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Laser optoelectronic oscillators / / Alexander A. Bortsov, Sergey M. Smolskiy, Yuri B. Il'in
| Laser optoelectronic oscillators / / Alexander A. Bortsov, Sergey M. Smolskiy, Yuri B. Il'in |
| Autore | Bortsov Alexander A. |
| Edizione | [1st ed. 2020.] |
| Pubbl/distr/stampa | Cham, Switzerland : , : Springer, , [2020] |
| Descrizione fisica | 1 online resource (XXXV, 522 p. 203 illus., 5 illus. in color.) |
| Disciplina | 621.381045 |
| Collana | Springer Series in Optical Sciences |
| Soggetto topico |
Optoelectronic devices - Reliability
Lasers |
| ISBN | 3-030-45700-1 |
| Formato | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto | Chapter 1. Introduction -- Chapter 2. Nanostructural Optoelectronic Oscillators with the Fiber-Optical Delay Line -- Chapter 3. Modulation Methods of Laser Emission in Optoelectronic oscillator (OEO) and OEO Differential Equations -- Chapter 4. Semiclassical Theory and Laser Differential Equations for Optoelectronic oscillator (OEO) Analysis. -- Chapter 5. Optoelectronic oscillator (OEO) Differential Equations as the Laser System with Modulation and Positive Feedback -- Chapter 6. Operation Analysis of Optoelectronic oscillator (OEO) with External Mach–Zehnder Modulator. -- Chapter 7. Optoelectronic oscillator (OEO) as the Time and Spatial Correlator of Random Variables with Differential Delay Line -- Chapter 8. Experimental Investigations and Practical Circuits of Optoelectronic oscillator (OEO) with RF FODL. |
| Record Nr. | UNISA-996418444803316 |
Bortsov Alexander A.
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| Cham, Switzerland : , : Springer, , [2020] | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. di Salerno | ||
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LEOS 2006 : 19th annual meeting of the IEEE Lasers and Electro-Optics Society, 2006 ; Oct. 29, 2006 - Nov. 2, 2006, Montreal / / Institute of Electrical and Electronics Engineers
| LEOS 2006 : 19th annual meeting of the IEEE Lasers and Electro-Optics Society, 2006 ; Oct. 29, 2006 - Nov. 2, 2006, Montreal / / Institute of Electrical and Electronics Engineers |
| Pubbl/distr/stampa | Piscataway, NJ : , : IEEE, , 2006 |
| Descrizione fisica | 1 online resource (971 pages) |
| Disciplina | 621.381045 |
| Soggetto topico | Optoelectronic devices |
| ISBN | 1-5090-9079-7 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNINA-9910136312103321 |
| Piscataway, NJ : , : IEEE, , 2006 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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LEOS 2006 : 19th annual meeting of the IEEE Lasers and Electro-Optics Society, 2006 ; Oct. 29, 2006 - Nov. 2, 2006, Montreal / / Institute of Electrical and Electronics Engineers
| LEOS 2006 : 19th annual meeting of the IEEE Lasers and Electro-Optics Society, 2006 ; Oct. 29, 2006 - Nov. 2, 2006, Montreal / / Institute of Electrical and Electronics Engineers |
| Pubbl/distr/stampa | Piscataway, NJ : , : IEEE, , 2006 |
| Descrizione fisica | 1 online resource (971 pages) |
| Disciplina | 621.381045 |
| Soggetto topico | Optoelectronic devices |
| ISBN | 1-5090-9079-7 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNISA-996280981703316 |
| Piscataway, NJ : , : IEEE, , 2006 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. di Salerno | ||
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LEOS 2007 - IEEE Lasers and Electro-Optics Society Annual Meeting Conference Proceedings / / Institute of Electrical and Electronics Engineers
| LEOS 2007 - IEEE Lasers and Electro-Optics Society Annual Meeting Conference Proceedings / / Institute of Electrical and Electronics Engineers |
| Pubbl/distr/stampa | Lake Buena Vista, FL : , : IEEE, , 2007 |
| Descrizione fisica | 1 online resource (946 pages) |
| Disciplina | 621.381045 |
| Soggetto topico | Optoelectronics |
| ISBN | 1-5090-8288-3 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Altri titoli varianti |
Lasers and Electro-Optics Society, 2007. LEOS 2007. The 20th Annual Meeting of the IEEE
Availability, Reliability and Security |
| Record Nr. | UNISA-996197884903316 |
| Lake Buena Vista, FL : , : IEEE, , 2007 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. di Salerno | ||
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LEOS 2007 - IEEE Lasers and Electro-Optics Society Annual Meeting Conference Proceedings / / Institute of Electrical and Electronics Engineers
| LEOS 2007 - IEEE Lasers and Electro-Optics Society Annual Meeting Conference Proceedings / / Institute of Electrical and Electronics Engineers |
| Pubbl/distr/stampa | Lake Buena Vista, FL : , : IEEE, , 2007 |
| Descrizione fisica | 1 online resource (946 pages) |
| Disciplina | 621.381045 |
| Soggetto topico | Optoelectronics |
| ISBN | 1-5090-8288-3 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Altri titoli varianti |
Lasers and Electro-Optics Society, 2007. LEOS 2007. The 20th Annual Meeting of the IEEE
Availability, Reliability and Security |
| Record Nr. | UNINA-9910146721403321 |
| Lake Buena Vista, FL : , : IEEE, , 2007 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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Microoptics [[electronic resource] /] / Stefan Sinzinger, Jürgen Jahns
| Microoptics [[electronic resource] /] / Stefan Sinzinger, Jürgen Jahns |
| Autore | Sinzinger Stefan |
| Edizione | [2nd rev. and enlarged ed.] |
| Pubbl/distr/stampa | Weinheim, : Wiley-VCH, c2003 |
| Descrizione fisica | 1 online resource (453 p.) |
| Disciplina | 621.381045 |
| Altri autori (Persone) | JahnsJurgen <1953-> |
| Soggetto topico |
Integrated optics
Optoelectronic devices Miniature electronic equipment |
| Soggetto genere / forma | Electronic books. |
| ISBN |
1-280-52098-1
9786610520985 3-527-60632-7 3-527-60340-9 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Microoptics; Preface; Foreword to the Second Edition; Contents; 1 From macrooptics to microoptics - an overview; 1.1 Optics technology; 1.2 Classification of optical hardware; 1.3 Optical functions and their implementation; 1.4 Scope of this book; 1.5 Organization of the book; 1.6 Further reading; 1.7 Acknowledgment; References; 2 Optical components with small dimensions; 2.1 Microlens performance; 2.1.1 Diffraction limit; 2.1.2 Aberrations; 2.1.3 Quality criteria for lens performance; 2.2 Scaling - from macro- to micro-components; 2.2.1 Scaling of diffractive and refractive lenses
2.2.2 Scaling of prisms2.3 List of symbols; 2.4 Exercises; References; 3 Lithographic fabrication technology; 3.1 Pattern generation; 3.1.1 Plotting and photoreduction; 3.1.2 Laser beam writing; 3.1.3 X-ray and e-beam writing; 3.1.4 Grey-level masks; 3.1.5 Special masks; 3.2 Coating or thin layer deposition; 3.2.1 Spin coating; 3.2.2 Physical vapour deposition (PVD); 3.2.3 Chemical Vapour Deposition (CVD); 3.3 Alignment and exposure; 3.3.1 Exposure geometry; 3.3.2 Light sources for mask lithography; 3.3.3 Illumination with x-ray (synchrotron) and proton radiation; 3.3.4 Multimask alignment 3.3.5 Through-wafer alignment3.4 Pattern transfer; 3.4.1 Etching; 3.4.2 Laser micromachining - laser initiated ablation; 3.4.3 Mechanical micromachining - diamond turning of microoptical components; 3.4.4 Replication of microrelief structures; 3.4.5 Diffusion - ion-exchange processes; 3.5 Bonding of planar structures; 3.5.1 Flip-chip bonding; 3.5.2 Thermo-anodic bonding; 3.6 List of new symbols; 3.7 Exercises; References; 4 Measurement and characterization of microoptics; 4.1 Physical probing-profilometry; 4.2 Interferometry; 4.2.1 Types of interferometers; 4.2.2 Phase-shifting interferometry 4.2.3 Evaluation of interferometric measurements4.3 Imaging experiments; 4.4 Array testing; 4.5 List of new symbols; 4.6 Exercises; References; 5 Refractive microoptics; 5.1 Surface profile microlenses; 5.1.1 Melted photoresist lenses - reflow lenses; 5.1.2 Microlens fabrication by mass transport mechanisms in semiconductors; 5.1.3 Microlenses formed by volume change of a substrate material; 5.1.4 Lithographically initiated volume growth in PMMA for microlens fabrication; 5.1.5 Dispensed or droplet microlenses; 5.1.6 Direct writing techniques for refractive microoptics 5.1.7 Grey-scale lithography for ROE fabrication5.2 Gradient-index (GRIN) optics; 5.2.1 GRIN rod lenses; 5.2.2 Planar GRIN lenses; 5.3 Microprisms and micromirrors; 5.3.1 Lithography for the fabrication of microprisms; 5.3.2 Micromachining of microprisms using single point diamond turning or embossing; 5.3.3 Anisotropic etching of mirror structures in crystalline materials; 5.4 List of new symbols; 5.5 Exercises; References; 6 Diffractive microoptics; 6.1 Trading spatial resolution for reduced phase thickness; 6.1.1 Blazing and phase quantization 6.1.2 Alternative quantization schemes for microlenses |
| Record Nr. | UNINA-9910146231103321 |
|
Sinzinger Stefan
|
||
| Weinheim, : Wiley-VCH, c2003 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Microoptics [[electronic resource] /] / Stefan Sinzinger, Jürgen Jahns
| Microoptics [[electronic resource] /] / Stefan Sinzinger, Jürgen Jahns |
| Autore | Sinzinger Stefan |
| Edizione | [2nd rev. and enlarged ed.] |
| Pubbl/distr/stampa | Weinheim, : Wiley-VCH, c2003 |
| Descrizione fisica | 1 online resource (453 p.) |
| Disciplina | 621.381045 |
| Altri autori (Persone) | JahnsJurgen <1953-> |
| Soggetto topico |
Integrated optics
Optoelectronic devices Miniature electronic equipment |
| ISBN |
1-280-52098-1
9786610520985 3-527-60632-7 3-527-60340-9 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Microoptics; Preface; Foreword to the Second Edition; Contents; 1 From macrooptics to microoptics - an overview; 1.1 Optics technology; 1.2 Classification of optical hardware; 1.3 Optical functions and their implementation; 1.4 Scope of this book; 1.5 Organization of the book; 1.6 Further reading; 1.7 Acknowledgment; References; 2 Optical components with small dimensions; 2.1 Microlens performance; 2.1.1 Diffraction limit; 2.1.2 Aberrations; 2.1.3 Quality criteria for lens performance; 2.2 Scaling - from macro- to micro-components; 2.2.1 Scaling of diffractive and refractive lenses
2.2.2 Scaling of prisms2.3 List of symbols; 2.4 Exercises; References; 3 Lithographic fabrication technology; 3.1 Pattern generation; 3.1.1 Plotting and photoreduction; 3.1.2 Laser beam writing; 3.1.3 X-ray and e-beam writing; 3.1.4 Grey-level masks; 3.1.5 Special masks; 3.2 Coating or thin layer deposition; 3.2.1 Spin coating; 3.2.2 Physical vapour deposition (PVD); 3.2.3 Chemical Vapour Deposition (CVD); 3.3 Alignment and exposure; 3.3.1 Exposure geometry; 3.3.2 Light sources for mask lithography; 3.3.3 Illumination with x-ray (synchrotron) and proton radiation; 3.3.4 Multimask alignment 3.3.5 Through-wafer alignment3.4 Pattern transfer; 3.4.1 Etching; 3.4.2 Laser micromachining - laser initiated ablation; 3.4.3 Mechanical micromachining - diamond turning of microoptical components; 3.4.4 Replication of microrelief structures; 3.4.5 Diffusion - ion-exchange processes; 3.5 Bonding of planar structures; 3.5.1 Flip-chip bonding; 3.5.2 Thermo-anodic bonding; 3.6 List of new symbols; 3.7 Exercises; References; 4 Measurement and characterization of microoptics; 4.1 Physical probing-profilometry; 4.2 Interferometry; 4.2.1 Types of interferometers; 4.2.2 Phase-shifting interferometry 4.2.3 Evaluation of interferometric measurements4.3 Imaging experiments; 4.4 Array testing; 4.5 List of new symbols; 4.6 Exercises; References; 5 Refractive microoptics; 5.1 Surface profile microlenses; 5.1.1 Melted photoresist lenses - reflow lenses; 5.1.2 Microlens fabrication by mass transport mechanisms in semiconductors; 5.1.3 Microlenses formed by volume change of a substrate material; 5.1.4 Lithographically initiated volume growth in PMMA for microlens fabrication; 5.1.5 Dispensed or droplet microlenses; 5.1.6 Direct writing techniques for refractive microoptics 5.1.7 Grey-scale lithography for ROE fabrication5.2 Gradient-index (GRIN) optics; 5.2.1 GRIN rod lenses; 5.2.2 Planar GRIN lenses; 5.3 Microprisms and micromirrors; 5.3.1 Lithography for the fabrication of microprisms; 5.3.2 Micromachining of microprisms using single point diamond turning or embossing; 5.3.3 Anisotropic etching of mirror structures in crystalline materials; 5.4 List of new symbols; 5.5 Exercises; References; 6 Diffractive microoptics; 6.1 Trading spatial resolution for reduced phase thickness; 6.1.1 Blazing and phase quantization 6.1.2 Alternative quantization schemes for microlenses |
| Record Nr. | UNINA-9910830395003321 |
|
Sinzinger Stefan
|
||
| Weinheim, : Wiley-VCH, c2003 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Microoptics / / Stefan Sinzinger, Jürgen Jahns
| Microoptics / / Stefan Sinzinger, Jürgen Jahns |
| Autore | Sinzinger Stefan |
| Edizione | [2nd rev. and enlarged ed.] |
| Pubbl/distr/stampa | Weinheim, : Wiley-VCH, c2003 |
| Descrizione fisica | 1 online resource (453 p.) |
| Disciplina | 621.381045 |
| Altri autori (Persone) | JahnsJurgen <1953-> |
| Soggetto topico |
Integrated optics
Optoelectronic devices Miniature electronic equipment |
| ISBN |
1-280-52098-1
9786610520985 3-527-60632-7 3-527-60340-9 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Microoptics; Preface; Foreword to the Second Edition; Contents; 1 From macrooptics to microoptics - an overview; 1.1 Optics technology; 1.2 Classification of optical hardware; 1.3 Optical functions and their implementation; 1.4 Scope of this book; 1.5 Organization of the book; 1.6 Further reading; 1.7 Acknowledgment; References; 2 Optical components with small dimensions; 2.1 Microlens performance; 2.1.1 Diffraction limit; 2.1.2 Aberrations; 2.1.3 Quality criteria for lens performance; 2.2 Scaling - from macro- to micro-components; 2.2.1 Scaling of diffractive and refractive lenses
2.2.2 Scaling of prisms2.3 List of symbols; 2.4 Exercises; References; 3 Lithographic fabrication technology; 3.1 Pattern generation; 3.1.1 Plotting and photoreduction; 3.1.2 Laser beam writing; 3.1.3 X-ray and e-beam writing; 3.1.4 Grey-level masks; 3.1.5 Special masks; 3.2 Coating or thin layer deposition; 3.2.1 Spin coating; 3.2.2 Physical vapour deposition (PVD); 3.2.3 Chemical Vapour Deposition (CVD); 3.3 Alignment and exposure; 3.3.1 Exposure geometry; 3.3.2 Light sources for mask lithography; 3.3.3 Illumination with x-ray (synchrotron) and proton radiation; 3.3.4 Multimask alignment 3.3.5 Through-wafer alignment3.4 Pattern transfer; 3.4.1 Etching; 3.4.2 Laser micromachining - laser initiated ablation; 3.4.3 Mechanical micromachining - diamond turning of microoptical components; 3.4.4 Replication of microrelief structures; 3.4.5 Diffusion - ion-exchange processes; 3.5 Bonding of planar structures; 3.5.1 Flip-chip bonding; 3.5.2 Thermo-anodic bonding; 3.6 List of new symbols; 3.7 Exercises; References; 4 Measurement and characterization of microoptics; 4.1 Physical probing-profilometry; 4.2 Interferometry; 4.2.1 Types of interferometers; 4.2.2 Phase-shifting interferometry 4.2.3 Evaluation of interferometric measurements4.3 Imaging experiments; 4.4 Array testing; 4.5 List of new symbols; 4.6 Exercises; References; 5 Refractive microoptics; 5.1 Surface profile microlenses; 5.1.1 Melted photoresist lenses - reflow lenses; 5.1.2 Microlens fabrication by mass transport mechanisms in semiconductors; 5.1.3 Microlenses formed by volume change of a substrate material; 5.1.4 Lithographically initiated volume growth in PMMA for microlens fabrication; 5.1.5 Dispensed or droplet microlenses; 5.1.6 Direct writing techniques for refractive microoptics 5.1.7 Grey-scale lithography for ROE fabrication5.2 Gradient-index (GRIN) optics; 5.2.1 GRIN rod lenses; 5.2.2 Planar GRIN lenses; 5.3 Microprisms and micromirrors; 5.3.1 Lithography for the fabrication of microprisms; 5.3.2 Micromachining of microprisms using single point diamond turning or embossing; 5.3.3 Anisotropic etching of mirror structures in crystalline materials; 5.4 List of new symbols; 5.5 Exercises; References; 6 Diffractive microoptics; 6.1 Trading spatial resolution for reduced phase thickness; 6.1.1 Blazing and phase quantization 6.1.2 Alternative quantization schemes for microlenses |
| Record Nr. | UNINA-9910841748603321 |
|
Sinzinger Stefan
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| Weinheim, : Wiley-VCH, c2003 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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MWP 2018 : 2018 International Topical Meeting on Microwave Photonics : 22-25 October 2018, Toulouse, France / / Institute of Electrical and Electronics Engineers
| MWP 2018 : 2018 International Topical Meeting on Microwave Photonics : 22-25 October 2018, Toulouse, France / / Institute of Electrical and Electronics Engineers |
| Pubbl/distr/stampa | Piscataway, New Jersey : , : Institute of Electrical and Electronics Engineers, , 2018 |
| Descrizione fisica | 1 online resource (846 pages) |
| Disciplina | 621.381045 |
| Soggetto topico |
Optoelectronics
Microwave communication systems |
| ISBN | 1-5386-5226-9 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNISA-996280054403316 |
| Piscataway, New Jersey : , : Institute of Electrical and Electronics Engineers, , 2018 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. di Salerno | ||
| ||
MWP 2018 : 2018 International Topical Meeting on Microwave Photonics : 22-25 October 2018, Toulouse, France / / Institute of Electrical and Electronics Engineers
| MWP 2018 : 2018 International Topical Meeting on Microwave Photonics : 22-25 October 2018, Toulouse, France / / Institute of Electrical and Electronics Engineers |
| Pubbl/distr/stampa | Piscataway, New Jersey : , : Institute of Electrical and Electronics Engineers, , 2018 |
| Descrizione fisica | 1 online resource (846 pages) |
| Disciplina | 621.381045 |
| Soggetto topico |
Optoelectronics
Microwave communication systems |
| ISBN | 1-5386-5226-9 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNINA-9910295814703321 |
| Piscataway, New Jersey : , : Institute of Electrical and Electronics Engineers, , 2018 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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