ASMC : 2018 29th Annual SEMI Advanced Semiconductor Manufacturing Conference : 30 April-3 May 2018, Saratoga Springs, NY, USA / / Institute of Electrical and Electronics Engineers |
Pubbl/distr/stampa | Piscataway, New Jersey : , : Institute of Electrical and Electronics Engineers, , 2018 |
Descrizione fisica | 1 online resource (394 pages) |
Disciplina | 621.38152 |
Soggetto topico |
Semiconductors - Design and construction
Process control |
ISBN | 1-5386-3748-0 |
Formato | Materiale a stampa ![]() |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Record Nr. | UNINA-9910280928203321 |
Piscataway, New Jersey : , : Institute of Electrical and Electronics Engineers, , 2018 | ||
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Lo trovi qui: Univ. Federico II | ||
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ASMC '92 : 3rd Annual Advanced Semiconductor Manufacturing Conference and Workshop 1992 : September 30-October 1, 1992, Hyatt Regency, Cambridge, Massachusetts / / sponsored by Institute of Electrical and Electronics Engineers [and three others] |
Pubbl/distr/stampa | Piscataway, New Jersey : , : Institute of Electrical and Electronics Engineers, , 1992 |
Descrizione fisica | 1 online resource (205 pages) |
Disciplina | 621.38152 |
Soggetto topico |
Semiconductor industry
Semiconductors - Design and construction |
Formato | Materiale a stampa ![]() |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Record Nr. | UNISA-996211918503316 |
Piscataway, New Jersey : , : Institute of Electrical and Electronics Engineers, , 1992 | ||
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Lo trovi qui: Univ. di Salerno | ||
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ASMC ... proceedings / / IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop |
Pubbl/distr/stampa | New York, NY : , : IEEE, , c1990- |
Disciplina | 621.3815 |
Soggetto topico |
Semiconductors - Design and construction
Semiconductor industry |
Soggetto genere / forma |
Periodicals.
Conference papers and proceedings. |
ISSN | 2376-6697 |
Formato | Materiale a stampa ![]() |
Livello bibliografico | Periodico |
Lingua di pubblicazione | eng |
Altri titoli varianti |
Proceedings
Advanced Semiconductor Manufacturing Conference and Workshop |
Record Nr. | UNINA-9910626195103321 |
New York, NY : , : IEEE, , c1990- | ||
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Lo trovi qui: Univ. Federico II | ||
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ASMC ... proceedings / / IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop |
Pubbl/distr/stampa | New York, NY : , : IEEE, , c1990- |
Disciplina | 621.3815 |
Soggetto topico |
Semiconductors - Design and construction
Semiconductor industry |
Soggetto genere / forma |
Periodicals.
Conference papers and proceedings. |
ISSN | 2376-6697 |
Formato | Materiale a stampa ![]() |
Livello bibliografico | Periodico |
Lingua di pubblicazione | eng |
Altri titoli varianti |
Proceedings
Advanced Semiconductor Manufacturing Conference and Workshop |
Record Nr. | UNISA-996279730603316 |
New York, NY : , : IEEE, , c1990- | ||
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Lo trovi qui: Univ. di Salerno | ||
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Database needs for modeling and simulation of plasma processing [[electronic resource] /] / Panel on Database Needs in Plasma Processing, Committee on Atomic, Molecular, and Optical Sciences and Plasma Science Committee, Board on Physics and Astronomy, Commission on Physical Sciences, Mathematics, and Applications, National Research Council |
Pubbl/distr/stampa | Washington, D.C., : National Academy Press, 1996 |
Descrizione fisica | 1 online resource (74 p.) |
Collana | The compass series |
Soggetto topico |
Semiconductors - Design and construction
Plasma engineering - Databases Plasma engineering - Computer simulation |
Soggetto genere / forma | Electronic books. |
ISBN |
0-309-57353-X
0-585-08454-8 |
Formato | Materiale a stampa ![]() |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Nota di contenuto |
""Database Needs for Modeling and Simulation of Plasma Processing""; ""Copyright""; ""Preface""; ""Contents""; ""Executive Summary""; ""FINDINGS""; ""CONCLUSIONS""; ""RECOMMENDATIONS""; ""REFERENCES""; ""1 Industrial Perspectives ""; ""INTRODUCTION""; ""PLASMA PROCESSING FOR SEMICONDUCTOR MANUFACTURING""; ""PLASMA EQUIPMENT SUPPLIER PERSPECTIVES""; ""CHIP MANUFACTURER PERSPECTIVES""; ""RECOMMENDED PRIORITIES FOR DEVELOPMENT OF AN IMPROVED DATABASE""; ""FINDINGS""; ""CONCLUSIONS""; ""REFERENCES""; ""2 Tool Scale and Feature Scale Models ""; ""INTRODUCTION""; ""TOOL SCALE MODELS""
""Capabilities Needed for Tool Scale Models""""Barriers to Using Tool Scale Models""; ""FEATURE SCALE MODELS""; ""GENERAL ASSESSMENT OF MODELING STATE OF THE ART AND VISION OF FUTURE CAPABILITY AND IMPLIED NEEDS""; ""FINDINGS""; ""CONCLUSIONS""; ""REFERENCES""; ""3 Radiative Processes and Diagnostics ""; ""INTRODUCTION""; ""TECHNIQUES FOR MEASUREMENTS OF GAS PHASE SPECIES""; ""Information Resources""; ""Roles of the Database In Motivating Diagnostic Experiments""; ""SURFACE REACTION DATABASE AND DIAGNOSTICS""; ""Information Resources""; ""New Diagnostic Techniques""; ""FINDINGS"" ""REFERENCES""""4 Heterogeneous Processes ""; ""INTRODUCTION""; ""STATE OF THE DATABASE""; ""TECHNIQUES FOR IMPROVING THE DATABASE""; ""Approach""; ""Measurements On Realistic Plasma Reactors""; ""Incident Flux and Desorbing Flux Analysis""; ""Condition of the Surface""; ""Technology""; ""Ultrahigh-Vacuum Approach Using Mass and Energy Selected Reactive Beams""; ""Particle Beams""; ""Sticking Coefficients""; ""Synergistic Effects""; ""Substrate Temperature Dependence""; ""Angle Dependence""; ""Computer Simulations""; ""FINDINGS""; ""REFERENCES""; ""5 Electron Collision Processes "" ""INTRODUCTION""""IONIZATION""; ""Atoms""; ""Molecules""; ""Theoretical Methods and Advances""; ""Neutral Dissociation""; ""ELECTRON-IMPACT EXCITATION""; ""ATTACHMENT""; ""MOMENTUM TRANSFER, SWARM, AND DISCHARGE MEASUREMENTS""; ""GENERAL COMMENTS""; ""FINDINGS""; ""REFERENCES""; ""6 Ion Processes, Neutral Chemistry, And Thermochemical Data ""; ""INTRODUCTION""; ""CROSS SECTIONS AND RATE COEFFICIENTS""; ""Ion Processes""; ""Momentum Transfer""; ""Ion-Molecule and Charge Exchange Reactions""; ""Ion-Ion Neutralization""; ""Electron-Ion Recombination"" ""Ion-Neutral and Neutral-Neutral Excitation""""Neutral Chemistry""; ""Status of the Database""; ""Excited State Chemistry and Penning Ionization""; ""Summary""; ""Ion Processes""; ""Neutral Chemistry""; ""THERMOCHEMICAL DATA""; ""FINDINGS""; ""REFERENCES""; ""Appendix A: Acronyms and Abbreviations""; ""Appendix B: Workshop Agenda""; ""Appendix C: Workshop Participants"" |
Record Nr. | UNINA-9910456054403321 |
Washington, D.C., : National Academy Press, 1996 | ||
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Lo trovi qui: Univ. Federico II | ||
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Database needs for modeling and simulation of plasma processing [[electronic resource] /] / Panel on Database Needs in Plasma Processing, Committee on Atomic, Molecular, and Optical Sciences and Plasma Science Committee, Board on Physics and Astronomy, Commission on Physical Sciences, Mathematics, and Applications, National Research Council |
Pubbl/distr/stampa | Washington, D.C., : National Academy Press, 1996 |
Descrizione fisica | 1 online resource (74 p.) |
Collana | The compass series |
Soggetto topico |
Semiconductors - Design and construction
Plasma engineering - Databases Plasma engineering - Computer simulation |
ISBN |
0-309-17513-5
0-309-57353-X 0-585-08454-8 |
Formato | Materiale a stampa ![]() |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Nota di contenuto |
""Database Needs for Modeling and Simulation of Plasma Processing""; ""Copyright""; ""Preface""; ""Contents""; ""Executive Summary""; ""FINDINGS""; ""CONCLUSIONS""; ""RECOMMENDATIONS""; ""REFERENCES""; ""1 Industrial Perspectives ""; ""INTRODUCTION""; ""PLASMA PROCESSING FOR SEMICONDUCTOR MANUFACTURING""; ""PLASMA EQUIPMENT SUPPLIER PERSPECTIVES""; ""CHIP MANUFACTURER PERSPECTIVES""; ""RECOMMENDED PRIORITIES FOR DEVELOPMENT OF AN IMPROVED DATABASE""; ""FINDINGS""; ""CONCLUSIONS""; ""REFERENCES""; ""2 Tool Scale and Feature Scale Models ""; ""INTRODUCTION""; ""TOOL SCALE MODELS""
""Capabilities Needed for Tool Scale Models""""Barriers to Using Tool Scale Models""; ""FEATURE SCALE MODELS""; ""GENERAL ASSESSMENT OF MODELING STATE OF THE ART AND VISION OF FUTURE CAPABILITY AND IMPLIED NEEDS""; ""FINDINGS""; ""CONCLUSIONS""; ""REFERENCES""; ""3 Radiative Processes and Diagnostics ""; ""INTRODUCTION""; ""TECHNIQUES FOR MEASUREMENTS OF GAS PHASE SPECIES""; ""Information Resources""; ""Roles of the Database In Motivating Diagnostic Experiments""; ""SURFACE REACTION DATABASE AND DIAGNOSTICS""; ""Information Resources""; ""New Diagnostic Techniques""; ""FINDINGS"" ""REFERENCES""""4 Heterogeneous Processes ""; ""INTRODUCTION""; ""STATE OF THE DATABASE""; ""TECHNIQUES FOR IMPROVING THE DATABASE""; ""Approach""; ""Measurements On Realistic Plasma Reactors""; ""Incident Flux and Desorbing Flux Analysis""; ""Condition of the Surface""; ""Technology""; ""Ultrahigh-Vacuum Approach Using Mass and Energy Selected Reactive Beams""; ""Particle Beams""; ""Sticking Coefficients""; ""Synergistic Effects""; ""Substrate Temperature Dependence""; ""Angle Dependence""; ""Computer Simulations""; ""FINDINGS""; ""REFERENCES""; ""5 Electron Collision Processes "" ""INTRODUCTION""""IONIZATION""; ""Atoms""; ""Molecules""; ""Theoretical Methods and Advances""; ""Neutral Dissociation""; ""ELECTRON-IMPACT EXCITATION""; ""ATTACHMENT""; ""MOMENTUM TRANSFER, SWARM, AND DISCHARGE MEASUREMENTS""; ""GENERAL COMMENTS""; ""FINDINGS""; ""REFERENCES""; ""6 Ion Processes, Neutral Chemistry, And Thermochemical Data ""; ""INTRODUCTION""; ""CROSS SECTIONS AND RATE COEFFICIENTS""; ""Ion Processes""; ""Momentum Transfer""; ""Ion-Molecule and Charge Exchange Reactions""; ""Ion-Ion Neutralization""; ""Electron-Ion Recombination"" ""Ion-Neutral and Neutral-Neutral Excitation""""Neutral Chemistry""; ""Status of the Database""; ""Excited State Chemistry and Penning Ionization""; ""Summary""; ""Ion Processes""; ""Neutral Chemistry""; ""THERMOCHEMICAL DATA""; ""FINDINGS""; ""REFERENCES""; ""Appendix A: Acronyms and Abbreviations""; ""Appendix B: Workshop Agenda""; ""Appendix C: Workshop Participants"" |
Record Nr. | UNINA-9910778672203321 |
Washington, D.C., : National Academy Press, 1996 | ||
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Lo trovi qui: Univ. Federico II | ||
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Database needs for modeling and simulation of plasma processing / / Panel on Database Needs in Plasma Processing, Committee on Atomic, Molecular, and Optical Sciences and Plasma Science Committee, Board on Physics and Astronomy, Commission on Physical Sciences, Mathematics, and Applications, National Research Council |
Edizione | [1st ed.] |
Pubbl/distr/stampa | Washington, D.C., : National Academy Press, 1996 |
Descrizione fisica | 1 online resource (74 p.) |
Collana | The compass series |
Soggetto topico |
Semiconductors - Design and construction
Plasma engineering - Databases Plasma engineering - Computer simulation |
ISBN |
0-309-17513-5
0-309-57353-X 0-585-08454-8 |
Formato | Materiale a stampa ![]() |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Nota di contenuto |
""Database Needs for Modeling and Simulation of Plasma Processing""; ""Copyright""; ""Preface""; ""Contents""; ""Executive Summary""; ""FINDINGS""; ""CONCLUSIONS""; ""RECOMMENDATIONS""; ""REFERENCES""; ""1 Industrial Perspectives ""; ""INTRODUCTION""; ""PLASMA PROCESSING FOR SEMICONDUCTOR MANUFACTURING""; ""PLASMA EQUIPMENT SUPPLIER PERSPECTIVES""; ""CHIP MANUFACTURER PERSPECTIVES""; ""RECOMMENDED PRIORITIES FOR DEVELOPMENT OF AN IMPROVED DATABASE""; ""FINDINGS""; ""CONCLUSIONS""; ""REFERENCES""; ""2 Tool Scale and Feature Scale Models ""; ""INTRODUCTION""; ""TOOL SCALE MODELS""
""Capabilities Needed for Tool Scale Models""""Barriers to Using Tool Scale Models""; ""FEATURE SCALE MODELS""; ""GENERAL ASSESSMENT OF MODELING STATE OF THE ART AND VISION OF FUTURE CAPABILITY AND IMPLIED NEEDS""; ""FINDINGS""; ""CONCLUSIONS""; ""REFERENCES""; ""3 Radiative Processes and Diagnostics ""; ""INTRODUCTION""; ""TECHNIQUES FOR MEASUREMENTS OF GAS PHASE SPECIES""; ""Information Resources""; ""Roles of the Database In Motivating Diagnostic Experiments""; ""SURFACE REACTION DATABASE AND DIAGNOSTICS""; ""Information Resources""; ""New Diagnostic Techniques""; ""FINDINGS"" ""REFERENCES""""4 Heterogeneous Processes ""; ""INTRODUCTION""; ""STATE OF THE DATABASE""; ""TECHNIQUES FOR IMPROVING THE DATABASE""; ""Approach""; ""Measurements On Realistic Plasma Reactors""; ""Incident Flux and Desorbing Flux Analysis""; ""Condition of the Surface""; ""Technology""; ""Ultrahigh-Vacuum Approach Using Mass and Energy Selected Reactive Beams""; ""Particle Beams""; ""Sticking Coefficients""; ""Synergistic Effects""; ""Substrate Temperature Dependence""; ""Angle Dependence""; ""Computer Simulations""; ""FINDINGS""; ""REFERENCES""; ""5 Electron Collision Processes "" ""INTRODUCTION""""IONIZATION""; ""Atoms""; ""Molecules""; ""Theoretical Methods and Advances""; ""Neutral Dissociation""; ""ELECTRON-IMPACT EXCITATION""; ""ATTACHMENT""; ""MOMENTUM TRANSFER, SWARM, AND DISCHARGE MEASUREMENTS""; ""GENERAL COMMENTS""; ""FINDINGS""; ""REFERENCES""; ""6 Ion Processes, Neutral Chemistry, And Thermochemical Data ""; ""INTRODUCTION""; ""CROSS SECTIONS AND RATE COEFFICIENTS""; ""Ion Processes""; ""Momentum Transfer""; ""Ion-Molecule and Charge Exchange Reactions""; ""Ion-Ion Neutralization""; ""Electron-Ion Recombination"" ""Ion-Neutral and Neutral-Neutral Excitation""""Neutral Chemistry""; ""Status of the Database""; ""Excited State Chemistry and Penning Ionization""; ""Summary""; ""Ion Processes""; ""Neutral Chemistry""; ""THERMOCHEMICAL DATA""; ""FINDINGS""; ""REFERENCES""; ""Appendix A: Acronyms and Abbreviations""; ""Appendix B: Workshop Agenda""; ""Appendix C: Workshop Participants"" |
Record Nr. | UNINA-9910825813503321 |
Washington, D.C., : National Academy Press, 1996 | ||
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Lo trovi qui: Univ. Federico II | ||
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Elettronica di Millman / Jacob Millman, Arvin Grabel, Pierangelo Terreni |
Autore | Millman, Jacob |
Edizione | [4. ed.] |
Pubbl/distr/stampa | Milano : McGraw-Hill, c2008 |
Descrizione fisica | xxviii, 840 p. : ill. ; 27 cm |
Disciplina | 621.381 |
Altri autori (Persone) |
Grabel, Arvinauthor
Terreni, Pierangeloauthor |
Collana | Collana di istruzione scientifica. Serie di elettronica |
Soggetto topico |
Integrated circuits - Design and construction
Semiconductors - Design and construction Electronic circuit design |
ISBN | 9788838664762 |
Classificazione |
LC TK7874
621.3.2 |
Formato | Materiale a stampa ![]() |
Livello bibliografico | Monografia |
Lingua di pubblicazione | ita |
Record Nr. | UNISALENTO-991003590639707536 |
Millman, Jacob
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Milano : McGraw-Hill, c2008 | ||
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Lo trovi qui: Univ. del Salento | ||
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Extended Abstracts - 2008 8th International Workshop on Junction Technology : 15-16 May 2008, Shanghai, China / / Institute of Electrical and Electronics Engineers |
Pubbl/distr/stampa | Piscataway, New Jersey : , : Institute of Electrical and Electronics Engineers, , 2008 |
Descrizione fisica | 1 online resource (77 pages) |
Disciplina | 621.38152 |
Soggetto topico |
Semiconductors - Junctions
Semiconductors - Design and construction Integrated circuits - Very large scale integration - Design and construction |
ISBN |
1-5090-7708-1
1-4244-1738-4 |
Formato | Materiale a stampa ![]() |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Record Nr. | UNISA-996202451703316 |
Piscataway, New Jersey : , : Institute of Electrical and Electronics Engineers, , 2008 | ||
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Lo trovi qui: Univ. di Salerno | ||
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Extended Abstracts - 2008 8th International Workshop on Junction Technology : 15-16 May 2008, Shanghai, China / / Institute of Electrical and Electronics Engineers |
Pubbl/distr/stampa | Piscataway, New Jersey : , : Institute of Electrical and Electronics Engineers, , 2008 |
Descrizione fisica | 1 online resource (77 pages) |
Disciplina | 621.38152 |
Soggetto topico |
Semiconductors - Junctions
Semiconductors - Design and construction Integrated circuits - Very large scale integration - Design and construction |
ISBN |
1-5090-7708-1
1-4244-1738-4 |
Formato | Materiale a stampa ![]() |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Record Nr. | UNINA-9910145710303321 |
Piscataway, New Jersey : , : Institute of Electrical and Electronics Engineers, , 2008 | ||
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Lo trovi qui: Univ. Federico II | ||
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