Spectroscopic ellipsometry [[electronic resource] ] : principles and applications / / Hiroyuki Fujiwara

• Autore: Fujiwara Hiroyuki
• Pubblicazione: Chichester, England ; ; Hoboken, NJ, : John Wiley & Sons, c2007
• Descrizione fisica: 1 online resource (389 p.)
• Disciplina: 535.52; 620.1/1295
• Soggetto topico: Ellipsometry; Spectrum analysis; Materials - Optical properties
• Note generali: Description based upon print version of record.
• Nota di bibliografia: Includes bibliographical references and index.
• Nota di contenuto: Spectroscopic Ellipsometry; Contents; Foreword; Preface; Acknowledgments; 1 Introduction to Spectroscopic Ellipsometry; 1.1 Features of Spectroscopic Ellipsometry; 1.2 Applications of Spectroscopic Ellipsometry; 1.3 Data Analysis; 1.4 History of Development; 1.5 Future Prospects; References; 2 Principles of Optics; 2.1 Propagation of Light; 2.1.1 Propagation of One-Dimensional Waves; 2.1.2 Electromagnetic Waves; 2.1.3 Refractive Index; 2.2 Dielectrics; 2.2.1 Dielectric Polarization; 2.2.2 Dielectric Constant; 2.2.3 Dielectric Function; 2.3 Reflection and Transmission of Light ; 2.3.1 Refraction of Light2.3.2 p- and s-Polarized Light Waves; 2.3.3 Reflectance and Transmittance; 2.3.4 Brewster Angle; 2.3.5 Total Reflection; 2.4 Optical Interference; 2.4.1 Optical Interference in Thin Films; 2.4.2 Multilayers; References; 3 Polarization of Light; 3.1 Representation of Polarized Light; 3.1.1 Phase of Light; 3.1.2 Polarization States of Light Waves; 3.2 Optical Elements; 3.2.1 Polarizer (Analyzer); 3.2.2 Compensator (Retarder); 3.2.3 Photoelastic Modulator; 3.2.4 Depolarizer; 3.3 Jones Matrix; 3.3.1 Jones Vector; 3.3.2 Transformation of Coordinate Systems ; 3.3.3 Jones Matrices of Optical Elements3.3.4 Representation of Optical Measurement by Jones Matrices; 3.4 Stokes Parameters; 3.4.1 Definition of Stokes Parameters; 3.4.2 Poincaré Sphere; 3.4.3 Partially Polarized Light; 3.4.4 Mueller Matrix; References; 4 Principles of Spectroscopic Ellipsometry; 4.1 Principles of Ellipsometry Measurement; 4.1.1 Measured Values in Ellipsometry; 4.1.2 Coordinate System in Ellipsometry; 4.1.3 Jones and Mueller Matrices of Samples; 4.2 Ellipsometry Measurement; 4.2.1 Measurement Methods of Ellipsometry; 4.2.2 Rotating-Analyzer Ellipsometry (RAE) ; 5.3.2 Modeling of Surface Roughness
• Sommario/riassunto: Ellipsometry is a powerful tool used for the characterization of thin films and multi-layer semiconductor structures. This book deals with fundamental principles and applications of spectroscopic ellipsometry (SE). Beginning with an overview of SE technologies the text moves on to focus on the data analysis of results obtained from SE, Fundamental data analyses, principles and physical backgrounds and the various materials used in different fields from LSI industry to biotechnology are described. The final chapter describes the latest developments of real-time monitoring and process control wh
• Titolo autorizzato: Spectroscopic ellipsometry
• ISBN: 1-281-00211-9; 9786611002114; 0-470-06019-0; 0-470-06018-2
• Formato: Materiale a stampa
• Livello bibliografico: Monografia
• Lingua di pubblicazione: Inglese
• Record Nr.: 9910143718703321
• Lo trovi qui: Univ. Federico II