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Plasma nanoscience : basic concepts and applications of deterministic nanofabrication / / Kostya (Ken) Ostrikov
| Plasma nanoscience : basic concepts and applications of deterministic nanofabrication / / Kostya (Ken) Ostrikov |
| Autore | Ostrikov Kostya (Ken) |
| Pubbl/distr/stampa | Weinheim, [Germany] : , : Wiley-VCH Verlag GmbH & Co. KGaA, , 2008 |
| Descrizione fisica | 1 online resource (566 p.) |
| Disciplina | 621.044 |
| Soggetto topico |
Nanostructured materials
Plasma engineering Low temperature plasmas |
| Soggetto genere / forma | Electronic books. |
| ISBN |
1-281-94721-0
9786611947217 3-527-62332-9 3-527-62331-0 |
| Formato | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Plasma Nanoscience; Contents; Preface; Acronyms; 1 Introduction; 1.1 Main Concepts and Issues; 1.2 Self-Organized Nanoworld, Commonsense Science of the Small and Socio-Economic Push; 1.3 Nature's Plasma Nanofab and Nanotechnology Research Directions; 1.4 Deterministic Nanofabrication and Plasma Nanoscience; 1.5 Structure of the Monograph and Advice to the Reader; 2 What Makes Low-Temperature Plasmas a Versatile Nanotool?; 2.1 Basic Ideas and Major Issues; 2.2 Plasma Nanofabrication Concept; 2.3 Useful Plasma Features for Nanoscale Fabrication
2.4 Choice and Generation of Building and Working Units2.5 Effect of the Plasma Sheath; 2.6 How Plasmas Affect Elementary Surface Processes; 2.7 Concluding Remarks; 3 Specific Examples and Practical Framework; 3.1 Semiconducting Nanofilms and Nanostructures; 3.2 Carbon-Based Nanofilms and Nanostructures; 3.3 Practical Framework - Bridging Nine Orders of Magnitude; 3.4 Concluding Remarks; 4 Generation of Building and Working Units; 4.1 Species in Methane-Based Plasmas for Synthesis of Carbon Nanostructures; 4.1.1 Experimental Details; 4.1.2 Basic Assumptions of the Model 4.1.3 Particle and Power Balance in Plasma Discharge4.1.4 Densities of Neutral and Charged Species; 4.1.4.1 Effect of RF Power; 4.1.4.2 Effect of Argon and Methane Dilution; 4.1.5 Deposited Neutral and Ion Fluxes; 4.1.6 Most Important Points and Summary; 4.2 Species in Acetylene-Based Plasmas for Synthesis of Carbon Nanostructures; 4.2.1 Formulation of the Problem; 4.2.2 Number Densities of the Main Discharge Species; 4.2.3 Fluxes of Building and Working Units; 4.3 Nanocluster and Nanoparticle Building Units; 4.3.1 Nano-Sized Building Units from Reactive Plasmas 4.3.2 Nanoparticle Generation: Other Examples4.4 Concluding Remarks; 5 Transport, Manipulation and Deposition of Building and Working Units; 5.1 Microscopic Ion Fluxes During Nanoassembly Processes; 5.1.1 Formulation and Model; 5.1.2 Numerical Results; 5.1.3 Interpretation of Numerical Results; 5.2 Nanoparticle Manipulation in the Synthesis of Carbon Nanostructures; 5.2.1 Nanoparticle Manipulation: Experimental Results; 5.2.2 Nanoparticle Manipulation: Numerical Model; 5.3 Selected-Area Nanoparticle Deposition Onto Microstructured Surfaces; 5.3.1 Numerical Model and Simulation Parameters 5.3.2 Selected-Area Nanoparticle Deposition5.3.3 Practical Implementation Framework; 5.4 Electrostatic Nanoparticle Filter; 5.5 Concluding Remarks; 6 Surface Science of Plasma-Exposed Surfaces and Self-Organization Processes; 6.1 Synthesis of Self-Organizing Arrays of Quantum Dots: Objectives and Approach; 6.2 Initial Stage of Ge/Si Nanodot Formation Using Nanocluster Fluxes; 6.2.1 Physical Model and Numerical Details; 6.2.2 Physical Interpretation and Relevant Experimental Data; 6.3 Binary Si(x)C(1-x) Quantum Dot Systems: Initial Growth Stage 6.3.1 Adatom Fluxes at Initial Growth Stages of Si(x)C(1-x) Quantum Dots |
| Record Nr. | UNINA-9910144450103321 |
Ostrikov Kostya (Ken)
|
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| Weinheim, [Germany] : , : Wiley-VCH Verlag GmbH & Co. KGaA, , 2008 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Plasma nanoscience : basic concepts and applications of deterministic nanofabrication / / Kostya Ostrikov
| Plasma nanoscience : basic concepts and applications of deterministic nanofabrication / / Kostya Ostrikov |
| Autore | Ostrikov K (Kostya) |
| Pubbl/distr/stampa | Weinheim : , : Wiley-VCH Verlag GmbH & Co. KGaA, , [2008] |
| Descrizione fisica | 1 online resource (566 p.) |
| Disciplina | 530.44 |
| Soggetto topico |
Low temperature plasmas
Nanostructured materials Plasma engineering |
| ISBN |
1-281-94721-0
9786611947217 3-527-62332-9 3-527-62331-0 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Plasma Nanoscience; Contents; Preface; Acronyms; 1 Introduction; 1.1 Main Concepts and Issues; 1.2 Self-Organized Nanoworld, Commonsense Science of the Small and Socio-Economic Push; 1.3 Nature's Plasma Nanofab and Nanotechnology Research Directions; 1.4 Deterministic Nanofabrication and Plasma Nanoscience; 1.5 Structure of the Monograph and Advice to the Reader; 2 What Makes Low-Temperature Plasmas a Versatile Nanotool?; 2.1 Basic Ideas and Major Issues; 2.2 Plasma Nanofabrication Concept; 2.3 Useful Plasma Features for Nanoscale Fabrication
2.4 Choice and Generation of Building and Working Units2.5 Effect of the Plasma Sheath; 2.6 How Plasmas Affect Elementary Surface Processes; 2.7 Concluding Remarks; 3 Specific Examples and Practical Framework; 3.1 Semiconducting Nanofilms and Nanostructures; 3.2 Carbon-Based Nanofilms and Nanostructures; 3.3 Practical Framework - Bridging Nine Orders of Magnitude; 3.4 Concluding Remarks; 4 Generation of Building and Working Units; 4.1 Species in Methane-Based Plasmas for Synthesis of Carbon Nanostructures; 4.1.1 Experimental Details; 4.1.2 Basic Assumptions of the Model 4.1.3 Particle and Power Balance in Plasma Discharge4.1.4 Densities of Neutral and Charged Species; 4.1.4.1 Effect of RF Power; 4.1.4.2 Effect of Argon and Methane Dilution; 4.1.5 Deposited Neutral and Ion Fluxes; 4.1.6 Most Important Points and Summary; 4.2 Species in Acetylene-Based Plasmas for Synthesis of Carbon Nanostructures; 4.2.1 Formulation of the Problem; 4.2.2 Number Densities of the Main Discharge Species; 4.2.3 Fluxes of Building and Working Units; 4.3 Nanocluster and Nanoparticle Building Units; 4.3.1 Nano-Sized Building Units from Reactive Plasmas 4.3.2 Nanoparticle Generation: Other Examples4.4 Concluding Remarks; 5 Transport, Manipulation and Deposition of Building and Working Units; 5.1 Microscopic Ion Fluxes During Nanoassembly Processes; 5.1.1 Formulation and Model; 5.1.2 Numerical Results; 5.1.3 Interpretation of Numerical Results; 5.2 Nanoparticle Manipulation in the Synthesis of Carbon Nanostructures; 5.2.1 Nanoparticle Manipulation: Experimental Results; 5.2.2 Nanoparticle Manipulation: Numerical Model; 5.3 Selected-Area Nanoparticle Deposition Onto Microstructured Surfaces; 5.3.1 Numerical Model and Simulation Parameters 5.3.2 Selected-Area Nanoparticle Deposition5.3.3 Practical Implementation Framework; 5.4 Electrostatic Nanoparticle Filter; 5.5 Concluding Remarks; 6 Surface Science of Plasma-Exposed Surfaces and Self-Organization Processes; 6.1 Synthesis of Self-Organizing Arrays of Quantum Dots: Objectives and Approach; 6.2 Initial Stage of Ge/Si Nanodot Formation Using Nanocluster Fluxes; 6.2.1 Physical Model and Numerical Details; 6.2.2 Physical Interpretation and Relevant Experimental Data; 6.3 Binary Si(x)C(1-x) Quantum Dot Systems: Initial Growth Stage 6.3.1 Adatom Fluxes at Initial Growth Stages of Si(x)C(1-x) Quantum Dots |
| Record Nr. | UNINA-9910830407303321 |
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Ostrikov K (Kostya)
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| Weinheim : , : Wiley-VCH Verlag GmbH & Co. KGaA, , [2008] | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Plasma physics and engineering / / by Alexander Fridman and Lawrence A. Kennedy
| Plasma physics and engineering / / by Alexander Fridman and Lawrence A. Kennedy |
| Autore | Fridman Alexander A. <1953-> |
| Edizione | [Second edition.] |
| Pubbl/distr/stampa | Boca Raton, FL : , : CRC Press, an imprint of Taylor and Francis, , 2011 |
| Descrizione fisica | 1 online resource (912 p.) |
| Disciplina | 530.4/4 |
| Soggetto topico |
Plasma (Ionized gases)
Plasma engineering |
| Soggetto genere / forma | Electronic books. |
| ISBN |
0-429-19075-1
1-4398-1229-2 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Front cover; Contents; Preface; Acknowledgments; Authors; Part I. Fundamentals of Plasma Physics and Plasma Chemistry; Chapter 1. Plasma in Nature, in the Laboratory, and in Industry; Chapter 2. Elementary Processes of Charged Species in Plasma; Chapter 3. Elementary Processes of Excited Molecules and Atoms in Plasma; Chapter 4. Plasma Statistics and Kinetics of Charged Particles; Chapter 5. Kinetics of Excited Particles in Plasma; Chapter 6. Electrostatics, Electrodynamics, and Fluid Mechanics of Plasma; Part II. Physics and Engineering of Electric Discharges; Chapter 7. Glow Discharge
Chapter 8. Arc DischargesChapter 9. Nonequilibrium Cold Atmospheric Pressure Discharges; Chapter 10. Plasma Created in High-Frequency Electromagnetic Fields: Radio Frequency, Microwave, and Optical Discharges; Chapter 11. Discharges in Aerosols, Dusty Plasmas, and Liquids; Chapter 12. Electron Beam Plasmas; References; Back cover |
| Record Nr. | UNINA-9910460591803321 |
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Fridman Alexander A. <1953->
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| Boca Raton, FL : , : CRC Press, an imprint of Taylor and Francis, , 2011 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Plasma physics and engineering / / by Alexander Fridman and Lawrence A. Kennedy
| Plasma physics and engineering / / by Alexander Fridman and Lawrence A. Kennedy |
| Autore | Fridman Alexander A. <1953-> |
| Edizione | [Second edition.] |
| Pubbl/distr/stampa | Boca Raton, FL : , : CRC Press, an imprint of Taylor and Francis, , 2011 |
| Descrizione fisica | 1 online resource (912 p.) |
| Disciplina | 530.4/4 |
| Soggetto topico |
Plasma (Ionized gases)
Plasma engineering |
| ISBN |
1-4398-8481-1
0-429-19075-1 1-4398-1229-2 |
| Classificazione | SCI051000SCI055000 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Front cover; Contents; Preface; Acknowledgments; Authors; Part I. Fundamentals of Plasma Physics and Plasma Chemistry; Chapter 1. Plasma in Nature, in the Laboratory, and in Industry; Chapter 2. Elementary Processes of Charged Species in Plasma; Chapter 3. Elementary Processes of Excited Molecules and Atoms in Plasma; Chapter 4. Plasma Statistics and Kinetics of Charged Particles; Chapter 5. Kinetics of Excited Particles in Plasma; Chapter 6. Electrostatics, Electrodynamics, and Fluid Mechanics of Plasma; Part II. Physics and Engineering of Electric Discharges; Chapter 7. Glow Discharge
Chapter 8. Arc DischargesChapter 9. Nonequilibrium Cold Atmospheric Pressure Discharges; Chapter 10. Plasma Created in High-Frequency Electromagnetic Fields: Radio Frequency, Microwave, and Optical Discharges; Chapter 11. Discharges in Aerosols, Dusty Plasmas, and Liquids; Chapter 12. Electron Beam Plasmas; References; Back cover |
| Record Nr. | UNINA-9910797031503321 |
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Fridman Alexander A. <1953->
|
||
| Boca Raton, FL : , : CRC Press, an imprint of Taylor and Francis, , 2011 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Plasma physics and engineering / / by Alexander Fridman and Lawrence A. Kennedy
| Plasma physics and engineering / / by Alexander Fridman and Lawrence A. Kennedy |
| Autore | Fridman Alexander A. <1953-> |
| Edizione | [Second edition.] |
| Pubbl/distr/stampa | Boca Raton, FL : , : CRC Press, an imprint of Taylor and Francis, , 2011 |
| Descrizione fisica | 1 online resource (912 p.) |
| Disciplina | 530.4/4 |
| Soggetto topico |
Plasma (Ionized gases)
Plasma engineering |
| ISBN |
1-4398-8481-1
0-429-19075-1 1-4398-1229-2 |
| Classificazione | SCI051000SCI055000 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Front cover; Contents; Preface; Acknowledgments; Authors; Part I. Fundamentals of Plasma Physics and Plasma Chemistry; Chapter 1. Plasma in Nature, in the Laboratory, and in Industry; Chapter 2. Elementary Processes of Charged Species in Plasma; Chapter 3. Elementary Processes of Excited Molecules and Atoms in Plasma; Chapter 4. Plasma Statistics and Kinetics of Charged Particles; Chapter 5. Kinetics of Excited Particles in Plasma; Chapter 6. Electrostatics, Electrodynamics, and Fluid Mechanics of Plasma; Part II. Physics and Engineering of Electric Discharges; Chapter 7. Glow Discharge
Chapter 8. Arc DischargesChapter 9. Nonequilibrium Cold Atmospheric Pressure Discharges; Chapter 10. Plasma Created in High-Frequency Electromagnetic Fields: Radio Frequency, Microwave, and Optical Discharges; Chapter 11. Discharges in Aerosols, Dusty Plasmas, and Liquids; Chapter 12. Electron Beam Plasmas; References; Back cover |
| Record Nr. | UNINA-9910813132403321 |
|
Fridman Alexander A. <1953->
|
||
| Boca Raton, FL : , : CRC Press, an imprint of Taylor and Francis, , 2011 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Plasma processes and plasma kinetics : 586 worked out problems for science and technology / / Boris M. Smirnov
| Plasma processes and plasma kinetics : 586 worked out problems for science and technology / / Boris M. Smirnov |
| Autore | Smirnov Boris M. |
| Pubbl/distr/stampa | Weinheim, [Germany] : , : Wiley-VCH Verlag GmbH & Co. KGaA, , 2007 |
| Descrizione fisica | 1 online resource (583 p.) |
| Disciplina | 530.44 |
| Soggetto topico |
Plasma (Ionized gases)
Plasma engineering Plasma dynamics |
| Soggetto genere / forma | Electronic books. |
| ISBN |
1-281-84338-5
9786611843380 3-527-61907-0 3-527-61908-9 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Plasma Processes and Plasma Kinetics; Contents; Preface; 1 Distributions and Equilibria for Particle Ensembles; 1.1 Distributions of Identical Atomic Particles; 1.2 Statistics of Bose-Einstein and Fermi-Dirac; 1.3 Distribution of Particle Density in External Fields; 1.4 Laws of Black Body Radiation; 1.5 Ionization and Dissociation Equilibrium; 1.6 Ionization Equilibrium for Clusters; 2 Elementary Processes in Plasma; 2.1 Elementary Act of Particle Collision; 2.2 Elastic Collision of Two Particles; 2.3 Elastic Scattering of Classical Particles; 2.4 Phase Theory of Particle Elastic Scattering
2.5 Total Cross Section of Elastic Collision3 Slow Atomic Collisions; 3.1 Slow Collisions of Heavy Atomic Particles; 3.2 Resonant Charge Exchange and Similar Processes; 3.3 Processes Involving Negative Ions; 3.4 Three-Body Processes; 3.5 Principle of Detailed Balance; 4 Collisions Involving Electrons; 4.1 Inelastic Electron-Atom Collisions; 4.2 Atom Quenching by Electron Impact; 4.3 Atom Ionization by Electron Impact; 4.4 Recombination of Electrons and Ions; 5 Elementary Radiative Processes in Excited Gases; 5.1 Broadening of Spectral Lines; 5.2 Cross Sections of Radiative Tansitions 5.3 Absorption Coefficient for Resonant Photons5.4 Absorption Coefficient in Molecular Gases; 6 Boltzmann Kinetic Equation; 6.1 Boltzmann Equation for a Gas; 6.2 Peculiarities of Statistical Description of Gas Evolution; 6.3 Integral Relations from the Boltzmann Equation; 6.4 Stepwise Quantities and Processes; 6.5 Collision Integral for Electrons; 7 Transport and Kinetics of Electrons in Gases in External Fields; 7.1 Electron Drift in a Gas in an Electric Field; 7.2 Energy Balance for Electrons Moving in a Gas in an Electric Field 7.3 Dynamics of Electrons in a Gas in Electric and in Magnetic Fields7.4 Conductivity of a Weakly Ionized Gas; 7.5 Thermal Conductivity and Thermal Diffusion of Electrons in a Gas; 8 Transport of Ions and Atoms in Gases and Plasmas; 8.1 General Peculiarities of Transport Processes; 8.2 Thermal Conductivity and Viscosity of Atomic Gases; 8.3 Di.usion and Drift Character of Particle Motion; 8.4 Chapman-Enskog Approximation; 8.5 Di.usion of Ions in Gas in an External Electric Field; 8.6 Transport of Atomic Ions in the Parent Gas in an External Electric Field 9 Kinetics and Radiative Transport of Excitations in Gases9.1 Resonant Radiation of Optically Thick Layer of Excited Gas; 9.2 Radiation Transport in Optically Thick Medium; 9.3 Emission of Infrared Radiation from Molecular Layer; 9.4 Propagation of Resonant Radiation in Optically Thick Gas; 9.5 Kinetics of Atom Excitation by Electron Impact in a Gas in Electric Field; 10 Processes in Photoresonant Plasma; 10.1 Interaction of Resonant Radiation and Gas; 10.2 Excited Atoms in Photoresonant Plasma; 10.3 Processes in Photoresonant Plasma Involving Electrons 10.4 Propagation of Excitation and Ionization Waves |
| Record Nr. | UNINA-9910144724403321 |
|
Smirnov Boris M.
|
||
| Weinheim, [Germany] : , : Wiley-VCH Verlag GmbH & Co. KGaA, , 2007 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Plasma processes and plasma kinetics : 586 worked out problems for science and technology / / Boris M. Smirnov
| Plasma processes and plasma kinetics : 586 worked out problems for science and technology / / Boris M. Smirnov |
| Autore | Smirnov Boris M. |
| Pubbl/distr/stampa | Weinheim, [Germany] : , : Wiley-VCH Verlag GmbH & Co. KGaA, , 2007 |
| Descrizione fisica | 1 online resource (583 p.) |
| Disciplina | 530.44 |
| Soggetto topico |
Plasma (Ionized gases)
Plasma engineering Plasma dynamics |
| ISBN |
1-281-84338-5
9786611843380 3-527-61907-0 3-527-61908-9 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Plasma Processes and Plasma Kinetics; Contents; Preface; 1 Distributions and Equilibria for Particle Ensembles; 1.1 Distributions of Identical Atomic Particles; 1.2 Statistics of Bose-Einstein and Fermi-Dirac; 1.3 Distribution of Particle Density in External Fields; 1.4 Laws of Black Body Radiation; 1.5 Ionization and Dissociation Equilibrium; 1.6 Ionization Equilibrium for Clusters; 2 Elementary Processes in Plasma; 2.1 Elementary Act of Particle Collision; 2.2 Elastic Collision of Two Particles; 2.3 Elastic Scattering of Classical Particles; 2.4 Phase Theory of Particle Elastic Scattering
2.5 Total Cross Section of Elastic Collision3 Slow Atomic Collisions; 3.1 Slow Collisions of Heavy Atomic Particles; 3.2 Resonant Charge Exchange and Similar Processes; 3.3 Processes Involving Negative Ions; 3.4 Three-Body Processes; 3.5 Principle of Detailed Balance; 4 Collisions Involving Electrons; 4.1 Inelastic Electron-Atom Collisions; 4.2 Atom Quenching by Electron Impact; 4.3 Atom Ionization by Electron Impact; 4.4 Recombination of Electrons and Ions; 5 Elementary Radiative Processes in Excited Gases; 5.1 Broadening of Spectral Lines; 5.2 Cross Sections of Radiative Tansitions 5.3 Absorption Coefficient for Resonant Photons5.4 Absorption Coefficient in Molecular Gases; 6 Boltzmann Kinetic Equation; 6.1 Boltzmann Equation for a Gas; 6.2 Peculiarities of Statistical Description of Gas Evolution; 6.3 Integral Relations from the Boltzmann Equation; 6.4 Stepwise Quantities and Processes; 6.5 Collision Integral for Electrons; 7 Transport and Kinetics of Electrons in Gases in External Fields; 7.1 Electron Drift in a Gas in an Electric Field; 7.2 Energy Balance for Electrons Moving in a Gas in an Electric Field 7.3 Dynamics of Electrons in a Gas in Electric and in Magnetic Fields7.4 Conductivity of a Weakly Ionized Gas; 7.5 Thermal Conductivity and Thermal Diffusion of Electrons in a Gas; 8 Transport of Ions and Atoms in Gases and Plasmas; 8.1 General Peculiarities of Transport Processes; 8.2 Thermal Conductivity and Viscosity of Atomic Gases; 8.3 Di.usion and Drift Character of Particle Motion; 8.4 Chapman-Enskog Approximation; 8.5 Di.usion of Ions in Gas in an External Electric Field; 8.6 Transport of Atomic Ions in the Parent Gas in an External Electric Field 9 Kinetics and Radiative Transport of Excitations in Gases9.1 Resonant Radiation of Optically Thick Layer of Excited Gas; 9.2 Radiation Transport in Optically Thick Medium; 9.3 Emission of Infrared Radiation from Molecular Layer; 9.4 Propagation of Resonant Radiation in Optically Thick Gas; 9.5 Kinetics of Atom Excitation by Electron Impact in a Gas in Electric Field; 10 Processes in Photoresonant Plasma; 10.1 Interaction of Resonant Radiation and Gas; 10.2 Excited Atoms in Photoresonant Plasma; 10.3 Processes in Photoresonant Plasma Involving Electrons 10.4 Propagation of Excitation and Ionization Waves |
| Record Nr. | UNINA-9910830011603321 |
|
Smirnov Boris M.
|
||
| Weinheim, [Germany] : , : Wiley-VCH Verlag GmbH & Co. KGaA, , 2007 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Plasma processing and processing science [[electronic resource] /] / Panel on Plasma Processing, Naval Studies Board, Commission on Physical Sciences, Mathematics, and Applications, National Research Council
| Plasma processing and processing science [[electronic resource] /] / Panel on Plasma Processing, Naval Studies Board, Commission on Physical Sciences, Mathematics, and Applications, National Research Council |
| Pubbl/distr/stampa | Washington, D.C., : National Academy Press, 1995 |
| Descrizione fisica | 1 online resource (45 p.) |
| Disciplina | 621.044 |
| Altri autori (Persone) | ChenFrancis F. <1929-> |
| Collana | NRL strategic series |
| Soggetto topico |
Plasma engineering
Semiconductors - Etching Plasma etching |
| Soggetto genere / forma | Electronic books. |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
""Plasma Processing and Processing Science""; ""Copyright""; ""Preface""; ""Contents""; ""Chapter 1 Introduction and Summary""; ""Chapter 2 Modeling and Simulation of Plasma Processing""; ""RESEARCH OPPORTUNITIES""; ""Requirements of the Microelectronics Fabrication Industry""; ""Multidimensional Models""; ""Plasma Chemistry""; ""Surface Chemistry""; ""Electromagnetics""; ""Current Status of Modeling and Simulation""; ""Particle-in-Cell Simulations""; ""Kinetic Models""; ""Fluid or Hydrodynamic Models""; ""Hybrid Models""; ""A ROLE FOR NRL""; ""Chapter 3 Semiconductor Processing""
""RESEARCH OPPORTUNITIES""""A ROLE FOR NRL""; ""Development and Characterization of Precompetitive Materials and Processes""; ""Comparative Analysis and Characterization of Tools and Processes in Development""; ""Sensor Development for Control and Fingerprinting of Manufacturing Processes""; ""Chapter 4 Plasma Deposition and Polymerization""; ""RESEARCH OPPORTUNITIES""; ""Semiconductor Fabrication""; ""Barrier Coatings""; ""Fibrous Materials""; ""Optical Coatings and Photonics""; ""Plasma Polymerization""; ""A ROLE FOR NRL""; ""Chapter 5 Ion Implantation and Surface Modification"" ""RESEARCH OPPORTUNITIES""""Introduction""; ""Plasma and Ion Beam Implantation Technology""; ""Ion Beam Implantation""; ""Plasma Source Ion Implantation""; ""Applications""; ""Implantation of Metals""; ""Implantation of Nonmetals""; ""A ROLE FOR NRL""; ""Chapter 6 Thermal Plasmas""; ""RESEARCH OPPORTUNITIES""; ""Introduction""; ""Plasma Spraying""; ""Plasma Chemical Vapor Deposition""; ""Plasma Waste Destruction""; ""Plasma Metallurgy""; ""Thermal Plasma Synthesis""; ""Plasma Consolidation""; ""A ROLE FOR NRL""; ""Thermal Plasma Waste Destruction""; ""Plasma Chemical Vapor Deposition"" ""Diamond Films""""Cubic Boron Nitride Films""; ""Carbon Nitride""; ""Chapter 7 Flat Panel Displays""; ""RESEARCH OPPORTUNITIES""; ""Introduction""; ""Passive Matrix Liquid Crystal Display""; ""Active Matrix Liquid Crystal Display""; ""Amorphous Silicon""; ""Polycrystalline Silicon""; ""Transfer Silicon""; ""Thin Film Electroluminescent Displays""; ""Digital Micromirror Devices""; ""Plasma Displays""; ""Field Emission Displays""; ""A ROLE FOR NRL""; ""Chapter 8 Low-Temperature Plasma Physics""; ""RESEARCH OPPORTUNITIES""; ""A ROLE FOR NRL""; ""Chapter 9 Conclusions and Recommendations"" ""RECOMMENDATION FOR A PROGRAM IN PLASMA PROCESSING AND PROCESSING SCIENCE""""CONCLUSIONS BASED ON NRL'S PRESENT RESEARCH CAPABILITIES"" |
| Record Nr. | UNINA-9910451786303321 |
| Washington, D.C., : National Academy Press, 1995 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Plasma processing and processing science [[electronic resource] /] / Panel on Plasma Processing, Naval Studies Board, Commission on Physical Sciences, Mathematics, and Applications, National Research Council
| Plasma processing and processing science [[electronic resource] /] / Panel on Plasma Processing, Naval Studies Board, Commission on Physical Sciences, Mathematics, and Applications, National Research Council |
| Pubbl/distr/stampa | Washington, D.C., : National Academy Press, 1995 |
| Descrizione fisica | 1 online resource (45 p.) |
| Disciplina | 621.044 |
| Altri autori (Persone) | ChenFrancis F. <1929-> |
| Collana | NRL strategic series |
| Soggetto topico |
Plasma engineering
Semiconductors - Etching Plasma etching |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
""Plasma Processing and Processing Science""; ""Copyright""; ""Preface""; ""Contents""; ""Chapter 1 Introduction and Summary""; ""Chapter 2 Modeling and Simulation of Plasma Processing""; ""RESEARCH OPPORTUNITIES""; ""Requirements of the Microelectronics Fabrication Industry""; ""Multidimensional Models""; ""Plasma Chemistry""; ""Surface Chemistry""; ""Electromagnetics""; ""Current Status of Modeling and Simulation""; ""Particle-in-Cell Simulations""; ""Kinetic Models""; ""Fluid or Hydrodynamic Models""; ""Hybrid Models""; ""A ROLE FOR NRL""; ""Chapter 3 Semiconductor Processing""
""RESEARCH OPPORTUNITIES""""A ROLE FOR NRL""; ""Development and Characterization of Precompetitive Materials and Processes""; ""Comparative Analysis and Characterization of Tools and Processes in Development""; ""Sensor Development for Control and Fingerprinting of Manufacturing Processes""; ""Chapter 4 Plasma Deposition and Polymerization""; ""RESEARCH OPPORTUNITIES""; ""Semiconductor Fabrication""; ""Barrier Coatings""; ""Fibrous Materials""; ""Optical Coatings and Photonics""; ""Plasma Polymerization""; ""A ROLE FOR NRL""; ""Chapter 5 Ion Implantation and Surface Modification"" ""RESEARCH OPPORTUNITIES""""Introduction""; ""Plasma and Ion Beam Implantation Technology""; ""Ion Beam Implantation""; ""Plasma Source Ion Implantation""; ""Applications""; ""Implantation of Metals""; ""Implantation of Nonmetals""; ""A ROLE FOR NRL""; ""Chapter 6 Thermal Plasmas""; ""RESEARCH OPPORTUNITIES""; ""Introduction""; ""Plasma Spraying""; ""Plasma Chemical Vapor Deposition""; ""Plasma Waste Destruction""; ""Plasma Metallurgy""; ""Thermal Plasma Synthesis""; ""Plasma Consolidation""; ""A ROLE FOR NRL""; ""Thermal Plasma Waste Destruction""; ""Plasma Chemical Vapor Deposition"" ""Diamond Films""""Cubic Boron Nitride Films""; ""Carbon Nitride""; ""Chapter 7 Flat Panel Displays""; ""RESEARCH OPPORTUNITIES""; ""Introduction""; ""Passive Matrix Liquid Crystal Display""; ""Active Matrix Liquid Crystal Display""; ""Amorphous Silicon""; ""Polycrystalline Silicon""; ""Transfer Silicon""; ""Thin Film Electroluminescent Displays""; ""Digital Micromirror Devices""; ""Plasma Displays""; ""Field Emission Displays""; ""A ROLE FOR NRL""; ""Chapter 8 Low-Temperature Plasma Physics""; ""RESEARCH OPPORTUNITIES""; ""A ROLE FOR NRL""; ""Chapter 9 Conclusions and Recommendations"" ""RECOMMENDATION FOR A PROGRAM IN PLASMA PROCESSING AND PROCESSING SCIENCE""""CONCLUSIONS BASED ON NRL'S PRESENT RESEARCH CAPABILITIES"" |
| Record Nr. | UNINA-9910777418303321 |
| Washington, D.C., : National Academy Press, 1995 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Plasma processing and processing science / / Panel on Plasma Processing, Naval Studies Board, Commission on Physical Sciences, Mathematics, and Applications, National Research Council
| Plasma processing and processing science / / Panel on Plasma Processing, Naval Studies Board, Commission on Physical Sciences, Mathematics, and Applications, National Research Council |
| Edizione | [1st ed.] |
| Pubbl/distr/stampa | Washington, D.C., : National Academy Press, 1995 |
| Descrizione fisica | 1 online resource (45 p.) |
| Disciplina | 621.044 |
| Altri autori (Persone) | ChenFrancis F. <1929-> |
| Collana | NRL strategic series |
| Soggetto topico |
Plasma engineering
Semiconductors - Etching Plasma etching |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
""Plasma Processing and Processing Science""; ""Copyright""; ""Preface""; ""Contents""; ""Chapter 1 Introduction and Summary""; ""Chapter 2 Modeling and Simulation of Plasma Processing""; ""RESEARCH OPPORTUNITIES""; ""Requirements of the Microelectronics Fabrication Industry""; ""Multidimensional Models""; ""Plasma Chemistry""; ""Surface Chemistry""; ""Electromagnetics""; ""Current Status of Modeling and Simulation""; ""Particle-in-Cell Simulations""; ""Kinetic Models""; ""Fluid or Hydrodynamic Models""; ""Hybrid Models""; ""A ROLE FOR NRL""; ""Chapter 3 Semiconductor Processing""
""RESEARCH OPPORTUNITIES""""A ROLE FOR NRL""; ""Development and Characterization of Precompetitive Materials and Processes""; ""Comparative Analysis and Characterization of Tools and Processes in Development""; ""Sensor Development for Control and Fingerprinting of Manufacturing Processes""; ""Chapter 4 Plasma Deposition and Polymerization""; ""RESEARCH OPPORTUNITIES""; ""Semiconductor Fabrication""; ""Barrier Coatings""; ""Fibrous Materials""; ""Optical Coatings and Photonics""; ""Plasma Polymerization""; ""A ROLE FOR NRL""; ""Chapter 5 Ion Implantation and Surface Modification"" ""RESEARCH OPPORTUNITIES""""Introduction""; ""Plasma and Ion Beam Implantation Technology""; ""Ion Beam Implantation""; ""Plasma Source Ion Implantation""; ""Applications""; ""Implantation of Metals""; ""Implantation of Nonmetals""; ""A ROLE FOR NRL""; ""Chapter 6 Thermal Plasmas""; ""RESEARCH OPPORTUNITIES""; ""Introduction""; ""Plasma Spraying""; ""Plasma Chemical Vapor Deposition""; ""Plasma Waste Destruction""; ""Plasma Metallurgy""; ""Thermal Plasma Synthesis""; ""Plasma Consolidation""; ""A ROLE FOR NRL""; ""Thermal Plasma Waste Destruction""; ""Plasma Chemical Vapor Deposition"" ""Diamond Films""""Cubic Boron Nitride Films""; ""Carbon Nitride""; ""Chapter 7 Flat Panel Displays""; ""RESEARCH OPPORTUNITIES""; ""Introduction""; ""Passive Matrix Liquid Crystal Display""; ""Active Matrix Liquid Crystal Display""; ""Amorphous Silicon""; ""Polycrystalline Silicon""; ""Transfer Silicon""; ""Thin Film Electroluminescent Displays""; ""Digital Micromirror Devices""; ""Plasma Displays""; ""Field Emission Displays""; ""A ROLE FOR NRL""; ""Chapter 8 Low-Temperature Plasma Physics""; ""RESEARCH OPPORTUNITIES""; ""A ROLE FOR NRL""; ""Chapter 9 Conclusions and Recommendations"" ""RECOMMENDATION FOR A PROGRAM IN PLASMA PROCESSING AND PROCESSING SCIENCE""""CONCLUSIONS BASED ON NRL'S PRESENT RESEARCH CAPABILITIES"" |
| Record Nr. | UNINA-9910828377903321 |
| Washington, D.C., : National Academy Press, 1995 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
