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Total-reflection x-ray fluorescence analysis and related methods / / Reinhold Klockenkämper, Alex von Bohlen
| Total-reflection x-ray fluorescence analysis and related methods / / Reinhold Klockenkämper, Alex von Bohlen |
| Autore | Reinhold Klockenkämper |
| Edizione | [2nd ed.] |
| Pubbl/distr/stampa | Hoboken, New Jersey : , : Wiley, , 2015 |
| Descrizione fisica | 1 online resource (555 p.) |
| Disciplina | 543.56 |
| Collana | Chemical Analysis |
| Soggetto topico |
Fluorescence spectroscopy
X-ray spectroscopy Reflectance spectroscopy |
| ISBN |
1-118-98595-8
1-118-98587-7 |
| Formato | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Total-Reflection X-ray Fluorescence Analysis and Related Methods; Contents; Foreword; Acknowledgments; List of Acronyms; List of Physical Units and Subunits; List of Symbols; Chapter 1: Fundamentals of X-Ray Fluorescence; 1.1 A Short History of XRF; 1.2 The New Variant TXRF; 1.2.1 Retrospect on its Development; 1.2.2 Relationship of XRF and TXRF; 1.3 Nature and Production of X-Rays; 1.3.1 The Nature of X-Rays; 1.3.2 X-Ray Tubes as X-Ray Sources; 1.3.2.1 The Line Spectrum; 1.3.2.2 The Continuous Spectrum; 1.3.3 Polarization of X-Rays; 1.3.4 Synchrotron Radiation as X-Ray Source
1.3.4.1 Electrons in Fields of Bending Magnets 1.3.4.2 Radiation Power of a Single Electron; 1.3.4.3 Angular and Spectral Distribution of SR; 1.3.4.4 Comparison with Black-Body Radiation; 1.4 Attenuation of X-Rays; 1.4.1 Photoelectric Absorption; 1.4.2 X-Ray Scatter; 1.4.3 Total Attenuation; 1.5 Deflection of X-Rays; 1.5.1 Reflection and Refraction; 1.5.2 Diffraction and Bragg's Law; 1.5.3 Total External Reflection; 1.5.3.1 Reflectivity; 1.5.3.2 Penetration Depth; 1.5.4 Refraction and Dispersion; References; Chapter 2: Principles of Total Reflection XRF; 2.1 Interference of X-Rays 2.1.1 Double-Beam Interference 2.1.2 Multiple-Beam Interference; 2.2 X-Ray Standing Wave Fields; 2.2.1 Standing Waves in Front of a Thick Substrate; 2.2.2 Standing Wave Fields Within a Thin Layer; 2.2.3 Standing Waves Within a Multilayer or Crystal; 2.3 Intensity of Fluorescence Signals; 2.3.1 Infinitely Thick and Flat Substrates; 2.3.2 Granular Residues on a Substrate; 2.3.3 Buried Layers in a Substrate; 2.3.4 Reflecting Layers on Substrates; 2.3.5 Periodic Multilayers and Crystals; 2.4 Formalism for Intensity Calculations; 2.4.1 A Thick and Flat Substrate 2.4.2 A Thin Homogeneous Layer on a Substrate 2.4.3 A Stratified Medium of Several Layers; References; Chapter 3: Instrumentation for TXRF and GI-XRF; 3.1 Basic Instrumental Setup; 3.2 High and Low-Power X-Ray Sources; 3.2.1 Fine-Focus X-Ray Tubes; 3.2.2 Rotating Anode Tubes; 3.2.3 Air-Cooled X-Ray Tubes; 3.3 Synchrotron Facilities; 3.3.1 Basic Setup with Bending Magnets; 3.3.2 Undulators, Wigglers, and FELs; 3.3.3 Facilities Worldwide; 3.4 The Beam Adapting Unit; 3.4.1 Low-Pass Filters; 3.4.2 Simple Monochromators; 3.4.3 Double-Crystal Monochromators; 3.5 Sample Positioning 3.5.1 Sample Carriers 3.5.2 Fixed Angle Adjustment for TXRF ("Angle Cut"); 3.5.3 Stepwise-Angle Variation for GI-XRF ("Angle Scan"); 3.6 Energy-Dispersive Detection of X-Rays; 3.6.1 The Semiconductor Detector; 3.6.2 The Silicon Drift Detector; 3.6.3 Position Sensitive Detectors; 3.7 Wavelength-Dispersive Detection of X-Rays; 3.7.1 Dispersing Crystals with Soller Collimators; 3.7.2 Gas-Filled Detectors; 3.7.3 Scintillation Detectors; 3.8 Spectra Registration and Evaluation; 3.8.1 The Registration Unit; 3.8.2 Performance Characteristics; 3.8.2.1 Detector Efficiency; 3.8.2.2 Spectral Resolution 3.8.2.3 Input-Output Yield |
| Record Nr. | UNINA-9910132307903321 |
Reinhold Klockenkämper
|
||
| Hoboken, New Jersey : , : Wiley, , 2015 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Total-reflection x-ray fluorescence analysis and related methods / / Reinhold Klockenkämper, Alex von Bohlen
| Total-reflection x-ray fluorescence analysis and related methods / / Reinhold Klockenkämper, Alex von Bohlen |
| Autore | Reinhold Klockenkämper |
| Edizione | [2nd ed.] |
| Pubbl/distr/stampa | Hoboken, New Jersey : , : Wiley, , 2015 |
| Descrizione fisica | 1 online resource (555 p.) |
| Disciplina | 543.56 |
| Collana | Chemical Analysis |
| Soggetto topico |
Fluorescence spectroscopy
X-ray spectroscopy Reflectance spectroscopy |
| ISBN |
1-118-98595-8
1-118-98587-7 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Total-Reflection X-ray Fluorescence Analysis and Related Methods; Contents; Foreword; Acknowledgments; List of Acronyms; List of Physical Units and Subunits; List of Symbols; Chapter 1: Fundamentals of X-Ray Fluorescence; 1.1 A Short History of XRF; 1.2 The New Variant TXRF; 1.2.1 Retrospect on its Development; 1.2.2 Relationship of XRF and TXRF; 1.3 Nature and Production of X-Rays; 1.3.1 The Nature of X-Rays; 1.3.2 X-Ray Tubes as X-Ray Sources; 1.3.2.1 The Line Spectrum; 1.3.2.2 The Continuous Spectrum; 1.3.3 Polarization of X-Rays; 1.3.4 Synchrotron Radiation as X-Ray Source
1.3.4.1 Electrons in Fields of Bending Magnets 1.3.4.2 Radiation Power of a Single Electron; 1.3.4.3 Angular and Spectral Distribution of SR; 1.3.4.4 Comparison with Black-Body Radiation; 1.4 Attenuation of X-Rays; 1.4.1 Photoelectric Absorption; 1.4.2 X-Ray Scatter; 1.4.3 Total Attenuation; 1.5 Deflection of X-Rays; 1.5.1 Reflection and Refraction; 1.5.2 Diffraction and Bragg's Law; 1.5.3 Total External Reflection; 1.5.3.1 Reflectivity; 1.5.3.2 Penetration Depth; 1.5.4 Refraction and Dispersion; References; Chapter 2: Principles of Total Reflection XRF; 2.1 Interference of X-Rays 2.1.1 Double-Beam Interference 2.1.2 Multiple-Beam Interference; 2.2 X-Ray Standing Wave Fields; 2.2.1 Standing Waves in Front of a Thick Substrate; 2.2.2 Standing Wave Fields Within a Thin Layer; 2.2.3 Standing Waves Within a Multilayer or Crystal; 2.3 Intensity of Fluorescence Signals; 2.3.1 Infinitely Thick and Flat Substrates; 2.3.2 Granular Residues on a Substrate; 2.3.3 Buried Layers in a Substrate; 2.3.4 Reflecting Layers on Substrates; 2.3.5 Periodic Multilayers and Crystals; 2.4 Formalism for Intensity Calculations; 2.4.1 A Thick and Flat Substrate 2.4.2 A Thin Homogeneous Layer on a Substrate 2.4.3 A Stratified Medium of Several Layers; References; Chapter 3: Instrumentation for TXRF and GI-XRF; 3.1 Basic Instrumental Setup; 3.2 High and Low-Power X-Ray Sources; 3.2.1 Fine-Focus X-Ray Tubes; 3.2.2 Rotating Anode Tubes; 3.2.3 Air-Cooled X-Ray Tubes; 3.3 Synchrotron Facilities; 3.3.1 Basic Setup with Bending Magnets; 3.3.2 Undulators, Wigglers, and FELs; 3.3.3 Facilities Worldwide; 3.4 The Beam Adapting Unit; 3.4.1 Low-Pass Filters; 3.4.2 Simple Monochromators; 3.4.3 Double-Crystal Monochromators; 3.5 Sample Positioning 3.5.1 Sample Carriers 3.5.2 Fixed Angle Adjustment for TXRF ("Angle Cut"); 3.5.3 Stepwise-Angle Variation for GI-XRF ("Angle Scan"); 3.6 Energy-Dispersive Detection of X-Rays; 3.6.1 The Semiconductor Detector; 3.6.2 The Silicon Drift Detector; 3.6.3 Position Sensitive Detectors; 3.7 Wavelength-Dispersive Detection of X-Rays; 3.7.1 Dispersing Crystals with Soller Collimators; 3.7.2 Gas-Filled Detectors; 3.7.3 Scintillation Detectors; 3.8 Spectra Registration and Evaluation; 3.8.1 The Registration Unit; 3.8.2 Performance Characteristics; 3.8.2.1 Detector Efficiency; 3.8.2.2 Spectral Resolution 3.8.2.3 Input-Output Yield |
| Record Nr. | UNINA-9910822150203321 |
|
Reinhold Klockenkämper
|
||
| Hoboken, New Jersey : , : Wiley, , 2015 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||