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CVD polymers : fabrication of organic surfaces and devices / / edited by Karen K. Gleason ; contributors Peter Baumann [and thirty six others]
| CVD polymers : fabrication of organic surfaces and devices / / edited by Karen K. Gleason ; contributors Peter Baumann [and thirty six others] |
| Pubbl/distr/stampa | Weinheim, Germany : , : Wiley-VCH, , 2015 |
| Descrizione fisica | 1 online resource (484 p.) |
| Disciplina | 621.38152 |
| Soggetto topico |
Chemical vapor deposition
Polymers |
| ISBN |
3-527-69028-X
3-527-69027-1 3-527-69026-3 |
| Formato | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Cover; Contents; List of Contributors; Chapter 1 Overview of Chemically Vapor Deposited (CVD) Polymers; 1.1 Motivation and Characteristics; 1.1.1 Quality; 1.1.2 Conformality; 1.1.3 Durability; 1.1.4 Composition; 1.2 Fundamentals and Mechanisms; 1.2.1 Gas Phase and Surface Reactions; 1.2.2 The Monomer Saturation Ratio; 1.2.3 Process Simplification and Substrate Independence; 1.3 Scale-Up and Commercialization; 1.4 Process and Materials Chemistry; 1.4.1 Initiated CVD (iCVD) and Its Variants; 1.4.2 Plasma Enhanced CVD (PECVD); 1.4.3 Poly(p-xylylene) (PPX) and Its Derivatives (""Parylenes"")
1.4.4 Oxidative CVD (oCVD)1.4.5 Vapor Deposition Polymerization (VDP) and Molecular Layer Deposition (MLD); 1.4.6 Additional Methods; 1.5 Summary; Acknowledgments; References; Part I: Fundamentals; Chapter 2 Growth Mechanism, Kinetics, and Molecular Weight; 2.1 Introduction; 2.2 iCVD Process; 2.3 Kinetics and Growth Mechanism; 2.3.1 Fluorocarbon Polymers; 2.3.2 Organosilicon Polymers; 2.3.3 Acrylate and Methacrylate Polymers; 2.3.4 Styrene and Other Vinyl Polymers; 2.3.5 Ring Opening Polymers; 2.4 Summary; References; Chapter 3 Copolymerization and Crosslinking; 3.1 Introduction 3.2 Copolymer Composition and Structure3.2.1 Confirmation of iCVD Copolymerization; 3.2.2 Analysis of Copolymer Composition; 3.2.3 Compositional Gradient; 3.3 Copolymerization Kinetics; 3.3.1 Copolymerization Equation and Reactivity Ratio; 3.3.2 Types of iCVD Copolymerization; 3.4 Tunable Properties of iCVD Copolymers; 3.4.1 Mechanical Properties; 3.4.2 Swelling; 3.4.3 Thermal Properties; 3.4.4 Surface Properties; 3.5 Conclusions; References; Chapter 4 Non-Thermal Initiation Strategies and Grafting; 4.1 Introduction; 4.2 Initiation Strategies; 4.2.1 Plasma Initiation Strategies 4.2.1.1 Plasma Enhanced Chemical Vapor Deposition (PECVD)4.2.1.2 Pulsed-Plasma Enhanced Chemical Vapor Deposition (PPECVD); 4.2.1.3 Microwave Plasmas; 4.2.1.4 Initiated Plasma Enhanced Chemical Vapor Deposition (iPECVD); 4.2.1.5 Plasma Initiation Summary; 4.2.2 Photoinitiation Strategies; 4.2.2.1 Photoactive Initiator Molecules; 4.2.2.2 Photoactive Monomer Species; 4.2.2.3 Photoinitiation Summary; 4.3 Grafting; 4.3.1 Surface Modification of Organic Substrates; 4.3.2 Surface Modification of Inorganic Substrates; 4.3.3 Grafting Summary; 4.4 Summary; References; Chapter 5 Conformal Polymer CVD 5.1 Introduction5.2 Vapor Phase Transport; 5.3 Conformal Polymer Coating Applications; 5.4 Conformal Polymer Coating Technologies; 5.5 Gas and Surface Reactions; 5.6 The Reaction-Diffusion Model; 5.6.1 Reaction and Diffusion in a Pore; 5.6.2 Initiator Controlled Consumption; 5.6.3 Factors Affecting the Initiator Sticking Probability; 5.6.4 Monomer Controlled Consumption; 5.6.5 Other Polymer CVD Systems; 5.7 Applications; 5.8 Conclusion; Acknowledgment; References Chapter 6 Plasma Enhanced-Chemical Vapor Deposited Polymers: Plasma Phase Reactions, Plasma-Surface Interactions, and Film Properties |
| Record Nr. | UNINA-9910132408603321 |
| Weinheim, Germany : , : Wiley-VCH, , 2015 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
CVD polymers : fabrication of organic surfaces and devices / / edited by Karen K. Gleason ; contributors Peter Baumann [and thirty six others]
| CVD polymers : fabrication of organic surfaces and devices / / edited by Karen K. Gleason ; contributors Peter Baumann [and thirty six others] |
| Pubbl/distr/stampa | Weinheim, Germany : , : Wiley-VCH, , 2015 |
| Descrizione fisica | 1 online resource (484 p.) |
| Disciplina | 621.38152 |
| Soggetto topico |
Chemical vapor deposition
Polymers |
| ISBN |
3-527-69028-X
3-527-69027-1 3-527-69026-3 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Cover; Contents; List of Contributors; Chapter 1 Overview of Chemically Vapor Deposited (CVD) Polymers; 1.1 Motivation and Characteristics; 1.1.1 Quality; 1.1.2 Conformality; 1.1.3 Durability; 1.1.4 Composition; 1.2 Fundamentals and Mechanisms; 1.2.1 Gas Phase and Surface Reactions; 1.2.2 The Monomer Saturation Ratio; 1.2.3 Process Simplification and Substrate Independence; 1.3 Scale-Up and Commercialization; 1.4 Process and Materials Chemistry; 1.4.1 Initiated CVD (iCVD) and Its Variants; 1.4.2 Plasma Enhanced CVD (PECVD); 1.4.3 Poly(p-xylylene) (PPX) and Its Derivatives (""Parylenes"")
1.4.4 Oxidative CVD (oCVD)1.4.5 Vapor Deposition Polymerization (VDP) and Molecular Layer Deposition (MLD); 1.4.6 Additional Methods; 1.5 Summary; Acknowledgments; References; Part I: Fundamentals; Chapter 2 Growth Mechanism, Kinetics, and Molecular Weight; 2.1 Introduction; 2.2 iCVD Process; 2.3 Kinetics and Growth Mechanism; 2.3.1 Fluorocarbon Polymers; 2.3.2 Organosilicon Polymers; 2.3.3 Acrylate and Methacrylate Polymers; 2.3.4 Styrene and Other Vinyl Polymers; 2.3.5 Ring Opening Polymers; 2.4 Summary; References; Chapter 3 Copolymerization and Crosslinking; 3.1 Introduction 3.2 Copolymer Composition and Structure3.2.1 Confirmation of iCVD Copolymerization; 3.2.2 Analysis of Copolymer Composition; 3.2.3 Compositional Gradient; 3.3 Copolymerization Kinetics; 3.3.1 Copolymerization Equation and Reactivity Ratio; 3.3.2 Types of iCVD Copolymerization; 3.4 Tunable Properties of iCVD Copolymers; 3.4.1 Mechanical Properties; 3.4.2 Swelling; 3.4.3 Thermal Properties; 3.4.4 Surface Properties; 3.5 Conclusions; References; Chapter 4 Non-Thermal Initiation Strategies and Grafting; 4.1 Introduction; 4.2 Initiation Strategies; 4.2.1 Plasma Initiation Strategies 4.2.1.1 Plasma Enhanced Chemical Vapor Deposition (PECVD)4.2.1.2 Pulsed-Plasma Enhanced Chemical Vapor Deposition (PPECVD); 4.2.1.3 Microwave Plasmas; 4.2.1.4 Initiated Plasma Enhanced Chemical Vapor Deposition (iPECVD); 4.2.1.5 Plasma Initiation Summary; 4.2.2 Photoinitiation Strategies; 4.2.2.1 Photoactive Initiator Molecules; 4.2.2.2 Photoactive Monomer Species; 4.2.2.3 Photoinitiation Summary; 4.3 Grafting; 4.3.1 Surface Modification of Organic Substrates; 4.3.2 Surface Modification of Inorganic Substrates; 4.3.3 Grafting Summary; 4.4 Summary; References; Chapter 5 Conformal Polymer CVD 5.1 Introduction5.2 Vapor Phase Transport; 5.3 Conformal Polymer Coating Applications; 5.4 Conformal Polymer Coating Technologies; 5.5 Gas and Surface Reactions; 5.6 The Reaction-Diffusion Model; 5.6.1 Reaction and Diffusion in a Pore; 5.6.2 Initiator Controlled Consumption; 5.6.3 Factors Affecting the Initiator Sticking Probability; 5.6.4 Monomer Controlled Consumption; 5.6.5 Other Polymer CVD Systems; 5.7 Applications; 5.8 Conclusion; Acknowledgment; References Chapter 6 Plasma Enhanced-Chemical Vapor Deposited Polymers: Plasma Phase Reactions, Plasma-Surface Interactions, and Film Properties |
| Record Nr. | UNINA-9910816719503321 |
| Weinheim, Germany : , : Wiley-VCH, , 2015 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||