Pubbl/distr/stampa	Piscataway, New Jersey : , : Institute of Electrical and Electronics Engineers, , 2018
Descrizione fisica	1 online resource (394 pages)
Disciplina	621.38152
Soggetto topico	Semiconductors - Design and construction Process control
ISBN	1-5386-3748-0
Formato	Materiale a stampa
Livello bibliografico	Monografia
Lingua di pubblicazione	eng
Record Nr.	UNINA-9910280928203321

Pubbl/distr/stampa	New York, NY : , : IEEE, , c1990-
Disciplina	621.3815
Soggetto topico	Semiconductors - Design and construction Semiconductor industry
Soggetto genere / forma	Periodicals. Conference papers and proceedings.
ISSN	2376-6697
Formato	Materiale a stampa
Livello bibliografico	Periodico
Lingua di pubblicazione	eng
Altri titoli varianti	Proceedings Advanced Semiconductor Manufacturing Conference and Workshop
Record Nr.	UNINA-9910626195103321

Pubbl/distr/stampa	Washington, D.C., : National Academy Press, 1996
Descrizione fisica	1 online resource (74 p.)
Collana	The compass series
Soggetto topico	Semiconductors - Design and construction Plasma engineering - Databases Plasma engineering - Computer simulation
Soggetto genere / forma	Electronic books.
ISBN	0-309-57353-X 0-585-08454-8
Formato	Materiale a stampa
Livello bibliografico	Monografia
Lingua di pubblicazione	eng
Nota di contenuto	""Database Needs for Modeling and Simulation of Plasma Processing""; ""Copyright""; ""Preface""; ""Contents""; ""Executive Summary""; ""FINDINGS""; ""CONCLUSIONS""; ""RECOMMENDATIONS""; ""REFERENCES""; ""1 Industrial Perspectives ""; ""INTRODUCTION""; ""PLASMA PROCESSING FOR SEMICONDUCTOR MANUFACTURING""; ""PLASMA EQUIPMENT SUPPLIER PERSPECTIVES""; ""CHIP MANUFACTURER PERSPECTIVES""; ""RECOMMENDED PRIORITIES FOR DEVELOPMENT OF AN IMPROVED DATABASE""; ""FINDINGS""; ""CONCLUSIONS""; ""REFERENCES""; ""2 Tool Scale and Feature Scale Models ""; ""INTRODUCTION""; ""TOOL SCALE MODELS"" ""Capabilities Needed for Tool Scale Models""""Barriers to Using Tool Scale Models""; ""FEATURE SCALE MODELS""; ""GENERAL ASSESSMENT OF MODELING STATE OF THE ART AND VISION OF FUTURE CAPABILITY AND IMPLIED NEEDS""; ""FINDINGS""; ""CONCLUSIONS""; ""REFERENCES""; ""3 Radiative Processes and Diagnostics ""; ""INTRODUCTION""; ""TECHNIQUES FOR MEASUREMENTS OF GAS PHASE SPECIES""; ""Information Resources""; ""Roles of the Database In Motivating Diagnostic Experiments""; ""SURFACE REACTION DATABASE AND DIAGNOSTICS""; ""Information Resources""; ""New Diagnostic Techniques""; ""FINDINGS"" ""REFERENCES""""4 Heterogeneous Processes ""; ""INTRODUCTION""; ""STATE OF THE DATABASE""; ""TECHNIQUES FOR IMPROVING THE DATABASE""; ""Approach""; ""Measurements On Realistic Plasma Reactors""; ""Incident Flux and Desorbing Flux Analysis""; ""Condition of the Surface""; ""Technology""; ""Ultrahigh-Vacuum Approach Using Mass and Energy Selected Reactive Beams""; ""Particle Beams""; ""Sticking Coefficients""; ""Synergistic Effects""; ""Substrate Temperature Dependence""; ""Angle Dependence""; ""Computer Simulations""; ""FINDINGS""; ""REFERENCES""; ""5 Electron Collision Processes "" ""INTRODUCTION""""IONIZATION""; ""Atoms""; ""Molecules""; ""Theoretical Methods and Advances""; ""Neutral Dissociation""; ""ELECTRON-IMPACT EXCITATION""; ""ATTACHMENT""; ""MOMENTUM TRANSFER, SWARM, AND DISCHARGE MEASUREMENTS""; ""GENERAL COMMENTS""; ""FINDINGS""; ""REFERENCES""; ""6 Ion Processes, Neutral Chemistry, And Thermochemical Data ""; ""INTRODUCTION""; ""CROSS SECTIONS AND RATE COEFFICIENTS""; ""Ion Processes""; ""Momentum Transfer""; ""Ion-Molecule and Charge Exchange Reactions""; ""Ion-Ion Neutralization""; ""Electron-Ion Recombination"" ""Ion-Neutral and Neutral-Neutral Excitation""""Neutral Chemistry""; ""Status of the Database""; ""Excited State Chemistry and Penning Ionization""; ""Summary""; ""Ion Processes""; ""Neutral Chemistry""; ""THERMOCHEMICAL DATA""; ""FINDINGS""; ""REFERENCES""; ""Appendix A: Acronyms and Abbreviations""; ""Appendix B: Workshop Agenda""; ""Appendix C: Workshop Participants""
Record Nr.	UNINA-9910456054403321

Edizione	[1st ed.]
Pubbl/distr/stampa	Washington, D.C., : National Academy Press, 1996
Descrizione fisica	1 online resource (74 p.)
Collana	The compass series
Soggetto topico	Semiconductors - Design and construction Plasma engineering - Databases Plasma engineering - Computer simulation
ISBN	0-309-17513-5 0-309-57353-X 0-585-08454-8
Formato	Materiale a stampa
Livello bibliografico	Monografia
Lingua di pubblicazione	eng
Nota di contenuto	""Database Needs for Modeling and Simulation of Plasma Processing""; ""Copyright""; ""Preface""; ""Contents""; ""Executive Summary""; ""FINDINGS""; ""CONCLUSIONS""; ""RECOMMENDATIONS""; ""REFERENCES""; ""1 Industrial Perspectives ""; ""INTRODUCTION""; ""PLASMA PROCESSING FOR SEMICONDUCTOR MANUFACTURING""; ""PLASMA EQUIPMENT SUPPLIER PERSPECTIVES""; ""CHIP MANUFACTURER PERSPECTIVES""; ""RECOMMENDED PRIORITIES FOR DEVELOPMENT OF AN IMPROVED DATABASE""; ""FINDINGS""; ""CONCLUSIONS""; ""REFERENCES""; ""2 Tool Scale and Feature Scale Models ""; ""INTRODUCTION""; ""TOOL SCALE MODELS"" ""Capabilities Needed for Tool Scale Models""""Barriers to Using Tool Scale Models""; ""FEATURE SCALE MODELS""; ""GENERAL ASSESSMENT OF MODELING STATE OF THE ART AND VISION OF FUTURE CAPABILITY AND IMPLIED NEEDS""; ""FINDINGS""; ""CONCLUSIONS""; ""REFERENCES""; ""3 Radiative Processes and Diagnostics ""; ""INTRODUCTION""; ""TECHNIQUES FOR MEASUREMENTS OF GAS PHASE SPECIES""; ""Information Resources""; ""Roles of the Database In Motivating Diagnostic Experiments""; ""SURFACE REACTION DATABASE AND DIAGNOSTICS""; ""Information Resources""; ""New Diagnostic Techniques""; ""FINDINGS"" ""REFERENCES""""4 Heterogeneous Processes ""; ""INTRODUCTION""; ""STATE OF THE DATABASE""; ""TECHNIQUES FOR IMPROVING THE DATABASE""; ""Approach""; ""Measurements On Realistic Plasma Reactors""; ""Incident Flux and Desorbing Flux Analysis""; ""Condition of the Surface""; ""Technology""; ""Ultrahigh-Vacuum Approach Using Mass and Energy Selected Reactive Beams""; ""Particle Beams""; ""Sticking Coefficients""; ""Synergistic Effects""; ""Substrate Temperature Dependence""; ""Angle Dependence""; ""Computer Simulations""; ""FINDINGS""; ""REFERENCES""; ""5 Electron Collision Processes "" ""INTRODUCTION""""IONIZATION""; ""Atoms""; ""Molecules""; ""Theoretical Methods and Advances""; ""Neutral Dissociation""; ""ELECTRON-IMPACT EXCITATION""; ""ATTACHMENT""; ""MOMENTUM TRANSFER, SWARM, AND DISCHARGE MEASUREMENTS""; ""GENERAL COMMENTS""; ""FINDINGS""; ""REFERENCES""; ""6 Ion Processes, Neutral Chemistry, And Thermochemical Data ""; ""INTRODUCTION""; ""CROSS SECTIONS AND RATE COEFFICIENTS""; ""Ion Processes""; ""Momentum Transfer""; ""Ion-Molecule and Charge Exchange Reactions""; ""Ion-Ion Neutralization""; ""Electron-Ion Recombination"" ""Ion-Neutral and Neutral-Neutral Excitation""""Neutral Chemistry""; ""Status of the Database""; ""Excited State Chemistry and Penning Ionization""; ""Summary""; ""Ion Processes""; ""Neutral Chemistry""; ""THERMOCHEMICAL DATA""; ""FINDINGS""; ""REFERENCES""; ""Appendix A: Acronyms and Abbreviations""; ""Appendix B: Workshop Agenda""; ""Appendix C: Workshop Participants""
Record Nr.	UNINA-9910825813503321

Autore	Millman, Jacob
Edizione	[4. ed.]
Pubbl/distr/stampa	Milano : McGraw-Hill, c2008
Descrizione fisica	xxviii, 840 p. : ill. ; 27 cm
Disciplina	621.381
Altri autori (Persone)	Grabel, Arvinauthor Terreni, Pierangeloauthor
Collana	Collana di istruzione scientifica. Serie di elettronica
Soggetto topico	Integrated circuits - Design and construction Semiconductors - Design and construction Electronic circuit design
ISBN	9788838664762
Classificazione	LC TK7874 621.3.2
Formato	Materiale a stampa
Livello bibliografico	Monografia
Lingua di pubblicazione	ita
Record Nr.	UNISALENTO-991003590639707536