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Metal Impurities in Silicon-Device Fabrication [[electronic resource] /] / by Klaus Graff
| Metal Impurities in Silicon-Device Fabrication [[electronic resource] /] / by Klaus Graff |
| Autore | Graff Klaus |
| Edizione | [1st ed. 1995.] |
| Pubbl/distr/stampa | Berlin, Heidelberg : , : Springer Berlin Heidelberg : , : Imprint : Springer, , 1995 |
| Descrizione fisica | 1 online resource (IX, 216 p.) |
| Disciplina | 620.44 |
| Collana | Springer Series in Materials Science |
| Soggetto topico |
Materials—Surfaces
Thin films Electronics Microelectronics Inorganic chemistry Surfaces and Interfaces, Thin Films Electronics and Microelectronics, Instrumentation Inorganic Chemistry |
| ISBN | 3-642-97593-3 |
| Formato | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto | 1. Introduction -- 2. Common Properties of Transition Metals -- 2.1 General Behavior -- 2.2 Contamination of Silicon Wafers -- 2.3 Impact on Device Performance -- 3. Properties of Transition Metals in Silicon -- 3.1 Solubilities -- 3.2 Diffusivities -- 3.3 Dissolved Impurities -- 3.4 Precipitated Metals -- 4. Properties of the Main Impurities -- 4.1 Iron -- 4.2 Nickel -- 4.3 Copper -- 4.4 Molybdenum -- 4.5 Palladium -- 4.6 Platinum -- 4.7 Gold -- 5. Properties of Rare Impurities -- 5.1 Scandium -- 5.2 Titanium -- 5.3 Vanadium -- 5.4 Chromium -- 5.5 Manganese -- 5.6 Cobalt -- 5.7 Zinc -- 5.8 Rhodium -- 5.9 Silver -- 5.10 Tantalum -- 5.11 Tungsten -- 5.12 Mercury -- 6. Detection Methods -- 6.1 Detection of Total Impurity Content -- 6.2 Detection of Dissolved Impurities -- 6.3 Detection of Precipitates -- 7. Requirements of Modern Technology -- 7.1 Reduction of Contamination -- 8. Gettering of Impurities -- 8.1 Gettering Mechanisms -- 8.2 Control of Gettering Efficiency -- 9. Conclusion and Future Trends -- References. |
| Record Nr. | UNINA-9910480192003321 |
Graff Klaus
|
||
| Berlin, Heidelberg : , : Springer Berlin Heidelberg : , : Imprint : Springer, , 1995 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Metal Impurities in Silicon-Device Fabrication [[electronic resource] /] / by Klaus Graff
| Metal Impurities in Silicon-Device Fabrication [[electronic resource] /] / by Klaus Graff |
| Autore | Graff Klaus |
| Edizione | [1st ed. 1995.] |
| Pubbl/distr/stampa | Berlin, Heidelberg : , : Springer Berlin Heidelberg : , : Imprint : Springer, , 1995 |
| Descrizione fisica | 1 online resource (IX, 216 p.) |
| Disciplina | 620.44 |
| Collana | Springer Series in Materials Science |
| Soggetto topico |
Materials—Surfaces
Thin films Electronics Microelectronics Inorganic chemistry Surfaces and Interfaces, Thin Films Electronics and Microelectronics, Instrumentation Inorganic Chemistry |
| ISBN | 3-642-97593-3 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto | 1. Introduction -- 2. Common Properties of Transition Metals -- 2.1 General Behavior -- 2.2 Contamination of Silicon Wafers -- 2.3 Impact on Device Performance -- 3. Properties of Transition Metals in Silicon -- 3.1 Solubilities -- 3.2 Diffusivities -- 3.3 Dissolved Impurities -- 3.4 Precipitated Metals -- 4. Properties of the Main Impurities -- 4.1 Iron -- 4.2 Nickel -- 4.3 Copper -- 4.4 Molybdenum -- 4.5 Palladium -- 4.6 Platinum -- 4.7 Gold -- 5. Properties of Rare Impurities -- 5.1 Scandium -- 5.2 Titanium -- 5.3 Vanadium -- 5.4 Chromium -- 5.5 Manganese -- 5.6 Cobalt -- 5.7 Zinc -- 5.8 Rhodium -- 5.9 Silver -- 5.10 Tantalum -- 5.11 Tungsten -- 5.12 Mercury -- 6. Detection Methods -- 6.1 Detection of Total Impurity Content -- 6.2 Detection of Dissolved Impurities -- 6.3 Detection of Precipitates -- 7. Requirements of Modern Technology -- 7.1 Reduction of Contamination -- 8. Gettering of Impurities -- 8.1 Gettering Mechanisms -- 8.2 Control of Gettering Efficiency -- 9. Conclusion and Future Trends -- References. |
| Record Nr. | UNINA-9910792491703321 |
|
Graff Klaus
|
||
| Berlin, Heidelberg : , : Springer Berlin Heidelberg : , : Imprint : Springer, , 1995 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Metal Impurities in Silicon-Device Fabrication [[electronic resource] /] / by Klaus Graff
| Metal Impurities in Silicon-Device Fabrication [[electronic resource] /] / by Klaus Graff |
| Autore | Graff Klaus |
| Edizione | [1st ed. 1995.] |
| Pubbl/distr/stampa | Berlin, Heidelberg : , : Springer Berlin Heidelberg : , : Imprint : Springer, , 1995 |
| Descrizione fisica | 1 online resource (IX, 216 p.) |
| Disciplina | 620.44 |
| Collana | Springer Series in Materials Science |
| Soggetto topico |
Materials—Surfaces
Thin films Electronics Microelectronics Inorganic chemistry Surfaces and Interfaces, Thin Films Electronics and Microelectronics, Instrumentation Inorganic Chemistry |
| ISBN | 3-642-97593-3 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto | 1. Introduction -- 2. Common Properties of Transition Metals -- 2.1 General Behavior -- 2.2 Contamination of Silicon Wafers -- 2.3 Impact on Device Performance -- 3. Properties of Transition Metals in Silicon -- 3.1 Solubilities -- 3.2 Diffusivities -- 3.3 Dissolved Impurities -- 3.4 Precipitated Metals -- 4. Properties of the Main Impurities -- 4.1 Iron -- 4.2 Nickel -- 4.3 Copper -- 4.4 Molybdenum -- 4.5 Palladium -- 4.6 Platinum -- 4.7 Gold -- 5. Properties of Rare Impurities -- 5.1 Scandium -- 5.2 Titanium -- 5.3 Vanadium -- 5.4 Chromium -- 5.5 Manganese -- 5.6 Cobalt -- 5.7 Zinc -- 5.8 Rhodium -- 5.9 Silver -- 5.10 Tantalum -- 5.11 Tungsten -- 5.12 Mercury -- 6. Detection Methods -- 6.1 Detection of Total Impurity Content -- 6.2 Detection of Dissolved Impurities -- 6.3 Detection of Precipitates -- 7. Requirements of Modern Technology -- 7.1 Reduction of Contamination -- 8. Gettering of Impurities -- 8.1 Gettering Mechanisms -- 8.2 Control of Gettering Efficiency -- 9. Conclusion and Future Trends -- References. |
| Record Nr. | UNINA-9910817421703321 |
|
Graff Klaus
|
||
| Berlin, Heidelberg : , : Springer Berlin Heidelberg : , : Imprint : Springer, , 1995 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||