1998 3rd International Symposium on Plasma Process-Induced Damage : June 4-5, 1998, Honolulu, Hawaii, USA |
Pubbl/distr/stampa | [Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 1998 |
Disciplina | 621.3815/2 |
Soggetto topico |
Semiconductor wafers - Defects
Semiconductors - Effect of radiation on Plasma etching Electrical & Computer Engineering Engineering & Applied Sciences Electrical Engineering |
Formato | Materiale a stampa |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Record Nr. | UNISA-996206560303316 |
[Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 1998 | ||
Materiale a stampa | ||
Lo trovi qui: Univ. di Salerno | ||
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1998 3rd International Symposium on Plasma Process-Induced Damage : June 4-5, 1998, Honolulu, Hawaii, USA |
Pubbl/distr/stampa | [Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 1998 |
Disciplina | 621.3815/2 |
Soggetto topico |
Semiconductor wafers - Defects
Semiconductors - Effect of radiation on Plasma etching Electrical & Computer Engineering Engineering & Applied Sciences Electrical Engineering |
Formato | Materiale a stampa |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Record Nr. | UNINA-9910872956003321 |
[Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 1998 | ||
Materiale a stampa | ||
Lo trovi qui: Univ. Federico II | ||
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1999 4th International Symposium on Plasma Process-Induced Damage : May 9-11, 1999, Monterey, California, USA |
Pubbl/distr/stampa | [Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 1999 |
Disciplina | 621.3815/2 |
Soggetto topico |
Semiconductor wafers - Effect of radiation on
Semiconductors Plasma radiation Electrical & Computer Engineering Engineering & Applied Sciences Electrical Engineering |
Formato | Materiale a stampa |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Record Nr. | UNISA-996206560003316 |
[Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 1999 | ||
Materiale a stampa | ||
Lo trovi qui: Univ. di Salerno | ||
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1999 4th International Symposium on Plasma Process-Induced Damage : May 9-11, 1999, Monterey, California, USA |
Pubbl/distr/stampa | [Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 1999 |
Disciplina | 621.3815/2 |
Soggetto topico |
Semiconductor wafers - Effect of radiation on
Semiconductors Plasma radiation Electrical & Computer Engineering Engineering & Applied Sciences Electrical Engineering |
Formato | Materiale a stampa |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Record Nr. | UNINA-9910872956903321 |
[Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 1999 | ||
Materiale a stampa | ||
Lo trovi qui: Univ. Federico II | ||
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2001 6th International Symposium on Plasma- and Process-Induced Damage : May 13-15, 2001, Monterey, California, USA |
Pubbl/distr/stampa | [Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 2001 |
Disciplina | 621.3815/2 |
Soggetto topico |
Semiconductor wafers - Effect of radiation on
Semiconductors - Defects Plasma radiation Semiconductors Electrical & Computer Engineering Engineering & Applied Sciences Electrical Engineering |
Formato | Materiale a stampa |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Record Nr. | UNISA-996206559403316 |
[Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 2001 | ||
Materiale a stampa | ||
Lo trovi qui: Univ. di Salerno | ||
|
2001 6th International Symposium on Plasma- and Process-Induced Damage : May 13-15, 2001, Monterey, California, USA |
Pubbl/distr/stampa | [Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 2001 |
Disciplina | 621.3815/2 |
Soggetto topico |
Semiconductor wafers - Effect of radiation on
Semiconductors - Defects Plasma radiation Semiconductors Electrical & Computer Engineering Engineering & Applied Sciences Electrical Engineering |
Formato | Materiale a stampa |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Record Nr. | UNINA-9910872958903321 |
[Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 2001 | ||
Materiale a stampa | ||
Lo trovi qui: Univ. Federico II | ||
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2002 7th International Symposium on Plasma- and Process-Induced Damage : June 5-7, 2002, Maui, Hawaii, USA |
Pubbl/distr/stampa | [Place of publication not identified], : AVS, 2002 |
Disciplina | 621.3815/2 |
Soggetto topico |
Semiconductor wafers - Effect of radiation on
Semiconductors Plasma radiation Electrical & Computer Engineering Engineering & Applied Sciences Electrical Engineering |
Formato | Materiale a stampa |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Record Nr. | UNISA-996206559003316 |
[Place of publication not identified], : AVS, 2002 | ||
Materiale a stampa | ||
Lo trovi qui: Univ. di Salerno | ||
|
2002 7th International Symposium on Plasma- and Process-Induced Damage : June 5-7, 2002, Maui, Hawaii, USA |
Pubbl/distr/stampa | [Place of publication not identified], : AVS, 2002 |
Disciplina | 621.3815/2 |
Soggetto topico |
Semiconductor wafers - Effect of radiation on
Semiconductors Plasma radiation Electrical & Computer Engineering Engineering & Applied Sciences Electrical Engineering |
Formato | Materiale a stampa |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Record Nr. | UNINA-9910872931603321 |
[Place of publication not identified], : AVS, 2002 | ||
Materiale a stampa | ||
Lo trovi qui: Univ. Federico II | ||
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2003 8th International Symposium on Plasma- and Process-Induced Damage : April 24-25, 2003, Corbeil-Essonnes, France |
Pubbl/distr/stampa | [Place of publication not identified], : IEEE, 2003 |
Disciplina | 621.3815/2 |
Soggetto topico |
Semiconductor wafers - Effect of radiation on
Semiconductors Plasma radiation Electrical & Computer Engineering Engineering & Applied Sciences Electrical Engineering |
Formato | Materiale a stampa |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Record Nr. | UNISA-996202482203316 |
[Place of publication not identified], : IEEE, 2003 | ||
Materiale a stampa | ||
Lo trovi qui: Univ. di Salerno | ||
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2003 8th International Symposium on Plasma- and Process-Induced Damage : April 24-25, 2003, Corbeil-Essonnes, France |
Pubbl/distr/stampa | [Place of publication not identified], : IEEE, 2003 |
Disciplina | 621.3815/2 |
Soggetto topico |
Semiconductor wafers - Effect of radiation on
Semiconductors Plasma radiation Electrical & Computer Engineering Engineering & Applied Sciences Electrical Engineering |
Formato | Materiale a stampa |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Record Nr. | UNINA-9910872472003321 |
[Place of publication not identified], : IEEE, 2003 | ||
Materiale a stampa | ||
Lo trovi qui: Univ. Federico II | ||
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