Extended abstracts of the third International Workshop on Junction Technology : IWJT : December 2-3, 2002, Tokyo, Japan |
Pubbl/distr/stampa | [Place of publication not identified], : Business Center for Academic Societies Japan, 2002 |
Disciplina | 621.3815/2 |
Soggetto topico |
Semiconductors - Junctions
Semiconductors - Design and construction Electrical & Computer Engineering Engineering & Applied Sciences Electrical Engineering |
Formato | Materiale a stampa ![]() |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Record Nr. | UNISA-996206246403316 |
[Place of publication not identified], : Business Center for Academic Societies Japan, 2002 | ||
![]() | ||
Lo trovi qui: Univ. di Salerno | ||
|
Extended abstracts of the third International Workshop on Junction Technology : IWJT : December 2-3, 2002, Tokyo, Japan |
Pubbl/distr/stampa | [Place of publication not identified], : Business Center for Academic Societies Japan, 2002 |
Disciplina | 621.3815/2 |
Soggetto topico |
Semiconductors - Junctions
Semiconductors - Design and construction Electrical & Computer Engineering Engineering & Applied Sciences Electrical Engineering |
Formato | Materiale a stampa ![]() |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Record Nr. | UNINA-9910872557603321 |
[Place of publication not identified], : Business Center for Academic Societies Japan, 2002 | ||
![]() | ||
Lo trovi qui: Univ. Federico II | ||
|
Fabrication engineering at the micro- and nanoscale / Stephen A. Campbell |
Autore | Campbell, Stephen A. |
Edizione | [Fourth edition] |
Descrizione fisica | xiv, 671 pages; 24 cm |
Disciplina | 621.3815/2 |
Collana | The Oxford series in electrical and computer engineering |
Soggetto topico | Semiconductors - Design and construction |
ISBN | 9780199861224 |
Classificazione |
LC TK7871.85
621.3.2.4 |
Formato | Materiale a stampa ![]() |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Record Nr. | UNISALENTO-991003427979707536 |
Campbell, Stephen A.
![]() |
||
![]() | ||
Lo trovi qui: Univ. del Salento | ||
|
Fourth International Workshop on Junction Technology, 2004 : 16 March 2004, Shanghai, China / / Institute of Electrical and Electronics Engineers |
Pubbl/distr/stampa | Piscataway, New Jersey : , : Institute of Electrical and Electronics Engineers, , 2004 |
Descrizione fisica | 1 online resource (68 pages) |
Disciplina | 621.395 |
Altri autori (Persone) | QuXin-Ping |
Soggetto topico |
Integrated circuits - Very large scale integration - Design and construction
Semiconductors - Junctions Semiconductors - Design and construction |
Formato | Materiale a stampa ![]() |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Record Nr. | UNISA-996202923903316 |
Piscataway, New Jersey : , : Institute of Electrical and Electronics Engineers, , 2004 | ||
![]() | ||
Lo trovi qui: Univ. di Salerno | ||
|
Fundamentals of semiconductor manufacturing and process control / / Gary S. May, Costas J. Spanos |
Autore | May Gary S. |
Pubbl/distr/stampa | [Piscataway, New Jersey] : , : IEEE, , c2006 |
Descrizione fisica | 1 online resource (485 p.) |
Disciplina |
621.3815/2
621.38152 |
Altri autori (Persone) | SpanosCostas J |
Soggetto topico |
Semiconductors - Design and construction
Integrated circuits - Design and construction Process control - Statistical methods |
ISBN |
1-280-45023-1
9786610450237 0-470-35916-1 0-471-79028-1 1-61583-845-7 0-471-79027-3 |
Formato | Materiale a stampa ![]() |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Nota di contenuto | Introduction to semiconductor manufacturing -- Technology overview -- Process monitoring -- Statistical fundamentals -- Yield modeling -- Statistical process control -- Statistical experimental design -- Process modeling -- Advanced process control -- Process and equipment diagnosis. |
Record Nr. | UNINA-9910143417603321 |
May Gary S.
![]() |
||
[Piscataway, New Jersey] : , : IEEE, , c2006 | ||
![]() | ||
Lo trovi qui: Univ. Federico II | ||
|
Fundamentals of semiconductor manufacturing and process control / / Gary S. May, Costas J. Spanos |
Autore | May Gary S. |
Pubbl/distr/stampa | [Piscataway, New Jersey] : , : IEEE, , c2006 |
Descrizione fisica | 1 online resource (485 p.) |
Disciplina |
621.3815/2
621.38152 |
Altri autori (Persone) | SpanosCostas J |
Soggetto topico |
Semiconductors - Design and construction
Integrated circuits - Design and construction Process control - Statistical methods |
ISBN |
1-280-45023-1
9786610450237 0-470-35916-1 0-471-79028-1 1-61583-845-7 0-471-79027-3 |
Formato | Materiale a stampa ![]() |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Nota di contenuto | Introduction to semiconductor manufacturing -- Technology overview -- Process monitoring -- Statistical fundamentals -- Yield modeling -- Statistical process control -- Statistical experimental design -- Process modeling -- Advanced process control -- Process and equipment diagnosis. |
Record Nr. | UNISA-996202373203316 |
May Gary S.
![]() |
||
[Piscataway, New Jersey] : , : IEEE, , c2006 | ||
![]() | ||
Lo trovi qui: Univ. di Salerno | ||
|
Fundamentals of semiconductor manufacturing and process control / / Gary S. May, Costas J. Spanos |
Autore | May Gary S. |
Pubbl/distr/stampa | [Piscataway, New Jersey] : , : IEEE, , c2006 |
Descrizione fisica | 1 online resource (485 p.) |
Disciplina |
621.3815/2
621.38152 |
Altri autori (Persone) | SpanosCostas J |
Soggetto topico |
Semiconductors - Design and construction
Integrated circuits - Design and construction Process control - Statistical methods |
ISBN |
1-280-45023-1
9786610450237 0-470-35916-1 0-471-79028-1 1-61583-845-7 0-471-79027-3 |
Formato | Materiale a stampa ![]() |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Nota di contenuto | Introduction to semiconductor manufacturing -- Technology overview -- Process monitoring -- Statistical fundamentals -- Yield modeling -- Statistical process control -- Statistical experimental design -- Process modeling -- Advanced process control -- Process and equipment diagnosis. |
Record Nr. | UNINA-9910830857403321 |
May Gary S.
![]() |
||
[Piscataway, New Jersey] : , : IEEE, , c2006 | ||
![]() | ||
Lo trovi qui: Univ. Federico II | ||
|
Handbook of Semiconductor Technology |
Pubbl/distr/stampa | [Place of publication not identified], : Wiley VCH Imprint, 2000 |
Disciplina | 621.3815/2 |
Soggetto topico |
Semiconductors - Analysis
Semiconductors - Materials Semiconductors - Design and construction Electronic structure - Defects Semiconductors Electrical & Computer Engineering Engineering & Applied Sciences Electrical Engineering |
ISBN | 3-527-61929-1 |
Formato | Materiale a stampa ![]() |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Record Nr. | UNINA-9910144686403321 |
[Place of publication not identified], : Wiley VCH Imprint, 2000 | ||
![]() | ||
Lo trovi qui: Univ. Federico II | ||
|
Handbook of Semiconductor Technology |
Pubbl/distr/stampa | [Place of publication not identified], : Wiley VCH Imprint, 2000 |
Disciplina | 621.3815/2 |
Soggetto topico |
Semiconductors - Analysis
Semiconductors - Materials Semiconductors - Design and construction Electronic structure - Defects Semiconductors Electrical & Computer Engineering Engineering & Applied Sciences Electrical Engineering |
ISBN | 3-527-61929-1 |
Formato | Materiale a stampa ![]() |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Record Nr. | UNINA-9910830491703321 |
[Place of publication not identified], : Wiley VCH Imprint, 2000 | ||
![]() | ||
Lo trovi qui: Univ. Federico II | ||
|
ICICDT : IEEE International Conference on IC Design and Technology : May 28th-30th, 2014, Austin, Texas, USA |
Pubbl/distr/stampa | New York : , : IEEE, , 2014 |
Descrizione fisica | 1 online resource (246 pages) |
Soggetto topico |
Semiconductors - Design and construction
Integrated circuits - Design and construction |
ISBN |
1-4799-2153-X
1-4799-2154-8 |
Formato | Materiale a stampa ![]() |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Record Nr. | UNISA-996279277803316 |
New York : , : IEEE, , 2014 | ||
![]() | ||
Lo trovi qui: Univ. di Salerno | ||
|