Lee
| Unconventional nanopatterning techniques and applications [[electronic resource] /] / John A. Rogers, Hong H. Lee |
| Autore | Rogers John A |
| Pubbl/distr/stampa | Hoboken, N.J., : Wiley, c2009 |
| Descrizione fisica | 1 online resource (616 p.) |
| Disciplina |
620
620.5 |
| Altri autori (Persone) | LeeHong H |
| Soggetto topico |
Nanoparticles
Nanostructured materials |
| ISBN |
1-281-93858-0
9786611938581 0-470-40578-3 0-470-40577-5 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
UNCONVENTIONAL NANOPATTERNING TECHNIQUES AND APPLICATIONS; CONTENTS; PREFACE; I NANOPATTERNING TECHNIQUES; 1 INTRODUCTION; 2 MATERIALS; 2.1 Introduction; 2.2 Mold Materials and Mold Preparation; 2.2.1 Soft Molds; 2.2.2 Hard Molds; 2.2.3 Rigiflex Molds; 2.3 Surface Treatment and Modification; References; 3 PATTERNING BASED ON NATURAL FORCE; 3.1 Introduction; 3.2 Capillary Force; 3.2.1 Open-Ended Capillary; 3.2.2 Closed Permeable Capillary; 3.2.3 Completely Closed Capillary; 3.2.4 Fast Patterning; 3.2.5 Capillary Kinetics; 3.3 London Force and Liquid Filament Stability
3.3.1 Patterning by Selective Dewetting3.3.2 Liquid Filament Stability: Filling and Patterning; 3.4 Mechanical Stress: Patterning of A Metal Surface; References; 4 PATTERNING BASED ON WORK OF ADHESION; 4.1 Introduction; 4.2 Work of Adhesion; 4.3 Kinetic Effects; 4.4 Transfer Patterning; 4.5 Subtractive Transfer Patterning; 4.6 Transfer Printing; References; 5 PATTERNING BASED ON LIGHT: OPTICAL SOFT LITHOGRAPHY; 5.1 Introduction; 5.2 System Elements; 5.2.1 Overview; 5.2.2 Elastomeric Photomasks; 5.2.3 Photosensitive Materials; 5.3 Two-Dimensional Optical Soft Lithography (OSL) 5.3.1 Two-Dimensional OSL with Phase Masks5.3.2 Two-Dimensional OSL with Embossed Masks; 5.3.3 Two-Dimensional OSL with Amplitude Masks; 5.3.4 Two-Dimensional OSL with Amplitude/Phase Masks; 5.4 Three-Dimensional Optical Soft Lithography; 5.4.1 Optics; 5.4.2 Patterning Results; 5.5 Applications; 5.5.1 Low-Voltage Organic Electronics; 5.5.2 Filters and Mixers for Microfluidics; 5.5.3 High Energy Fusion Targets and Media for Chemical Release; 5.5.4 Photonic Bandgap Materials; References; 6 PATTERNING BASED ON EXTERNAL FORCE: NANOIMPRINT LITHOGRAPHY; 6.1 Introduction; 6.2 NIL MOLD 6.2.1 Mold Fabrication6.2.2 Mold Surface Preparation; 6.2.3 Flexible Fluoropolymer Mold; 6.3 NIL Resist; 6.3.1 Thermoplastic Resist; 6.3.2 Copolymer Thermoplastic Resists; 6.3.3 Thermal-Curable Resists; 6.3.4 UV-Curable Resist; 6.3.5 Other Imprintable Materials; 6.4 The Nanoimprint Process; 6.4.1 Cavity Fill Process; 6.5 Variations of NIL Processes; 6.5.1 Reverse Nanoimprint; 6.5.2 Combined Nanoimprint and Photolithography; 6.5.3 Roll-to-Roll Nanoimprint Lithography (R2RNIL); 6.6 Conclusion; References; 7 PATTERNING BASED ON EDGE EFFECTS: EDGE LITHOGRAPHY; 7.1 Introduction 7.2 Topography-Directed Pattern Transfer7.2.1 Photolithography with Phase-Shifting Masks; 7.2.2 Use of Edge-Defined Defects in SAMs; 7.2.3 Controlled Undercutting; 7.2.4 Edge-Spreading Lithography; 7.2.5 Edge Transfer Lithography; 7.2.6 Step-Edge Decoration; 7.3 Exposure of Nanoscale Edges; 7.3.1 Fracturing of Thin Films; 7.3.2 Sectioning of Encapsulated Thin Films; 7.3.3 Thin Metallic Films along Sidewalls of Patterned Stamps; 7.3.4 Topographic Reorientation; 7.4 Conclusion and Outlook; References; 8 PATTERNING WITH ELECTROLYTE: SOLID-STATE SUPERIONIC STAMPING; 8.1 Introduction 8.2 Solid-State Superionic Stamping |
| Record Nr. | UNINA-9910830446403321 |
|
Rogers John A
|
||
| Hoboken, N.J., : Wiley, c2009 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Unconventional nanopatterning techniques and applications / / John A. Rogers, Hong H. Lee
| Unconventional nanopatterning techniques and applications / / John A. Rogers, Hong H. Lee |
| Autore | Rogers John A |
| Pubbl/distr/stampa | Hoboken, N.J., : Wiley, c2009 |
| Descrizione fisica | 1 online resource (616 p.) |
| Disciplina | 620/.5 |
| Altri autori (Persone) | LeeHong H |
| Soggetto topico |
Nanoparticles
Nanostructured materials |
| ISBN |
9786611938581
9781281938589 1281938580 9780470405789 0470405783 9780470405772 0470405775 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
UNCONVENTIONAL NANOPATTERNING TECHNIQUES AND APPLICATIONS; CONTENTS; PREFACE; I NANOPATTERNING TECHNIQUES; 1 INTRODUCTION; 2 MATERIALS; 2.1 Introduction; 2.2 Mold Materials and Mold Preparation; 2.2.1 Soft Molds; 2.2.2 Hard Molds; 2.2.3 Rigiflex Molds; 2.3 Surface Treatment and Modification; References; 3 PATTERNING BASED ON NATURAL FORCE; 3.1 Introduction; 3.2 Capillary Force; 3.2.1 Open-Ended Capillary; 3.2.2 Closed Permeable Capillary; 3.2.3 Completely Closed Capillary; 3.2.4 Fast Patterning; 3.2.5 Capillary Kinetics; 3.3 London Force and Liquid Filament Stability
3.3.1 Patterning by Selective Dewetting3.3.2 Liquid Filament Stability: Filling and Patterning; 3.4 Mechanical Stress: Patterning of A Metal Surface; References; 4 PATTERNING BASED ON WORK OF ADHESION; 4.1 Introduction; 4.2 Work of Adhesion; 4.3 Kinetic Effects; 4.4 Transfer Patterning; 4.5 Subtractive Transfer Patterning; 4.6 Transfer Printing; References; 5 PATTERNING BASED ON LIGHT: OPTICAL SOFT LITHOGRAPHY; 5.1 Introduction; 5.2 System Elements; 5.2.1 Overview; 5.2.2 Elastomeric Photomasks; 5.2.3 Photosensitive Materials; 5.3 Two-Dimensional Optical Soft Lithography (OSL) 5.3.1 Two-Dimensional OSL with Phase Masks5.3.2 Two-Dimensional OSL with Embossed Masks; 5.3.3 Two-Dimensional OSL with Amplitude Masks; 5.3.4 Two-Dimensional OSL with Amplitude/Phase Masks; 5.4 Three-Dimensional Optical Soft Lithography; 5.4.1 Optics; 5.4.2 Patterning Results; 5.5 Applications; 5.5.1 Low-Voltage Organic Electronics; 5.5.2 Filters and Mixers for Microfluidics; 5.5.3 High Energy Fusion Targets and Media for Chemical Release; 5.5.4 Photonic Bandgap Materials; References; 6 PATTERNING BASED ON EXTERNAL FORCE: NANOIMPRINT LITHOGRAPHY; 6.1 Introduction; 6.2 NIL MOLD 6.2.1 Mold Fabrication6.2.2 Mold Surface Preparation; 6.2.3 Flexible Fluoropolymer Mold; 6.3 NIL Resist; 6.3.1 Thermoplastic Resist; 6.3.2 Copolymer Thermoplastic Resists; 6.3.3 Thermal-Curable Resists; 6.3.4 UV-Curable Resist; 6.3.5 Other Imprintable Materials; 6.4 The Nanoimprint Process; 6.4.1 Cavity Fill Process; 6.5 Variations of NIL Processes; 6.5.1 Reverse Nanoimprint; 6.5.2 Combined Nanoimprint and Photolithography; 6.5.3 Roll-to-Roll Nanoimprint Lithography (R2RNIL); 6.6 Conclusion; References; 7 PATTERNING BASED ON EDGE EFFECTS: EDGE LITHOGRAPHY; 7.1 Introduction 7.2 Topography-Directed Pattern Transfer7.2.1 Photolithography with Phase-Shifting Masks; 7.2.2 Use of Edge-Defined Defects in SAMs; 7.2.3 Controlled Undercutting; 7.2.4 Edge-Spreading Lithography; 7.2.5 Edge Transfer Lithography; 7.2.6 Step-Edge Decoration; 7.3 Exposure of Nanoscale Edges; 7.3.1 Fracturing of Thin Films; 7.3.2 Sectioning of Encapsulated Thin Films; 7.3.3 Thin Metallic Films along Sidewalls of Patterned Stamps; 7.3.4 Topographic Reorientation; 7.4 Conclusion and Outlook; References; 8 PATTERNING WITH ELECTROLYTE: SOLID-STATE SUPERIONIC STAMPING; 8.1 Introduction 8.2 Solid-State Superionic Stamping |
| Record Nr. | UNINA-9911019578503321 |
|
Rogers John A
|
||
| Hoboken, N.J., : Wiley, c2009 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||