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Fundamentals of Friction and Wear on the Nanoscale / / edited by Enrico Gnecco, Ernst Meyer
| Fundamentals of Friction and Wear on the Nanoscale / / edited by Enrico Gnecco, Ernst Meyer |
| Autore | Gnecco Enrico |
| Edizione | [3rd ed. 2024.] |
| Pubbl/distr/stampa | Cham : , : Springer International Publishing : , : Imprint : Springer, , 2024 |
| Descrizione fisica | 1 online resource (463 pages) |
| Disciplina |
530.41
620.115 |
| Altri autori (Persone) | MeyerErnst |
| Collana | NanoScience and Technology |
| Soggetto topico |
Nanoscience
Tribology Materials - Microscopy Condensed matter Surfaces (Technology) Thin films Materials science - Data processing Nanophysics Microscopy Two-dimensional Materials Surfaces, Interfaces and Thin Film Computational Materials Science |
| ISBN | 3-031-63065-3 |
| Formato | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto | Friction Force Microscopy -- Surface Forces Apparatus in Nanotribology -- Ultrasonic Atomic Force Microscopies in Nanotribology -- Atomic-Scale Friction on Crystal Surfaces in Ultra-High Vacuum -- The (Grain) Boundaries of Structural Superlubricity -- Towards Application of Microscale Structural Superlubricity -- Molecular Tribology: Chemically Engineering Energy Dissipation at the Nanoscale -- Nanoisland Manipulation Experiments at Oxidized, Contaminated and Nanorough Interfaces: Structural Superlubricity and Directional Locking -- Tribological Aspects of in Situ Manipulation of Nanostructures Inside Scanning Electron Microscope -- Probing Superlubricity of Layered Van der Waals Contact Junctions by Colloidal Probe Atomic Force Microscopy -- Frictional Characteristics of Graphene on Textured Surfaces -- Early-Stage Wear of Polymer Surfaces and Layered Materials Scraped by a Nanotip -- Nanoscale Study of Antiwear Tribofilm Growth Using in situ Atomic Force Microscopy under Lubricated Contacts -- In Operando Formation of Layered Materials for Friction Reduction -- Dissipation at Large Separations -- Triboluminescence -- Fundamentals of Friction and Wear on the Nanoscale, 3rd Ed., 2023 [Gnecco-Meyer, editors] -- Liquid-solid Friction at the Nanoscale: From Hydrodynamics to Molecular Mechanism -- Micro- and Nanotribology at the Insect-plant Interface. |
| Record Nr. | UNINA-9910886074303321 |
Gnecco Enrico
|
||
| Cham : , : Springer International Publishing : , : Imprint : Springer, , 2024 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Nanoscale processes on insulating surfaces [[electronic resource] /] / Enrico Gnecco, Marek Szymonski
| Nanoscale processes on insulating surfaces [[electronic resource] /] / Enrico Gnecco, Marek Szymonski |
| Autore | Gnecco Enrico |
| Pubbl/distr/stampa | Singapore ; ; Hackensack, N.J., : World Scientific, c2009 |
| Descrizione fisica | 1 online resource (201 p.) |
| Disciplina | 530.4/275 |
| Altri autori (Persone) | SzymońskiMarek |
| Soggetto topico |
Scanning probe microscopy
Nanoelectronics Ionic crystals Thin films - Surfaces |
| Soggetto genere / forma | Electronic books. |
| ISBN |
1-282-75749-0
9786612757495 981-283-763-9 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Contents; About the authors; Preface; 1. Crystal Structures of Insulating Surfaces; 1.1 Halide Surfaces; 1.1.1 Alkali halide surfaces; 1.1.2 Alkaline earth halide surfaces; 1.2 Oxide Surfaces; 1.2.1 True insulating oxide surfaces; 1.2.1.1 Aluminum oxide; 1.2.1.2 Magnesium oxide; 1.2.1.3 Silicon dioxide; 1.2.2 Mixed conducting oxide surfaces; 1.2.2.1 Titanium dioxide; 1.2.2.2 Zinc oxide; 1.2.2.3 Tin dioxide; 1.2.2.4 Cerium dioxide; 1.2.2.5 Strontium titanate; 2. Preparation Techniques of Insulating Surfaces; 2.1 Ultra High Vacuum.; 2.2 Preparation of Bulk Insulating Surfaces
2.2.1 Halide surfaces2.2.2 Oxide surfaces; 2.2.3 Nanostructuring of insulating surfaces; 2.2.3.1 Evaporation spirals on alkali halides; 2.2.3.2 Faceting of halide and oxide surfaces; 2.3 Deposition of Insulating Films, Metals and Organic Molecules; 2.3.1 Thin insulating films; 2.3.2 Metal adsorbates on insulators; 2.3.3 Organic molecules on insulators; 3. Scanning Probe Microscopy in Ultra High Vacuum; 3.1 Atomic Force Microscopy; 3.1.1 Relevant forces in AFM; 3.1.2 Contact AFM; 3.1.3 Non-contact AFM; 3.1.3.1 Tuning fork sensors; 3.1.4 Kelvin probe force microscopy 3.2 Scanning Tunneling Microscopy 3.2.1 Scanning tunneling microscopy; 3.2.2 Scanning tunneling spectroscopy; 3.3 Atomistic Modeling of SPM; 4. Scanning Probe Microscopy on Bulk Insulating Surfaces; 4.1 Halide Surfaces; 4.1.1 Alkali halide surfaces; 4.1.2 Alkaline earth halide surfaces; 4.2 Oxide Surfaces; 4.2.1 True insulating oxide surfaces; 4.2.1.1 Aluminum oxide; 4.2.1.2 Magnesium oxide; 4.2.1.3 Silicon dioxide; 4.2.2 Mixed conducting oxide surfaces; 4.2.2.1 Titanium dioxide; 4.2.2.2 Zinc oxide; 4.2.2.3 Tin dioxide; 4.2.2.4 Cerium dioxide; 4.2.2.5 Strontium titanate 4.3 Modeling AFM on Bulk Insulating Surfaces4.3.1 Halide surfaces; 4.3.2 Oxide surfaces; 5. Scanning Probe Microscopy on Thin Insulating Films; 5.1 Halide Films on Metals; 5.1.1 Carpet-like growth.; 5.1.2 Restructuring and patterning of vicinal surfaces; 5.1.3 Fractal growth at low temperatures; 5.2 Halide Films on Semiconductors; 5.3 Heteroepitaxial Growth of Alkali Halide Films; 5.4 Oxide Films; 5.5 Modeling AFM on Thin Insulating Films; 6. Interaction of Ions, Electrons and Photons with Halide Surfaces; 6.1 Ion Bombardment of Alkali Halides; 6.2 Electron and Photon Stimulated Desorption 6.2.1 Electron stimulated desorption 6.2.2 Photon stimulated desorption; 6.2.2.1 Desorption by excitation at threshold energies; 6.2.2.2 Desorption due to band-band excitation; 7. Surface Patterning with Electrons and Photons; 7.1 Surface Topography Modification by Electronic Excitations; 7.1.1 Layer-by-layer desorption; 7.1.2 Coexcitation with visible light; 7.2 Nanoscale Pits on Alkali Halide Surfaces; 7.2.1 Diffusion equation for F-centers; 8. Surface Patterning with Ions; 8.1 Ripple Formation by Ion Bombardment; 8.1.1 Linear continuum theory for ripple formation 8.1.2 Beyond the continuum theory |
| Record Nr. | UNINA-9910455864303321 |
|
Gnecco Enrico
|
||
| Singapore ; ; Hackensack, N.J., : World Scientific, c2009 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Nanoscale processes on insulating surfaces [[electronic resource] /] / Enrico Gnecco, Marek Szymonski
| Nanoscale processes on insulating surfaces [[electronic resource] /] / Enrico Gnecco, Marek Szymonski |
| Autore | Gnecco Enrico |
| Pubbl/distr/stampa | Singapore ; ; Hackensack, N.J., : World Scientific, c2009 |
| Descrizione fisica | 1 online resource (201 p.) |
| Disciplina | 530.4/275 |
| Altri autori (Persone) | SzymońskiMarek |
| Soggetto topico |
Scanning probe microscopy
Nanoelectronics Ionic crystals Thin films - Surfaces |
| ISBN |
1-282-75749-0
9786612757495 981-283-763-9 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Contents; About the authors; Preface; 1. Crystal Structures of Insulating Surfaces; 1.1 Halide Surfaces; 1.1.1 Alkali halide surfaces; 1.1.2 Alkaline earth halide surfaces; 1.2 Oxide Surfaces; 1.2.1 True insulating oxide surfaces; 1.2.1.1 Aluminum oxide; 1.2.1.2 Magnesium oxide; 1.2.1.3 Silicon dioxide; 1.2.2 Mixed conducting oxide surfaces; 1.2.2.1 Titanium dioxide; 1.2.2.2 Zinc oxide; 1.2.2.3 Tin dioxide; 1.2.2.4 Cerium dioxide; 1.2.2.5 Strontium titanate; 2. Preparation Techniques of Insulating Surfaces; 2.1 Ultra High Vacuum.; 2.2 Preparation of Bulk Insulating Surfaces
2.2.1 Halide surfaces2.2.2 Oxide surfaces; 2.2.3 Nanostructuring of insulating surfaces; 2.2.3.1 Evaporation spirals on alkali halides; 2.2.3.2 Faceting of halide and oxide surfaces; 2.3 Deposition of Insulating Films, Metals and Organic Molecules; 2.3.1 Thin insulating films; 2.3.2 Metal adsorbates on insulators; 2.3.3 Organic molecules on insulators; 3. Scanning Probe Microscopy in Ultra High Vacuum; 3.1 Atomic Force Microscopy; 3.1.1 Relevant forces in AFM; 3.1.2 Contact AFM; 3.1.3 Non-contact AFM; 3.1.3.1 Tuning fork sensors; 3.1.4 Kelvin probe force microscopy 3.2 Scanning Tunneling Microscopy 3.2.1 Scanning tunneling microscopy; 3.2.2 Scanning tunneling spectroscopy; 3.3 Atomistic Modeling of SPM; 4. Scanning Probe Microscopy on Bulk Insulating Surfaces; 4.1 Halide Surfaces; 4.1.1 Alkali halide surfaces; 4.1.2 Alkaline earth halide surfaces; 4.2 Oxide Surfaces; 4.2.1 True insulating oxide surfaces; 4.2.1.1 Aluminum oxide; 4.2.1.2 Magnesium oxide; 4.2.1.3 Silicon dioxide; 4.2.2 Mixed conducting oxide surfaces; 4.2.2.1 Titanium dioxide; 4.2.2.2 Zinc oxide; 4.2.2.3 Tin dioxide; 4.2.2.4 Cerium dioxide; 4.2.2.5 Strontium titanate 4.3 Modeling AFM on Bulk Insulating Surfaces4.3.1 Halide surfaces; 4.3.2 Oxide surfaces; 5. Scanning Probe Microscopy on Thin Insulating Films; 5.1 Halide Films on Metals; 5.1.1 Carpet-like growth.; 5.1.2 Restructuring and patterning of vicinal surfaces; 5.1.3 Fractal growth at low temperatures; 5.2 Halide Films on Semiconductors; 5.3 Heteroepitaxial Growth of Alkali Halide Films; 5.4 Oxide Films; 5.5 Modeling AFM on Thin Insulating Films; 6. Interaction of Ions, Electrons and Photons with Halide Surfaces; 6.1 Ion Bombardment of Alkali Halides; 6.2 Electron and Photon Stimulated Desorption 6.2.1 Electron stimulated desorption 6.2.2 Photon stimulated desorption; 6.2.2.1 Desorption by excitation at threshold energies; 6.2.2.2 Desorption due to band-band excitation; 7. Surface Patterning with Electrons and Photons; 7.1 Surface Topography Modification by Electronic Excitations; 7.1.1 Layer-by-layer desorption; 7.1.2 Coexcitation with visible light; 7.2 Nanoscale Pits on Alkali Halide Surfaces; 7.2.1 Diffusion equation for F-centers; 8. Surface Patterning with Ions; 8.1 Ripple Formation by Ion Bombardment; 8.1.1 Linear continuum theory for ripple formation 8.1.2 Beyond the continuum theory |
| Record Nr. | UNINA-9910780727703321 |
|
Gnecco Enrico
|
||
| Singapore ; ; Hackensack, N.J., : World Scientific, c2009 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Nanoscale processes on insulating surfaces / / Enrico Gnecco, Marek Szymonski
| Nanoscale processes on insulating surfaces / / Enrico Gnecco, Marek Szymonski |
| Autore | Gnecco Enrico |
| Edizione | [1st ed.] |
| Pubbl/distr/stampa | Singapore ; ; Hackensack, N.J., : World Scientific, c2009 |
| Descrizione fisica | 1 online resource (201 p.) |
| Disciplina | 530.4/275 |
| Altri autori (Persone) | SzymońskiMarek |
| Soggetto topico |
Scanning probe microscopy
Nanoelectronics Ionic crystals Thin films - Surfaces |
| ISBN |
1-282-75749-0
9786612757495 981-283-763-9 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Contents; About the authors; Preface; 1. Crystal Structures of Insulating Surfaces; 1.1 Halide Surfaces; 1.1.1 Alkali halide surfaces; 1.1.2 Alkaline earth halide surfaces; 1.2 Oxide Surfaces; 1.2.1 True insulating oxide surfaces; 1.2.1.1 Aluminum oxide; 1.2.1.2 Magnesium oxide; 1.2.1.3 Silicon dioxide; 1.2.2 Mixed conducting oxide surfaces; 1.2.2.1 Titanium dioxide; 1.2.2.2 Zinc oxide; 1.2.2.3 Tin dioxide; 1.2.2.4 Cerium dioxide; 1.2.2.5 Strontium titanate; 2. Preparation Techniques of Insulating Surfaces; 2.1 Ultra High Vacuum.; 2.2 Preparation of Bulk Insulating Surfaces
2.2.1 Halide surfaces2.2.2 Oxide surfaces; 2.2.3 Nanostructuring of insulating surfaces; 2.2.3.1 Evaporation spirals on alkali halides; 2.2.3.2 Faceting of halide and oxide surfaces; 2.3 Deposition of Insulating Films, Metals and Organic Molecules; 2.3.1 Thin insulating films; 2.3.2 Metal adsorbates on insulators; 2.3.3 Organic molecules on insulators; 3. Scanning Probe Microscopy in Ultra High Vacuum; 3.1 Atomic Force Microscopy; 3.1.1 Relevant forces in AFM; 3.1.2 Contact AFM; 3.1.3 Non-contact AFM; 3.1.3.1 Tuning fork sensors; 3.1.4 Kelvin probe force microscopy 3.2 Scanning Tunneling Microscopy 3.2.1 Scanning tunneling microscopy; 3.2.2 Scanning tunneling spectroscopy; 3.3 Atomistic Modeling of SPM; 4. Scanning Probe Microscopy on Bulk Insulating Surfaces; 4.1 Halide Surfaces; 4.1.1 Alkali halide surfaces; 4.1.2 Alkaline earth halide surfaces; 4.2 Oxide Surfaces; 4.2.1 True insulating oxide surfaces; 4.2.1.1 Aluminum oxide; 4.2.1.2 Magnesium oxide; 4.2.1.3 Silicon dioxide; 4.2.2 Mixed conducting oxide surfaces; 4.2.2.1 Titanium dioxide; 4.2.2.2 Zinc oxide; 4.2.2.3 Tin dioxide; 4.2.2.4 Cerium dioxide; 4.2.2.5 Strontium titanate 4.3 Modeling AFM on Bulk Insulating Surfaces4.3.1 Halide surfaces; 4.3.2 Oxide surfaces; 5. Scanning Probe Microscopy on Thin Insulating Films; 5.1 Halide Films on Metals; 5.1.1 Carpet-like growth.; 5.1.2 Restructuring and patterning of vicinal surfaces; 5.1.3 Fractal growth at low temperatures; 5.2 Halide Films on Semiconductors; 5.3 Heteroepitaxial Growth of Alkali Halide Films; 5.4 Oxide Films; 5.5 Modeling AFM on Thin Insulating Films; 6. Interaction of Ions, Electrons and Photons with Halide Surfaces; 6.1 Ion Bombardment of Alkali Halides; 6.2 Electron and Photon Stimulated Desorption 6.2.1 Electron stimulated desorption 6.2.2 Photon stimulated desorption; 6.2.2.1 Desorption by excitation at threshold energies; 6.2.2.2 Desorption due to band-band excitation; 7. Surface Patterning with Electrons and Photons; 7.1 Surface Topography Modification by Electronic Excitations; 7.1.1 Layer-by-layer desorption; 7.1.2 Coexcitation with visible light; 7.2 Nanoscale Pits on Alkali Halide Surfaces; 7.2.1 Diffusion equation for F-centers; 8. Surface Patterning with Ions; 8.1 Ripple Formation by Ion Bombardment; 8.1.1 Linear continuum theory for ripple formation 8.1.2 Beyond the continuum theory |
| Record Nr. | UNINA-9910811307303321 |
|
Gnecco Enrico
|
||
| Singapore ; ; Hackensack, N.J., : World Scientific, c2009 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||