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IEEE International Conference on Plasma Sciences, 1992
| IEEE International Conference on Plasma Sciences, 1992 |
| Pubbl/distr/stampa | [Place of publication not identified], : IEEE, 1992 |
| Descrizione fisica | 1 online resource (200 pages) : illustrations |
| Disciplina | 621.044 |
| Soggetto topico | Plasma engineering |
| Formato | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNISA-996211920003316 |
| [Place of publication not identified], : IEEE, 1992 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. di Salerno | ||
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Low temperature plasma technology : methods and applications / / edited by Paul K. Chu, XinPei Lu
| Low temperature plasma technology : methods and applications / / edited by Paul K. Chu, XinPei Lu |
| Pubbl/distr/stampa | Boca Raton : , : CRC Press, , 2014 |
| Descrizione fisica | 1 online resource (488 p.) |
| Disciplina |
621.044
621.5/6 621.56 |
| Altri autori (Persone) | ChuPaul K |
| Soggetto topico |
Low temperature plasmas
Low temperature plasmas - Industrial applications Low temperature plasmas - Scientific applications |
| ISBN |
0-429-19397-1
1-4665-0991-0 |
| Classificazione | SCI013050SCI055000TEC021000 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto | section 1. Fundamentals -- section 2. Processing and characterization -- section 3. Applications. |
| Record Nr. | UNINA-9910786825903321 |
| Boca Raton : , : CRC Press, , 2014 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Low temperature plasma technology : methods and applications / / edited by Paul K. Chu, XinPei Lu
| Low temperature plasma technology : methods and applications / / edited by Paul K. Chu, XinPei Lu |
| Edizione | [1st ed.] |
| Pubbl/distr/stampa | Boca Raton : , : CRC Press, , 2014 |
| Descrizione fisica | 1 online resource (488 p.) |
| Disciplina |
621.044
621.5/6 621.56 |
| Altri autori (Persone) | ChuPaul K |
| Soggetto topico |
Low temperature plasmas
Low temperature plasmas - Industrial applications Low temperature plasmas - Scientific applications |
| ISBN |
0-429-19397-1
1-4665-0991-0 |
| Classificazione | SCI013050SCI055000TEC021000 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto | section 1. Fundamentals -- section 2. Processing and characterization -- section 3. Applications. |
| Record Nr. | UNINA-9910816230703321 |
| Boca Raton : , : CRC Press, , 2014 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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Nonthermal plasmas for materials processing / / Jörg Florian Friedrich and Jürgen Meichsner
| Nonthermal plasmas for materials processing / / Jörg Florian Friedrich and Jürgen Meichsner |
| Autore | Friedrich Jörg Florian |
| Pubbl/distr/stampa | Hoboken, New Jersey : , : Wiley-Scrivener Publishing, , [2022] |
| Descrizione fisica | 1 online resource (708 pages) |
| Disciplina | 621.044 |
| Soggetto topico | Plasma engineering |
| ISBN |
1-119-36475-2
1-119-36477-9 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNINA-9910830058303321 |
Friedrich Jörg Florian
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| Hoboken, New Jersey : , : Wiley-Scrivener Publishing, , [2022] | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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Particle beams & plasma interaction on materials and ion & plasma finishing 2004 : proceedings of PIM & ASIP 2004, 25-27 November 2004, Chiang Mai, Thailand / / edited by T. Vilaithong, D. Boonyawan and C. Thongbai
| Particle beams & plasma interaction on materials and ion & plasma finishing 2004 : proceedings of PIM & ASIP 2004, 25-27 November 2004, Chiang Mai, Thailand / / edited by T. Vilaithong, D. Boonyawan and C. Thongbai |
| Pubbl/distr/stampa | Uetikon-Zuerich : , : Trans Tech Publications, , [2005] |
| Descrizione fisica | 1 online resource (151 p.) |
| Disciplina | 621.044 |
| Altri autori (Persone) |
VilaithongThiraphat
BoonyawanD (Dheerawan) ThongbaiC |
| Collana | Diffusion and defect data - solid state data. Pt. B, Solid state phenomena |
| Soggetto topico | Plasma engineering |
| Soggetto genere / forma | Electronic books. |
| ISBN | 3-03813-028-1 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
PIM & ASIP 2004; Table of Contents; X-Rays at the SIAM Photon Source; Study of Multicellular Living Organisms by SXCM (Soft X-Ray Contact Microscopy); Radiation Production Using Femtosecond Electron Bunches; Femtosecond Electron Pulses Production System; A New Design and Computer Simulation of a 5-Electrode Ion Extraction/Focusing System; The Progress of Ion Beam Bioengineering in China; Plasma-Based Ion Implantation Treatments under Industrially Relevant Conditions; The Progress of the Research and Application of Ion Implantation Biotechnology in China
Formation of Aluminum Nitride Film for High Power Soft X-Ray Source Using Ion-Beam Assisted Deposition Method Development of In Situ Atomic Force Microscopy for Study of Ion Beam Interaction with Biological Cell Surface; Ion Beam Synthesis of Silicon Carbide; Search for Enhanced D+D+D Reactions under D+ Beam Irradiation into TiDx Targets; Bunch Compression of a Non-Relativistic 280-keV-He+ Beam; Vacuum Arc Plasma Guns and Ion Sources; Seeing Inside a Hot Plasma: Photoionization of Ions; DLC-Film Schottky Barrier Diodes Development of High Voltage High Frequency Resonant Inverter Power Supply for Atmospheric Surface Glow Barrier Discharges Inactivation and Destruction of Bacillus Subtilis Using a Low Pressure Glow Discharge Plasma; Efficiency of Energy Transfer in a Small Plasma Focus Device; Sterilization Performance of Ultraviolet Emission from Laser Plasmas; Formation and Characteristics of the Low Dielectric Carbon Doped Silicon Oxide Thin Film Deposited by MTMS/O2 - ICPCVD; Ion Beam Modification of Carbon Materials Anti-Corrosion Properties of Nitrogen and Oxygen Plasma-Implanted Nickel-Titanium Shape Memory Alloy Structural and Conductive Changes of Alumina Ceramics and Silicon Crystal Implanted with High-Flux Ti Ion; Atmospheric Pressure Plasma Jets for 2D and 3D Materials Processing; Plasma Treatment of Silk; Diamond-Like Carbon Formed by Plasma Immersion Ion Implantation and Deposition Technique on 304 Stainless Steel; Tribological Improvement of Thermal-Sprayed Ti-Based Coatings Modified by 1200 K Nitridation; Thermal Stability of Nanoscale Multilayered ZrAlN/ZrB2 Coatings Improve Stability of Dicalcium Silicate/Zirconia Composite Coatings by Post-Spraying Heat TreatmentDeposition of TiC on γ-TiAl Alloys by Directly Applying Voltages; Generation of Deuteron Beam from the Plasma Focus; Keywords Index; Authors Index |
| Record Nr. | UNINA-9910453315503321 |
| Uetikon-Zuerich : , : Trans Tech Publications, , [2005] | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Particle beams & plasma interaction on materials and ion & plasma finishing 2004 : proceedings of PIM & ASIP 2004, 25-27 November 2004, Chiang Mai, Thailand / / edited by T. Vilaithong, D. Boonyawan and C. Thongbai
| Particle beams & plasma interaction on materials and ion & plasma finishing 2004 : proceedings of PIM & ASIP 2004, 25-27 November 2004, Chiang Mai, Thailand / / edited by T. Vilaithong, D. Boonyawan and C. Thongbai |
| Pubbl/distr/stampa | Uetikon-Zuerich : , : Trans Tech Publications, , [2005] |
| Descrizione fisica | 1 online resource (151 p.) |
| Disciplina | 621.044 |
| Altri autori (Persone) |
VilaithongThiraphat
BoonyawanD (Dheerawan) ThongbaiC |
| Collana | Diffusion and defect data - solid state data. Pt. B, Solid state phenomena |
| Soggetto topico | Plasma engineering |
| ISBN | 3-03813-028-1 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
PIM & ASIP 2004; Table of Contents; X-Rays at the SIAM Photon Source; Study of Multicellular Living Organisms by SXCM (Soft X-Ray Contact Microscopy); Radiation Production Using Femtosecond Electron Bunches; Femtosecond Electron Pulses Production System; A New Design and Computer Simulation of a 5-Electrode Ion Extraction/Focusing System; The Progress of Ion Beam Bioengineering in China; Plasma-Based Ion Implantation Treatments under Industrially Relevant Conditions; The Progress of the Research and Application of Ion Implantation Biotechnology in China
Formation of Aluminum Nitride Film for High Power Soft X-Ray Source Using Ion-Beam Assisted Deposition Method Development of In Situ Atomic Force Microscopy for Study of Ion Beam Interaction with Biological Cell Surface; Ion Beam Synthesis of Silicon Carbide; Search for Enhanced D+D+D Reactions under D+ Beam Irradiation into TiDx Targets; Bunch Compression of a Non-Relativistic 280-keV-He+ Beam; Vacuum Arc Plasma Guns and Ion Sources; Seeing Inside a Hot Plasma: Photoionization of Ions; DLC-Film Schottky Barrier Diodes Development of High Voltage High Frequency Resonant Inverter Power Supply for Atmospheric Surface Glow Barrier Discharges Inactivation and Destruction of Bacillus Subtilis Using a Low Pressure Glow Discharge Plasma; Efficiency of Energy Transfer in a Small Plasma Focus Device; Sterilization Performance of Ultraviolet Emission from Laser Plasmas; Formation and Characteristics of the Low Dielectric Carbon Doped Silicon Oxide Thin Film Deposited by MTMS/O2 - ICPCVD; Ion Beam Modification of Carbon Materials Anti-Corrosion Properties of Nitrogen and Oxygen Plasma-Implanted Nickel-Titanium Shape Memory Alloy Structural and Conductive Changes of Alumina Ceramics and Silicon Crystal Implanted with High-Flux Ti Ion; Atmospheric Pressure Plasma Jets for 2D and 3D Materials Processing; Plasma Treatment of Silk; Diamond-Like Carbon Formed by Plasma Immersion Ion Implantation and Deposition Technique on 304 Stainless Steel; Tribological Improvement of Thermal-Sprayed Ti-Based Coatings Modified by 1200 K Nitridation; Thermal Stability of Nanoscale Multilayered ZrAlN/ZrB2 Coatings Improve Stability of Dicalcium Silicate/Zirconia Composite Coatings by Post-Spraying Heat TreatmentDeposition of TiC on γ-TiAl Alloys by Directly Applying Voltages; Generation of Deuteron Beam from the Plasma Focus; Keywords Index; Authors Index |
| Record Nr. | UNINA-9910790772503321 |
| Uetikon-Zuerich : , : Trans Tech Publications, , [2005] | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Particle beams & plasma interaction on materials and ion & plasma finishing 2004 : proceedings of PIM & ASIP 2004, 25-27 November 2004, Chiang Mai, Thailand / / edited by T. Vilaithong, D. Boonyawan and C. Thongbai
| Particle beams & plasma interaction on materials and ion & plasma finishing 2004 : proceedings of PIM & ASIP 2004, 25-27 November 2004, Chiang Mai, Thailand / / edited by T. Vilaithong, D. Boonyawan and C. Thongbai |
| Pubbl/distr/stampa | Uetikon-Zuerich : , : Trans Tech Publications, , [2005] |
| Descrizione fisica | 1 online resource (151 p.) |
| Disciplina | 621.044 |
| Altri autori (Persone) |
VilaithongThiraphat
BoonyawanD (Dheerawan) ThongbaiC |
| Collana | Diffusion and defect data - solid state data. Pt. B, Solid state phenomena |
| Soggetto topico | Plasma engineering |
| ISBN | 3-03813-028-1 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
PIM & ASIP 2004; Table of Contents; X-Rays at the SIAM Photon Source; Study of Multicellular Living Organisms by SXCM (Soft X-Ray Contact Microscopy); Radiation Production Using Femtosecond Electron Bunches; Femtosecond Electron Pulses Production System; A New Design and Computer Simulation of a 5-Electrode Ion Extraction/Focusing System; The Progress of Ion Beam Bioengineering in China; Plasma-Based Ion Implantation Treatments under Industrially Relevant Conditions; The Progress of the Research and Application of Ion Implantation Biotechnology in China
Formation of Aluminum Nitride Film for High Power Soft X-Ray Source Using Ion-Beam Assisted Deposition Method Development of In Situ Atomic Force Microscopy for Study of Ion Beam Interaction with Biological Cell Surface; Ion Beam Synthesis of Silicon Carbide; Search for Enhanced D+D+D Reactions under D+ Beam Irradiation into TiDx Targets; Bunch Compression of a Non-Relativistic 280-keV-He+ Beam; Vacuum Arc Plasma Guns and Ion Sources; Seeing Inside a Hot Plasma: Photoionization of Ions; DLC-Film Schottky Barrier Diodes Development of High Voltage High Frequency Resonant Inverter Power Supply for Atmospheric Surface Glow Barrier Discharges Inactivation and Destruction of Bacillus Subtilis Using a Low Pressure Glow Discharge Plasma; Efficiency of Energy Transfer in a Small Plasma Focus Device; Sterilization Performance of Ultraviolet Emission from Laser Plasmas; Formation and Characteristics of the Low Dielectric Carbon Doped Silicon Oxide Thin Film Deposited by MTMS/O2 - ICPCVD; Ion Beam Modification of Carbon Materials Anti-Corrosion Properties of Nitrogen and Oxygen Plasma-Implanted Nickel-Titanium Shape Memory Alloy Structural and Conductive Changes of Alumina Ceramics and Silicon Crystal Implanted with High-Flux Ti Ion; Atmospheric Pressure Plasma Jets for 2D and 3D Materials Processing; Plasma Treatment of Silk; Diamond-Like Carbon Formed by Plasma Immersion Ion Implantation and Deposition Technique on 304 Stainless Steel; Tribological Improvement of Thermal-Sprayed Ti-Based Coatings Modified by 1200 K Nitridation; Thermal Stability of Nanoscale Multilayered ZrAlN/ZrB2 Coatings Improve Stability of Dicalcium Silicate/Zirconia Composite Coatings by Post-Spraying Heat TreatmentDeposition of TiC on γ-TiAl Alloys by Directly Applying Voltages; Generation of Deuteron Beam from the Plasma Focus; Keywords Index; Authors Index |
| Record Nr. | UNINA-9910810697303321 |
| Uetikon-Zuerich : , : Trans Tech Publications, , [2005] | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Plasma Engineering : Applications from Aerospace to Bio and Nanotechnology
| Plasma Engineering : Applications from Aerospace to Bio and Nanotechnology |
| Autore | Keidar Michael |
| Edizione | [2nd ed.] |
| Pubbl/distr/stampa | San Diego : , : Elsevier Science & Technology, , 2018 |
| Descrizione fisica | 1 online resource (xvii, 567 pages) |
| Disciplina | 621.044 |
| Altri autori (Persone) | BeilisIsak |
| Soggetto topico |
Plasma engineering
Plasma (Ionized gases) |
| ISBN |
0-12-813703-7
0-12-813702-9 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto | 1. Plasma concepts; 2. Plasma diagnostics; 3. Electrical discharges; 4. Plasma Dynamics; 5. Plasma in Space Propulsion; 6. Plasma-based control; 7. Plasma nanoscience and nanotechnology; 8. Plasma Medicine |
| Record Nr. | UNINA-9910583091503321 |
|
Keidar Michael
|
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| San Diego : , : Elsevier Science & Technology, , 2018 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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Plasma nanoscience : basic concepts and applications of deterministic nanofabrication / / Kostya (Ken) Ostrikov
| Plasma nanoscience : basic concepts and applications of deterministic nanofabrication / / Kostya (Ken) Ostrikov |
| Autore | Ostrikov Kostya (Ken) |
| Pubbl/distr/stampa | Weinheim, [Germany] : , : Wiley-VCH Verlag GmbH & Co. KGaA, , 2008 |
| Descrizione fisica | 1 online resource (566 p.) |
| Disciplina | 621.044 |
| Soggetto topico |
Nanostructured materials
Plasma engineering Low temperature plasmas |
| Soggetto genere / forma | Electronic books. |
| ISBN |
1-281-94721-0
9786611947217 3-527-62332-9 3-527-62331-0 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Plasma Nanoscience; Contents; Preface; Acronyms; 1 Introduction; 1.1 Main Concepts and Issues; 1.2 Self-Organized Nanoworld, Commonsense Science of the Small and Socio-Economic Push; 1.3 Nature's Plasma Nanofab and Nanotechnology Research Directions; 1.4 Deterministic Nanofabrication and Plasma Nanoscience; 1.5 Structure of the Monograph and Advice to the Reader; 2 What Makes Low-Temperature Plasmas a Versatile Nanotool?; 2.1 Basic Ideas and Major Issues; 2.2 Plasma Nanofabrication Concept; 2.3 Useful Plasma Features for Nanoscale Fabrication
2.4 Choice and Generation of Building and Working Units2.5 Effect of the Plasma Sheath; 2.6 How Plasmas Affect Elementary Surface Processes; 2.7 Concluding Remarks; 3 Specific Examples and Practical Framework; 3.1 Semiconducting Nanofilms and Nanostructures; 3.2 Carbon-Based Nanofilms and Nanostructures; 3.3 Practical Framework - Bridging Nine Orders of Magnitude; 3.4 Concluding Remarks; 4 Generation of Building and Working Units; 4.1 Species in Methane-Based Plasmas for Synthesis of Carbon Nanostructures; 4.1.1 Experimental Details; 4.1.2 Basic Assumptions of the Model 4.1.3 Particle and Power Balance in Plasma Discharge4.1.4 Densities of Neutral and Charged Species; 4.1.4.1 Effect of RF Power; 4.1.4.2 Effect of Argon and Methane Dilution; 4.1.5 Deposited Neutral and Ion Fluxes; 4.1.6 Most Important Points and Summary; 4.2 Species in Acetylene-Based Plasmas for Synthesis of Carbon Nanostructures; 4.2.1 Formulation of the Problem; 4.2.2 Number Densities of the Main Discharge Species; 4.2.3 Fluxes of Building and Working Units; 4.3 Nanocluster and Nanoparticle Building Units; 4.3.1 Nano-Sized Building Units from Reactive Plasmas 4.3.2 Nanoparticle Generation: Other Examples4.4 Concluding Remarks; 5 Transport, Manipulation and Deposition of Building and Working Units; 5.1 Microscopic Ion Fluxes During Nanoassembly Processes; 5.1.1 Formulation and Model; 5.1.2 Numerical Results; 5.1.3 Interpretation of Numerical Results; 5.2 Nanoparticle Manipulation in the Synthesis of Carbon Nanostructures; 5.2.1 Nanoparticle Manipulation: Experimental Results; 5.2.2 Nanoparticle Manipulation: Numerical Model; 5.3 Selected-Area Nanoparticle Deposition Onto Microstructured Surfaces; 5.3.1 Numerical Model and Simulation Parameters 5.3.2 Selected-Area Nanoparticle Deposition5.3.3 Practical Implementation Framework; 5.4 Electrostatic Nanoparticle Filter; 5.5 Concluding Remarks; 6 Surface Science of Plasma-Exposed Surfaces and Self-Organization Processes; 6.1 Synthesis of Self-Organizing Arrays of Quantum Dots: Objectives and Approach; 6.2 Initial Stage of Ge/Si Nanodot Formation Using Nanocluster Fluxes; 6.2.1 Physical Model and Numerical Details; 6.2.2 Physical Interpretation and Relevant Experimental Data; 6.3 Binary Si(x)C(1-x) Quantum Dot Systems: Initial Growth Stage 6.3.1 Adatom Fluxes at Initial Growth Stages of Si(x)C(1-x) Quantum Dots |
| Record Nr. | UNINA-9910144450103321 |
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Ostrikov Kostya (Ken)
|
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| Weinheim, [Germany] : , : Wiley-VCH Verlag GmbH & Co. KGaA, , 2008 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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Plasma processing and processing science [[electronic resource] /] / Panel on Plasma Processing, Naval Studies Board, Commission on Physical Sciences, Mathematics, and Applications, National Research Council
| Plasma processing and processing science [[electronic resource] /] / Panel on Plasma Processing, Naval Studies Board, Commission on Physical Sciences, Mathematics, and Applications, National Research Council |
| Pubbl/distr/stampa | Washington, D.C., : National Academy Press, 1995 |
| Descrizione fisica | 1 online resource (45 p.) |
| Disciplina | 621.044 |
| Altri autori (Persone) | ChenFrancis F. <1929-> |
| Collana | NRL strategic series |
| Soggetto topico |
Plasma engineering
Semiconductors - Etching Plasma etching |
| Soggetto genere / forma | Electronic books. |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
""Plasma Processing and Processing Science""; ""Copyright""; ""Preface""; ""Contents""; ""Chapter 1 Introduction and Summary""; ""Chapter 2 Modeling and Simulation of Plasma Processing""; ""RESEARCH OPPORTUNITIES""; ""Requirements of the Microelectronics Fabrication Industry""; ""Multidimensional Models""; ""Plasma Chemistry""; ""Surface Chemistry""; ""Electromagnetics""; ""Current Status of Modeling and Simulation""; ""Particle-in-Cell Simulations""; ""Kinetic Models""; ""Fluid or Hydrodynamic Models""; ""Hybrid Models""; ""A ROLE FOR NRL""; ""Chapter 3 Semiconductor Processing""
""RESEARCH OPPORTUNITIES""""A ROLE FOR NRL""; ""Development and Characterization of Precompetitive Materials and Processes""; ""Comparative Analysis and Characterization of Tools and Processes in Development""; ""Sensor Development for Control and Fingerprinting of Manufacturing Processes""; ""Chapter 4 Plasma Deposition and Polymerization""; ""RESEARCH OPPORTUNITIES""; ""Semiconductor Fabrication""; ""Barrier Coatings""; ""Fibrous Materials""; ""Optical Coatings and Photonics""; ""Plasma Polymerization""; ""A ROLE FOR NRL""; ""Chapter 5 Ion Implantation and Surface Modification"" ""RESEARCH OPPORTUNITIES""""Introduction""; ""Plasma and Ion Beam Implantation Technology""; ""Ion Beam Implantation""; ""Plasma Source Ion Implantation""; ""Applications""; ""Implantation of Metals""; ""Implantation of Nonmetals""; ""A ROLE FOR NRL""; ""Chapter 6 Thermal Plasmas""; ""RESEARCH OPPORTUNITIES""; ""Introduction""; ""Plasma Spraying""; ""Plasma Chemical Vapor Deposition""; ""Plasma Waste Destruction""; ""Plasma Metallurgy""; ""Thermal Plasma Synthesis""; ""Plasma Consolidation""; ""A ROLE FOR NRL""; ""Thermal Plasma Waste Destruction""; ""Plasma Chemical Vapor Deposition"" ""Diamond Films""""Cubic Boron Nitride Films""; ""Carbon Nitride""; ""Chapter 7 Flat Panel Displays""; ""RESEARCH OPPORTUNITIES""; ""Introduction""; ""Passive Matrix Liquid Crystal Display""; ""Active Matrix Liquid Crystal Display""; ""Amorphous Silicon""; ""Polycrystalline Silicon""; ""Transfer Silicon""; ""Thin Film Electroluminescent Displays""; ""Digital Micromirror Devices""; ""Plasma Displays""; ""Field Emission Displays""; ""A ROLE FOR NRL""; ""Chapter 8 Low-Temperature Plasma Physics""; ""RESEARCH OPPORTUNITIES""; ""A ROLE FOR NRL""; ""Chapter 9 Conclusions and Recommendations"" ""RECOMMENDATION FOR A PROGRAM IN PLASMA PROCESSING AND PROCESSING SCIENCE""""CONCLUSIONS BASED ON NRL'S PRESENT RESEARCH CAPABILITIES"" |
| Record Nr. | UNINA-9910451786303321 |
| Washington, D.C., : National Academy Press, 1995 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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