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ACP : 2016 Asia Communications and Photonics Conference : proceedings : 2-5 November 2016, Wuhan, China / / Institute of Electrical and Electronics Engineers
| ACP : 2016 Asia Communications and Photonics Conference : proceedings : 2-5 November 2016, Wuhan, China / / Institute of Electrical and Electronics Engineers |
| Pubbl/distr/stampa | Piscataway, New Jersey : , : Institute of Electrical and Electronics Engineers, , 2016 |
| Descrizione fisica | 1 online resource (760 pages) |
| Disciplina | 621.36 |
| Soggetto topico |
Photonics
Optical communications |
| ISBN | 0-9600380-0-0 |
| Formato | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNISA-996575388803316 |
| Piscataway, New Jersey : , : Institute of Electrical and Electronics Engineers, , 2016 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. di Salerno | ||
| ||
ACP : 2014 Asia Communications and Photonics Conference : proceedings : 11-14 November 2014, Shanghai, China / / Institute of Electrical and Electronics Engineers
| ACP : 2014 Asia Communications and Photonics Conference : proceedings : 11-14 November 2014, Shanghai, China / / Institute of Electrical and Electronics Engineers |
| Pubbl/distr/stampa | Piscataway, New Jersey : , : Institute of Electrical and Electronics Engineers, , 2014 |
| Descrizione fisica | 1 online resource (280 pages) |
| Disciplina | 621.36 |
| Soggetto topico |
Photonics
Optical communications |
| ISBN | 1-55752-852-7 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNINA-9910318353003321 |
| Piscataway, New Jersey : , : Institute of Electrical and Electronics Engineers, , 2014 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
ACP : 2014 Asia Communications and Photonics Conference : proceedings : 11-14 November 2014, Shanghai, China / / Institute of Electrical and Electronics Engineers
| ACP : 2014 Asia Communications and Photonics Conference : proceedings : 11-14 November 2014, Shanghai, China / / Institute of Electrical and Electronics Engineers |
| Pubbl/distr/stampa | Piscataway, New Jersey : , : Institute of Electrical and Electronics Engineers, , 2014 |
| Descrizione fisica | 1 online resource (280 pages) |
| Disciplina | 621.36 |
| Soggetto topico |
Photonics
Optical communications |
| ISBN | 1-55752-852-7 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNISA-996575393003316 |
| Piscataway, New Jersey : , : Institute of Electrical and Electronics Engineers, , 2014 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. di Salerno | ||
| ||
Active Plasmonic Devices : Based on Magnetoplasmonic Nanostructures / / by Diana Martín Becerra
| Active Plasmonic Devices : Based on Magnetoplasmonic Nanostructures / / by Diana Martín Becerra |
| Autore | Martín Becerra Diana |
| Edizione | [1st ed. 2017.] |
| Pubbl/distr/stampa | Cham : , : Springer International Publishing : , : Imprint : Springer, , 2017 |
| Descrizione fisica | 1 online resource (XXIII, 113 p. 55 illus., 4 illus. in color.) |
| Disciplina | 621.36 |
| Collana | Springer Theses, Recognizing Outstanding Ph.D. Research |
| Soggetto topico |
Lasers
Photonics Surfaces (Physics) Interfaces (Physical sciences) Thin films Nanotechnology Nanoscale science Nanoscience Nanostructures Materials—Surfaces Optics, Lasers, Photonics, Optical Devices Surface and Interface Science, Thin Films Nanoscale Science and Technology Surfaces and Interfaces, Thin Films |
| ISBN | 3-319-48411-7 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto | Motivation and Objectives -- Active Plasmonics and Magnetoplasmonics -- Magnetoplasmonic Interferometry -- Magnetic Modulation of SPP in Au/Co/Au Trilayers -- Sensing Capability of the Interferometers -- Near Field Magnetoplasmonic Interferometry -- General Conclusions. |
| Record Nr. | UNINA-9910151856703321 |
Martín Becerra Diana
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| Cham : , : Springer International Publishing : , : Imprint : Springer, , 2017 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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Adaptive optics for vision science [[electronic resource] ] : principles, practices, design, and applications / / edited by Jason Porter ... [et al.]
| Adaptive optics for vision science [[electronic resource] ] : principles, practices, design, and applications / / edited by Jason Porter ... [et al.] |
| Pubbl/distr/stampa | Hoboken, NJ, : Wiley-Interscience, c2006 |
| Descrizione fisica | 1 online resource (624 p.) |
| Disciplina |
621.36
621.369 |
| Altri autori (Persone) | PorterJason |
| Collana | Wiley series in microwave and optical engineering |
| Soggetto topico | Optics, Adaptive |
| Soggetto genere / forma | Electronic books. |
| ISBN |
1-280-51754-9
9786610517541 0-470-36040-2 0-471-91464-9 0-471-91487-8 1-60119-091-3 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Adaptive Optics for Vision Science; Contents; FOREWORD; ACKNOWLEDGMENTS; CONTRIBUTORS; PART ONE INTRODUCTION; 1 Development of Adaptive Optics in Vision Science and Ophthalmology; 1.1 Brief History of Aberration Correction in the Human Eye; 1.1.1 Vision Correction; 1.1.2 Retinal Imaging; 1.2 Applications of Ocular Adaptive Optics; 1.2.1 Vision Correction; 1.2.2 Retinal Imaging; PART TWO WAVEFRONT MEASUREMENT AND CORRECTION; 2 Aberration Structure of the Human Eye; 2.1 Introduction; 2.2 Location of Monochromatic Aberrations Within the Eye
2.3 Temporal Properties of Aberrations: Accommodation and Aging2.3.1 Effect of Accommodation on Aberrations and Their Correction; 2.3.2 Aging and Aberrations; 2.4 Chromatic Aberrations; 2.4.1 Longitudinal Chromatic Aberration; 2.4.2 Transverse Chromatic Aberration; 2.4.3 Interaction Between Monochromatic and Chromatic Aberrations; 2.5 Off-Axis Aberrations; 2.5.1 Peripheral Refraction; 2.5.2 Monochromatic and Chromatic Off-Axis Aberrations; 2.5.3 Monochromatic Image Quality and Correction of Off-Axis Aberrations; 2.6 Statistics of Aberrations in Normal Populations 2.7 Effects of Polarization and Scatter2.7.1 Impact of Polarization on the Ocular Aberrations; 2.7.2 Intraocular Scatter; 3 Wavefront Sensing and Diagnostic Uses; 3.1 Wavefront Sensors for the Eye; 3.1.1 Spatially Resolved Refractometer; 3.1.2 Laser Ray Tracing; 3.1.3 Shack-Hartmann Wavefront Sensor; 3.2 Optimizing a Shack-Hartmann Wavefront Sensor; 3.2.1 Number of Lenslets Versus Number of Zernike Coefficients; 3.2.2 Trade-off Between Dynamic Range and Measurement Sensitivity; 3.2.3 Focal Length of the Lenslet Array 3.2.4 Increasing the Dynamic Range of a Wavefront Sensor Without Losing Measurement Sensitivity3.3 Calibration of a Wavefront Sensor; 3.3.1 Reconstruction Algorithm; 3.3.2 System Aberrations; 3.4 Summary; 4 Wavefront Correctors for Vision Science; 4.1 Introduction; 4.2 Principal Components of an AO System; 4.3 Wavefront Correctors; 4.4 Wavefront Correctors Used in Vision Science; 4.4.1 Macroscopic Discrete Actuator Deformable Mirrors; 4.4.2 Liquid Crystal Spatial Light Modulators; 4.4.3 Bimorph Mirrors; 4.4.4 Microelectromechanical Systems 4.5 Performance Predictions for Various Types of Wavefront Correctors4.5.1 Description of Two Large Populations; 4.5.2 Required Corrector Stroke; 4.5.3 Discrete Actuator Deformable Mirrors; 4.5.4 Piston-Only Segmented Mirrors; 4.5.5 Piston/Tip/Tilt Segmented Mirrors; 4.5.6 Membrane and Bimorph Mirrors; 4.6 Summary and Conclusion; 5 Control Algorithms; 5.1 Introduction; 5.2 Configuration of Lenslets and Actuators; 5.3 Influence Function Measurement; 5.4 Spatial Control Command of the Wavefront Corrector; 5.4.1 Control Matrix for the Direct Slope Algorithm; 5.4.2 Modal Wavefront Correction 5.4.3 Wave Aberration Generator |
| Record Nr. | UNINA-9910142431903321 |
| Hoboken, NJ, : Wiley-Interscience, c2006 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Adaptive optics for vision science [[electronic resource] ] : principles, practices, design, and applications / / edited by Jason Porter ... [et al.]
| Adaptive optics for vision science [[electronic resource] ] : principles, practices, design, and applications / / edited by Jason Porter ... [et al.] |
| Pubbl/distr/stampa | Hoboken, NJ, : Wiley-Interscience, c2006 |
| Descrizione fisica | 1 online resource (624 p.) |
| Disciplina |
621.36
621.369 |
| Altri autori (Persone) | PorterJason |
| Collana | Wiley series in microwave and optical engineering |
| Soggetto topico | Optics, Adaptive |
| ISBN |
1-280-51754-9
9786610517541 0-470-36040-2 0-471-91464-9 0-471-91487-8 1-60119-091-3 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Adaptive Optics for Vision Science; Contents; FOREWORD; ACKNOWLEDGMENTS; CONTRIBUTORS; PART ONE INTRODUCTION; 1 Development of Adaptive Optics in Vision Science and Ophthalmology; 1.1 Brief History of Aberration Correction in the Human Eye; 1.1.1 Vision Correction; 1.1.2 Retinal Imaging; 1.2 Applications of Ocular Adaptive Optics; 1.2.1 Vision Correction; 1.2.2 Retinal Imaging; PART TWO WAVEFRONT MEASUREMENT AND CORRECTION; 2 Aberration Structure of the Human Eye; 2.1 Introduction; 2.2 Location of Monochromatic Aberrations Within the Eye
2.3 Temporal Properties of Aberrations: Accommodation and Aging2.3.1 Effect of Accommodation on Aberrations and Their Correction; 2.3.2 Aging and Aberrations; 2.4 Chromatic Aberrations; 2.4.1 Longitudinal Chromatic Aberration; 2.4.2 Transverse Chromatic Aberration; 2.4.3 Interaction Between Monochromatic and Chromatic Aberrations; 2.5 Off-Axis Aberrations; 2.5.1 Peripheral Refraction; 2.5.2 Monochromatic and Chromatic Off-Axis Aberrations; 2.5.3 Monochromatic Image Quality and Correction of Off-Axis Aberrations; 2.6 Statistics of Aberrations in Normal Populations 2.7 Effects of Polarization and Scatter2.7.1 Impact of Polarization on the Ocular Aberrations; 2.7.2 Intraocular Scatter; 3 Wavefront Sensing and Diagnostic Uses; 3.1 Wavefront Sensors for the Eye; 3.1.1 Spatially Resolved Refractometer; 3.1.2 Laser Ray Tracing; 3.1.3 Shack-Hartmann Wavefront Sensor; 3.2 Optimizing a Shack-Hartmann Wavefront Sensor; 3.2.1 Number of Lenslets Versus Number of Zernike Coefficients; 3.2.2 Trade-off Between Dynamic Range and Measurement Sensitivity; 3.2.3 Focal Length of the Lenslet Array 3.2.4 Increasing the Dynamic Range of a Wavefront Sensor Without Losing Measurement Sensitivity3.3 Calibration of a Wavefront Sensor; 3.3.1 Reconstruction Algorithm; 3.3.2 System Aberrations; 3.4 Summary; 4 Wavefront Correctors for Vision Science; 4.1 Introduction; 4.2 Principal Components of an AO System; 4.3 Wavefront Correctors; 4.4 Wavefront Correctors Used in Vision Science; 4.4.1 Macroscopic Discrete Actuator Deformable Mirrors; 4.4.2 Liquid Crystal Spatial Light Modulators; 4.4.3 Bimorph Mirrors; 4.4.4 Microelectromechanical Systems 4.5 Performance Predictions for Various Types of Wavefront Correctors4.5.1 Description of Two Large Populations; 4.5.2 Required Corrector Stroke; 4.5.3 Discrete Actuator Deformable Mirrors; 4.5.4 Piston-Only Segmented Mirrors; 4.5.5 Piston/Tip/Tilt Segmented Mirrors; 4.5.6 Membrane and Bimorph Mirrors; 4.6 Summary and Conclusion; 5 Control Algorithms; 5.1 Introduction; 5.2 Configuration of Lenslets and Actuators; 5.3 Influence Function Measurement; 5.4 Spatial Control Command of the Wavefront Corrector; 5.4.1 Control Matrix for the Direct Slope Algorithm; 5.4.2 Modal Wavefront Correction 5.4.3 Wave Aberration Generator |
| Record Nr. | UNINA-9910829863203321 |
| Hoboken, NJ, : Wiley-Interscience, c2006 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Adaptive optics for vision science [[electronic resource] ] : principles, practices, design, and applications / / edited by Jason Porter ... [et al.]
| Adaptive optics for vision science [[electronic resource] ] : principles, practices, design, and applications / / edited by Jason Porter ... [et al.] |
| Pubbl/distr/stampa | Hoboken, NJ, : Wiley-Interscience, c2006 |
| Descrizione fisica | 1 online resource (624 p.) |
| Disciplina |
621.36
621.369 |
| Altri autori (Persone) | PorterJason |
| Collana | Wiley series in microwave and optical engineering |
| Soggetto topico | Optics, Adaptive |
| ISBN |
1-280-51754-9
9786610517541 0-470-36040-2 0-471-91464-9 0-471-91487-8 1-60119-091-3 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Adaptive Optics for Vision Science; Contents; FOREWORD; ACKNOWLEDGMENTS; CONTRIBUTORS; PART ONE INTRODUCTION; 1 Development of Adaptive Optics in Vision Science and Ophthalmology; 1.1 Brief History of Aberration Correction in the Human Eye; 1.1.1 Vision Correction; 1.1.2 Retinal Imaging; 1.2 Applications of Ocular Adaptive Optics; 1.2.1 Vision Correction; 1.2.2 Retinal Imaging; PART TWO WAVEFRONT MEASUREMENT AND CORRECTION; 2 Aberration Structure of the Human Eye; 2.1 Introduction; 2.2 Location of Monochromatic Aberrations Within the Eye
2.3 Temporal Properties of Aberrations: Accommodation and Aging2.3.1 Effect of Accommodation on Aberrations and Their Correction; 2.3.2 Aging and Aberrations; 2.4 Chromatic Aberrations; 2.4.1 Longitudinal Chromatic Aberration; 2.4.2 Transverse Chromatic Aberration; 2.4.3 Interaction Between Monochromatic and Chromatic Aberrations; 2.5 Off-Axis Aberrations; 2.5.1 Peripheral Refraction; 2.5.2 Monochromatic and Chromatic Off-Axis Aberrations; 2.5.3 Monochromatic Image Quality and Correction of Off-Axis Aberrations; 2.6 Statistics of Aberrations in Normal Populations 2.7 Effects of Polarization and Scatter2.7.1 Impact of Polarization on the Ocular Aberrations; 2.7.2 Intraocular Scatter; 3 Wavefront Sensing and Diagnostic Uses; 3.1 Wavefront Sensors for the Eye; 3.1.1 Spatially Resolved Refractometer; 3.1.2 Laser Ray Tracing; 3.1.3 Shack-Hartmann Wavefront Sensor; 3.2 Optimizing a Shack-Hartmann Wavefront Sensor; 3.2.1 Number of Lenslets Versus Number of Zernike Coefficients; 3.2.2 Trade-off Between Dynamic Range and Measurement Sensitivity; 3.2.3 Focal Length of the Lenslet Array 3.2.4 Increasing the Dynamic Range of a Wavefront Sensor Without Losing Measurement Sensitivity3.3 Calibration of a Wavefront Sensor; 3.3.1 Reconstruction Algorithm; 3.3.2 System Aberrations; 3.4 Summary; 4 Wavefront Correctors for Vision Science; 4.1 Introduction; 4.2 Principal Components of an AO System; 4.3 Wavefront Correctors; 4.4 Wavefront Correctors Used in Vision Science; 4.4.1 Macroscopic Discrete Actuator Deformable Mirrors; 4.4.2 Liquid Crystal Spatial Light Modulators; 4.4.3 Bimorph Mirrors; 4.4.4 Microelectromechanical Systems 4.5 Performance Predictions for Various Types of Wavefront Correctors4.5.1 Description of Two Large Populations; 4.5.2 Required Corrector Stroke; 4.5.3 Discrete Actuator Deformable Mirrors; 4.5.4 Piston-Only Segmented Mirrors; 4.5.5 Piston/Tip/Tilt Segmented Mirrors; 4.5.6 Membrane and Bimorph Mirrors; 4.6 Summary and Conclusion; 5 Control Algorithms; 5.1 Introduction; 5.2 Configuration of Lenslets and Actuators; 5.3 Influence Function Measurement; 5.4 Spatial Control Command of the Wavefront Corrector; 5.4.1 Control Matrix for the Direct Slope Algorithm; 5.4.2 Modal Wavefront Correction 5.4.3 Wave Aberration Generator |
| Record Nr. | UNINA-9910840566203321 |
| Hoboken, NJ, : Wiley-Interscience, c2006 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Advanced Electromagnetic Materials in Microwaves and Optics (METAMATERIALS), 2013 7th International Congress on . Part 111 Overhead, Pad-Mounted, Dry Vault, and Submersible Automatic Circuit Reclosers and Fault Interrupters for Alternating Current Systems up to 38 kV / / Institute of Electrical and Electronics Engineers
| Advanced Electromagnetic Materials in Microwaves and Optics (METAMATERIALS), 2013 7th International Congress on . Part 111 Overhead, Pad-Mounted, Dry Vault, and Submersible Automatic Circuit Reclosers and Fault Interrupters for Alternating Current Systems up to 38 kV / / Institute of Electrical and Electronics Engineers |
| Pubbl/distr/stampa | Piscataway, NJ : , : IEEE, , 2013 |
| Descrizione fisica | 1 online resource |
| Disciplina | 621.36 |
| Soggetto topico | Optics |
| ISBN | 1-4799-1232-8 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Altri titoli varianti |
2013 7th International Congress on Advanced Electromagnetic Materials in Microwaves and Optics
Advanced Electromagnetic Materials in Microwaves and Optics |
| Record Nr. | UNISA-996279732003316 |
| Piscataway, NJ : , : IEEE, , 2013 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. di Salerno | ||
| ||
Advanced Electromagnetic Materials in Microwaves and Optics (METAMATERIALS), 2013 7th International Congress on . Part 111 Overhead, Pad-Mounted, Dry Vault, and Submersible Automatic Circuit Reclosers and Fault Interrupters for Alternating Current Systems up to 38 kV / / Institute of Electrical and Electronics Engineers
| Advanced Electromagnetic Materials in Microwaves and Optics (METAMATERIALS), 2013 7th International Congress on . Part 111 Overhead, Pad-Mounted, Dry Vault, and Submersible Automatic Circuit Reclosers and Fault Interrupters for Alternating Current Systems up to 38 kV / / Institute of Electrical and Electronics Engineers |
| Pubbl/distr/stampa | Piscataway, NJ : , : IEEE, , 2013 |
| Descrizione fisica | 1 online resource |
| Disciplina | 621.36 |
| Soggetto topico | Optics |
| ISBN | 1-4799-1232-8 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Altri titoli varianti |
2013 7th International Congress on Advanced Electromagnetic Materials in Microwaves and Optics
Advanced Electromagnetic Materials in Microwaves and Optics |
| Record Nr. | UNINA-9910140444003321 |
| Piscataway, NJ : , : IEEE, , 2013 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Advanced Functional Materials : Proceedings of Chinese Materials Conference 2017 / Yafang Han editor
| Advanced Functional Materials : Proceedings of Chinese Materials Conference 2017 / Yafang Han editor |
| Pubbl/distr/stampa | Singapore, : Springer, 2018 |
| Descrizione fisica | XVI, 973 p. : ill. ; 24 cm |
| Disciplina |
621.36(Ingegneria ottica. Ottica applicata)
620.11(Materiali dell'ingegneria) 620.192(Polimeri) 620.1(Scienze dei materiali) 620.14(Ceramica e materiali affini) |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNICAMPANIA-VAN0125467 |
| Singapore, : Springer, 2018 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Vanvitelli | ||
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