Proceedings of the ... Bipolar Circuits and Technology Meeting / / sponsored by IEEE Electron Devices Society and Microelectronic and Information Sciences Center, University of Minnesota, in cooperation with the IEEE Circuits and Systems Society and IEEE Twin Cities Section |
Pubbl/distr/stampa | New York, NY, : IEEE |
Descrizione fisica | 1 online resource |
Disciplina | 621.39/732 |
Soggetto topico |
Bipolar integrated circuits
Bipolar transistors |
Soggetto genere / forma | Conference papers and proceedings. |
Formato | Materiale a stampa |
Livello bibliografico | Periodico |
Lingua di pubblicazione | eng |
Record Nr. | UNISA-996279849203316 |
New York, NY, : IEEE | ||
Materiale a stampa | ||
Lo trovi qui: Univ. di Salerno | ||
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Proceedings of the ... Bipolar/BiCMOS Circuits and Technology Meeting |
Pubbl/distr/stampa | [New York] : , : [IEEE] |
Disciplina |
621.39
621.39/732 |
Soggetto topico |
Bipolar integrated circuits
Bipolar transistors Metal oxide semiconductors, Complementary |
Soggetto genere / forma |
Periodicals.
Conference papers and proceedings. |
ISSN | 2378-590X |
Formato | Materiale a stampa |
Livello bibliografico | Periodico |
Lingua di pubblicazione | eng |
Altri titoli varianti |
.. Bipolar/BiCOMS Circuits and Technology Meeting
BCTM proceedings IEEE Bipolar/BiCMOS Circuits and Technology Meeting Bipolar/BiCMOS Circuits and Technology Meeting ... proceedings of the Proceedings of the ... Bipolar/BiCOMS [sic] Circuits and Technology Meeting |
Record Nr. | UNISA-996278334403316 |
[New York] : , : [IEEE] | ||
Materiale a stampa | ||
Lo trovi qui: Univ. di Salerno | ||
|
Proceedings of the ... Bipolar/BiCMOS Circuits and Technology Meeting |
Pubbl/distr/stampa | [New York] : , : [IEEE] |
Disciplina |
621.39
621.39/732 |
Soggetto topico |
Bipolar integrated circuits
Bipolar transistors Metal oxide semiconductors, Complementary |
Soggetto genere / forma |
Periodicals.
Conference papers and proceedings. |
ISSN | 2378-590X |
Formato | Materiale a stampa |
Livello bibliografico | Periodico |
Lingua di pubblicazione | eng |
Altri titoli varianti |
.. Bipolar/BiCOMS Circuits and Technology Meeting
BCTM proceedings IEEE Bipolar/BiCMOS Circuits and Technology Meeting Bipolar/BiCMOS Circuits and Technology Meeting ... proceedings of the Proceedings of the ... Bipolar/BiCOMS [sic] Circuits and Technology Meeting |
Record Nr. | UNINA-9910626172703321 |
[New York] : , : [IEEE] | ||
Materiale a stampa | ||
Lo trovi qui: Univ. Federico II | ||
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Programmable, automated transistor test system / / Long V. Truong and Gale R. Sundburg |
Autore | Truong Long V. |
Pubbl/distr/stampa | Washington, D.C. : , : National Aeronautics and Space Administration, Scientific and Technical Information Branch, , February 1986 |
Descrizione fisica | 1 online resource (22 pages) : illustrations |
Collana | NASA/TP |
Soggetto topico |
Bipolar transistors
Performance tests Field effect transistors Numerical control Software engineering Transistors - Testing - Computer programs Bipolar transistors - Testing - Computer programs Metal oxide semiconductors - Testing - Computer programs |
Formato | Materiale a stampa |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Record Nr. | UNINA-9910709716503321 |
Truong Long V. | ||
Washington, D.C. : , : National Aeronautics and Space Administration, Scientific and Technical Information Branch, , February 1986 | ||
Materiale a stampa | ||
Lo trovi qui: Univ. Federico II | ||
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The role of the Silicon Germanium (SiGe) Heterojunction Bipolar Transistor (HBT) in mobile technology platforms / / by Gregory A. Mitchell |
Autore | Mitchell Gregory A. |
Pubbl/distr/stampa | Adelphi, MD : , : Army Research Laboratory, , September 2011 |
Descrizione fisica | 1 online resource (vi, 30 pages) : illustrations |
Collana | ARL-TN |
Soggetto topico |
Bipolar transistors
Silicon Germanium Digital communications |
Formato | Materiale a stampa |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Altri titoli varianti | Role of the Silicon Germanium |
Record Nr. | UNINA-9910701448803321 |
Mitchell Gregory A. | ||
Adelphi, MD : , : Army Research Laboratory, , September 2011 | ||
Materiale a stampa | ||
Lo trovi qui: Univ. Federico II | ||
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SiGe heterojunction bipolar transistors [[electronic resource] /] / Peter Ashburn |
Autore | Ashburn Peter |
Pubbl/distr/stampa | Hoboken, NJ, : John Wiley & Sons, c2003 |
Descrizione fisica | 1 online resource (288 p.) |
Disciplina |
621.313
621.3815282 |
Soggetto topico |
Bipolar transistors
Silicon Germanium |
Soggetto genere / forma | Electronic books. |
ISBN |
1-280-26903-0
9786610269037 0-470-09073-1 0-470-09074-X |
Formato | Materiale a stampa |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Nota di contenuto |
SiGe Heterojunction Bipolar Transistors; Contents; Preface; Physical Constants and Properties of Silicon and Silicon-Germanium; List of Symbols; 1 Introduction; 1.1 Evolution of Silicon Bipolar Technology; 1.2 Evolution of Silicon-Germanium HBT Technology; 1.3 Operating Principles of the Bipolar Transistor; References; 2 Basic Bipolar Transistor Theory; 2.1 Introduction; 2.2 Components of Base Current; 2.3 Fundamental Equations; 2.3.1 Assumptions; 2.4 Base Current; 2.4.1 Base Current in Shallow Emitters; 2.4.2 Base Current in Deep Emitters; 2.4.3 Recombination Current in the Neutral Base
2.5 Collector Current2.6 Current Gain; 2.7 Gummel Numbers; 3 Heavy Doping Effects; 3.1 Introduction; 3.2 Majority and Minority Carrier Mobility; 3.3 Bandgap Narrowing; 3.4 Minority Carrier Lifetime; 3.5 Gain and Heavy Doping Effects; 3.6 Non-uniform Doping Profiles; References; 4 Second-Order Effects; 4.1 Introduction; 4.2 Low Current Gain; 4.2.1 Recombination via Deep Levels; 4.2.2 Recombination Current in the Forward Biased Emitter/Base Depletion Region; 4.2.3 Generation Current in a Reverse Biased pn Junction; 4.2.4 Origins of Deep Levels in Bipolar Transistors; 4.3 High Current Gain 4.4 Basewidth Modulation4.5 Series Resistance; 4.6 Junction Breakdown; 4.6.1 Punch-through; 4.6.2 Zener Breakdown; 4.6.3 Avalanche Breakdown; 4.6.4 Junction Breakdown in Practice; 4.6.5 Common Base and Common Emitter Breakdown Voltages; 4.6.6 Trade-off between Gain and BV(CEO); References; 5 High-frequency Performance; 5.1 Introduction; 5.2 Forward Transit Time t(F); 5.2.1 Components of t(F); 5.2.2 Base Transit Time; 5.2.3 Emitter Delay; 5.2.4 Collector/Base Depletion Region Transit Time; 5.2.5 Emitter/Base Depletion Region Delay; 5.3 Cut-off Frequency f(T) 5.4 Maximum Oscillation Frequency f(max)5.5 Kirk Effect; 5.6 Base, Collector and Emitter Resistance; 5.6.1 Base Resistance; 5.6.2 Collector Resistance; 5.7 Emitter/Base and Collector/Base Depletion Capacitance; 5.8 Quasi-saturation; 5.9 Current Crowding; References; 6 Polysilicon Emitters; 6.1 Introduction; 6.2 Basic Fabrication and Operation of Polysilicon Emitters; 6.3 Diffusion in Polysilicon Emitters; 6.4 Influence of the Polysilicon/Silicon Interface; 6.5 Base Current in Polysilicon Emitters; 6.6 Effective Surface Recombination Velocity; 6.7 Emitter Resistance 6.8 Design of Practical Polysilicon Emitters6.8.1 Break-up of the Interfacial Oxide Layer and Epitaxial Regrowth; 6.8.2 Epitaxially Regrown Emitters; 6.8.3 Trade-off between Emitter Resistance and Current Gain in Polysilicon Emitters; 6.8.4 Emitter Plug Effect and in situ Doped Polysilicon Emitters; 6.9 pnp Polysilicon Emitters; References; 7 Properties and Growth of Silicon-Germanium; 7.1 Introduction; 7.2 Materials Properties of Silicon-Germanium; 7.2.1 Pseudomorphic Silicon-Germanium; 7.2.2 Critical Thickness; 7.2.3 Band Structure of Silicon-Germanium 7.3 Physical Properties of Silicon-Germanium |
Record Nr. | UNINA-9910143229303321 |
Ashburn Peter | ||
Hoboken, NJ, : John Wiley & Sons, c2003 | ||
Materiale a stampa | ||
Lo trovi qui: Univ. Federico II | ||
|
SiGe heterojunction bipolar transistors [[electronic resource] /] / Peter Ashburn |
Autore | Ashburn Peter |
Pubbl/distr/stampa | Hoboken, NJ, : John Wiley & Sons, c2003 |
Descrizione fisica | 1 online resource (288 p.) |
Disciplina |
621.313
621.3815282 |
Soggetto topico |
Bipolar transistors
Silicon Germanium |
ISBN |
1-280-26903-0
9786610269037 0-470-09073-1 0-470-09074-X |
Formato | Materiale a stampa |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Nota di contenuto |
SiGe Heterojunction Bipolar Transistors; Contents; Preface; Physical Constants and Properties of Silicon and Silicon-Germanium; List of Symbols; 1 Introduction; 1.1 Evolution of Silicon Bipolar Technology; 1.2 Evolution of Silicon-Germanium HBT Technology; 1.3 Operating Principles of the Bipolar Transistor; References; 2 Basic Bipolar Transistor Theory; 2.1 Introduction; 2.2 Components of Base Current; 2.3 Fundamental Equations; 2.3.1 Assumptions; 2.4 Base Current; 2.4.1 Base Current in Shallow Emitters; 2.4.2 Base Current in Deep Emitters; 2.4.3 Recombination Current in the Neutral Base
2.5 Collector Current2.6 Current Gain; 2.7 Gummel Numbers; 3 Heavy Doping Effects; 3.1 Introduction; 3.2 Majority and Minority Carrier Mobility; 3.3 Bandgap Narrowing; 3.4 Minority Carrier Lifetime; 3.5 Gain and Heavy Doping Effects; 3.6 Non-uniform Doping Profiles; References; 4 Second-Order Effects; 4.1 Introduction; 4.2 Low Current Gain; 4.2.1 Recombination via Deep Levels; 4.2.2 Recombination Current in the Forward Biased Emitter/Base Depletion Region; 4.2.3 Generation Current in a Reverse Biased pn Junction; 4.2.4 Origins of Deep Levels in Bipolar Transistors; 4.3 High Current Gain 4.4 Basewidth Modulation4.5 Series Resistance; 4.6 Junction Breakdown; 4.6.1 Punch-through; 4.6.2 Zener Breakdown; 4.6.3 Avalanche Breakdown; 4.6.4 Junction Breakdown in Practice; 4.6.5 Common Base and Common Emitter Breakdown Voltages; 4.6.6 Trade-off between Gain and BV(CEO); References; 5 High-frequency Performance; 5.1 Introduction; 5.2 Forward Transit Time t(F); 5.2.1 Components of t(F); 5.2.2 Base Transit Time; 5.2.3 Emitter Delay; 5.2.4 Collector/Base Depletion Region Transit Time; 5.2.5 Emitter/Base Depletion Region Delay; 5.3 Cut-off Frequency f(T) 5.4 Maximum Oscillation Frequency f(max)5.5 Kirk Effect; 5.6 Base, Collector and Emitter Resistance; 5.6.1 Base Resistance; 5.6.2 Collector Resistance; 5.7 Emitter/Base and Collector/Base Depletion Capacitance; 5.8 Quasi-saturation; 5.9 Current Crowding; References; 6 Polysilicon Emitters; 6.1 Introduction; 6.2 Basic Fabrication and Operation of Polysilicon Emitters; 6.3 Diffusion in Polysilicon Emitters; 6.4 Influence of the Polysilicon/Silicon Interface; 6.5 Base Current in Polysilicon Emitters; 6.6 Effective Surface Recombination Velocity; 6.7 Emitter Resistance 6.8 Design of Practical Polysilicon Emitters6.8.1 Break-up of the Interfacial Oxide Layer and Epitaxial Regrowth; 6.8.2 Epitaxially Regrown Emitters; 6.8.3 Trade-off between Emitter Resistance and Current Gain in Polysilicon Emitters; 6.8.4 Emitter Plug Effect and in situ Doped Polysilicon Emitters; 6.9 pnp Polysilicon Emitters; References; 7 Properties and Growth of Silicon-Germanium; 7.1 Introduction; 7.2 Materials Properties of Silicon-Germanium; 7.2.1 Pseudomorphic Silicon-Germanium; 7.2.2 Critical Thickness; 7.2.3 Band Structure of Silicon-Germanium 7.3 Physical Properties of Silicon-Germanium |
Record Nr. | UNINA-9910830033303321 |
Ashburn Peter | ||
Hoboken, NJ, : John Wiley & Sons, c2003 | ||
Materiale a stampa | ||
Lo trovi qui: Univ. Federico II | ||
|
SiGe heterojunction bipolar transistors [[electronic resource] /] / Peter Ashburn |
Autore | Ashburn Peter |
Pubbl/distr/stampa | Hoboken, NJ, : John Wiley & Sons, c2003 |
Descrizione fisica | 1 online resource (288 p.) |
Disciplina |
621.313
621.3815282 |
Soggetto topico |
Bipolar transistors
Silicon Germanium |
ISBN |
1-280-26903-0
9786610269037 0-470-09073-1 0-470-09074-X |
Formato | Materiale a stampa |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Nota di contenuto |
SiGe Heterojunction Bipolar Transistors; Contents; Preface; Physical Constants and Properties of Silicon and Silicon-Germanium; List of Symbols; 1 Introduction; 1.1 Evolution of Silicon Bipolar Technology; 1.2 Evolution of Silicon-Germanium HBT Technology; 1.3 Operating Principles of the Bipolar Transistor; References; 2 Basic Bipolar Transistor Theory; 2.1 Introduction; 2.2 Components of Base Current; 2.3 Fundamental Equations; 2.3.1 Assumptions; 2.4 Base Current; 2.4.1 Base Current in Shallow Emitters; 2.4.2 Base Current in Deep Emitters; 2.4.3 Recombination Current in the Neutral Base
2.5 Collector Current2.6 Current Gain; 2.7 Gummel Numbers; 3 Heavy Doping Effects; 3.1 Introduction; 3.2 Majority and Minority Carrier Mobility; 3.3 Bandgap Narrowing; 3.4 Minority Carrier Lifetime; 3.5 Gain and Heavy Doping Effects; 3.6 Non-uniform Doping Profiles; References; 4 Second-Order Effects; 4.1 Introduction; 4.2 Low Current Gain; 4.2.1 Recombination via Deep Levels; 4.2.2 Recombination Current in the Forward Biased Emitter/Base Depletion Region; 4.2.3 Generation Current in a Reverse Biased pn Junction; 4.2.4 Origins of Deep Levels in Bipolar Transistors; 4.3 High Current Gain 4.4 Basewidth Modulation4.5 Series Resistance; 4.6 Junction Breakdown; 4.6.1 Punch-through; 4.6.2 Zener Breakdown; 4.6.3 Avalanche Breakdown; 4.6.4 Junction Breakdown in Practice; 4.6.5 Common Base and Common Emitter Breakdown Voltages; 4.6.6 Trade-off between Gain and BV(CEO); References; 5 High-frequency Performance; 5.1 Introduction; 5.2 Forward Transit Time t(F); 5.2.1 Components of t(F); 5.2.2 Base Transit Time; 5.2.3 Emitter Delay; 5.2.4 Collector/Base Depletion Region Transit Time; 5.2.5 Emitter/Base Depletion Region Delay; 5.3 Cut-off Frequency f(T) 5.4 Maximum Oscillation Frequency f(max)5.5 Kirk Effect; 5.6 Base, Collector and Emitter Resistance; 5.6.1 Base Resistance; 5.6.2 Collector Resistance; 5.7 Emitter/Base and Collector/Base Depletion Capacitance; 5.8 Quasi-saturation; 5.9 Current Crowding; References; 6 Polysilicon Emitters; 6.1 Introduction; 6.2 Basic Fabrication and Operation of Polysilicon Emitters; 6.3 Diffusion in Polysilicon Emitters; 6.4 Influence of the Polysilicon/Silicon Interface; 6.5 Base Current in Polysilicon Emitters; 6.6 Effective Surface Recombination Velocity; 6.7 Emitter Resistance 6.8 Design of Practical Polysilicon Emitters6.8.1 Break-up of the Interfacial Oxide Layer and Epitaxial Regrowth; 6.8.2 Epitaxially Regrown Emitters; 6.8.3 Trade-off between Emitter Resistance and Current Gain in Polysilicon Emitters; 6.8.4 Emitter Plug Effect and in situ Doped Polysilicon Emitters; 6.9 pnp Polysilicon Emitters; References; 7 Properties and Growth of Silicon-Germanium; 7.1 Introduction; 7.2 Materials Properties of Silicon-Germanium; 7.2.1 Pseudomorphic Silicon-Germanium; 7.2.2 Critical Thickness; 7.2.3 Band Structure of Silicon-Germanium 7.3 Physical Properties of Silicon-Germanium |
Record Nr. | UNINA-9910841795803321 |
Ashburn Peter | ||
Hoboken, NJ, : John Wiley & Sons, c2003 | ||
Materiale a stampa | ||
Lo trovi qui: Univ. Federico II | ||
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Silicon-germanium heterojunction bipolar transistors for mm-wave systems : technology, modeling and circuit applications / / editors, Niccolò Rinaldi, Michael Schröter |
Pubbl/distr/stampa | Gistrup, Denmark ; ; Delft, Netherlands : , : River Publishers, , [2018] |
Descrizione fisica | 1 online resource (378 pages) |
Disciplina | 621.381528 |
Collana | River Publishers Series in Electronic Materials and Devices |
Soggetto topico |
Bipolar transistors
Silicon alloys |
Soggetto genere / forma | Electronic books. |
ISBN | 87-93519-60-5 |
Formato | Materiale a stampa |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Record Nr. | UNINA-9910480906203321 |
Gistrup, Denmark ; ; Delft, Netherlands : , : River Publishers, , [2018] | ||
Materiale a stampa | ||
Lo trovi qui: Univ. Federico II | ||
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Silicon-germanium heterojunction bipolar transistors for mm-wave systems : technology, modeling and circuit applications / / Niccolò Rinaldi and Niccolò Rinaldi, editors |
Edizione | [1st ed.] |
Pubbl/distr/stampa | Gistrup, Denmark : , : River Publishers, , [2018] |
Descrizione fisica | 1 online resource (378 pages) |
Disciplina | 621.381528 |
Collana | River Publishers Series in Electronic Materials and Devices |
Soggetto topico |
Bipolar transistors
Digital communications Silicon alloys |
ISBN |
1-00-333951-4
1-000-79128-9 1-003-33951-4 1-000-79440-7 87-93519-60-5 |
Formato | Materiale a stampa |
Livello bibliografico | Monografia |
Lingua di pubblicazione | eng |
Record Nr. | UNINA-9910632998403321 |
Gistrup, Denmark : , : River Publishers, , [2018] | ||
Materiale a stampa | ||
Lo trovi qui: Univ. Federico II | ||
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