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Atomic and nano scale materials for advanced energy conversion . Volume 2 / / edited by Zongyou Yin
Atomic and nano scale materials for advanced energy conversion . Volume 2 / / edited by Zongyou Yin
Pubbl/distr/stampa Weinheim, Germany : , : Wiley-VCH GmbH, , [2022]
Descrizione fisica 1 online resource (861 pages)
Disciplina 621.042
Soggetto topico Nanostructured materials
Soggetto genere / forma Electronic books.
ISBN 3-527-83139-8
3-527-83140-1
3-527-83138-X
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Record Nr. UNINA-9910554822603321
Weinheim, Germany : , : Wiley-VCH GmbH, , [2022]
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
Atomic and nano scale materials for advanced energy conversion . Volume 2 / / edited by Zongyou Yin
Atomic and nano scale materials for advanced energy conversion . Volume 2 / / edited by Zongyou Yin
Pubbl/distr/stampa Weinheim, Germany : , : Wiley-VCH GmbH, , [2022]
Descrizione fisica 1 online resource (861 pages)
Disciplina 621.042
Soggetto topico Nanostructured materials
ISBN 3-527-83139-8
3-527-83140-1
3-527-83138-X
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Record Nr. UNINA-9910830107903321
Weinheim, Germany : , : Wiley-VCH GmbH, , [2022]
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
Atomic layer processing : semiconductor dry etching technology / / Thorsten Lill
Atomic layer processing : semiconductor dry etching technology / / Thorsten Lill
Autore Lill Thorsten
Pubbl/distr/stampa Weinheim, Germany : , : Wiley-VCH GmbH, , [2021]
Descrizione fisica 1 online resource (301 pages)
Disciplina 621.38152
Soggetto topico Semiconductors - Etching
Soggetto genere / forma Electronic books.
ISBN 3-527-82419-7
3-527-82420-0
3-527-82418-9
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Nota di contenuto Cover -- Title Page -- Copyright -- Contents -- List of Abbreviations -- Chapter 1 Introduction -- References -- Chapter 2 Fundamentals -- 2.1 Important Performance Metrics of Etching Processes -- 2.1.1 Etching Rate (ER) -- 2.1.2 Etching Rate Nonuniformity (ERNU) -- 2.1.3 Selectivity -- 2.1.4 Profile -- 2.1.5 Critical Dimension (CD) -- 2.1.6 Line Width and Edge Roughness (LWR and LER) -- 2.1.7 Edge Placement Error (EPE) -- 2.1.8 Aspect Ratio‐Dependent Etching (ARDE) -- 2.2 Physisorption and Chemisorption -- 2.3 Desorption -- 2.4 Surface Reactions -- 2.5 Sputtering -- 2.6 Implantation -- 2.7 Diffusion -- 2.8 Transport Phenomena in 3D Features -- 2.8.1 Neutral Transport -- 2.8.2 Ion Transport -- 2.8.3 Transport of Reaction Products -- 2.9 Classification of Etching Technologies -- Problems -- References -- Chapter 3 Thermal Etching -- 3.1 Mechanism and Performance Metrics of Thermal Etching -- 3.1.1 Etching Rate and ERNU -- 3.1.2 Selectivity -- 3.1.3 Profile and CD Control -- 3.1.4 ARDE -- 3.2 Applications Examples -- Problems -- References -- Chapter 4 Thermal Isotropic ALE -- 4.1 Mechanism of Thermal Isotropic ALE -- 4.1.1 Chelation/Condensation ALE -- 4.1.2 Ligand Exchange ALE -- 4.1.3 Conversion ALE -- 4.1.4 Oxidation/Fluorination ALE -- 4.2 Performance Metrics -- 4.2.1 Etching Rate (EPC) -- 4.2.2 ERNU (EPC Nonuniformity) -- 4.2.3 Selectivity -- 4.2.4 Profile and ARDE -- 4.2.5 CD Control -- 4.2.6 Surface Smoothness -- 4.3 Plasma‐Assisted Thermal Isotropic ALE -- 4.4 Applications Examples -- 4.4.1 Area‐Selective Deposition -- 4.4.2 Formation of Lateral Devices -- Problems -- References -- Chapter 5 Radical Etching -- 5.1 Mechanism of Radical Etching -- 5.2 Performance Metrics -- 5.2.1 Etching Rate and ERNU -- 5.2.2 Selectivity -- 5.2.3 Profile and ARDE -- 5.2.4 CD Control -- 5.3 Applications Examples -- Problems -- References.
Chapter 6 Directional ALE -- 6.1 Mechanism of Directional ALE -- 6.1.1 ALE with Directional Modification Step -- 6.1.2 ALE with Directional Removal Step and Modification by Chemisorption and Diffusion -- 6.1.3 ALE with Directional Removal Step and Modification by Reactive Layer Deposition -- 6.2 Performance Metrics -- 6.2.1 Etching Rate (EPC) -- 6.2.2 ERNU (EPC Nonuniformity) -- 6.2.3 Selectivity -- 6.2.4 Profile and ARDE -- 6.2.5 Surface Smoothness and LWR/LER -- 6.3 Applications Examples -- 6.3.1 ALE with Directional Modification Step -- 6.3.2 ALE with Directional Removal Step and Modification by Chemisorption and Diffusion -- 6.3.3 ALE with Directional Removal Step and Modification by Reactive Layer Deposition -- Problems -- References -- Chapter 7 Reactive Ion Etching -- 7.1 Reactive Ion Etching Mechanisms -- 7.1.1 Simultaneous Species Fluxes -- 7.1.2 Chemical Sputtering -- 7.1.3 Mixed Layer Formation -- 7.1.4 Role of Etching Products -- 7.2 Performance Metrics -- 7.2.1 Etching Rate -- 7.2.2 ERNU -- 7.2.3 ARDE -- 7.2.4 Selectivity -- 7.2.5 Profile Control -- 7.2.5.1 Sidewall Passivation -- 7.2.5.2 Selection of Etching Species -- 7.2.5.3 Temperature -- 7.2.6 CD Control -- 7.2.7 Surface Smoothness -- 7.2.8 LWR/LER -- 7.3 Applications Examples -- 7.3.1 Patterning -- 7.3.1.1 Self‐aligned Patterning -- 7.3.1.2 Extreme Ultraviolet (EUV) Lithography -- 7.3.2 Logic Devices -- 7.3.2.1 Fin Etch -- 7.3.2.2 Gate Etch -- 7.3.2.3 Spacer Etch -- 7.3.2.4 Contact Etch -- 7.3.2.5 BEOL Etch -- 7.3.3 DRAM and 3D NAND Memory -- 7.3.3.1 DRAM Capacitor Cell Etch -- 7.3.3.2 High Aspect Ratio 3D NAND Etch -- 7.3.4 Emerging Memories -- 7.3.4.1 Phase Change Memory (PCM) -- 7.3.4.2 ReRAM -- Problems -- References -- Chapter 8 Ion Beam Etching -- 8.1 Mechanism and Performance Metrics of Ion Beam Etching -- 8.2 Applications Examples -- Problems -- References.
Chapter 9 Etching Species Generation -- 9.1 Introduction of Low‐Temperature Plasmas -- 9.2 Capacitively Coupled Plasmas -- 9.3 Inductively Coupled Plasmas -- 9.4 Ion Energy Distribution Modulation -- 9.5 Plasma Pulsing -- 9.6 Grid Sources -- Problems -- References -- Chapter 10 Emerging Etching Technologies -- 10.1 Electron‐Assisted Chemical Etching -- 10.2 Photon‐Assisted Chemical Etching -- Problems -- References -- Index -- EULA.
Record Nr. UNINA-9910586084803321
Lill Thorsten  
Weinheim, Germany : , : Wiley-VCH GmbH, , [2021]
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
Atomic layer processing : semiconductor dry etching technology / / Thorsten Lill
Atomic layer processing : semiconductor dry etching technology / / Thorsten Lill
Autore Lill Thorsten
Pubbl/distr/stampa Weinheim, Germany : , : Wiley-VCH GmbH, , [2021]
Descrizione fisica 1 online resource (301 pages)
Disciplina 621.38152
Soggetto topico Semiconductors - Etching
ISBN 3-527-82419-7
3-527-82420-0
3-527-82418-9
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Nota di contenuto Cover -- Title Page -- Copyright -- Contents -- List of Abbreviations -- Chapter 1 Introduction -- References -- Chapter 2 Fundamentals -- 2.1 Important Performance Metrics of Etching Processes -- 2.1.1 Etching Rate (ER) -- 2.1.2 Etching Rate Nonuniformity (ERNU) -- 2.1.3 Selectivity -- 2.1.4 Profile -- 2.1.5 Critical Dimension (CD) -- 2.1.6 Line Width and Edge Roughness (LWR and LER) -- 2.1.7 Edge Placement Error (EPE) -- 2.1.8 Aspect Ratio‐Dependent Etching (ARDE) -- 2.2 Physisorption and Chemisorption -- 2.3 Desorption -- 2.4 Surface Reactions -- 2.5 Sputtering -- 2.6 Implantation -- 2.7 Diffusion -- 2.8 Transport Phenomena in 3D Features -- 2.8.1 Neutral Transport -- 2.8.2 Ion Transport -- 2.8.3 Transport of Reaction Products -- 2.9 Classification of Etching Technologies -- Problems -- References -- Chapter 3 Thermal Etching -- 3.1 Mechanism and Performance Metrics of Thermal Etching -- 3.1.1 Etching Rate and ERNU -- 3.1.2 Selectivity -- 3.1.3 Profile and CD Control -- 3.1.4 ARDE -- 3.2 Applications Examples -- Problems -- References -- Chapter 4 Thermal Isotropic ALE -- 4.1 Mechanism of Thermal Isotropic ALE -- 4.1.1 Chelation/Condensation ALE -- 4.1.2 Ligand Exchange ALE -- 4.1.3 Conversion ALE -- 4.1.4 Oxidation/Fluorination ALE -- 4.2 Performance Metrics -- 4.2.1 Etching Rate (EPC) -- 4.2.2 ERNU (EPC Nonuniformity) -- 4.2.3 Selectivity -- 4.2.4 Profile and ARDE -- 4.2.5 CD Control -- 4.2.6 Surface Smoothness -- 4.3 Plasma‐Assisted Thermal Isotropic ALE -- 4.4 Applications Examples -- 4.4.1 Area‐Selective Deposition -- 4.4.2 Formation of Lateral Devices -- Problems -- References -- Chapter 5 Radical Etching -- 5.1 Mechanism of Radical Etching -- 5.2 Performance Metrics -- 5.2.1 Etching Rate and ERNU -- 5.2.2 Selectivity -- 5.2.3 Profile and ARDE -- 5.2.4 CD Control -- 5.3 Applications Examples -- Problems -- References.
Chapter 6 Directional ALE -- 6.1 Mechanism of Directional ALE -- 6.1.1 ALE with Directional Modification Step -- 6.1.2 ALE with Directional Removal Step and Modification by Chemisorption and Diffusion -- 6.1.3 ALE with Directional Removal Step and Modification by Reactive Layer Deposition -- 6.2 Performance Metrics -- 6.2.1 Etching Rate (EPC) -- 6.2.2 ERNU (EPC Nonuniformity) -- 6.2.3 Selectivity -- 6.2.4 Profile and ARDE -- 6.2.5 Surface Smoothness and LWR/LER -- 6.3 Applications Examples -- 6.3.1 ALE with Directional Modification Step -- 6.3.2 ALE with Directional Removal Step and Modification by Chemisorption and Diffusion -- 6.3.3 ALE with Directional Removal Step and Modification by Reactive Layer Deposition -- Problems -- References -- Chapter 7 Reactive Ion Etching -- 7.1 Reactive Ion Etching Mechanisms -- 7.1.1 Simultaneous Species Fluxes -- 7.1.2 Chemical Sputtering -- 7.1.3 Mixed Layer Formation -- 7.1.4 Role of Etching Products -- 7.2 Performance Metrics -- 7.2.1 Etching Rate -- 7.2.2 ERNU -- 7.2.3 ARDE -- 7.2.4 Selectivity -- 7.2.5 Profile Control -- 7.2.5.1 Sidewall Passivation -- 7.2.5.2 Selection of Etching Species -- 7.2.5.3 Temperature -- 7.2.6 CD Control -- 7.2.7 Surface Smoothness -- 7.2.8 LWR/LER -- 7.3 Applications Examples -- 7.3.1 Patterning -- 7.3.1.1 Self‐aligned Patterning -- 7.3.1.2 Extreme Ultraviolet (EUV) Lithography -- 7.3.2 Logic Devices -- 7.3.2.1 Fin Etch -- 7.3.2.2 Gate Etch -- 7.3.2.3 Spacer Etch -- 7.3.2.4 Contact Etch -- 7.3.2.5 BEOL Etch -- 7.3.3 DRAM and 3D NAND Memory -- 7.3.3.1 DRAM Capacitor Cell Etch -- 7.3.3.2 High Aspect Ratio 3D NAND Etch -- 7.3.4 Emerging Memories -- 7.3.4.1 Phase Change Memory (PCM) -- 7.3.4.2 ReRAM -- Problems -- References -- Chapter 8 Ion Beam Etching -- 8.1 Mechanism and Performance Metrics of Ion Beam Etching -- 8.2 Applications Examples -- Problems -- References.
Chapter 9 Etching Species Generation -- 9.1 Introduction of Low‐Temperature Plasmas -- 9.2 Capacitively Coupled Plasmas -- 9.3 Inductively Coupled Plasmas -- 9.4 Ion Energy Distribution Modulation -- 9.5 Plasma Pulsing -- 9.6 Grid Sources -- Problems -- References -- Chapter 10 Emerging Etching Technologies -- 10.1 Electron‐Assisted Chemical Etching -- 10.2 Photon‐Assisted Chemical Etching -- Problems -- References -- Index -- EULA.
Record Nr. UNINA-9910830463403321
Lill Thorsten  
Weinheim, Germany : , : Wiley-VCH GmbH, , [2021]
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
Charge and energy transfer dynamics in molecular systems / / Volkhard May and Oliver Kühn
Charge and energy transfer dynamics in molecular systems / / Volkhard May and Oliver Kühn
Autore May Volkhard
Edizione [Fourth edition.]
Pubbl/distr/stampa Weinheim, Germany : , : Wiley-VCH GmbH, , [2023]
Descrizione fisica 1 online resource (547 pages)
Disciplina 541/.22
Soggetto topico Energy transfer
ISBN 3-527-69626-1
3-527-69627-X
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Record Nr. UNINA-9910830176603321
May Volkhard  
Weinheim, Germany : , : Wiley-VCH GmbH, , [2023]
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
Chemical engineering dynamics : an introduction to modelling and computer simulation / / John Ingham, [and five others]
Chemical engineering dynamics : an introduction to modelling and computer simulation / / John Ingham, [and five others]
Autore Ingham John, Dr.
Edizione [3rd, completely rev. ed.]
Pubbl/distr/stampa Weinheim, Germany : , : Wiley-VCH GmbH, , [2007]
Descrizione fisica 1 online resource (643 p.)
Disciplina 660.28155362
Soggetto topico Chemical engineering - Mathematical models
ISBN 1-281-23930-5
9786611239305
3-527-61421-4
3-527-61422-2
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Nota di contenuto Chemical Engineering Dynamics; Contents; Preface; Acknowledgements; Nomenclature for Chapters 1-4; 1 Basic Concepts; 1.1 Modelling Fundamentals; 1.1.1 Chemical Engineering Modelling; 1.1.2 General Aspects of the Modelling Approach; 1.1.3 General Modelling Procedure; 1.2 Formulation of Dynamic Models; 1.2.1 Material Balance Equations; 1.2.2 Balancing Procedures; 1.2.2.1 Case A: Continuous Stirred-Tank Reactor; 1.2.2.2 Case B: Tubular Reactor; 1.2.2.3 Case C: Coffee Percolator; 1.2.3 Total Material Balances; 1.2.3.1 Case A: Tank Drainage; 1.2.4 Component Balances
1.2.4.1 Case A: Waste Holding Tank1.2.4.2 Case B: Extraction from a Solid by a Solvent; 1.2.5 Energy Balancing; 1.2.5.1 Case A: Continuous Heating in an Agitated Tank; 1.2.5.2 Case B: Heating in a Filling Tank; 1.2.5.3 Case C: Parallel Reaction in a Semi-Continuous Reactor with Large Temperature Changes; 1.2.6 Momentum Balances; 1.2.7 Dimensionless Model Equations; 1.2.7.1 Case A: Continuous Stirred-Tank Reactor (CSTR); 1.2.7.2 Case B: Gas-Liquid Mass Transfer to a Continuous Tank Reactor with Chemical Reaction; 1.3 Chemical Kinetics; 1.3.1 Rate of Chemical Reaction
1.3.2 Reaction Rate Constant1.3.3 Heat of Reaction; 1.3.4 Chemical Equilibrium and Temperature; 1.3.5 Yield, Conversion and Selectivity; 1.3.6 Microbial Growth Kinetics; 1.4 Mass Transfer Theory; 1.4.1 Stagewise and Differential Mass Transfer Contacting; 1.4.2 Phase Equilibria; 1.4.3 Interphase Mass Transfer; 2 Process Dynamics Fundamentals; 2.1 Signal and Process Dynamics; 2.1.1 Measurement and Process Response; 2.1.1.1 First-Order Response to an Input Step-Change Disturbance; 2.1.1.2 Case A: Concentration Response of a Continuous Flow, Stirred Tank
2.1.1.3 Case B: Concentration Response in a Continuous Stirred Tank with Chemical Reaction2.1.1.4 Case C: Response of a Temperature Measuring Element; 2.1.1.5 Case D: Measurement Lag for Concentration in a Batch Reactor; 2.1.2 Higher Order Responses; 2.1.2.1 Case A: Multiple Tanks in Series; 2.1.2.2 Case B: Response of a Second-Order Temperature Measuring Element; 2.1.3 Pure Time Delay; 2.1.4 Transfer Function Representation; 2.2 Time Constants; 2.2.1 Common Time Constants; 2.2.1.1 Flow Phenomena; 2.2.1.2 Diffusion-Dispersion; 2.2.1.3 Chemical Reaction; 2.2.1.4 Mass Transfer
2.2.1.5 Heat Transfer2.2.2 Application of Time Constants; 2.3 Fundamentals of Automatic Control; 2.3.1 Basic Feedback Control; 2.3.2 Types of Controller Action; 2.3.2.1 On/Off Control; 2.3.2.2 Proportional-Integral-Derivative (PID) Control; 2.3.2.3 Case A: Operation of a Proportional Temperature Controller; 2.3.3 Controller Tuning; 2.3.3.1 Trial and Error Method; 2.3.3.2 Ziegler-Nichols Open-Loop Method; 2.3.3.3 Cohen-Coon Controller Settings; 2.3.3.4 Ultimate Gain Method; 2.3.3.5 Time Integral Criteria; 2.3.4 Advanced Control Strategies; 2.3.4.1 Cascade Control; 2.3.4.2 Feedforward Control
2.3.4.3 Adaptive Control
Record Nr. UNINA-9910144002903321
Ingham John, Dr.  
Weinheim, Germany : , : Wiley-VCH GmbH, , [2007]
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
Chemical product formulation design and optimization : methods, techniques, and case studies / / Ali Elkamel, [and four others]
Chemical product formulation design and optimization : methods, techniques, and case studies / / Ali Elkamel, [and four others]
Autore Elkamel Ali
Pubbl/distr/stampa Weinheim, Germany : , : Wiley-VCH GmbH, , [2023]
Descrizione fisica 1 online resource (227 pages)
Disciplina 737
Soggetto topico Chemical engineering
ISBN 3-527-68963-X
3-527-68962-1
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Nota di contenuto Cover -- Title Page -- Copyright -- Contents -- Preface -- About the Authors -- Chapter 1 Introduction -- 1.1 Chemical Product Engineering -- 1.2 Chemical Product Design -- 1.3 Product Design and Computer‐Aided Product Design -- References -- Chapter 2 Some Typical Applications of Chemical Product Design and Intellectual Property -- 2.1 Natural Fiber Plastic Composites -- 2.2 Wheat Straw Polypropylene Composites -- 2.3 Modeling Natural Fiber Polymer Composites -- 2.4 Graphene Composites -- 2.5 Corrosion Protection Using Polymer Composites -- 2.6 Intellectual Property -- References -- Chapter 3 Mathematical Principles for Chemical Product Design -- 3.1 Factorial and Fractional Factorial Design -- 3.2 Response Surface Methods and Designs -- 3.3 D‐Optimal Designs -- 3.4 Bayesian Design of Fractional Factorial Experiments -- 3.5 Regression Analysis -- 3.6 Artificial Neural Networks -- 3.7 Mixture Design of Experiments -- 3.8 Multiway Principal Component Analysis -- 3.8.1 Model‐based Principal Component Analysis (MB‐PCA) -- 3.8.2 MPLS Analysis Using NIPALS -- References -- Chapter 4 Disinfectant Formulation Design -- 4.1 Introduction -- 4.2 Disinfectants Characteristics -- 4.2.1 Antimicrobial Tests -- 4.2.2 Stability Tests -- 4.2.3 Corrosion Tests -- 4.3 Toxicity of Disinfectants -- 4.3.1 Harmful (Xn) -- 4.3.2 Severe Eye Damage, Xi (R41) -- 4.3.3 Eye Irritant, Xi (R36) -- 4.3.4 Skin Irritant, Xi (R38) -- 4.3.5 Respiratory Irritant, Xi (R37) -- 4.4 Experimental Design for Antimicrobial Activity -- 4.4.1 Prior Knowledge -- 4.4.2 Historical Data Augmentation -- 4.4.3 Linear Least Squares Regression Analysis -- 4.4.4 Artificial Neural Networks -- 4.5 Experimental Design for Stability of Hydrogen Peroxide -- 4.5.1 Historical Data Analysis -- 4.5.2 Historical Data Augmentation Using Bayesian D‐optimality Approach -- 4.6 Experimental Design for Corrosion.
4.6.1 Preliminary Experimental Design -- 4.6.2 Response Surface Methodology -- 4.6.3 Artificial Neural Networks -- 4.7 Final Formulation Optimization -- 4.7.1 Optimization -- 4.7.2 Optimized Formulation Verification -- 4.7.3 Comparing the Optimized Formulations to an Available Product -- 4.8 Conclusion -- References -- Chapter 5 Streptomyces Lividans 66 for developing a Minimal Defined Medium for Recombinant Human Interleukin‐3 -- 5.1 Introduction -- 5.2 Materials and Methods -- 5.2.1 Microorganism and Medium -- 5.2.2 Analytical Methods -- 5.2.3 Experimental Design and Data Analysis -- 5.3 Results and Discussion -- 5.3.1 Starvation Trails -- 5.3.2 Screening Mixture Experiments -- 5.3.3 Defined Medium Optimization by Mixture Design Method -- 5.4 Conclusion -- References -- Chapter 6 Multivariate Modeling of a Chemical Toner Manufacturing Process -- 6.1 Introduction -- 6.1.1 Process and Data Description -- 6.1.2 Model Cross‐Validation -- 6.2 Results and Discussion -- 6.3 Conclusion -- References -- Chapter 7 Wheat Straw Fiber Size Effects on the Mechanical Properties of Polypropylene Composites -- 7.1 Introduction -- 7.2 Materials and Methods -- 7.2.1 Materials -- 7.2.2 Fiber Preparation and Size Measurement -- 7.2.3 Fiber Thermal and Chemical Analysis -- 7.2.4 Composite Sample Preparation and Properties Measurement -- 7.3 Results and Discussions -- 7.3.1 Fiber Fractionation and Size Measurement -- 7.3.2 Fiber Thermal and Chemical Analysis -- 7.3.3 Fiber Size Reduction During Compounding Process -- 7.3.4 Composite Flexural Properties -- 7.3.5 Composite Impact Properties -- 7.3.6 Composite‐Specific Properties -- 7.4 Conclusion -- References -- Chapter 8 Framework for Product Design of Wheat Straw Polypropylene Composite -- 8.1 Introduction -- 8.2 Product Design Framework for WS‐PP Composite -- 8.3 Response Surface Models.
8.3.1 The Design of Mixture Experiment -- 8.3.2 Materials and Methods -- 8.3.3 Results and Discussion -- 8.3.3.1 Flexural Modulus -- 8.3.3.2 Izod Impact Strength -- 8.3.3.3 Other Properties -- 8.4 Case Study -- 8.5 Conclusion -- References -- Chapter 9 Product Design for Gasoline Blends to Control Environmental Impact Using Novel Sustainability Indices: A Case Study -- 9.1 Introduction -- 9.2 Methodology -- 9.2.1 The Impacts of Gasoline Blends on Octane Number (ON) -- 9.2.2 The Impacts of Blending Ethanol and Gasoline on Mileage -- 9.2.3 The Effects of Ethanol, Methanol, and Isooctane on the Octane Number of Gasoline Blends -- 9.2.4 The Impacts of E5, M5, and I5 on Heat Value, Mileage, and Price -- 9.2.5 Impacts of E5, M5, and I5 on Environment in Potential Environmental Impacts (PEIs) -- 9.2.6 The Impacts of E5, M5, and I5 on Safety Risk -- 9.2.7 Selecting the Best Blend Through the Analytic Hierarchy Process (AHP) -- 9.3 Results -- 9.4 Conclusion -- References -- Chapter 10 Corrosion Protection of Copper Using Polyetherimide/Graphene Composite Coatings -- 10.1 Introduction -- 10.2 Experimental -- 10.2.1 Material -- 10.2.2 Composite Preparation, Coating, and Curing -- 10.2.3 Morphology Characterization -- 10.2.4 Adhesion -- 10.2.5 Electrochemical Measurement -- 10.3 Results and Discussion -- 10.3.1 Morphology -- 10.3.2 Adhesion -- 10.3.3 Potentiodynamic Measurements -- 10.3.4 Impedance -- 10.4 Conclusion -- References -- Chapter 11 Optimization of Mechanical Properties of Polypropylene Montmorillonite Nanocomposites -- 11.1 Introduction -- 11.2 Methodology -- 11.3 Mathematical Models -- 11.4 Optimization Mechanism -- 11.5 Results and Discussion -- 11.5.1 Minimizing the Cost of PP‐OMMT -- 11.5.2 Minimizing the Variance Between Desired Properties -- 11.6 Conclusion -- References.
Chapter 12 Product Selection and Business Portfolio for Long‐Range Financial Stability: Case Study from the Petrochemical Industry -- 12.1 Introduction -- 12.2 Manufacturing Strategy and Product Selection Tools -- 12.3 Model Development -- 12.4 Illustrative Case Study -- 12.5 Conclusion -- References -- Index -- EULA.
Record Nr. UNINA-9910830131703321
Elkamel Ali  
Weinheim, Germany : , : Wiley-VCH GmbH, , [2023]
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
Chemo-enzymatic cascade reactions / / Dunming Zhu
Chemo-enzymatic cascade reactions / / Dunming Zhu
Autore Zhu Dunming
Pubbl/distr/stampa Weinheim, Germany : , : Wiley-VCH GmbH, , [2021]
Descrizione fisica 1 online resource
Disciplina 660.634
Soggetto topico Biocatalysis
Soggetto genere / forma Electronic books.
ISBN 3-527-81428-0
1-5231-3668-5
3-527-81427-2
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Nota di contenuto Cover -- Title Page -- Copyright -- Contents -- Preface -- Chapter 1 Introduction -- 1.1 Advantages of Enzyme Catalysis -- 1.1.1 Chemoselectivity -- 1.1.2 Regioselectivity -- 1.1.3 Stereoselectivity -- 1.1.4 Mild Reaction Conditions -- 1.2 Modes of Chemoenzymatic Transformations -- 1.2.1 "Separate-Pot Two-Step" Mode -- 1.2.2 "One-Pot Two-Step" Mode -- 1.2.3 "One-Pot One-Step" Mode -- References -- Chapter 2 "Separate-pot Two-step" Chemoenzymatic Transformation -- 2.1 Lipases -- 2.2 Nitrilases -- 2.3 Carbonyl Reductases -- 2.4 Ene Reductases -- 2.5 Transaminases -- 2.6 Imine Reductases -- 2.7 Cytochromes P450s -- 2.8 Baeyer-Villiger Monooxygenases (BVMOs) -- 2.9 Aldolases -- 2.10 Epoxide Hydrolases -- 2.11 Other Enzymes -- 2.12 Integration of Multienzyme Cascade with Chemical Transformation -- 2.13 Summary and Outlook -- References -- Chapter 3 One-pot Sequential Chemoenzymatic Reactions -- 3.1 Lipases and Esterases -- 3.2 Carbonyl Reductases -- 3.3 Ene Reductases -- 3.4 Transaminases -- 3.5 Epoxide Hydrolases (EHs) -- 3.6 Other Enzymes -- 3.6.1 Aldolases -- 3.6.2 Halohydrin Dehalogenases -- 3.6.3 Phenylalanine Ammonia Lyases -- 3.6.4 d-Amino Acid Dehydrogenases (DAADHs) -- 3.6.5 Halogenases -- 3.6.6 Imine Reductases -- 3.6.7 Decarboxylases -- 3.6.8 Cytochrome P450s -- 3.6.9 Hydroxynitrile Lyases -- 3.6.10 Nitrilases -- 3.6.11 Laccases -- 3.6.12 Transglutaminases -- 3.6.13 α-Ketoglutarate (α-KG)-dependent Non-heme Iron Oxygenases -- 3.6.14 Galactose Oxidases -- 3.6.15 FAD-dependent Monooxygenases -- 3.7 Summary and Outlook -- References -- Chapter 4 Chemoenzymatic Dynamic Kinetic Resolution -- 4.1 Enzymatic Kinetic Resolution -- 4.2 Dynamic Kinetic Resolution -- 4.3 Racemization Techniques -- 4.4 DKR of Chiral Alcohols -- 4.5 DKR of Chiral Amines -- 4.6 DKRs of Other Compounds -- 4.7 Summary and Outlook -- References.
Chapter 5 Chemoenzymatic Concurrent Deracemization -- 5.1 Deracemization of Amino Acids and Amines -- 5.2 Deracemization of Hydroxy Acids and Alcohols -- 5.3 Deracemization of Chiral Sulfoxides -- 5.4 Summary and Outlook -- References -- Chapter 6 One-pot Concurrent Chemoenzymatic Reactions -- 6.1 One-pot Concurrent Chemoenzymatic Cascades -- 6.1.1 Lipases -- 6.1.2 Carbonyl Reductases -- 6.1.3 Enoate Reductases -- 6.1.4 Transaminases -- 6.1.5 Monoamine Oxidases -- 6.1.6 Cytochrome P450s -- 6.1.7 Halohydrin Dehalogenases -- 6.1.8 Vanadium Haloperoxidases -- 6.1.9 Laccases -- 6.2 Integration of Chemical Reaction with Metabolism of Living Organisms -- 6.3 One-pot Concurrent Chemoenzymatic Cascades via Compartmentalization -- 6.4 Summary and Outlook -- References -- Chapter 7 Photocatalytic and Biocatalytic Cascade Transformations -- 7.1 Photoenzymes -- 7.2 Light-Activation of Redox Enzymes Without Cofactor Regeneration -- 7.3 Light-Activated Cofactor Regeneration for Redox Enzymes -- 7.4 Photoinduced Catalytic Promiscuity of Redox Enzymes -- 7.5 Photocatalysis and Biocatalysis Cascades -- 7.6 Summary and Outlook -- References -- Chapter 8 Perspectives -- References -- Index -- EULA.
Record Nr. UNINA-9910554861703321
Zhu Dunming  
Weinheim, Germany : , : Wiley-VCH GmbH, , [2021]
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
Chemo-enzymatic cascade reactions / / Dunming Zhu
Chemo-enzymatic cascade reactions / / Dunming Zhu
Autore Zhu Dunming
Pubbl/distr/stampa Weinheim, Germany : , : Wiley-VCH GmbH, , [2021]
Descrizione fisica 1 online resource
Disciplina 660.634
Soggetto topico Biocatalysis
ISBN 3-527-81428-0
1-5231-3668-5
3-527-81427-2
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Nota di contenuto Cover -- Title Page -- Copyright -- Contents -- Preface -- Chapter 1 Introduction -- 1.1 Advantages of Enzyme Catalysis -- 1.1.1 Chemoselectivity -- 1.1.2 Regioselectivity -- 1.1.3 Stereoselectivity -- 1.1.4 Mild Reaction Conditions -- 1.2 Modes of Chemoenzymatic Transformations -- 1.2.1 "Separate-Pot Two-Step" Mode -- 1.2.2 "One-Pot Two-Step" Mode -- 1.2.3 "One-Pot One-Step" Mode -- References -- Chapter 2 "Separate-pot Two-step" Chemoenzymatic Transformation -- 2.1 Lipases -- 2.2 Nitrilases -- 2.3 Carbonyl Reductases -- 2.4 Ene Reductases -- 2.5 Transaminases -- 2.6 Imine Reductases -- 2.7 Cytochromes P450s -- 2.8 Baeyer-Villiger Monooxygenases (BVMOs) -- 2.9 Aldolases -- 2.10 Epoxide Hydrolases -- 2.11 Other Enzymes -- 2.12 Integration of Multienzyme Cascade with Chemical Transformation -- 2.13 Summary and Outlook -- References -- Chapter 3 One-pot Sequential Chemoenzymatic Reactions -- 3.1 Lipases and Esterases -- 3.2 Carbonyl Reductases -- 3.3 Ene Reductases -- 3.4 Transaminases -- 3.5 Epoxide Hydrolases (EHs) -- 3.6 Other Enzymes -- 3.6.1 Aldolases -- 3.6.2 Halohydrin Dehalogenases -- 3.6.3 Phenylalanine Ammonia Lyases -- 3.6.4 d-Amino Acid Dehydrogenases (DAADHs) -- 3.6.5 Halogenases -- 3.6.6 Imine Reductases -- 3.6.7 Decarboxylases -- 3.6.8 Cytochrome P450s -- 3.6.9 Hydroxynitrile Lyases -- 3.6.10 Nitrilases -- 3.6.11 Laccases -- 3.6.12 Transglutaminases -- 3.6.13 α-Ketoglutarate (α-KG)-dependent Non-heme Iron Oxygenases -- 3.6.14 Galactose Oxidases -- 3.6.15 FAD-dependent Monooxygenases -- 3.7 Summary and Outlook -- References -- Chapter 4 Chemoenzymatic Dynamic Kinetic Resolution -- 4.1 Enzymatic Kinetic Resolution -- 4.2 Dynamic Kinetic Resolution -- 4.3 Racemization Techniques -- 4.4 DKR of Chiral Alcohols -- 4.5 DKR of Chiral Amines -- 4.6 DKRs of Other Compounds -- 4.7 Summary and Outlook -- References.
Chapter 5 Chemoenzymatic Concurrent Deracemization -- 5.1 Deracemization of Amino Acids and Amines -- 5.2 Deracemization of Hydroxy Acids and Alcohols -- 5.3 Deracemization of Chiral Sulfoxides -- 5.4 Summary and Outlook -- References -- Chapter 6 One-pot Concurrent Chemoenzymatic Reactions -- 6.1 One-pot Concurrent Chemoenzymatic Cascades -- 6.1.1 Lipases -- 6.1.2 Carbonyl Reductases -- 6.1.3 Enoate Reductases -- 6.1.4 Transaminases -- 6.1.5 Monoamine Oxidases -- 6.1.6 Cytochrome P450s -- 6.1.7 Halohydrin Dehalogenases -- 6.1.8 Vanadium Haloperoxidases -- 6.1.9 Laccases -- 6.2 Integration of Chemical Reaction with Metabolism of Living Organisms -- 6.3 One-pot Concurrent Chemoenzymatic Cascades via Compartmentalization -- 6.4 Summary and Outlook -- References -- Chapter 7 Photocatalytic and Biocatalytic Cascade Transformations -- 7.1 Photoenzymes -- 7.2 Light-Activation of Redox Enzymes Without Cofactor Regeneration -- 7.3 Light-Activated Cofactor Regeneration for Redox Enzymes -- 7.4 Photoinduced Catalytic Promiscuity of Redox Enzymes -- 7.5 Photocatalysis and Biocatalysis Cascades -- 7.6 Summary and Outlook -- References -- Chapter 8 Perspectives -- References -- Index -- EULA.
Record Nr. UNINA-9910831034303321
Zhu Dunming  
Weinheim, Germany : , : Wiley-VCH GmbH, , [2021]
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui
Diarylethene molecular photoswitches : concepts and functionalities / / Masahiro Irie
Diarylethene molecular photoswitches : concepts and functionalities / / Masahiro Irie
Autore Irie Masahiro
Pubbl/distr/stampa Weinheim, Germany : , : Wiley-VCH GmbH, , [2021]
Descrizione fisica 1 online resource (239 pages)
Disciplina 547.7
Soggetto topico Molecular machinery
Soggetto genere / forma Electronic books.
ISBN 3-527-82286-0
3-527-34642-2
3-527-82285-2
Formato Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione eng
Nota di contenuto Cover -- Title Page -- Copyright -- Contents -- Preface -- Chapter 1 Introduction -- 1.1 General Introduction -- 1.2 Discovery of Diarylethene Molecular Photoswitches -- References -- Chapter 2 Reaction Mechanism -- 2.1 Basic Concepts -- 2.2 Theoretical Study -- 2.3 Reaction Dynamics -- 2.3.1 Cyclization Reaction -- 2.3.2 Cycloreversion Reaction -- References -- Chapter 3 Photoswitching Performance -- 3.1 Quantum Yield -- 3.1.1 Photocyclization Quantum Yield -- 3.1.2 Solvent Effect on Cyclization Quantum Yield -- 3.1.3 Photocycloreversion Quantum Yield -- 3.2 Thermal Stability -- 3.3 Fatigue Resistance -- 3.4 Fluorescence Property -- 3.4.1 Turn‐Off Mode Photoswitching -- 3.4.2 Turn‐On Mode Photoswitching -- 3.5 Chiral Property -- References -- Chapter 4 Photoswitchable Crystals -- 4.1 Dichroism -- 4.2 X‐Ray Crystallographic Analysis -- 4.3 Quantum Yield -- 4.4 Multicolored Systems and Nano‐Layered Periodic Structures -- 4.5 Fluorescent Crystals -- 4.6 Photomechanical Response -- 4.6.1 Surface Morphology Change -- 4.6.2 Reversible Shape Change -- 4.6.3 Bending Response of Mixed Crystals -- References -- Chapter 5 Memory -- 5.1 Single‐Molecule Memory -- 5.2 Near‐Field Optical Memory -- 5.3 Three‐Dimensional Optical Memory -- 5.4 Readout Using Infrared Absorption, Raman Scattering, and Refractive Index Changes -- References -- Chapter 6 Switches -- 6.1 Single‐Molecule Conductance Photoswitch -- 6.2 Optical Switch Based on Refractive Index Change -- 6.3 Magnetism -- References -- Chapter 7 Surface Properties -- 7.1 Surface Wettability -- 7.2 Selective Metal Deposition -- 7.3 Subwavelength Nanopatterning -- References -- Chapter 8 Polymers and Liquid Crystals -- 8.1 Polymers -- 8.2 Liquid Crystals -- References -- Chapter 9 Applications -- 9.1 Organic Field‐Effect Transistors (OFETs) -- 9.2 Metal Organic Frameworks (MOFs).
9.3 Super‐Resolution Fluorescence Microscopy -- 9.3.1 Control of Cycloreversion Quantum Yield -- 9.3.2 Fatigue Resistance -- 9.3.3 Photoswitching with Single‐Wavelength Visible Light -- 9.3.4 Super‐Resolution Bioimaging -- 9.4 Chemical Reactivity Control -- 9.5 Biological Activity -- 9.6 Color Dosimeters -- References -- Appendix A Synthesis Procedures of Typical Diarylethenes -- A.1 1,2‐Bis(2,4‐dimethyl‐5‐phenyl‐3‐thienyl)perfluorocyclopentene (7) [5-7] -- A.2 1,2‐Bis(2‐ethyl‐6‐phenyl‐1‐benzothiophene‐1,1‐ dioxide‐3‐yl)‐perfluorocyclopenetene (11) [8-10] -- References -- Index -- EULA.
Record Nr. UNINA-9910555115703321
Irie Masahiro  
Weinheim, Germany : , : Wiley-VCH GmbH, , [2021]
Materiale a stampa
Lo trovi qui: Univ. Federico II
Opac: Controlla la disponibilità qui