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Microoptics [[electronic resource] /] / Stefan Sinzinger, Jürgen Jahns
| Microoptics [[electronic resource] /] / Stefan Sinzinger, Jürgen Jahns |
| Autore | Sinzinger Stefan |
| Edizione | [2nd rev. and enlarged ed.] |
| Pubbl/distr/stampa | Weinheim, : Wiley-VCH, c2003 |
| Descrizione fisica | 1 online resource (453 p.) |
| Disciplina | 621.381045 |
| Altri autori (Persone) | JahnsJurgen <1953-> |
| Soggetto topico |
Integrated optics
Optoelectronic devices Miniature electronic equipment |
| Soggetto genere / forma | Electronic books. |
| ISBN |
1-280-52098-1
9786610520985 3-527-60632-7 3-527-60340-9 |
| Formato | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Microoptics; Preface; Foreword to the Second Edition; Contents; 1 From macrooptics to microoptics - an overview; 1.1 Optics technology; 1.2 Classification of optical hardware; 1.3 Optical functions and their implementation; 1.4 Scope of this book; 1.5 Organization of the book; 1.6 Further reading; 1.7 Acknowledgment; References; 2 Optical components with small dimensions; 2.1 Microlens performance; 2.1.1 Diffraction limit; 2.1.2 Aberrations; 2.1.3 Quality criteria for lens performance; 2.2 Scaling - from macro- to micro-components; 2.2.1 Scaling of diffractive and refractive lenses
2.2.2 Scaling of prisms2.3 List of symbols; 2.4 Exercises; References; 3 Lithographic fabrication technology; 3.1 Pattern generation; 3.1.1 Plotting and photoreduction; 3.1.2 Laser beam writing; 3.1.3 X-ray and e-beam writing; 3.1.4 Grey-level masks; 3.1.5 Special masks; 3.2 Coating or thin layer deposition; 3.2.1 Spin coating; 3.2.2 Physical vapour deposition (PVD); 3.2.3 Chemical Vapour Deposition (CVD); 3.3 Alignment and exposure; 3.3.1 Exposure geometry; 3.3.2 Light sources for mask lithography; 3.3.3 Illumination with x-ray (synchrotron) and proton radiation; 3.3.4 Multimask alignment 3.3.5 Through-wafer alignment3.4 Pattern transfer; 3.4.1 Etching; 3.4.2 Laser micromachining - laser initiated ablation; 3.4.3 Mechanical micromachining - diamond turning of microoptical components; 3.4.4 Replication of microrelief structures; 3.4.5 Diffusion - ion-exchange processes; 3.5 Bonding of planar structures; 3.5.1 Flip-chip bonding; 3.5.2 Thermo-anodic bonding; 3.6 List of new symbols; 3.7 Exercises; References; 4 Measurement and characterization of microoptics; 4.1 Physical probing-profilometry; 4.2 Interferometry; 4.2.1 Types of interferometers; 4.2.2 Phase-shifting interferometry 4.2.3 Evaluation of interferometric measurements4.3 Imaging experiments; 4.4 Array testing; 4.5 List of new symbols; 4.6 Exercises; References; 5 Refractive microoptics; 5.1 Surface profile microlenses; 5.1.1 Melted photoresist lenses - reflow lenses; 5.1.2 Microlens fabrication by mass transport mechanisms in semiconductors; 5.1.3 Microlenses formed by volume change of a substrate material; 5.1.4 Lithographically initiated volume growth in PMMA for microlens fabrication; 5.1.5 Dispensed or droplet microlenses; 5.1.6 Direct writing techniques for refractive microoptics 5.1.7 Grey-scale lithography for ROE fabrication5.2 Gradient-index (GRIN) optics; 5.2.1 GRIN rod lenses; 5.2.2 Planar GRIN lenses; 5.3 Microprisms and micromirrors; 5.3.1 Lithography for the fabrication of microprisms; 5.3.2 Micromachining of microprisms using single point diamond turning or embossing; 5.3.3 Anisotropic etching of mirror structures in crystalline materials; 5.4 List of new symbols; 5.5 Exercises; References; 6 Diffractive microoptics; 6.1 Trading spatial resolution for reduced phase thickness; 6.1.1 Blazing and phase quantization 6.1.2 Alternative quantization schemes for microlenses |
| Record Nr. | UNINA-9910146231103321 |
Sinzinger Stefan
|
||
| Weinheim, : Wiley-VCH, c2003 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Microoptics [[electronic resource] /] / Stefan Sinzinger, Jürgen Jahns
| Microoptics [[electronic resource] /] / Stefan Sinzinger, Jürgen Jahns |
| Autore | Sinzinger Stefan |
| Edizione | [2nd rev. and enlarged ed.] |
| Pubbl/distr/stampa | Weinheim, : Wiley-VCH, c2003 |
| Descrizione fisica | 1 online resource (453 p.) |
| Disciplina | 621.381045 |
| Altri autori (Persone) | JahnsJurgen <1953-> |
| Soggetto topico |
Integrated optics
Optoelectronic devices Miniature electronic equipment |
| ISBN |
1-280-52098-1
9786610520985 3-527-60632-7 3-527-60340-9 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Microoptics; Preface; Foreword to the Second Edition; Contents; 1 From macrooptics to microoptics - an overview; 1.1 Optics technology; 1.2 Classification of optical hardware; 1.3 Optical functions and their implementation; 1.4 Scope of this book; 1.5 Organization of the book; 1.6 Further reading; 1.7 Acknowledgment; References; 2 Optical components with small dimensions; 2.1 Microlens performance; 2.1.1 Diffraction limit; 2.1.2 Aberrations; 2.1.3 Quality criteria for lens performance; 2.2 Scaling - from macro- to micro-components; 2.2.1 Scaling of diffractive and refractive lenses
2.2.2 Scaling of prisms2.3 List of symbols; 2.4 Exercises; References; 3 Lithographic fabrication technology; 3.1 Pattern generation; 3.1.1 Plotting and photoreduction; 3.1.2 Laser beam writing; 3.1.3 X-ray and e-beam writing; 3.1.4 Grey-level masks; 3.1.5 Special masks; 3.2 Coating or thin layer deposition; 3.2.1 Spin coating; 3.2.2 Physical vapour deposition (PVD); 3.2.3 Chemical Vapour Deposition (CVD); 3.3 Alignment and exposure; 3.3.1 Exposure geometry; 3.3.2 Light sources for mask lithography; 3.3.3 Illumination with x-ray (synchrotron) and proton radiation; 3.3.4 Multimask alignment 3.3.5 Through-wafer alignment3.4 Pattern transfer; 3.4.1 Etching; 3.4.2 Laser micromachining - laser initiated ablation; 3.4.3 Mechanical micromachining - diamond turning of microoptical components; 3.4.4 Replication of microrelief structures; 3.4.5 Diffusion - ion-exchange processes; 3.5 Bonding of planar structures; 3.5.1 Flip-chip bonding; 3.5.2 Thermo-anodic bonding; 3.6 List of new symbols; 3.7 Exercises; References; 4 Measurement and characterization of microoptics; 4.1 Physical probing-profilometry; 4.2 Interferometry; 4.2.1 Types of interferometers; 4.2.2 Phase-shifting interferometry 4.2.3 Evaluation of interferometric measurements4.3 Imaging experiments; 4.4 Array testing; 4.5 List of new symbols; 4.6 Exercises; References; 5 Refractive microoptics; 5.1 Surface profile microlenses; 5.1.1 Melted photoresist lenses - reflow lenses; 5.1.2 Microlens fabrication by mass transport mechanisms in semiconductors; 5.1.3 Microlenses formed by volume change of a substrate material; 5.1.4 Lithographically initiated volume growth in PMMA for microlens fabrication; 5.1.5 Dispensed or droplet microlenses; 5.1.6 Direct writing techniques for refractive microoptics 5.1.7 Grey-scale lithography for ROE fabrication5.2 Gradient-index (GRIN) optics; 5.2.1 GRIN rod lenses; 5.2.2 Planar GRIN lenses; 5.3 Microprisms and micromirrors; 5.3.1 Lithography for the fabrication of microprisms; 5.3.2 Micromachining of microprisms using single point diamond turning or embossing; 5.3.3 Anisotropic etching of mirror structures in crystalline materials; 5.4 List of new symbols; 5.5 Exercises; References; 6 Diffractive microoptics; 6.1 Trading spatial resolution for reduced phase thickness; 6.1.1 Blazing and phase quantization 6.1.2 Alternative quantization schemes for microlenses |
| Record Nr. | UNINA-9910830395003321 |
|
Sinzinger Stefan
|
||
| Weinheim, : Wiley-VCH, c2003 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Microoptics / / Stefan Sinzinger, Jürgen Jahns
| Microoptics / / Stefan Sinzinger, Jürgen Jahns |
| Autore | Sinzinger Stefan |
| Edizione | [2nd rev. and enlarged ed.] |
| Pubbl/distr/stampa | Weinheim, : Wiley-VCH, c2003 |
| Descrizione fisica | 1 online resource (453 p.) |
| Disciplina | 621.381045 |
| Altri autori (Persone) | JahnsJurgen <1953-> |
| Soggetto topico |
Integrated optics
Optoelectronic devices Miniature electronic equipment |
| ISBN |
1-280-52098-1
9786610520985 3-527-60632-7 3-527-60340-9 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Microoptics; Preface; Foreword to the Second Edition; Contents; 1 From macrooptics to microoptics - an overview; 1.1 Optics technology; 1.2 Classification of optical hardware; 1.3 Optical functions and their implementation; 1.4 Scope of this book; 1.5 Organization of the book; 1.6 Further reading; 1.7 Acknowledgment; References; 2 Optical components with small dimensions; 2.1 Microlens performance; 2.1.1 Diffraction limit; 2.1.2 Aberrations; 2.1.3 Quality criteria for lens performance; 2.2 Scaling - from macro- to micro-components; 2.2.1 Scaling of diffractive and refractive lenses
2.2.2 Scaling of prisms2.3 List of symbols; 2.4 Exercises; References; 3 Lithographic fabrication technology; 3.1 Pattern generation; 3.1.1 Plotting and photoreduction; 3.1.2 Laser beam writing; 3.1.3 X-ray and e-beam writing; 3.1.4 Grey-level masks; 3.1.5 Special masks; 3.2 Coating or thin layer deposition; 3.2.1 Spin coating; 3.2.2 Physical vapour deposition (PVD); 3.2.3 Chemical Vapour Deposition (CVD); 3.3 Alignment and exposure; 3.3.1 Exposure geometry; 3.3.2 Light sources for mask lithography; 3.3.3 Illumination with x-ray (synchrotron) and proton radiation; 3.3.4 Multimask alignment 3.3.5 Through-wafer alignment3.4 Pattern transfer; 3.4.1 Etching; 3.4.2 Laser micromachining - laser initiated ablation; 3.4.3 Mechanical micromachining - diamond turning of microoptical components; 3.4.4 Replication of microrelief structures; 3.4.5 Diffusion - ion-exchange processes; 3.5 Bonding of planar structures; 3.5.1 Flip-chip bonding; 3.5.2 Thermo-anodic bonding; 3.6 List of new symbols; 3.7 Exercises; References; 4 Measurement and characterization of microoptics; 4.1 Physical probing-profilometry; 4.2 Interferometry; 4.2.1 Types of interferometers; 4.2.2 Phase-shifting interferometry 4.2.3 Evaluation of interferometric measurements4.3 Imaging experiments; 4.4 Array testing; 4.5 List of new symbols; 4.6 Exercises; References; 5 Refractive microoptics; 5.1 Surface profile microlenses; 5.1.1 Melted photoresist lenses - reflow lenses; 5.1.2 Microlens fabrication by mass transport mechanisms in semiconductors; 5.1.3 Microlenses formed by volume change of a substrate material; 5.1.4 Lithographically initiated volume growth in PMMA for microlens fabrication; 5.1.5 Dispensed or droplet microlenses; 5.1.6 Direct writing techniques for refractive microoptics 5.1.7 Grey-scale lithography for ROE fabrication5.2 Gradient-index (GRIN) optics; 5.2.1 GRIN rod lenses; 5.2.2 Planar GRIN lenses; 5.3 Microprisms and micromirrors; 5.3.1 Lithography for the fabrication of microprisms; 5.3.2 Micromachining of microprisms using single point diamond turning or embossing; 5.3.3 Anisotropic etching of mirror structures in crystalline materials; 5.4 List of new symbols; 5.5 Exercises; References; 6 Diffractive microoptics; 6.1 Trading spatial resolution for reduced phase thickness; 6.1.1 Blazing and phase quantization 6.1.2 Alternative quantization schemes for microlenses |
| Record Nr. | UNINA-9910841748603321 |
|
Sinzinger Stefan
|
||
| Weinheim, : Wiley-VCH, c2003 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||