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Plasma processing and processing science [[electronic resource] /] / Panel on Plasma Processing, Naval Studies Board, Commission on Physical Sciences, Mathematics, and Applications, National Research Council
| Plasma processing and processing science [[electronic resource] /] / Panel on Plasma Processing, Naval Studies Board, Commission on Physical Sciences, Mathematics, and Applications, National Research Council |
| Pubbl/distr/stampa | Washington, D.C., : National Academy Press, 1995 |
| Descrizione fisica | 1 online resource (45 p.) |
| Disciplina | 621.044 |
| Altri autori (Persone) | ChenFrancis F. <1929-> |
| Collana | NRL strategic series |
| Soggetto topico |
Plasma engineering
Semiconductors - Etching Plasma etching |
| Formato | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
""Plasma Processing and Processing Science""; ""Copyright""; ""Preface""; ""Contents""; ""Chapter 1 Introduction and Summary""; ""Chapter 2 Modeling and Simulation of Plasma Processing""; ""RESEARCH OPPORTUNITIES""; ""Requirements of the Microelectronics Fabrication Industry""; ""Multidimensional Models""; ""Plasma Chemistry""; ""Surface Chemistry""; ""Electromagnetics""; ""Current Status of Modeling and Simulation""; ""Particle-in-Cell Simulations""; ""Kinetic Models""; ""Fluid or Hydrodynamic Models""; ""Hybrid Models""; ""A ROLE FOR NRL""; ""Chapter 3 Semiconductor Processing""
""RESEARCH OPPORTUNITIES""""A ROLE FOR NRL""; ""Development and Characterization of Precompetitive Materials and Processes""; ""Comparative Analysis and Characterization of Tools and Processes in Development""; ""Sensor Development for Control and Fingerprinting of Manufacturing Processes""; ""Chapter 4 Plasma Deposition and Polymerization""; ""RESEARCH OPPORTUNITIES""; ""Semiconductor Fabrication""; ""Barrier Coatings""; ""Fibrous Materials""; ""Optical Coatings and Photonics""; ""Plasma Polymerization""; ""A ROLE FOR NRL""; ""Chapter 5 Ion Implantation and Surface Modification"" ""RESEARCH OPPORTUNITIES""""Introduction""; ""Plasma and Ion Beam Implantation Technology""; ""Ion Beam Implantation""; ""Plasma Source Ion Implantation""; ""Applications""; ""Implantation of Metals""; ""Implantation of Nonmetals""; ""A ROLE FOR NRL""; ""Chapter 6 Thermal Plasmas""; ""RESEARCH OPPORTUNITIES""; ""Introduction""; ""Plasma Spraying""; ""Plasma Chemical Vapor Deposition""; ""Plasma Waste Destruction""; ""Plasma Metallurgy""; ""Thermal Plasma Synthesis""; ""Plasma Consolidation""; ""A ROLE FOR NRL""; ""Thermal Plasma Waste Destruction""; ""Plasma Chemical Vapor Deposition"" ""Diamond Films""""Cubic Boron Nitride Films""; ""Carbon Nitride""; ""Chapter 7 Flat Panel Displays""; ""RESEARCH OPPORTUNITIES""; ""Introduction""; ""Passive Matrix Liquid Crystal Display""; ""Active Matrix Liquid Crystal Display""; ""Amorphous Silicon""; ""Polycrystalline Silicon""; ""Transfer Silicon""; ""Thin Film Electroluminescent Displays""; ""Digital Micromirror Devices""; ""Plasma Displays""; ""Field Emission Displays""; ""A ROLE FOR NRL""; ""Chapter 8 Low-Temperature Plasma Physics""; ""RESEARCH OPPORTUNITIES""; ""A ROLE FOR NRL""; ""Chapter 9 Conclusions and Recommendations"" ""RECOMMENDATION FOR A PROGRAM IN PLASMA PROCESSING AND PROCESSING SCIENCE""""CONCLUSIONS BASED ON NRL'S PRESENT RESEARCH CAPABILITIES"" |
| Record Nr. | UNINA-9910777418303321 |
| Washington, D.C., : National Academy Press, 1995 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Plasma processing and processing science [[electronic resource] /] / Panel on Plasma Processing, Naval Studies Board, Commission on Physical Sciences, Mathematics, and Applications, National Research Council
| Plasma processing and processing science [[electronic resource] /] / Panel on Plasma Processing, Naval Studies Board, Commission on Physical Sciences, Mathematics, and Applications, National Research Council |
| Pubbl/distr/stampa | Washington, D.C., : National Academy Press, 1995 |
| Descrizione fisica | 1 online resource (45 p.) |
| Disciplina | 621.044 |
| Altri autori (Persone) | ChenFrancis F. <1929-> |
| Collana | NRL strategic series |
| Soggetto topico |
Plasma engineering
Semiconductors - Etching Plasma etching |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
""Plasma Processing and Processing Science""; ""Copyright""; ""Preface""; ""Contents""; ""Chapter 1 Introduction and Summary""; ""Chapter 2 Modeling and Simulation of Plasma Processing""; ""RESEARCH OPPORTUNITIES""; ""Requirements of the Microelectronics Fabrication Industry""; ""Multidimensional Models""; ""Plasma Chemistry""; ""Surface Chemistry""; ""Electromagnetics""; ""Current Status of Modeling and Simulation""; ""Particle-in-Cell Simulations""; ""Kinetic Models""; ""Fluid or Hydrodynamic Models""; ""Hybrid Models""; ""A ROLE FOR NRL""; ""Chapter 3 Semiconductor Processing""
""RESEARCH OPPORTUNITIES""""A ROLE FOR NRL""; ""Development and Characterization of Precompetitive Materials and Processes""; ""Comparative Analysis and Characterization of Tools and Processes in Development""; ""Sensor Development for Control and Fingerprinting of Manufacturing Processes""; ""Chapter 4 Plasma Deposition and Polymerization""; ""RESEARCH OPPORTUNITIES""; ""Semiconductor Fabrication""; ""Barrier Coatings""; ""Fibrous Materials""; ""Optical Coatings and Photonics""; ""Plasma Polymerization""; ""A ROLE FOR NRL""; ""Chapter 5 Ion Implantation and Surface Modification"" ""RESEARCH OPPORTUNITIES""""Introduction""; ""Plasma and Ion Beam Implantation Technology""; ""Ion Beam Implantation""; ""Plasma Source Ion Implantation""; ""Applications""; ""Implantation of Metals""; ""Implantation of Nonmetals""; ""A ROLE FOR NRL""; ""Chapter 6 Thermal Plasmas""; ""RESEARCH OPPORTUNITIES""; ""Introduction""; ""Plasma Spraying""; ""Plasma Chemical Vapor Deposition""; ""Plasma Waste Destruction""; ""Plasma Metallurgy""; ""Thermal Plasma Synthesis""; ""Plasma Consolidation""; ""A ROLE FOR NRL""; ""Thermal Plasma Waste Destruction""; ""Plasma Chemical Vapor Deposition"" ""Diamond Films""""Cubic Boron Nitride Films""; ""Carbon Nitride""; ""Chapter 7 Flat Panel Displays""; ""RESEARCH OPPORTUNITIES""; ""Introduction""; ""Passive Matrix Liquid Crystal Display""; ""Active Matrix Liquid Crystal Display""; ""Amorphous Silicon""; ""Polycrystalline Silicon""; ""Transfer Silicon""; ""Thin Film Electroluminescent Displays""; ""Digital Micromirror Devices""; ""Plasma Displays""; ""Field Emission Displays""; ""A ROLE FOR NRL""; ""Chapter 8 Low-Temperature Plasma Physics""; ""RESEARCH OPPORTUNITIES""; ""A ROLE FOR NRL""; ""Chapter 9 Conclusions and Recommendations"" ""RECOMMENDATION FOR A PROGRAM IN PLASMA PROCESSING AND PROCESSING SCIENCE""""CONCLUSIONS BASED ON NRL'S PRESENT RESEARCH CAPABILITIES"" |
| Record Nr. | UNINA-9910828377903321 |
| Washington, D.C., : National Academy Press, 1995 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Plasma processing of materials [[electronic resource] ] : scientific opportunities and technological challenges / / Panel on Plasma Processing of Materials, Plasma Science Committee, Board on Physics and Astronomy, Commission on Physical Sciences, Mathematics, and Applications, National Research Council
| Plasma processing of materials [[electronic resource] ] : scientific opportunities and technological challenges / / Panel on Plasma Processing of Materials, Plasma Science Committee, Board on Physics and Astronomy, Commission on Physical Sciences, Mathematics, and Applications, National Research Council |
| Pubbl/distr/stampa | Washington, D.C., : National Academy Press, 1991 |
| Descrizione fisica | 1 online resource (87 p.) |
| Disciplina | 621.044 |
| Soggetto topico |
Plasma engineering
Microelectronics - Materials - Effect of radiation on Surfaces (Technology) |
| Soggetto genere / forma | Electronic books. |
| ISBN |
1-280-20336-6
9786610203369 0-309-58375-6 0-585-08463-7 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNINA-9910456249303321 |
| Washington, D.C., : National Academy Press, 1991 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Plasma processing of materials [[electronic resource] ] : scientific opportunities and technological challenges / / Panel on Plasma Processing of Materials, Plasma Science Committee, Board on Physics and Astronomy, Commission on Physical Sciences, Mathematics, and Applications, National Research Council
| Plasma processing of materials [[electronic resource] ] : scientific opportunities and technological challenges / / Panel on Plasma Processing of Materials, Plasma Science Committee, Board on Physics and Astronomy, Commission on Physical Sciences, Mathematics, and Applications, National Research Council |
| Pubbl/distr/stampa | Washington, D.C., : National Academy Press, 1991 |
| Descrizione fisica | 1 online resource (87 p.) |
| Disciplina | 621.044 |
| Soggetto topico |
Plasma engineering
Microelectronics - Materials - Effect of radiation on Surfaces (Technology) |
| ISBN |
1-280-20336-6
9786610203369 0-309-58375-6 0-585-08463-7 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNINA-9910778507903321 |
| Washington, D.C., : National Academy Press, 1991 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Plasma processing of materials [[electronic resource] ] : scientific opportunities and technological challenges / / Panel on Plasma Processing of Materials, Plasma Science Committee, Board on Physics and Astronomy, Commission on Physical Sciences, Mathematics, and Applications, National Research Council
| Plasma processing of materials [[electronic resource] ] : scientific opportunities and technological challenges / / Panel on Plasma Processing of Materials, Plasma Science Committee, Board on Physics and Astronomy, Commission on Physical Sciences, Mathematics, and Applications, National Research Council |
| Pubbl/distr/stampa | Washington, D.C., : National Academy Press, 1991 |
| Descrizione fisica | 1 online resource (87 p.) |
| Disciplina | 621.044 |
| Soggetto topico |
Plasma engineering
Microelectronics - Materials - Effect of radiation on Surfaces (Technology) |
| ISBN |
1-280-20336-6
9786610203369 0-309-58375-6 0-585-08463-7 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNINA-9910817008203321 |
| Washington, D.C., : National Academy Press, 1991 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Plasma Science Record Abstracts, 2000 International Conference
| Plasma Science Record Abstracts, 2000 International Conference |
| Pubbl/distr/stampa | [Place of publication not identified], : I E E E, 2000 |
| Descrizione fisica | 1 online resource (298 pages) |
| Disciplina | 621.044 |
| Soggetto topico | Plasma engineering |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNISA-996218188603316 |
| [Place of publication not identified], : I E E E, 2000 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. di Salerno | ||
| ||
Plasma surface engineering : proceedings of the 2nd International conference on plasma surface engineering : P.S.E. '90 : Garmisch, Germany, September 10-14, 1990 / E. Broszeit ... [et al.] editors
| Plasma surface engineering : proceedings of the 2nd International conference on plasma surface engineering : P.S.E. '90 : Garmisch, Germany, September 10-14, 1990 / E. Broszeit ... [et al.] editors |
| Autore | International conference on plasma surface engineering : 2. : 1990 |
| Pubbl/distr/stampa | Amsterdam [etc.] : Elsevier, 1991 |
| Disciplina | 621.044 |
| Soggetto non controllato | ingegneria del plasma |
| ISBN | 0-444-89279-6 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNISA-990000167550203316 |
International conference on plasma surface engineering : 2. : 1990
|
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| Amsterdam [etc.] : Elsevier, 1991 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. di Salerno | ||
| ||
Plasma technologies for textile and apparel / / edited by S.K. Nema and P.B. Jhala
| Plasma technologies for textile and apparel / / edited by S.K. Nema and P.B. Jhala |
| Pubbl/distr/stampa | New Delhi : , : Woodhead Publishing India |
| Descrizione fisica | 1 online resource (382 p.) |
| Disciplina | 621.044 |
| Collana | Woodhead Publishing India in Textiles |
| Soggetto topico |
Plasma engineering
Textile industry |
| Soggetto genere / forma | Electronic books. |
| ISBN |
0-429-08354-8
93-80308-95-7 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Front Cover; Contents; Preface; Foreword; Contributors; 1. Basics of plasma and its industrialapplications in textiles; 2. Atmospheric pressure plasma processingof textiles at FCIPT; 3. Atmospheric pressure plasma polymerization of HMDSO on different textile fibres and their studies; 4. In-situ plasma reactions for hydrophobicfunctionalization of textiles; 5. In-situ plasma reactions for hydrophilicfunctionalization of textile substrates; 6. Plasma processing of textiles to enhancetheir dyeing and surface properties
7. Next to skin easy care woolens by plasma andother eco-friendly technologies8. Low pressure air plasma for processingof silk textiles; 9. RF plasma treatment of Muga silkand its characterization; 10. Cold plasma for dry processing, functionalization and finishing of textile materials; 11. Nanotitania synthesis and its integration intextiles using plasma technology; 12. Plasma textile technology status, techno-economics, limitations and industrial usage potential |
| Record Nr. | UNINA-9910459222203321 |
| New Delhi : , : Woodhead Publishing India | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Plasma technology for hyperfunctional surfaces [[electronic resource] ] : food, biomedical and textile applications / / edited by Hubert Rauscher, Massimo Perucca, Guy Buyle
| Plasma technology for hyperfunctional surfaces [[electronic resource] ] : food, biomedical and textile applications / / edited by Hubert Rauscher, Massimo Perucca, Guy Buyle |
| Pubbl/distr/stampa | Weinheim, : Wiley-VCH, 2010 |
| Descrizione fisica | 1 online resource (428 p.) |
| Disciplina | 621.044 |
| Altri autori (Persone) |
RauscherHubert
PeruccaMassimo BuyleGuy |
| Soggetto topico |
Plasma devices
Surfaces (Technology) Hyperfunctions |
| Soggetto genere / forma | Electronic books. |
| ISBN |
1-283-14046-2
9786613140463 3-527-63045-7 3-527-63046-5 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Plasma Technology for Hyperfunctional Surfaces; Contents; Preface; List of Contributors; List of Contacts; Part I Introduction to Plasma Technology for Surface Functionalization; 1 Introduction to Plasma and Plasma Technology; 1.1 Plasma: the Fourth State of Matter; 1.2 Historical Highlights; 1.3 Plasma Fundamentals; 1.3.1 Free Ideal Gas; 1.3.2 Interacting Gas; 1.3.3 The Plasma as a Fluid; 1.3.4 Waves in Plasmas; 1.3.5 Relevant Parameters that Characterize the State of Plasma; 1.4 Classification of Technological Plasmas; 1.4.1 Hot (Thermal) Plasmas and Their Applications
1.4.2 Cold (Nonthermal) Plasmas and Their Applications1.5 Reactive Plasmas; 1.5.1 Elementary Plasma-Chemical Reactions; 1.5.2 Elastic Scattering and Inelastic Thomson Scattering: Ionization Cross-section; 1.5.3 Molecular Ionization Mechanisms; 1.5.4 Stepwise Ionization by Electron Impact; 1.6 Plasma Sheaths; 1.7 Summary; References; 2 Plasma Systems for Surface Treatment; 2.1 Introduction; 2.2 Low Pressure Plasma Systems; 2.2.1 Microwave Systems; 2.2.1.1 Introduction; 2.2.1.2 Standard Microwave System for Textile Treatment; 2.2.1.3 Example: Duo-Plasmaline-a Linearly Extended Plasma Source 2.2.1.4 Electron Cyclotron Resonance Heated Plasmas2.2.2 Capacitively Coupled Systems; 2.2.2.1 Introduction; 2.2.2.2 Capacitive Coupled Plasma for Biomedical Applications; 2.2.3 Physical Vapor Deposition Plasma: LARC; 2.2.3.1 Background; 2.2.3.2 Cathodic Arc PVD Systems; 2.2.3.3 Example: Treatment of Food Processing Tools by LARCPVD System; 2.3 Atmospheric Pressure Plasma Systems; 2.3.1 Corona-type Surface Treatment; 2.3.1.1 Standard Corona Treatment; 2.3.1.2 Controlled Atmosphere Corona Treatment-Aldyne Treatment; 2.3.1.3 Liquid Deposition; 2.3.2 Remote Surface Treatment 2.3.2.1 Plasma Sources Used for Modeling2.3.2.2 Example: AcXys Plasma; 2.4 Summary; Acknowledgment; References; 3 Plasma-surface Interaction; 3.1 Introduction; 3.2 Polymer Etching; 3.3 Plasma Grafting; 3.4 Chemical Kinetics; 3.4.1 Chain Polymerization; 3.4.2 Plasma Polymerization; 3.5 Example: Plasma Polymerization; 3.5.1 Plasma Polymerization of HEMA; 3.5.1.1 Theoretical Background; 3.5.1.2 Example: Polymerization of HEMA on PET Fabric; 3.5.2 Plasma Polymerization of HDMSO; 3.6 Conclusion; References; 4 Process Diagnostics by Optical Emission Spectroscopy; 4.1 Introduction 4.2 Optical Emission Spectroscopy4.2.1 Theory of Optical Emission; 4.2.2 Spectroscopy; 4.2.3 OES Bench and Set-up; 4.3 Optical Absorption Spectroscopy; 4.3.1 Actinometry; 4.4 Laser Induced Fluorescence (LIF); 4.5 Conclusion; References; 5 Surface Analysis for Plasma Treatment Characterization; 5.1 Introduction to Surface Characterization Techniques; 5.2 X-ray Photoelectron Spectroscopy (XPS) or Electron Spectroscopy for Chemical Analysis (ESCA); 5.2.1 Principles of XPS; 5.2.2 XPS Core Level Chemical Shift; 5.2.3 Quantitative Analysis 5.2.4 Quantitative Analysis of Nitrogen Plasma-Treated Polypropylene |
| Record Nr. | UNINA-9910140558203321 |
| Weinheim, : Wiley-VCH, 2010 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Plasma technology for hyperfunctional surfaces [[electronic resource] ] : food, biomedical and textile applications / / edited by Hubert Rauscher, Massimo Perucca, Guy Buyle
| Plasma technology for hyperfunctional surfaces [[electronic resource] ] : food, biomedical and textile applications / / edited by Hubert Rauscher, Massimo Perucca, Guy Buyle |
| Pubbl/distr/stampa | Weinheim, : Wiley-VCH, 2010 |
| Descrizione fisica | 1 online resource (428 p.) |
| Disciplina | 621.044 |
| Altri autori (Persone) |
RauscherHubert
PeruccaMassimo BuyleGuy |
| Soggetto topico |
Plasma devices
Surfaces (Technology) Hyperfunctions |
| ISBN |
1-283-14046-2
9786613140463 3-527-63045-7 3-527-63046-5 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Plasma Technology for Hyperfunctional Surfaces; Contents; Preface; List of Contributors; List of Contacts; Part I Introduction to Plasma Technology for Surface Functionalization; 1 Introduction to Plasma and Plasma Technology; 1.1 Plasma: the Fourth State of Matter; 1.2 Historical Highlights; 1.3 Plasma Fundamentals; 1.3.1 Free Ideal Gas; 1.3.2 Interacting Gas; 1.3.3 The Plasma as a Fluid; 1.3.4 Waves in Plasmas; 1.3.5 Relevant Parameters that Characterize the State of Plasma; 1.4 Classification of Technological Plasmas; 1.4.1 Hot (Thermal) Plasmas and Their Applications
1.4.2 Cold (Nonthermal) Plasmas and Their Applications1.5 Reactive Plasmas; 1.5.1 Elementary Plasma-Chemical Reactions; 1.5.2 Elastic Scattering and Inelastic Thomson Scattering: Ionization Cross-section; 1.5.3 Molecular Ionization Mechanisms; 1.5.4 Stepwise Ionization by Electron Impact; 1.6 Plasma Sheaths; 1.7 Summary; References; 2 Plasma Systems for Surface Treatment; 2.1 Introduction; 2.2 Low Pressure Plasma Systems; 2.2.1 Microwave Systems; 2.2.1.1 Introduction; 2.2.1.2 Standard Microwave System for Textile Treatment; 2.2.1.3 Example: Duo-Plasmaline-a Linearly Extended Plasma Source 2.2.1.4 Electron Cyclotron Resonance Heated Plasmas2.2.2 Capacitively Coupled Systems; 2.2.2.1 Introduction; 2.2.2.2 Capacitive Coupled Plasma for Biomedical Applications; 2.2.3 Physical Vapor Deposition Plasma: LARC; 2.2.3.1 Background; 2.2.3.2 Cathodic Arc PVD Systems; 2.2.3.3 Example: Treatment of Food Processing Tools by LARCPVD System; 2.3 Atmospheric Pressure Plasma Systems; 2.3.1 Corona-type Surface Treatment; 2.3.1.1 Standard Corona Treatment; 2.3.1.2 Controlled Atmosphere Corona Treatment-Aldyne Treatment; 2.3.1.3 Liquid Deposition; 2.3.2 Remote Surface Treatment 2.3.2.1 Plasma Sources Used for Modeling2.3.2.2 Example: AcXys Plasma; 2.4 Summary; Acknowledgment; References; 3 Plasma-surface Interaction; 3.1 Introduction; 3.2 Polymer Etching; 3.3 Plasma Grafting; 3.4 Chemical Kinetics; 3.4.1 Chain Polymerization; 3.4.2 Plasma Polymerization; 3.5 Example: Plasma Polymerization; 3.5.1 Plasma Polymerization of HEMA; 3.5.1.1 Theoretical Background; 3.5.1.2 Example: Polymerization of HEMA on PET Fabric; 3.5.2 Plasma Polymerization of HDMSO; 3.6 Conclusion; References; 4 Process Diagnostics by Optical Emission Spectroscopy; 4.1 Introduction 4.2 Optical Emission Spectroscopy4.2.1 Theory of Optical Emission; 4.2.2 Spectroscopy; 4.2.3 OES Bench and Set-up; 4.3 Optical Absorption Spectroscopy; 4.3.1 Actinometry; 4.4 Laser Induced Fluorescence (LIF); 4.5 Conclusion; References; 5 Surface Analysis for Plasma Treatment Characterization; 5.1 Introduction to Surface Characterization Techniques; 5.2 X-ray Photoelectron Spectroscopy (XPS) or Electron Spectroscopy for Chemical Analysis (ESCA); 5.2.1 Principles of XPS; 5.2.2 XPS Core Level Chemical Shift; 5.2.3 Quantitative Analysis 5.2.4 Quantitative Analysis of Nitrogen Plasma-Treated Polypropylene |
| Record Nr. | UNINA-9910830618703321 |
| Weinheim, : Wiley-VCH, 2010 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
