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Dielectric films for advanced microelectronics [[electronic resource] /] / edited by Mikhail Baklanov, Martin Green, and Karen Maex
| Dielectric films for advanced microelectronics [[electronic resource] /] / edited by Mikhail Baklanov, Martin Green, and Karen Maex |
| Pubbl/distr/stampa | Chichester, England ; ; Hoboken, NJ, : John Wiley & Sons, c2007 |
| Descrizione fisica | 1 online resource (510 p.) |
| Disciplina | 621.381 |
| Altri autori (Persone) |
BaklanovMikhail
GreenMartin MaexKaren |
| Collana | Wiley series in materials for electronic and optoelectronic applications |
| Soggetto topico |
Dielectric films
Microelectronics - Materials |
| ISBN |
1-282-34620-2
9786612346200 0-470-01794-5 0-470-06541-9 |
| Formato | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto | Low and ultralow dielectric constant films prepared by plasma-enhanced chemical vapor deposition / A. Grill -- Spin-on dielectric materials / Geraud Dubois, Robert D. Miller, Willi Volksen -- Positron annihilation spectroscopy / David W. Gidley, Hua-Gen Peng, Richard Vallery -- Structure characterization of nanoporous interlevel dielectric thin films with x-ray and neutron radiation / Christopher L. Soles ... [et al.] -- Ellipsometric porosimetry / Mikhail R. Baklanov -- Mechanical and transport properties of low-k dielectrics / J. L. Plawsky ... [et al.] -- Integration of low-k dielectric films in damascene processes / R. J. O. M. Hoofman ... [et al.] -- ONO structures and oxynitrides in modern microelectronics : material science, characterization and application / Yakov Roizin, Vladimir Gritsenko -- Material engineering of high-k gate dielectrics / Akira Toriumi, Koji Kita -- Physical characterization of ultra-thin high-k dielectric / T. Conard, H. Bender, W. Vandervorst -- Electrical characterization of advanced gate dielectrics / Robin Degraeve ... [et al.] -- Integration issues of high-k gate dielectrics / Yasuo Nara -- Anisotropic conductive film (ACF) for advanced microelectronic interconnects / Yi Li, C. P. Wong. |
| Record Nr. | UNINA-9910143706103321 |
| Chichester, England ; ; Hoboken, NJ, : John Wiley & Sons, c2007 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Dielectric films for advanced microelectronics [[electronic resource] /] / edited by Mikhail Baklanov, Martin Green, and Karen Maex
| Dielectric films for advanced microelectronics [[electronic resource] /] / edited by Mikhail Baklanov, Martin Green, and Karen Maex |
| Pubbl/distr/stampa | Chichester, England ; ; Hoboken, NJ, : John Wiley & Sons, c2007 |
| Descrizione fisica | 1 online resource (510 p.) |
| Disciplina | 621.381 |
| Altri autori (Persone) |
BaklanovMikhail
GreenMartin MaexKaren |
| Collana | Wiley series in materials for electronic and optoelectronic applications |
| Soggetto topico |
Dielectric films
Microelectronics - Materials |
| ISBN |
1-282-34620-2
9786612346200 0-470-01794-5 0-470-06541-9 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto | Low and ultralow dielectric constant films prepared by plasma-enhanced chemical vapor deposition / A. Grill -- Spin-on dielectric materials / Geraud Dubois, Robert D. Miller, Willi Volksen -- Positron annihilation spectroscopy / David W. Gidley, Hua-Gen Peng, Richard Vallery -- Structure characterization of nanoporous interlevel dielectric thin films with x-ray and neutron radiation / Christopher L. Soles ... [et al.] -- Ellipsometric porosimetry / Mikhail R. Baklanov -- Mechanical and transport properties of low-k dielectrics / J. L. Plawsky ... [et al.] -- Integration of low-k dielectric films in damascene processes / R. J. O. M. Hoofman ... [et al.] -- ONO structures and oxynitrides in modern microelectronics : material science, characterization and application / Yakov Roizin, Vladimir Gritsenko -- Material engineering of high-k gate dielectrics / Akira Toriumi, Koji Kita -- Physical characterization of ultra-thin high-k dielectric / T. Conard, H. Bender, W. Vandervorst -- Electrical characterization of advanced gate dielectrics / Robin Degraeve ... [et al.] -- Integration issues of high-k gate dielectrics / Yasuo Nara -- Anisotropic conductive film (ACF) for advanced microelectronic interconnects / Yi Li, C. P. Wong. |
| Record Nr. | UNINA-9910831036703321 |
| Chichester, England ; ; Hoboken, NJ, : John Wiley & Sons, c2007 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Dielectric films for advanced microelectronics / / edited by Mikhail Baklanov, Martin Green, and Karen Maex
| Dielectric films for advanced microelectronics / / edited by Mikhail Baklanov, Martin Green, and Karen Maex |
| Pubbl/distr/stampa | Chichester, England ; ; Hoboken, NJ, : John Wiley & Sons, c2007 |
| Descrizione fisica | 1 online resource (510 p.) |
| Disciplina | 621.381 |
| Altri autori (Persone) |
BaklanovMikhail
GreenMartin MaexKaren |
| Collana | Wiley series in materials for electronic and optoelectronic applications |
| Soggetto topico |
Dielectric films
Microelectronics - Materials |
| ISBN |
1-282-34620-2
9786612346200 0-470-01794-5 0-470-06541-9 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto | Low and ultralow dielectric constant films prepared by plasma-enhanced chemical vapor deposition / A. Grill -- Spin-on dielectric materials / Geraud Dubois, Robert D. Miller, Willi Volksen -- Positron annihilation spectroscopy / David W. Gidley, Hua-Gen Peng, Richard Vallery -- Structure characterization of nanoporous interlevel dielectric thin films with x-ray and neutron radiation / Christopher L. Soles ... [et al.] -- Ellipsometric porosimetry / Mikhail R. Baklanov -- Mechanical and transport properties of low-k dielectrics / J. L. Plawsky ... [et al.] -- Integration of low-k dielectric films in damascene processes / R. J. O. M. Hoofman ... [et al.] -- ONO structures and oxynitrides in modern microelectronics : material science, characterization and application / Yakov Roizin, Vladimir Gritsenko -- Material engineering of high-k gate dielectrics / Akira Toriumi, Koji Kita -- Physical characterization of ultra-thin high-k dielectric / T. Conard, H. Bender, W. Vandervorst -- Electrical characterization of advanced gate dielectrics / Robin Degraeve ... [et al.] -- Integration issues of high-k gate dielectrics / Yasuo Nara -- Anisotropic conductive film (ACF) for advanced microelectronic interconnects / Yi Li, C. P. Wong. |
| Record Nr. | UNINA-9910878092503321 |
| Chichester, England ; ; Hoboken, NJ, : John Wiley & Sons, c2007 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Electrocardiography of inherited arrhythmias and cardiomyopathies : from basic science to clinical practice / / Martin Green, Andrew Krahn, Wael Alqarawi, editors
| Electrocardiography of inherited arrhythmias and cardiomyopathies : from basic science to clinical practice / / Martin Green, Andrew Krahn, Wael Alqarawi, editors |
| Edizione | [1st ed. 2020.] |
| Pubbl/distr/stampa | Cham, Switzerland : , : Springer, , [2020] |
| Descrizione fisica | 1 online resource (XII, 162 p. 108 illus., 95 illus. in color.) |
| Disciplina | 616.1207547 |
| Soggetto topico | Electrocardiography |
| ISBN | 3-030-52173-7 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto | Part I. Inherited Arrhythmias -- Chapter 1. Long QT Syndrome -- Chapter 2. Brugada Syndrome -- Chapter 3. Short QT Syndrome -- Chapter 4. Early Repolarization Syndrome -- Chapter 5. Catecholaminergic Polymorphic Ventricular Tachycardia -- Chapter 6. Short-coupled PVC-induced Ventricular Fibrillation -- Part II. Inherited Cardiomyopathies -- Chapter 7. Arrhythmogenic Right Ventricular Cardiomyopathy -- Chapter 8: Hypertrophic Cardiomyopathy -- Chapter 9: Dilated Cardiomyopathy -- Chapter 10: AMP-K Syndromes -- Part III. ECG in Athletes -- Chapter 11. Athletes. |
| Record Nr. | UNINA-9910420948503321 |
| Cham, Switzerland : , : Springer, , [2020] | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||