X-ray fluorescence spectrometry and related techniques : an introduction / / Eva Marguí, René van Grieken |
Autore | Marguí Eva |
Pubbl/distr/stampa | New York, New York : , : Momentum Press, , [2013] |
Descrizione fisica | 1 online resource (162 p.) |
Disciplina | 543.08586 |
Soggetto topico | X-ray spectroscopy |
Soggetto genere / forma | Electronic books. |
ISBN |
1-283-99156-X
1-60650-393-6 |
Formato | Materiale a stampa |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Nota di contenuto |
Preface -- Series preface -- Series editor -- About the authors --
1. Introduction -- 1.1 Basic principles of x-ray fluorescence -- 1.2 Interactions of x-rays with matter -- 1.3 X-ray safety and protection -- 2. Basic components of x-ray fluorescence spectrometers -- 2.1 General introduction -- 2.2 Excitation sources -- 2.2.1 X-ray tubes -- 2.2.2 Radioisotopes -- 2.2.3 Other sources -- 2.3 Sample chamber -- 2.4 Detection system -- 2.4.1 Types of detectors -- 2.4.1.1 Gas-filled detectors -- 2.4.1.2 Scintillation detectors -- 2.4.1.3 Solid-state detectors -- 2.4.2 Resolution and efficiency -- 2.4.2.1 Resolution -- 2.4.2.2 Efficiency -- 2.4.3 Comparison of detection systems -- 2.4.4 Detector artifacts -- 2.4.4.1 Escape peaks -- 2.4.4.2 Sum peaks (pile-up effect) -- 2.4.5 Signal processing system -- 2.5 Source and detector modifiers -- 2.5.1 Filters -- 2.5.1.1 Primary filters -- 2.5.1.2 Detector filters -- 2.5.2 Secondary targets -- 2.5.3 Focusing optics -- 2.5.4 Dispersing systems -- 2.5.5 Collimators -- 2.5.6 Masks -- 2.6 Instrument configurations -- 3. Qualitative and quantitative x-ray fluorescence analysis -- 3.1 Evaluation of x-ray fluorescence spectra -- 3.2 Qualitative XRF analysis -- 3.3 Quantitative XRF analysis -- 3.3.1 Chemical matrix effects -- 3.3.1.1 Absorption effects -- 3.3.1.2 Enhancement effects -- 3.3.2 Correction and compensation methods -- 3.3.2.1 Compensation methods -- 3.3.2.2 Matrix correction methods -- 3.3.2.3 Overview of correction and compensation methods -- 3.3.3 Quality of XRF analytical results -- 3.3.3.1 Limits of detection (LOD) and quantification (LOQ) -- 3.3.3.2 Working range and linearity -- 3.3.3.3 Precision and accuracy -- 3.3.3.4 Quality control of the results -- 4. Sample preparation procedures -- 4.1 Introduction -- 4.2 General sample preparation procedures -- 4.2.1 Solid samples -- 4.2.1.1 Direct XRF analysis -- 4.2.1.2 Powdered specimen -- 4.2.1.3 Fused specimen -- 4.2.1.4 Digested specimen -- 4.2.2 Liquid samples -- 4.2.2.1 Preconcentration methods -- 4.3 Specific sample preparation procedures -- 5. Wavelength/energy dispersive x-ray fluorescence spectrometry (WDXRF/EDXRF) -- 5.1 Introduction and basic principles -- 5.2 WDXRF and EDXRF layouts -- 5.2.1 WDXRF instrumentation -- 5.2.2 EDXRF instrumentation -- 5.3 Comparison of WDXRF and EDXRF systems -- 5.4 Applications of WDXRF and case studies -- 5.4.1 Determination of metal residues in active pharmaceutical ingredients -- 5.4.2 Determination of heavy metal content in automotive -- shredder residues (ASR) -- 5.4.3 Metal determination in polluted soils and waters -- 5.5 Applications of EDXRF and case studies -- 5.5.1 Determination of heavy metals at trace levels in vegetation samples -- 5.5.2 Determination of Cu, Ni, Zn, Pb, and Cd in aqueous samples -- 5.5.3 Chemical characterization of aerosol samples -- 6. Total Reflection X-Ray Spectrometry (TXRF) -- 6.1 Introduction and basic principles -- 6.2 TXRF layout -- 6.3 Analytical capabilities of TXRF systems -- 6.3.1 Chemical analysis -- 6.3.1.1 Sample carriers -- 6.3.1.2 Sample treatment procedures for chemical analysis by TXRF -- 6.3.1.3 Quantification -- 6.3.2 Surface analysis -- 6.4 Other applications of TXRF and case studies -- 6.4.1 Multielement determination in waste water effluents -- 6.4.2 Determination of trace amounts of Se in soil samples -- 6.4.3 Analysis of Si wafer surfaces -- 7. Special XRF configurations and related techniques -- 7.1 Introduction -- 7.2 Microbeam X-ray fluorescence spectrometry ([mu]-XRF) -- 7.3 Synchrotron radiation-induced X-ray emission (SRXRF or SRIXE) -- 7.4 Particle-induced X-ray emission (PIXE) -- 7.5 Electron-induced X-ray emission -- 7.5.1 Scanning electron microscope (SEM) -- 7.5.2 Electron microprobe analysis (EMPA) -- 8. Overview of XRF and related techniques -- 8.1 Introduction -- 8.2 Comparative performance of XRF systems -- 8.3 Role of XRF spectrometry in analysis field -- 8.4 Future perspectives -- Buyer's guide to manufacturers -- Glossary of abbreviations and acronyms -- References -- Bibliography -- Books and encyclopedia chapters -- Journals -- Index. |
Record Nr. | UNINA-9910462825803321 |
Marguí Eva | ||
New York, New York : , : Momentum Press, , [2013] | ||
Materiale a stampa | ||
Lo trovi qui: Univ. Federico II | ||
|
X-ray fluorescence spectrometry and related techniques : an introduction / / Eva Marguí, René van Grieken |
Autore | Marguí Eva |
Pubbl/distr/stampa | New York, New York : , : Momentum Press, , [2013] |
Descrizione fisica | 1 online resource (162 p.) |
Disciplina | 543.08586 |
Soggetto topico | X-ray spectroscopy |
ISBN |
1-283-99156-X
1-60650-393-6 |
Formato | Materiale a stampa |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Nota di contenuto |
Preface -- Series preface -- Series editor -- About the authors --
1. Introduction -- 1.1 Basic principles of x-ray fluorescence -- 1.2 Interactions of x-rays with matter -- 1.3 X-ray safety and protection -- 2. Basic components of x-ray fluorescence spectrometers -- 2.1 General introduction -- 2.2 Excitation sources -- 2.2.1 X-ray tubes -- 2.2.2 Radioisotopes -- 2.2.3 Other sources -- 2.3 Sample chamber -- 2.4 Detection system -- 2.4.1 Types of detectors -- 2.4.1.1 Gas-filled detectors -- 2.4.1.2 Scintillation detectors -- 2.4.1.3 Solid-state detectors -- 2.4.2 Resolution and efficiency -- 2.4.2.1 Resolution -- 2.4.2.2 Efficiency -- 2.4.3 Comparison of detection systems -- 2.4.4 Detector artifacts -- 2.4.4.1 Escape peaks -- 2.4.4.2 Sum peaks (pile-up effect) -- 2.4.5 Signal processing system -- 2.5 Source and detector modifiers -- 2.5.1 Filters -- 2.5.1.1 Primary filters -- 2.5.1.2 Detector filters -- 2.5.2 Secondary targets -- 2.5.3 Focusing optics -- 2.5.4 Dispersing systems -- 2.5.5 Collimators -- 2.5.6 Masks -- 2.6 Instrument configurations -- 3. Qualitative and quantitative x-ray fluorescence analysis -- 3.1 Evaluation of x-ray fluorescence spectra -- 3.2 Qualitative XRF analysis -- 3.3 Quantitative XRF analysis -- 3.3.1 Chemical matrix effects -- 3.3.1.1 Absorption effects -- 3.3.1.2 Enhancement effects -- 3.3.2 Correction and compensation methods -- 3.3.2.1 Compensation methods -- 3.3.2.2 Matrix correction methods -- 3.3.2.3 Overview of correction and compensation methods -- 3.3.3 Quality of XRF analytical results -- 3.3.3.1 Limits of detection (LOD) and quantification (LOQ) -- 3.3.3.2 Working range and linearity -- 3.3.3.3 Precision and accuracy -- 3.3.3.4 Quality control of the results -- 4. Sample preparation procedures -- 4.1 Introduction -- 4.2 General sample preparation procedures -- 4.2.1 Solid samples -- 4.2.1.1 Direct XRF analysis -- 4.2.1.2 Powdered specimen -- 4.2.1.3 Fused specimen -- 4.2.1.4 Digested specimen -- 4.2.2 Liquid samples -- 4.2.2.1 Preconcentration methods -- 4.3 Specific sample preparation procedures -- 5. Wavelength/energy dispersive x-ray fluorescence spectrometry (WDXRF/EDXRF) -- 5.1 Introduction and basic principles -- 5.2 WDXRF and EDXRF layouts -- 5.2.1 WDXRF instrumentation -- 5.2.2 EDXRF instrumentation -- 5.3 Comparison of WDXRF and EDXRF systems -- 5.4 Applications of WDXRF and case studies -- 5.4.1 Determination of metal residues in active pharmaceutical ingredients -- 5.4.2 Determination of heavy metal content in automotive -- shredder residues (ASR) -- 5.4.3 Metal determination in polluted soils and waters -- 5.5 Applications of EDXRF and case studies -- 5.5.1 Determination of heavy metals at trace levels in vegetation samples -- 5.5.2 Determination of Cu, Ni, Zn, Pb, and Cd in aqueous samples -- 5.5.3 Chemical characterization of aerosol samples -- 6. Total Reflection X-Ray Spectrometry (TXRF) -- 6.1 Introduction and basic principles -- 6.2 TXRF layout -- 6.3 Analytical capabilities of TXRF systems -- 6.3.1 Chemical analysis -- 6.3.1.1 Sample carriers -- 6.3.1.2 Sample treatment procedures for chemical analysis by TXRF -- 6.3.1.3 Quantification -- 6.3.2 Surface analysis -- 6.4 Other applications of TXRF and case studies -- 6.4.1 Multielement determination in waste water effluents -- 6.4.2 Determination of trace amounts of Se in soil samples -- 6.4.3 Analysis of Si wafer surfaces -- 7. Special XRF configurations and related techniques -- 7.1 Introduction -- 7.2 Microbeam X-ray fluorescence spectrometry ([mu]-XRF) -- 7.3 Synchrotron radiation-induced X-ray emission (SRXRF or SRIXE) -- 7.4 Particle-induced X-ray emission (PIXE) -- 7.5 Electron-induced X-ray emission -- 7.5.1 Scanning electron microscope (SEM) -- 7.5.2 Electron microprobe analysis (EMPA) -- 8. Overview of XRF and related techniques -- 8.1 Introduction -- 8.2 Comparative performance of XRF systems -- 8.3 Role of XRF spectrometry in analysis field -- 8.4 Future perspectives -- Buyer's guide to manufacturers -- Glossary of abbreviations and acronyms -- References -- Bibliography -- Books and encyclopedia chapters -- Journals -- Index. |
Record Nr. | UNINA-9910786028203321 |
Marguí Eva | ||
New York, New York : , : Momentum Press, , [2013] | ||
Materiale a stampa | ||
Lo trovi qui: Univ. Federico II | ||
|
X-ray fluorescence spectrometry and related techniques : an introduction / / Eva Marguí, René van Grieken |
Autore | Marguí Eva |
Pubbl/distr/stampa | New York, New York : , : Momentum Press, , [2013] |
Descrizione fisica | 1 online resource (162 p.) |
Disciplina | 543.08586 |
Soggetto topico | X-ray spectroscopy |
ISBN |
1-283-99156-X
1-60650-393-6 |
Formato | Materiale a stampa |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Nota di contenuto |
Preface -- Series preface -- Series editor -- About the authors --
1. Introduction -- 1.1 Basic principles of x-ray fluorescence -- 1.2 Interactions of x-rays with matter -- 1.3 X-ray safety and protection -- 2. Basic components of x-ray fluorescence spectrometers -- 2.1 General introduction -- 2.2 Excitation sources -- 2.2.1 X-ray tubes -- 2.2.2 Radioisotopes -- 2.2.3 Other sources -- 2.3 Sample chamber -- 2.4 Detection system -- 2.4.1 Types of detectors -- 2.4.1.1 Gas-filled detectors -- 2.4.1.2 Scintillation detectors -- 2.4.1.3 Solid-state detectors -- 2.4.2 Resolution and efficiency -- 2.4.2.1 Resolution -- 2.4.2.2 Efficiency -- 2.4.3 Comparison of detection systems -- 2.4.4 Detector artifacts -- 2.4.4.1 Escape peaks -- 2.4.4.2 Sum peaks (pile-up effect) -- 2.4.5 Signal processing system -- 2.5 Source and detector modifiers -- 2.5.1 Filters -- 2.5.1.1 Primary filters -- 2.5.1.2 Detector filters -- 2.5.2 Secondary targets -- 2.5.3 Focusing optics -- 2.5.4 Dispersing systems -- 2.5.5 Collimators -- 2.5.6 Masks -- 2.6 Instrument configurations -- 3. Qualitative and quantitative x-ray fluorescence analysis -- 3.1 Evaluation of x-ray fluorescence spectra -- 3.2 Qualitative XRF analysis -- 3.3 Quantitative XRF analysis -- 3.3.1 Chemical matrix effects -- 3.3.1.1 Absorption effects -- 3.3.1.2 Enhancement effects -- 3.3.2 Correction and compensation methods -- 3.3.2.1 Compensation methods -- 3.3.2.2 Matrix correction methods -- 3.3.2.3 Overview of correction and compensation methods -- 3.3.3 Quality of XRF analytical results -- 3.3.3.1 Limits of detection (LOD) and quantification (LOQ) -- 3.3.3.2 Working range and linearity -- 3.3.3.3 Precision and accuracy -- 3.3.3.4 Quality control of the results -- 4. Sample preparation procedures -- 4.1 Introduction -- 4.2 General sample preparation procedures -- 4.2.1 Solid samples -- 4.2.1.1 Direct XRF analysis -- 4.2.1.2 Powdered specimen -- 4.2.1.3 Fused specimen -- 4.2.1.4 Digested specimen -- 4.2.2 Liquid samples -- 4.2.2.1 Preconcentration methods -- 4.3 Specific sample preparation procedures -- 5. Wavelength/energy dispersive x-ray fluorescence spectrometry (WDXRF/EDXRF) -- 5.1 Introduction and basic principles -- 5.2 WDXRF and EDXRF layouts -- 5.2.1 WDXRF instrumentation -- 5.2.2 EDXRF instrumentation -- 5.3 Comparison of WDXRF and EDXRF systems -- 5.4 Applications of WDXRF and case studies -- 5.4.1 Determination of metal residues in active pharmaceutical ingredients -- 5.4.2 Determination of heavy metal content in automotive -- shredder residues (ASR) -- 5.4.3 Metal determination in polluted soils and waters -- 5.5 Applications of EDXRF and case studies -- 5.5.1 Determination of heavy metals at trace levels in vegetation samples -- 5.5.2 Determination of Cu, Ni, Zn, Pb, and Cd in aqueous samples -- 5.5.3 Chemical characterization of aerosol samples -- 6. Total Reflection X-Ray Spectrometry (TXRF) -- 6.1 Introduction and basic principles -- 6.2 TXRF layout -- 6.3 Analytical capabilities of TXRF systems -- 6.3.1 Chemical analysis -- 6.3.1.1 Sample carriers -- 6.3.1.2 Sample treatment procedures for chemical analysis by TXRF -- 6.3.1.3 Quantification -- 6.3.2 Surface analysis -- 6.4 Other applications of TXRF and case studies -- 6.4.1 Multielement determination in waste water effluents -- 6.4.2 Determination of trace amounts of Se in soil samples -- 6.4.3 Analysis of Si wafer surfaces -- 7. Special XRF configurations and related techniques -- 7.1 Introduction -- 7.2 Microbeam X-ray fluorescence spectrometry ([mu]-XRF) -- 7.3 Synchrotron radiation-induced X-ray emission (SRXRF or SRIXE) -- 7.4 Particle-induced X-ray emission (PIXE) -- 7.5 Electron-induced X-ray emission -- 7.5.1 Scanning electron microscope (SEM) -- 7.5.2 Electron microprobe analysis (EMPA) -- 8. Overview of XRF and related techniques -- 8.1 Introduction -- 8.2 Comparative performance of XRF systems -- 8.3 Role of XRF spectrometry in analysis field -- 8.4 Future perspectives -- Buyer's guide to manufacturers -- Glossary of abbreviations and acronyms -- References -- Bibliography -- Books and encyclopedia chapters -- Journals -- Index. |
Record Nr. | UNINA-9910809468903321 |
Marguí Eva | ||
New York, New York : , : Momentum Press, , [2013] | ||
Materiale a stampa | ||
Lo trovi qui: Univ. Federico II | ||
|
X-ray spectrometry [[electronic resource] ] : recent technological advances / / edited by Kouichi Tsuji, Jasna Injuk, René Van Grieken |
Pubbl/distr/stampa | Chichester, West Sussex, England ; ; Hoboken, NJ, USA, : Wiley, c2004 |
Descrizione fisica | 1 online resource (617 p.) |
Disciplina |
543.08586
543.62 543/.62 |
Altri autori (Persone) |
TsujiKouichi
InjukJasna GriekenR. van (René) |
Soggetto topico | X-ray spectroscopy |
Soggetto genere / forma | Electronic books. |
ISBN |
1-280-23888-7
9786610238880 0-470-02042-3 0-470-02043-1 |
Formato | Materiale a stampa |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Nota di contenuto |
X-Ray Spectrometry: Recent Technological Advances; Contents; Contributors; Preface; 1 Introduction; 1.1 Considering the Role of X-ray Spectrometry in Chemical Analysis and Outlining the Volume; 2 X-Ray Sources; 2.1 Micro X-ray Sources; 2.2 New Synchrotron Radiation Sources; 2.3 Laser-driven X-ray Sources; 3 X-Ray Optics; 3.1 Multilayers for Soft and Hard X-rays; 3.2 Single Capillaries X-ray Optics; 3.3 Polycapillary X-ray Optics; 3.4 Parabolic Compound Refractive X-ray Lenses; 4 X-Ray Detectors; 4.1 Semiconductor Detectors for (Imaging) X-ray Spectroscopy
4.2 Gas Proportional Scintillation Counters for X-ray Spectrometry4.3 Superconducting Tunnel Junctions; 4.4 Cryogenic Microcalorimeters; 4.5 Position Sensitive Semiconductor Strip Detectors; 5 Special Configurations; 5.1 Grazing-incidence X-ray Spectrometry; 5.2 Grazing-exit X-ray Spectrometry; 5.3 Portable Equipment for X-ray Fluorescence Analysis; 5.4 Synchrotron Radiation for Microscopic X-ray Fluorescence Analysis; 5.5 High-energy X-ray Fluorescence; 5.6 Low-energy Electron Probe Microanalysis and Scanning Electron Microscopy 5.7 Energy Dispersive X-ray Microanalysis in Scanning and Conventional Transmission Electron Microscopy5.8 X-Ray Absorption Techniques; 6 New Computerisation Methods; 6.1 Monte Carlo Simulation for X-ray Fluorescence Spectroscopy; 6.2 Spectrum Evaluation; 7 New Applications; 7.1 X-Ray Fluorescence Analysis in Medical Sciences; 7.2 Total Reflection X-ray Fluorescence for Semiconductors and Thin Films; 7.3 X-Ray Spectrometry in Archaeometry; 7.4 X-Ray Spectrometry in Forensic Research; 7.5 Speciation and Surface Analysis of Single Particles Using Electron-excited X-ray Emission Spectrometry Index |
Record Nr. | UNINA-9910146051803321 |
Chichester, West Sussex, England ; ; Hoboken, NJ, USA, : Wiley, c2004 | ||
Materiale a stampa | ||
Lo trovi qui: Univ. Federico II | ||
|
X-ray spectrometry [[electronic resource] ] : recent technological advances / / edited by Kouichi Tsuji, Jasna Injuk, René Van Grieken |
Pubbl/distr/stampa | Chichester, West Sussex, England ; ; Hoboken, NJ, USA, : Wiley, c2004 |
Descrizione fisica | 1 online resource (617 p.) |
Disciplina |
543.08586
543.62 543/.62 |
Altri autori (Persone) |
TsujiKouichi
InjukJasna GriekenR. van (René) |
Soggetto topico | X-ray spectroscopy |
ISBN |
1-280-23888-7
9786610238880 0-470-02042-3 0-470-02043-1 |
Formato | Materiale a stampa |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Nota di contenuto |
X-Ray Spectrometry: Recent Technological Advances; Contents; Contributors; Preface; 1 Introduction; 1.1 Considering the Role of X-ray Spectrometry in Chemical Analysis and Outlining the Volume; 2 X-Ray Sources; 2.1 Micro X-ray Sources; 2.2 New Synchrotron Radiation Sources; 2.3 Laser-driven X-ray Sources; 3 X-Ray Optics; 3.1 Multilayers for Soft and Hard X-rays; 3.2 Single Capillaries X-ray Optics; 3.3 Polycapillary X-ray Optics; 3.4 Parabolic Compound Refractive X-ray Lenses; 4 X-Ray Detectors; 4.1 Semiconductor Detectors for (Imaging) X-ray Spectroscopy
4.2 Gas Proportional Scintillation Counters for X-ray Spectrometry4.3 Superconducting Tunnel Junctions; 4.4 Cryogenic Microcalorimeters; 4.5 Position Sensitive Semiconductor Strip Detectors; 5 Special Configurations; 5.1 Grazing-incidence X-ray Spectrometry; 5.2 Grazing-exit X-ray Spectrometry; 5.3 Portable Equipment for X-ray Fluorescence Analysis; 5.4 Synchrotron Radiation for Microscopic X-ray Fluorescence Analysis; 5.5 High-energy X-ray Fluorescence; 5.6 Low-energy Electron Probe Microanalysis and Scanning Electron Microscopy 5.7 Energy Dispersive X-ray Microanalysis in Scanning and Conventional Transmission Electron Microscopy5.8 X-Ray Absorption Techniques; 6 New Computerisation Methods; 6.1 Monte Carlo Simulation for X-ray Fluorescence Spectroscopy; 6.2 Spectrum Evaluation; 7 New Applications; 7.1 X-Ray Fluorescence Analysis in Medical Sciences; 7.2 Total Reflection X-ray Fluorescence for Semiconductors and Thin Films; 7.3 X-Ray Spectrometry in Archaeometry; 7.4 X-Ray Spectrometry in Forensic Research; 7.5 Speciation and Surface Analysis of Single Particles Using Electron-excited X-ray Emission Spectrometry Index |
Record Nr. | UNINA-9910830201903321 |
Chichester, West Sussex, England ; ; Hoboken, NJ, USA, : Wiley, c2004 | ||
Materiale a stampa | ||
Lo trovi qui: Univ. Federico II | ||
|