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1998 3rd International Symposium on Plasma Process-Induced Damage : June 4-5, 1998, Honolulu, Hawaii, USA
1998 3rd International Symposium on Plasma Process-Induced Damage : June 4-5, 1998, Honolulu, Hawaii, USA
Pubbl/distr/stampa [Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 1998
Disciplina 621.3815/2
Soggetto topico Semiconductor wafers - Defects
Semiconductors - Effect of radiation on
Plasma etching
Electrical & Computer Engineering
Engineering & Applied Sciences
Electrical Engineering
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Record Nr. UNISA-996206560303316
[Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 1998
Materiale a stampa
Lo trovi qui: Univ. di Salerno
Opac: Controlla la disponibilità qui
1998 3rd International Symposium on Plasma Process-Induced Damage : June 4-5, 1998, Honolulu, Hawaii, USA
1998 3rd International Symposium on Plasma Process-Induced Damage : June 4-5, 1998, Honolulu, Hawaii, USA
Pubbl/distr/stampa [Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 1998
Disciplina 621.3815/2
Soggetto topico Semiconductor wafers - Defects
Semiconductors - Effect of radiation on
Plasma etching
Electrical & Computer Engineering
Engineering & Applied Sciences
Electrical Engineering
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Record Nr. UNINA-9910872956003321
[Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 1998
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
1999 4th International Symposium on Plasma Process-Induced Damage : May 9-11, 1999, Monterey, California, USA
1999 4th International Symposium on Plasma Process-Induced Damage : May 9-11, 1999, Monterey, California, USA
Pubbl/distr/stampa [Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 1999
Disciplina 621.3815/2
Soggetto topico Semiconductor wafers - Effect of radiation on
Semiconductors
Plasma radiation
Electrical & Computer Engineering
Engineering & Applied Sciences
Electrical Engineering
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Record Nr. UNISA-996206560003316
[Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 1999
Materiale a stampa
Lo trovi qui: Univ. di Salerno
Opac: Controlla la disponibilità qui
1999 4th International Symposium on Plasma Process-Induced Damage : May 9-11, 1999, Monterey, California, USA
1999 4th International Symposium on Plasma Process-Induced Damage : May 9-11, 1999, Monterey, California, USA
Pubbl/distr/stampa [Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 1999
Disciplina 621.3815/2
Soggetto topico Semiconductor wafers - Effect of radiation on
Semiconductors
Plasma radiation
Electrical & Computer Engineering
Engineering & Applied Sciences
Electrical Engineering
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Record Nr. UNINA-9910872956903321
[Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 1999
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
2001 6th International Symposium on Plasma- and Process-Induced Damage : May 13-15, 2001, Monterey, California, USA
2001 6th International Symposium on Plasma- and Process-Induced Damage : May 13-15, 2001, Monterey, California, USA
Pubbl/distr/stampa [Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 2001
Disciplina 621.3815/2
Soggetto topico Semiconductor wafers - Effect of radiation on
Semiconductors - Defects
Plasma radiation
Semiconductors
Electrical & Computer Engineering
Engineering & Applied Sciences
Electrical Engineering
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Record Nr. UNISA-996206559403316
[Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 2001
Materiale a stampa
Lo trovi qui: Univ. di Salerno
Opac: Controlla la disponibilità qui
2001 6th International Symposium on Plasma- and Process-Induced Damage : May 13-15, 2001, Monterey, California, USA
2001 6th International Symposium on Plasma- and Process-Induced Damage : May 13-15, 2001, Monterey, California, USA
Pubbl/distr/stampa [Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 2001
Disciplina 621.3815/2
Soggetto topico Semiconductor wafers - Effect of radiation on
Semiconductors - Defects
Plasma radiation
Semiconductors
Electrical & Computer Engineering
Engineering & Applied Sciences
Electrical Engineering
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Record Nr. UNINA-9910872958903321
[Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 2001
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
2002 7th International Symposium on Plasma- and Process-Induced Damage : June 5-7, 2002, Maui, Hawaii, USA
2002 7th International Symposium on Plasma- and Process-Induced Damage : June 5-7, 2002, Maui, Hawaii, USA
Pubbl/distr/stampa [Place of publication not identified], : AVS, 2002
Disciplina 621.3815/2
Soggetto topico Semiconductor wafers - Effect of radiation on
Semiconductors
Plasma radiation
Electrical & Computer Engineering
Engineering & Applied Sciences
Electrical Engineering
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Record Nr. UNISA-996206559003316
[Place of publication not identified], : AVS, 2002
Materiale a stampa
Lo trovi qui: Univ. di Salerno
Opac: Controlla la disponibilità qui
2002 7th International Symposium on Plasma- and Process-Induced Damage : June 5-7, 2002, Maui, Hawaii, USA
2002 7th International Symposium on Plasma- and Process-Induced Damage : June 5-7, 2002, Maui, Hawaii, USA
Pubbl/distr/stampa [Place of publication not identified], : AVS, 2002
Disciplina 621.3815/2
Soggetto topico Semiconductor wafers - Effect of radiation on
Semiconductors
Plasma radiation
Electrical & Computer Engineering
Engineering & Applied Sciences
Electrical Engineering
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Record Nr. UNINA-9910872931603321
[Place of publication not identified], : AVS, 2002
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
2003 8th International Symposium on Plasma- and Process-Induced Damage : April 24-25, 2003, Corbeil-Essonnes, France
2003 8th International Symposium on Plasma- and Process-Induced Damage : April 24-25, 2003, Corbeil-Essonnes, France
Pubbl/distr/stampa [Place of publication not identified], : IEEE, 2003
Disciplina 621.3815/2
Soggetto topico Semiconductor wafers - Effect of radiation on
Semiconductors
Plasma radiation
Electrical & Computer Engineering
Engineering & Applied Sciences
Electrical Engineering
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Record Nr. UNISA-996202482203316
[Place of publication not identified], : IEEE, 2003
Materiale a stampa
Lo trovi qui: Univ. di Salerno
Opac: Controlla la disponibilità qui
2003 8th International Symposium on Plasma- and Process-Induced Damage : April 24-25, 2003, Corbeil-Essonnes, France
2003 8th International Symposium on Plasma- and Process-Induced Damage : April 24-25, 2003, Corbeil-Essonnes, France
Pubbl/distr/stampa [Place of publication not identified], : IEEE, 2003
Disciplina 621.3815/2
Soggetto topico Semiconductor wafers - Effect of radiation on
Semiconductors
Plasma radiation
Electrical & Computer Engineering
Engineering & Applied Sciences
Electrical Engineering
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Record Nr. UNINA-9910872472003321
[Place of publication not identified], : IEEE, 2003
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui