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1998 3rd International Symposium on Plasma Process-Induced Damage : June 4-5, 1998, Honolulu, Hawaii, USA
| 1998 3rd International Symposium on Plasma Process-Induced Damage : June 4-5, 1998, Honolulu, Hawaii, USA |
| Pubbl/distr/stampa | [Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 1998 |
| Disciplina | 621.3815/2 |
| Soggetto topico |
Semiconductor wafers - Defects
Semiconductors - Effect of radiation on Plasma etching Electrical & Computer Engineering Engineering & Applied Sciences Electrical Engineering |
| Formato | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNISA-996206560303316 |
| [Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 1998 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. di Salerno | ||
| ||
1999 4th International Symposium on Plasma Process-Induced Damage : May 9-11, 1999, Monterey, California, USA
| 1999 4th International Symposium on Plasma Process-Induced Damage : May 9-11, 1999, Monterey, California, USA |
| Pubbl/distr/stampa | [Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 1999 |
| Disciplina | 621.3815/2 |
| Soggetto topico |
Semiconductor wafers - Effect of radiation on
Semiconductors Plasma radiation Electrical & Computer Engineering Engineering & Applied Sciences Electrical Engineering |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNISA-996206560003316 |
| [Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 1999 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. di Salerno | ||
| ||