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Advanced plasma technology / / edited by Riccardo d'Agostino [and five others]
| Advanced plasma technology / / edited by Riccardo d'Agostino [and five others] |
| Pubbl/distr/stampa | Weinheim, Germany : , : Wiley-VCH Verlag GmbH & Co. KGaA, , 2008 |
| Descrizione fisica | 1 online resource (481 p.) |
| Disciplina |
621.044
660.004 |
| Soggetto topico | Plasma engineering |
| Soggetto genere / forma | Electronic books. |
| ISBN |
1-281-94675-3
9786611946753 3-527-62218-7 3-527-62219-5 |
| Formato | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Advanced Plasma Technology; Contents; Preface; List of Contributors; 1 Basic Approaches to Plasma Production and Control; 1.1 Plasma Production; 1.1.1 Under Low Gas Pressure (10 torr); 1.2 Energy Control; 1.2.1 Electron-Temperature Control; 1.2.2 Ion-Energy Control; 1.3 Dust Collection and Removal; References; 2 Plasma Sources and Reactor Configurations; 2.1 Introduction; 2.2 Characteristics of ICP; 2.2.1 Principle; 2.2.2 Transformer Model; 2.2.3 Technological Aspects; 2.2.3.1 Matching
2.2.3.2 Capacitive Coupling2.2.3.3 Standing Wave Effects; 2.3 Sources and Reactor Configuration; 2.3.1 Substrate Shape; 2.3.1.1 Flat Substrates; 2.3.1.2 Complex Three-Dimensional Shapes; 2.3.1.3 Large Area Treatment; 2.4 Conclusions; References; 3 Advanced Simulations for Industrial Plasma Applications; 3.1 Introduction; 3.2 PIC Simulations; 3.2.1 Capacitively Coupled O(2)/Ar Plasmas; 3.2.1.1 Gas Composition; 3.2.1.2 Pressure Effect in Ar/O(2) Plasmas; 3.2.2 Three-Dimensional (3D) Charge-up Simulation; 3.2.2.1 Description of 3D Charge-up Simulations 3.2.2.2 Effects of Secondary Electron Emission3.2.2.3 Negative Ion Extraction; 3.3 Fluid Simulations; 3.3.1 Capacitively Coupled Discharges; 3.3.2 Large Area Plasma Source; 3.4 Summary; References; 4 Modeling and Diagnostics of He Discharges for Treatment of Polymers; 4.1 Introduction; 4.2 Experimental; 4.3 Model Description; 4.4 Results and Discussion; 4.4.1 Electrical Properties; 4.4.2 Gas-Phase Chemistry; 4.4.3 Plasma-Surface Interactions; 4.5 Conclusions; References; 5 Three-Dimensional Modeling of Thermal Plasmas (RF and Transferred Arc) for the Design of Sources and Industrial Processes 5.1 Introduction5.2 Inductively Coupled Plasma Torches; 5.2.1 Modeling Approach; 5.2.1.1 Modeling Assumptions; 5.2.1.2 Governing Equations of the Continuum Phase; 5.2.1.3 Governing Equations of the Discrete Phase; 5.2.1.4 Computational Domain and Boundary Conditions; 5.2.2 Selected Simulation Results; 5.2.2.1 High-Definition Numerical Simulation of Industrial ICPTs; 5.2.2.2 Numerical Simulation of the Trajectories and Thermal Histories of Powders Injected in Industrial ICPTs; 5.3 DC Transferred Arc Plasma Torches; 5.3.1 Modeling Approach; 5.3.1.1 Modeling Assumptions 5.3.1.2 Governing Equations5.3.1.3 Computational Domain and Boundary Conditions; 5.3.2 Selected Simulation Results; 5.3.2.1 Magnetically Deflected Transferred Arc; 5.3.2.2 The Twin Torch; 5.3.2.3 The Cutting Torch; References; 6 Radiofrequency Plasma Sources for Semiconductor Processing; 6.1 Introduction; 6.2 Capacitively Coupled Plasmas; 6.2.1 Dual-Frequency CCPs; 6.3 Inductively Coupled Plasmas; 6.3.1 General Description; 6.3.2 Anomalous Skin Depth; 6.3.3 Magnetized ICPs; 6.4 Helicon Wave Sources; 6.4.1 General Description; 6.4.2 Unusual Features; 6.4.3 Extended Helicon Sources; References 7 Advanced Plasma Diagnostics for Thin-Film Deposition |
| Record Nr. | UNINA-9910144100803321 |
| Weinheim, Germany : , : Wiley-VCH Verlag GmbH & Co. KGaA, , 2008 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Advanced plasma technology / / edited by Riccardo d'Agostino [and five others]
| Advanced plasma technology / / edited by Riccardo d'Agostino [and five others] |
| Pubbl/distr/stampa | Weinheim, Germany : , : Wiley-VCH Verlag GmbH & Co. KGaA, , 2008 |
| Descrizione fisica | 1 online resource (481 p.) |
| Disciplina |
621.044
660.004 |
| Soggetto topico | Plasma engineering |
| ISBN |
1-281-94675-3
9786611946753 3-527-62218-7 3-527-62219-5 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Advanced Plasma Technology; Contents; Preface; List of Contributors; 1 Basic Approaches to Plasma Production and Control; 1.1 Plasma Production; 1.1.1 Under Low Gas Pressure (10 torr); 1.2 Energy Control; 1.2.1 Electron-Temperature Control; 1.2.2 Ion-Energy Control; 1.3 Dust Collection and Removal; References; 2 Plasma Sources and Reactor Configurations; 2.1 Introduction; 2.2 Characteristics of ICP; 2.2.1 Principle; 2.2.2 Transformer Model; 2.2.3 Technological Aspects; 2.2.3.1 Matching
2.2.3.2 Capacitive Coupling2.2.3.3 Standing Wave Effects; 2.3 Sources and Reactor Configuration; 2.3.1 Substrate Shape; 2.3.1.1 Flat Substrates; 2.3.1.2 Complex Three-Dimensional Shapes; 2.3.1.3 Large Area Treatment; 2.4 Conclusions; References; 3 Advanced Simulations for Industrial Plasma Applications; 3.1 Introduction; 3.2 PIC Simulations; 3.2.1 Capacitively Coupled O(2)/Ar Plasmas; 3.2.1.1 Gas Composition; 3.2.1.2 Pressure Effect in Ar/O(2) Plasmas; 3.2.2 Three-Dimensional (3D) Charge-up Simulation; 3.2.2.1 Description of 3D Charge-up Simulations 3.2.2.2 Effects of Secondary Electron Emission3.2.2.3 Negative Ion Extraction; 3.3 Fluid Simulations; 3.3.1 Capacitively Coupled Discharges; 3.3.2 Large Area Plasma Source; 3.4 Summary; References; 4 Modeling and Diagnostics of He Discharges for Treatment of Polymers; 4.1 Introduction; 4.2 Experimental; 4.3 Model Description; 4.4 Results and Discussion; 4.4.1 Electrical Properties; 4.4.2 Gas-Phase Chemistry; 4.4.3 Plasma-Surface Interactions; 4.5 Conclusions; References; 5 Three-Dimensional Modeling of Thermal Plasmas (RF and Transferred Arc) for the Design of Sources and Industrial Processes 5.1 Introduction5.2 Inductively Coupled Plasma Torches; 5.2.1 Modeling Approach; 5.2.1.1 Modeling Assumptions; 5.2.1.2 Governing Equations of the Continuum Phase; 5.2.1.3 Governing Equations of the Discrete Phase; 5.2.1.4 Computational Domain and Boundary Conditions; 5.2.2 Selected Simulation Results; 5.2.2.1 High-Definition Numerical Simulation of Industrial ICPTs; 5.2.2.2 Numerical Simulation of the Trajectories and Thermal Histories of Powders Injected in Industrial ICPTs; 5.3 DC Transferred Arc Plasma Torches; 5.3.1 Modeling Approach; 5.3.1.1 Modeling Assumptions 5.3.1.2 Governing Equations5.3.1.3 Computational Domain and Boundary Conditions; 5.3.2 Selected Simulation Results; 5.3.2.1 Magnetically Deflected Transferred Arc; 5.3.2.2 The Twin Torch; 5.3.2.3 The Cutting Torch; References; 6 Radiofrequency Plasma Sources for Semiconductor Processing; 6.1 Introduction; 6.2 Capacitively Coupled Plasmas; 6.2.1 Dual-Frequency CCPs; 6.3 Inductively Coupled Plasmas; 6.3.1 General Description; 6.3.2 Anomalous Skin Depth; 6.3.3 Magnetized ICPs; 6.4 Helicon Wave Sources; 6.4.1 General Description; 6.4.2 Unusual Features; 6.4.3 Extended Helicon Sources; References 7 Advanced Plasma Diagnostics for Thin-Film Deposition |
| Record Nr. | UNINA-9910830298803321 |
| Weinheim, Germany : , : Wiley-VCH Verlag GmbH & Co. KGaA, , 2008 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Plasma processes and polymers [[electronic resource] /] / edited by Riccardo d'Agostino ... (et al)
| Plasma processes and polymers [[electronic resource] /] / edited by Riccardo d'Agostino ... (et al) |
| Pubbl/distr/stampa | Weinheim ; ; [Chichester], : Wiley-VCH, c2005 |
| Descrizione fisica | 1 online resource (548 p.) |
| Disciplina |
547/.28
668.9 |
| Altri autori (Persone) | D'AgostinoRiccardo |
| Soggetto topico |
Plasma polymerization
Plasma chemistry |
| Soggetto genere / forma | Electronic books. |
| ISBN |
1-280-52063-9
9786610520633 3-527-60558-4 3-527-60557-6 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Plasma Processes and Polymers; Contents; Preface; List of Contributors; Part I Plasma Deposition of Thin Films; 1 Polymer Surface Modification with Monofunctional Groups of Different Type and Density; 1.1 Introduction; 1.2 Experimental; 1.3 Results; 1.3.1 Kinetics of the Deposition of Copolymers; 1.3.2 Variation of the Density of Functional Groups; 1.3.3 Structure and Stability of Copolymers; 1.3.4 Relation between Functional Groups of Copolymers and Surface Energy; 1.3.5 Relation between Functional Groups of Copolymers and Adhesion; 1.4 Discussion
2RF-Plasma Deposition of SiO(x) and a-C:H as Barrier Coatings on Polymers2.1 Introduction; 2.2 Experimental; 2.3 Results and Discussion; 2.4 Conclusions; 3 Upscaling of Plasma Processes for Carboxyl Functionalization; 3.1 Introduction; 3.2 Experimental; 3.2.1 Materials; 3.2.2 Plasma-Deposition Apparatus; 3.2.3 Characterization Techniques; 3.3 Results and Discussion; 3.4 Conclusions; 4 Deposition of Fluorocarbon Films on Al and SiO(2) Surfaces in High-Density Fluorocarbon Plasmas: Selectivity and Surface Wettability; 4.1 Introduction; 4.2 Experimental; 4.3 Results and Discussion 4.3.1 Etching and Deposition in C(4)F(8) Plasmas4.3.2 Etching and Deposition Experiments in CHF(3)/CH(4) Plasmas; 4.3.3 FC Film Characterization: Chemical Composition; 4.4 Conclusions; 5 Hot-wire Plasma Deposition of Doped DLC Films on Fluorocarbon Polymers for Biomedical Applications; 5.1 Introduction; 5.2 Experimental Details; 5.2.1 Preparation of Samples; 5.2.2 Plasma Deposition Technique; 5.2.3 Surface Characterization; 5.2.4 Platelet-Adhesion Technique; 5.3 Results and Discussion; 5.3.1 Characterization of Deposited Film; 5.3.2 Platelet Adhesion 6 Properties of Silicon Nitride by Room-Temperature Inductively Coupled Plasma Deposition6.1 Introduction; 6.2 Experimental Systems; 6.3 Results and Discussion; 6.4 Conclusions; 7 Structural Analysis of Diamond-like Carbon Films Deposited by RF (13.56 MHz) in a Methane Gas Plasma Atmosphere; 7.1 Introduction; 7.2 Experimental Procedure; 7.2.1 Deposition Apparatus; 7.2.2 Experimental Conditions; 7.3 Results and Discussions; 7.3.1 X-ray Auger Electron Spectroscopy (XAES); 7.3.2 Electron Energy Loss Spectroscopy (EELS); 7.4 Conclusion; 8 Rate constant of HMDSO + O reaction in plasma afterglow 8.1 Introduction8.2 Experimental; 8.3 Calculation of the rate constant; 8.4 Results and discussion; 8.5 Conclusion; 9 Plasma-Enhanced Thin-Film Deposition On Polycarbonates; 9.1 Introduction; 9.2 Experimental; 9.3 Results; 9.4 Discussion; 9.5 Conclusions; 10 Molecular Tailoring Coating on TiO(2) Nanoparticle Surface by Plasma Polymerization; 10.1 Introduction; 10.2 Experimental; 10.3 Results and Discussions; 10.3.1 Surface Morphology; 10.3.2 Surface Molecular Structure; 10.3.3 Dispersion Behavior of AA-Plasma-Polymer-Coated TiO(2) Nanoparticles; 10.4 Conclusion Part II Plasma-Grafting of Functional Groups |
| Record Nr. | UNINA-9910144710603321 |
| Weinheim ; ; [Chichester], : Wiley-VCH, c2005 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Plasma processes and polymers [[electronic resource] /] / edited by Riccardo d'Agostino ... (et al)
| Plasma processes and polymers [[electronic resource] /] / edited by Riccardo d'Agostino ... (et al) |
| Pubbl/distr/stampa | Weinheim ; ; [Chichester], : Wiley-VCH, c2005 |
| Descrizione fisica | 1 online resource (548 p.) |
| Disciplina |
547/.28
668.9 |
| Altri autori (Persone) | D'AgostinoRiccardo |
| Soggetto topico |
Plasma polymerization
Plasma chemistry |
| ISBN |
1-280-52063-9
9786610520633 3-527-60558-4 3-527-60557-6 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Plasma Processes and Polymers; Contents; Preface; List of Contributors; Part I Plasma Deposition of Thin Films; 1 Polymer Surface Modification with Monofunctional Groups of Different Type and Density; 1.1 Introduction; 1.2 Experimental; 1.3 Results; 1.3.1 Kinetics of the Deposition of Copolymers; 1.3.2 Variation of the Density of Functional Groups; 1.3.3 Structure and Stability of Copolymers; 1.3.4 Relation between Functional Groups of Copolymers and Surface Energy; 1.3.5 Relation between Functional Groups of Copolymers and Adhesion; 1.4 Discussion
2RF-Plasma Deposition of SiO(x) and a-C:H as Barrier Coatings on Polymers2.1 Introduction; 2.2 Experimental; 2.3 Results and Discussion; 2.4 Conclusions; 3 Upscaling of Plasma Processes for Carboxyl Functionalization; 3.1 Introduction; 3.2 Experimental; 3.2.1 Materials; 3.2.2 Plasma-Deposition Apparatus; 3.2.3 Characterization Techniques; 3.3 Results and Discussion; 3.4 Conclusions; 4 Deposition of Fluorocarbon Films on Al and SiO(2) Surfaces in High-Density Fluorocarbon Plasmas: Selectivity and Surface Wettability; 4.1 Introduction; 4.2 Experimental; 4.3 Results and Discussion 4.3.1 Etching and Deposition in C(4)F(8) Plasmas4.3.2 Etching and Deposition Experiments in CHF(3)/CH(4) Plasmas; 4.3.3 FC Film Characterization: Chemical Composition; 4.4 Conclusions; 5 Hot-wire Plasma Deposition of Doped DLC Films on Fluorocarbon Polymers for Biomedical Applications; 5.1 Introduction; 5.2 Experimental Details; 5.2.1 Preparation of Samples; 5.2.2 Plasma Deposition Technique; 5.2.3 Surface Characterization; 5.2.4 Platelet-Adhesion Technique; 5.3 Results and Discussion; 5.3.1 Characterization of Deposited Film; 5.3.2 Platelet Adhesion 6 Properties of Silicon Nitride by Room-Temperature Inductively Coupled Plasma Deposition6.1 Introduction; 6.2 Experimental Systems; 6.3 Results and Discussion; 6.4 Conclusions; 7 Structural Analysis of Diamond-like Carbon Films Deposited by RF (13.56 MHz) in a Methane Gas Plasma Atmosphere; 7.1 Introduction; 7.2 Experimental Procedure; 7.2.1 Deposition Apparatus; 7.2.2 Experimental Conditions; 7.3 Results and Discussions; 7.3.1 X-ray Auger Electron Spectroscopy (XAES); 7.3.2 Electron Energy Loss Spectroscopy (EELS); 7.4 Conclusion; 8 Rate constant of HMDSO + O reaction in plasma afterglow 8.1 Introduction8.2 Experimental; 8.3 Calculation of the rate constant; 8.4 Results and discussion; 8.5 Conclusion; 9 Plasma-Enhanced Thin-Film Deposition On Polycarbonates; 9.1 Introduction; 9.2 Experimental; 9.3 Results; 9.4 Discussion; 9.5 Conclusions; 10 Molecular Tailoring Coating on TiO(2) Nanoparticle Surface by Plasma Polymerization; 10.1 Introduction; 10.2 Experimental; 10.3 Results and Discussions; 10.3.1 Surface Morphology; 10.3.2 Surface Molecular Structure; 10.3.3 Dispersion Behavior of AA-Plasma-Polymer-Coated TiO(2) Nanoparticles; 10.4 Conclusion Part II Plasma-Grafting of Functional Groups |
| Record Nr. | UNINA-9910830010503321 |
| Weinheim ; ; [Chichester], : Wiley-VCH, c2005 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Plasma processes and polymers / / edited by Riccardo d'Agostino ... (et al)
| Plasma processes and polymers / / edited by Riccardo d'Agostino ... (et al) |
| Pubbl/distr/stampa | Weinheim ; ; [Chichester], : Wiley-VCH, c2005 |
| Descrizione fisica | 1 online resource (548 p.) |
| Disciplina |
547/.28
668.9 |
| Altri autori (Persone) | D'AgostinoRiccardo |
| Soggetto topico |
Plasma polymerization
Plasma chemistry |
| ISBN |
1-280-52063-9
9786610520633 3-527-60558-4 3-527-60557-6 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Plasma Processes and Polymers; Contents; Preface; List of Contributors; Part I Plasma Deposition of Thin Films; 1 Polymer Surface Modification with Monofunctional Groups of Different Type and Density; 1.1 Introduction; 1.2 Experimental; 1.3 Results; 1.3.1 Kinetics of the Deposition of Copolymers; 1.3.2 Variation of the Density of Functional Groups; 1.3.3 Structure and Stability of Copolymers; 1.3.4 Relation between Functional Groups of Copolymers and Surface Energy; 1.3.5 Relation between Functional Groups of Copolymers and Adhesion; 1.4 Discussion
2RF-Plasma Deposition of SiO(x) and a-C:H as Barrier Coatings on Polymers2.1 Introduction; 2.2 Experimental; 2.3 Results and Discussion; 2.4 Conclusions; 3 Upscaling of Plasma Processes for Carboxyl Functionalization; 3.1 Introduction; 3.2 Experimental; 3.2.1 Materials; 3.2.2 Plasma-Deposition Apparatus; 3.2.3 Characterization Techniques; 3.3 Results and Discussion; 3.4 Conclusions; 4 Deposition of Fluorocarbon Films on Al and SiO(2) Surfaces in High-Density Fluorocarbon Plasmas: Selectivity and Surface Wettability; 4.1 Introduction; 4.2 Experimental; 4.3 Results and Discussion 4.3.1 Etching and Deposition in C(4)F(8) Plasmas4.3.2 Etching and Deposition Experiments in CHF(3)/CH(4) Plasmas; 4.3.3 FC Film Characterization: Chemical Composition; 4.4 Conclusions; 5 Hot-wire Plasma Deposition of Doped DLC Films on Fluorocarbon Polymers for Biomedical Applications; 5.1 Introduction; 5.2 Experimental Details; 5.2.1 Preparation of Samples; 5.2.2 Plasma Deposition Technique; 5.2.3 Surface Characterization; 5.2.4 Platelet-Adhesion Technique; 5.3 Results and Discussion; 5.3.1 Characterization of Deposited Film; 5.3.2 Platelet Adhesion 6 Properties of Silicon Nitride by Room-Temperature Inductively Coupled Plasma Deposition6.1 Introduction; 6.2 Experimental Systems; 6.3 Results and Discussion; 6.4 Conclusions; 7 Structural Analysis of Diamond-like Carbon Films Deposited by RF (13.56 MHz) in a Methane Gas Plasma Atmosphere; 7.1 Introduction; 7.2 Experimental Procedure; 7.2.1 Deposition Apparatus; 7.2.2 Experimental Conditions; 7.3 Results and Discussions; 7.3.1 X-ray Auger Electron Spectroscopy (XAES); 7.3.2 Electron Energy Loss Spectroscopy (EELS); 7.4 Conclusion; 8 Rate constant of HMDSO + O reaction in plasma afterglow 8.1 Introduction8.2 Experimental; 8.3 Calculation of the rate constant; 8.4 Results and discussion; 8.5 Conclusion; 9 Plasma-Enhanced Thin-Film Deposition On Polycarbonates; 9.1 Introduction; 9.2 Experimental; 9.3 Results; 9.4 Discussion; 9.5 Conclusions; 10 Molecular Tailoring Coating on TiO(2) Nanoparticle Surface by Plasma Polymerization; 10.1 Introduction; 10.2 Experimental; 10.3 Results and Discussions; 10.3.1 Surface Morphology; 10.3.2 Surface Molecular Structure; 10.3.3 Dispersion Behavior of AA-Plasma-Polymer-Coated TiO(2) Nanoparticles; 10.4 Conclusion Part II Plasma-Grafting of Functional Groups |
| Record Nr. | UNINA-9910876604203321 |
| Weinheim ; ; [Chichester], : Wiley-VCH, c2005 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||