Accurate linewidth measurements on integrated-circuit photomasks / / John M. Jerke
| Accurate linewidth measurements on integrated-circuit photomasks / / John M. Jerke |
| Autore | Jerke John M |
| Pubbl/distr/stampa | Gaithersburg, MD : , : U.S. Dept. of Commerce, National Institute of Standards and Technology, , 1980 |
| Descrizione fisica | 1 online resource |
| Altri autori (Persone) | JerkeJohn M |
| Collana | NBS special publication |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNINA-9910709506203321 |
Jerke John M
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| Gaithersburg, MD : , : U.S. Dept. of Commerce, National Institute of Standards and Technology, , 1980 | ||
| Lo trovi qui: Univ. Federico II | ||
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Interlaboratory study on linewidth measurements for antireflective chromium photomasks / / John M. Jerke, M. Carroll Croarkin, Ruth N. Varner
| Interlaboratory study on linewidth measurements for antireflective chromium photomasks / / John M. Jerke, M. Carroll Croarkin, Ruth N. Varner |
| Autore | Jerke John M |
| Pubbl/distr/stampa | Gaithersburg, MD : , : U.S. Dept. of Commerce, National Institute of Standards and Technology, , 1982 |
| Descrizione fisica | 1 online resource |
| Altri autori (Persone) |
CroarkinM. Carroll
JerkeJohn M VarnerRuth N |
| Collana | NBS special publication |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNINA-9910709504903321 |
Jerke John M
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| Gaithersburg, MD : , : U.S. Dept. of Commerce, National Institute of Standards and Technology, , 1982 | ||
| Lo trovi qui: Univ. Federico II | ||
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