Info
- Utilizzare la checkbox di selezione a fianco di ciascun documento per attivare le funzionalità di stampa, invio email, download nei formati disponibili del (i) record.
Silicon photonics [[electronic resource] ] : an introduction / / Graham T. Reed, Andrew P. Knights
| Silicon photonics [[electronic resource] ] : an introduction / / Graham T. Reed, Andrew P. Knights |
| Autore | Reed Graham T |
| Pubbl/distr/stampa | Chichester ; ; Hoboken, NJ, : John Wiley, c2004 |
| Descrizione fisica | 1 online resource (277 p.) |
| Disciplina | 621.38152 |
| Altri autori (Persone) | KnightsAndrew P |
| Soggetto topico |
Optoelectronic devices
Silicon - Optical properties Photonics |
| Soggetto genere / forma | Electronic books. |
| ISBN |
1-280-27255-4
9786610272556 0-470-34594-2 0-470-87035-4 0-470-01418-0 |
| Formato | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Silicon Photonics; Contents; About the Authors; Foreword; Acknowledgements; 1 Fundamentals; 1.1 What is Phase?; 1.2 What is Polarisation?; 1.3 What is Interference?; 2 The Basics of Guided Waves; 2.1 The Ray Optics Approach to Describing Planar Waveguides; 2.2 Reflection Coefficients; 2.3 Phase of a Propagating Wave and its Wavevector; 2.4 Modes of a Planar Waveguide; 2.4.1 The Symmetrical Planar Waveguide; 2.4.2 The Asymmetrical Planar Waveguide; 2.4.3 Solving the Eigenvalue Equations for Symmetrical and Asymmetrical Waveguides; 2.4.4 Monomode Conditions; 2.4.5 Effective Index of a Mode
2.5 A Taste of Electromagnetic Theory2.6 Simplifying and Solving the Wave Equation; 2.7 Another Look at Propagation Constants; 2.8 Mode Profiles; 2.9 Confinement Factor; 2.10 The Goos-Hänchen Shift; 3 Characteristics of Optical Fibres for Communications; 3.1 The Structure of Optical Fibres; 3.2 Modes of an Optical Fibre; 3.2.1 Modes of a Step-index Fibre; 3.2.2 Modes of a Graded-index Fibre; 3.3 Numerical Aperture and Acceptance Angle; 3.4 Dispersion in Optical Fibres; 3.4.1 Intermodal Dispersion; 3.4.2 Intramodal Dispersion 3.5 Single-mode Fibres: Mode Profile, Mode-field Diameter, and Spot Size3.6 Normalised Frequency, Normalised Propagation Constant, and Cutoff Wavelength; References; 4 Silicon-on-Insulator (SOI) Photonics; 4.1 Introduction; 4.2 Silicon-on-Insulator Waveguides; 4.2.1 Modes of Two-dimensional Waveguides; 4.3 The Effective Index Method of Analysis; 4.4 Large Single-mode Rib Waveguides; 4.5 Refractive Index and Loss Coefficient in Optical Waveguides; 4.6 Contributions to Loss in an Optical Waveguide; 4.6.1 Scattering; 4.6.2 Absorption; 4.6.3 Radiation; 4.7 Coupling to the Optical Circuit 4.7.1 Grating Couplers4.7.2 Butt Coupling and End-fire Coupling; 4.7.3 Robust Coupling to Waveguides for Commercial Applications; 4.7.4 Measurement of Propagation Loss in Integrated Optical Waveguides; 4.8 Optical Modulation Mechanisms in Silicon; 4.8.1 Electric Field Effects; 4.8.2 Carrier Injection or Depletion; 4.8.3 The Thermo-optic Effect; 4.9 Other Advantages and Disadvantages of Silicon Photonics; References; 5 Fabrication of Silicon Waveguide Devices; 5.1 Silicon-on-Insulator (SOI); 5.1.1 Separation by IMplanted OXygen (SIMOX); 5.1.2 Bond and Etch-back SOI (BESOI) 5.1.3 Wafer Splitting (SmartCut(®) Process to Produce Unibond(®) Wafers)5.1.4 Silicon Epitaxial Growth; 5.1.5 Deciding on the SOI; 5.2 Fabrication of Surface Etched Features; 5.2.1 Photolithography; 5.2.2 Silicon Etching; 5.2.3 Critical Dimension Control; 5.3 Oxidation; 5.4 Formation of Submicron Silicon Waveguides; 5.4.1 Silicon Dioxide Thickness; 5.4.2 Surface and Interface Roughness; 5.4.3 Sidewall Roughness; 5.5 Silicon Doping; 5.5.1 Ion Implantation; 5.5.2 The Implantation System; 5.5.3 Implantation Parameters; 5.5.4 Dopant Activation and Drive-in; 5.6 Metallisation; 5.6.1 Via Formation 5.6.2 Metal Deposition |
| Record Nr. | UNINA-9910145903903321 |
Reed Graham T
|
||
| Chichester ; ; Hoboken, NJ, : John Wiley, c2004 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Silicon photonics [[electronic resource] ] : an introduction / / Graham T. Reed, Andrew P. Knights
| Silicon photonics [[electronic resource] ] : an introduction / / Graham T. Reed, Andrew P. Knights |
| Autore | Reed Graham T |
| Pubbl/distr/stampa | Chichester ; ; Hoboken, NJ, : John Wiley, c2004 |
| Descrizione fisica | 1 online resource (277 p.) |
| Disciplina | 621.38152 |
| Altri autori (Persone) | KnightsAndrew P |
| Soggetto topico |
Optoelectronic devices
Silicon - Optical properties Photonics |
| ISBN |
1-280-27255-4
9786610272556 0-470-34594-2 0-470-87035-4 0-470-01418-0 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Silicon Photonics; Contents; About the Authors; Foreword; Acknowledgements; 1 Fundamentals; 1.1 What is Phase?; 1.2 What is Polarisation?; 1.3 What is Interference?; 2 The Basics of Guided Waves; 2.1 The Ray Optics Approach to Describing Planar Waveguides; 2.2 Reflection Coefficients; 2.3 Phase of a Propagating Wave and its Wavevector; 2.4 Modes of a Planar Waveguide; 2.4.1 The Symmetrical Planar Waveguide; 2.4.2 The Asymmetrical Planar Waveguide; 2.4.3 Solving the Eigenvalue Equations for Symmetrical and Asymmetrical Waveguides; 2.4.4 Monomode Conditions; 2.4.5 Effective Index of a Mode
2.5 A Taste of Electromagnetic Theory2.6 Simplifying and Solving the Wave Equation; 2.7 Another Look at Propagation Constants; 2.8 Mode Profiles; 2.9 Confinement Factor; 2.10 The Goos-Hänchen Shift; 3 Characteristics of Optical Fibres for Communications; 3.1 The Structure of Optical Fibres; 3.2 Modes of an Optical Fibre; 3.2.1 Modes of a Step-index Fibre; 3.2.2 Modes of a Graded-index Fibre; 3.3 Numerical Aperture and Acceptance Angle; 3.4 Dispersion in Optical Fibres; 3.4.1 Intermodal Dispersion; 3.4.2 Intramodal Dispersion 3.5 Single-mode Fibres: Mode Profile, Mode-field Diameter, and Spot Size3.6 Normalised Frequency, Normalised Propagation Constant, and Cutoff Wavelength; References; 4 Silicon-on-Insulator (SOI) Photonics; 4.1 Introduction; 4.2 Silicon-on-Insulator Waveguides; 4.2.1 Modes of Two-dimensional Waveguides; 4.3 The Effective Index Method of Analysis; 4.4 Large Single-mode Rib Waveguides; 4.5 Refractive Index and Loss Coefficient in Optical Waveguides; 4.6 Contributions to Loss in an Optical Waveguide; 4.6.1 Scattering; 4.6.2 Absorption; 4.6.3 Radiation; 4.7 Coupling to the Optical Circuit 4.7.1 Grating Couplers4.7.2 Butt Coupling and End-fire Coupling; 4.7.3 Robust Coupling to Waveguides for Commercial Applications; 4.7.4 Measurement of Propagation Loss in Integrated Optical Waveguides; 4.8 Optical Modulation Mechanisms in Silicon; 4.8.1 Electric Field Effects; 4.8.2 Carrier Injection or Depletion; 4.8.3 The Thermo-optic Effect; 4.9 Other Advantages and Disadvantages of Silicon Photonics; References; 5 Fabrication of Silicon Waveguide Devices; 5.1 Silicon-on-Insulator (SOI); 5.1.1 Separation by IMplanted OXygen (SIMOX); 5.1.2 Bond and Etch-back SOI (BESOI) 5.1.3 Wafer Splitting (SmartCut(®) Process to Produce Unibond(®) Wafers)5.1.4 Silicon Epitaxial Growth; 5.1.5 Deciding on the SOI; 5.2 Fabrication of Surface Etched Features; 5.2.1 Photolithography; 5.2.2 Silicon Etching; 5.2.3 Critical Dimension Control; 5.3 Oxidation; 5.4 Formation of Submicron Silicon Waveguides; 5.4.1 Silicon Dioxide Thickness; 5.4.2 Surface and Interface Roughness; 5.4.3 Sidewall Roughness; 5.5 Silicon Doping; 5.5.1 Ion Implantation; 5.5.2 The Implantation System; 5.5.3 Implantation Parameters; 5.5.4 Dopant Activation and Drive-in; 5.6 Metallisation; 5.6.1 Via Formation 5.6.2 Metal Deposition |
| Record Nr. | UNINA-9910830976003321 |
|
Reed Graham T
|
||
| Chichester ; ; Hoboken, NJ, : John Wiley, c2004 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Silicon photonics [[electronic resource] ] : an introduction / / Graham T. Reed, Andrew P. Knights
| Silicon photonics [[electronic resource] ] : an introduction / / Graham T. Reed, Andrew P. Knights |
| Autore | Reed Graham T |
| Pubbl/distr/stampa | Chichester ; ; Hoboken, NJ, : John Wiley, c2004 |
| Descrizione fisica | 1 online resource (277 p.) |
| Disciplina | 621.38152 |
| Altri autori (Persone) | KnightsAndrew P |
| Soggetto topico |
Optoelectronic devices
Silicon - Optical properties Photonics |
| ISBN |
1-280-27255-4
9786610272556 0-470-34594-2 0-470-87035-4 0-470-01418-0 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Silicon Photonics; Contents; About the Authors; Foreword; Acknowledgements; 1 Fundamentals; 1.1 What is Phase?; 1.2 What is Polarisation?; 1.3 What is Interference?; 2 The Basics of Guided Waves; 2.1 The Ray Optics Approach to Describing Planar Waveguides; 2.2 Reflection Coefficients; 2.3 Phase of a Propagating Wave and its Wavevector; 2.4 Modes of a Planar Waveguide; 2.4.1 The Symmetrical Planar Waveguide; 2.4.2 The Asymmetrical Planar Waveguide; 2.4.3 Solving the Eigenvalue Equations for Symmetrical and Asymmetrical Waveguides; 2.4.4 Monomode Conditions; 2.4.5 Effective Index of a Mode
2.5 A Taste of Electromagnetic Theory2.6 Simplifying and Solving the Wave Equation; 2.7 Another Look at Propagation Constants; 2.8 Mode Profiles; 2.9 Confinement Factor; 2.10 The Goos-Hänchen Shift; 3 Characteristics of Optical Fibres for Communications; 3.1 The Structure of Optical Fibres; 3.2 Modes of an Optical Fibre; 3.2.1 Modes of a Step-index Fibre; 3.2.2 Modes of a Graded-index Fibre; 3.3 Numerical Aperture and Acceptance Angle; 3.4 Dispersion in Optical Fibres; 3.4.1 Intermodal Dispersion; 3.4.2 Intramodal Dispersion 3.5 Single-mode Fibres: Mode Profile, Mode-field Diameter, and Spot Size3.6 Normalised Frequency, Normalised Propagation Constant, and Cutoff Wavelength; References; 4 Silicon-on-Insulator (SOI) Photonics; 4.1 Introduction; 4.2 Silicon-on-Insulator Waveguides; 4.2.1 Modes of Two-dimensional Waveguides; 4.3 The Effective Index Method of Analysis; 4.4 Large Single-mode Rib Waveguides; 4.5 Refractive Index and Loss Coefficient in Optical Waveguides; 4.6 Contributions to Loss in an Optical Waveguide; 4.6.1 Scattering; 4.6.2 Absorption; 4.6.3 Radiation; 4.7 Coupling to the Optical Circuit 4.7.1 Grating Couplers4.7.2 Butt Coupling and End-fire Coupling; 4.7.3 Robust Coupling to Waveguides for Commercial Applications; 4.7.4 Measurement of Propagation Loss in Integrated Optical Waveguides; 4.8 Optical Modulation Mechanisms in Silicon; 4.8.1 Electric Field Effects; 4.8.2 Carrier Injection or Depletion; 4.8.3 The Thermo-optic Effect; 4.9 Other Advantages and Disadvantages of Silicon Photonics; References; 5 Fabrication of Silicon Waveguide Devices; 5.1 Silicon-on-Insulator (SOI); 5.1.1 Separation by IMplanted OXygen (SIMOX); 5.1.2 Bond and Etch-back SOI (BESOI) 5.1.3 Wafer Splitting (SmartCut(®) Process to Produce Unibond(®) Wafers)5.1.4 Silicon Epitaxial Growth; 5.1.5 Deciding on the SOI; 5.2 Fabrication of Surface Etched Features; 5.2.1 Photolithography; 5.2.2 Silicon Etching; 5.2.3 Critical Dimension Control; 5.3 Oxidation; 5.4 Formation of Submicron Silicon Waveguides; 5.4.1 Silicon Dioxide Thickness; 5.4.2 Surface and Interface Roughness; 5.4.3 Sidewall Roughness; 5.5 Silicon Doping; 5.5.1 Ion Implantation; 5.5.2 The Implantation System; 5.5.3 Implantation Parameters; 5.5.4 Dopant Activation and Drive-in; 5.6 Metallisation; 5.6.1 Via Formation 5.6.2 Metal Deposition |
| Record Nr. | UNINA-9910841222903321 |
|
Reed Graham T
|
||
| Chichester ; ; Hoboken, NJ, : John Wiley, c2004 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Silicon photonics : an introduction / / Graham T. Reed, Andrew P. Knights
| Silicon photonics : an introduction / / Graham T. Reed, Andrew P. Knights |
| Autore | Reed Graham T |
| Pubbl/distr/stampa | Chichester ; ; Hoboken, NJ, : John Wiley, c2004 |
| Descrizione fisica | 1 online resource (277 p.) |
| Disciplina | 621.38152 |
| Altri autori (Persone) | KnightsAndrew P |
| Soggetto topico |
Optoelectronic devices
Silicon - Optical properties Photonics |
| ISBN |
9786610272556
9781280272554 1280272554 9780470345948 0470345942 9780470870358 0470870354 9780470014189 0470014180 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Silicon Photonics; Contents; About the Authors; Foreword; Acknowledgements; 1 Fundamentals; 1.1 What is Phase?; 1.2 What is Polarisation?; 1.3 What is Interference?; 2 The Basics of Guided Waves; 2.1 The Ray Optics Approach to Describing Planar Waveguides; 2.2 Reflection Coefficients; 2.3 Phase of a Propagating Wave and its Wavevector; 2.4 Modes of a Planar Waveguide; 2.4.1 The Symmetrical Planar Waveguide; 2.4.2 The Asymmetrical Planar Waveguide; 2.4.3 Solving the Eigenvalue Equations for Symmetrical and Asymmetrical Waveguides; 2.4.4 Monomode Conditions; 2.4.5 Effective Index of a Mode
2.5 A Taste of Electromagnetic Theory2.6 Simplifying and Solving the Wave Equation; 2.7 Another Look at Propagation Constants; 2.8 Mode Profiles; 2.9 Confinement Factor; 2.10 The Goos-Hänchen Shift; 3 Characteristics of Optical Fibres for Communications; 3.1 The Structure of Optical Fibres; 3.2 Modes of an Optical Fibre; 3.2.1 Modes of a Step-index Fibre; 3.2.2 Modes of a Graded-index Fibre; 3.3 Numerical Aperture and Acceptance Angle; 3.4 Dispersion in Optical Fibres; 3.4.1 Intermodal Dispersion; 3.4.2 Intramodal Dispersion 3.5 Single-mode Fibres: Mode Profile, Mode-field Diameter, and Spot Size3.6 Normalised Frequency, Normalised Propagation Constant, and Cutoff Wavelength; References; 4 Silicon-on-Insulator (SOI) Photonics; 4.1 Introduction; 4.2 Silicon-on-Insulator Waveguides; 4.2.1 Modes of Two-dimensional Waveguides; 4.3 The Effective Index Method of Analysis; 4.4 Large Single-mode Rib Waveguides; 4.5 Refractive Index and Loss Coefficient in Optical Waveguides; 4.6 Contributions to Loss in an Optical Waveguide; 4.6.1 Scattering; 4.6.2 Absorption; 4.6.3 Radiation; 4.7 Coupling to the Optical Circuit 4.7.1 Grating Couplers4.7.2 Butt Coupling and End-fire Coupling; 4.7.3 Robust Coupling to Waveguides for Commercial Applications; 4.7.4 Measurement of Propagation Loss in Integrated Optical Waveguides; 4.8 Optical Modulation Mechanisms in Silicon; 4.8.1 Electric Field Effects; 4.8.2 Carrier Injection or Depletion; 4.8.3 The Thermo-optic Effect; 4.9 Other Advantages and Disadvantages of Silicon Photonics; References; 5 Fabrication of Silicon Waveguide Devices; 5.1 Silicon-on-Insulator (SOI); 5.1.1 Separation by IMplanted OXygen (SIMOX); 5.1.2 Bond and Etch-back SOI (BESOI) 5.1.3 Wafer Splitting (SmartCut(®) Process to Produce Unibond(®) Wafers)5.1.4 Silicon Epitaxial Growth; 5.1.5 Deciding on the SOI; 5.2 Fabrication of Surface Etched Features; 5.2.1 Photolithography; 5.2.2 Silicon Etching; 5.2.3 Critical Dimension Control; 5.3 Oxidation; 5.4 Formation of Submicron Silicon Waveguides; 5.4.1 Silicon Dioxide Thickness; 5.4.2 Surface and Interface Roughness; 5.4.3 Sidewall Roughness; 5.5 Silicon Doping; 5.5.1 Ion Implantation; 5.5.2 The Implantation System; 5.5.3 Implantation Parameters; 5.5.4 Dopant Activation and Drive-in; 5.6 Metallisation; 5.6.1 Via Formation 5.6.2 Metal Deposition |
| Record Nr. | UNINA-9911020129503321 |
|
Reed Graham T
|
||
| Chichester ; ; Hoboken, NJ, : John Wiley, c2004 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||