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Impedances and wakes in high-energy particle accelerators / Bruno W. Zotter, Semyon A. Kheifets
| Impedances and wakes in high-energy particle accelerators / Bruno W. Zotter, Semyon A. Kheifets |
| Autore | Zotter, Bruno W. |
| Pubbl/distr/stampa | Singapore [etc.], : World scientific, c1998 |
| Descrizione fisica | XIX, 405 p. : ill. ; 23 cm |
| Disciplina |
539.7
539.73 |
| Altri autori (Persone) | Kheifets, Semyon A. |
| Soggetto topico |
Acceleratori di particelle
Impedenza elettrica |
| ISBN | 9810226268 |
| Formato | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNISANNIO-RMS0054110 |
Zotter, Bruno W.
|
||
| Singapore [etc.], : World scientific, c1998 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. del Sannio | ||
| ||
Industrial accelerators and their applications [[electronic resource] /] / edited by Robert W. Hamm, Marianne E. Hamm
| Industrial accelerators and their applications [[electronic resource] /] / edited by Robert W. Hamm, Marianne E. Hamm |
| Pubbl/distr/stampa | Hackensack, NJ, : World Scientific Pub., 2012 |
| Descrizione fisica | 1 online resource (436 p.) |
| Disciplina | 539.73 |
| Altri autori (Persone) |
HammRobert Wray
HammMarianne Elizabeth |
| Soggetto topico |
Electron accelerators - Industrial applications
Ionizing radiation - Industrial applications Electron beams - Industrial applications |
| Soggetto genere / forma | Electronic books. |
| ISBN |
1-283-59361-0
9786613906069 981-4307-05-X |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Dedication; CONTENTS; 1. Introduction; Introduction to the Beam Business Robert W. Hamm and Marianne E. Hamm; Chapter 1. Ion Implantation for Fabrication of Semiconductor Devices and Materials Michael I. Current; 1. Introduction; 2. Applications of Ion Implantation: Devices and Materials; 2.1 Pre-amorphization; 2.2 Cocktail implants; 2.3 Carbon implants for tensile strained nMOS; 2.4 Oxygen implants for direct formation of Silicon-on-Insulator (SOI) wafers; 2.5 Hydrogen implants for formation of SOI wafers by layer transfer; 3. Accelerator Designs; 3.1 Beamline system types
3.2 Accel-decel beamlines 3.3 MeV beamlines; 3.4 Plasma immersion and ion shower implanters; 3.5 SIMOX high-current, high-temperature implanters; 4. Ion Source Designs; 4.1 Special ion sources: SIMOX, molecular ions, non-volatile elements, and large-area beams; 5. Scanning Methods; 5.1 Beam deflection and wafer motion in orthogonal directions; 5.2 Spinning wheel and pendulum wafer scanning; 6. New Directions: Gas Cluster Ions, Photovoltaic Cell Doping, and MeV Protons for Si Membrane Cutting; 6.1 Gas cluster ions; 6.2 Doping of Si-based photovoltaic cells 6.2.1 Alternatives to implant doping for PV cells 6.2.2 Advanced PV cells; 6.3 High-current, multi-MeV proton beams for fabrication of thin Si PV membranes; 7. Implantation into Metals and Biomaterials; 7.1 Metals: hardness, friction, and corrosion; 7.2 Biomaterials treated by plasma immersion implantation and deposition; 8. Summary; Acknowledgements; References; Chapter 2. Electron Beam Materials Processing Donald E. Powers; 1. Introduction; 2. Electron Beam Equipment; 3. Electron Beam Welding; 3.1 Large steam turbines; 3.2 High efficiency impellers; 3.3 Speed gears; 3.4 Drive rings 4. EB Cutting and Drilling 5. EB Heat Treating; 6. EB Melting and Casting; 7. Summary and Future Trends; Acknowledgements; References; Chapter 3. Electron Beam Materials Irradiators Marshall R. Cleland; 1. Introduction; 2. Physical Properties of High-Energy Electrons and X-Rays; 2.1 High-energy electrons; 2.2 High-energy X-rays; 2.3 Radiation dosimetry; 2.4 Dose versus electron beam power; 2.5 Dose versus electron beam current; 3. Industrial Electron Accelerators; 3.1 Low-energy accelerators; 3.2 Medium-energy accelerators; 3.3 High-energy accelerators 4. Major Applications of Industrial EB Irradiators4.1 Cross-linking of materials; 4.1.1 Wire and cable insulation; 4.1.2 Heat-shrinkable plastic tubing and film; 4.1.3 Curing of inks, coatings, and adhesives; 4.1.4 Automobile tires; 4.1.5 Polyethylene foam; 4.2 Radiation sterilization of medical devices; 4.3 Irradiation of foods; 5. Other EB Irradiation Applications; 5.1 Treatment of waste materials; 5.2 Cleaning of stack gases; 5.3 Curing of composite materials; 5.4 Silicon-carbide fiber manufacturing; 5.5 Production of fuel cells; 5.6 Cross-linking of PTFE and rubber sheeting 5.7 Seed and soil disinfestation |
| Record Nr. | UNINA-9910465497703321 |
| Hackensack, NJ, : World Scientific Pub., 2012 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Industrial accelerators and their applications [[electronic resource] /] / edited by Robert W. Hamm, Marianne E. Hamm
| Industrial accelerators and their applications [[electronic resource] /] / edited by Robert W. Hamm, Marianne E. Hamm |
| Pubbl/distr/stampa | Hackensack, NJ, : World Scientific Pub., 2012 |
| Descrizione fisica | 1 online resource (436 p.) |
| Disciplina | 539.73 |
| Altri autori (Persone) |
HammRobert Wray
HammMarianne Elizabeth |
| Soggetto topico |
Electron accelerators - Industrial applications
Ionizing radiation - Industrial applications Electron beams - Industrial applications |
| ISBN |
1-283-59361-0
9786613906069 981-4307-05-X |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Dedication; CONTENTS; 1. Introduction; Introduction to the Beam Business Robert W. Hamm and Marianne E. Hamm; Chapter 1. Ion Implantation for Fabrication of Semiconductor Devices and Materials Michael I. Current; 1. Introduction; 2. Applications of Ion Implantation: Devices and Materials; 2.1 Pre-amorphization; 2.2 Cocktail implants; 2.3 Carbon implants for tensile strained nMOS; 2.4 Oxygen implants for direct formation of Silicon-on-Insulator (SOI) wafers; 2.5 Hydrogen implants for formation of SOI wafers by layer transfer; 3. Accelerator Designs; 3.1 Beamline system types
3.2 Accel-decel beamlines 3.3 MeV beamlines; 3.4 Plasma immersion and ion shower implanters; 3.5 SIMOX high-current, high-temperature implanters; 4. Ion Source Designs; 4.1 Special ion sources: SIMOX, molecular ions, non-volatile elements, and large-area beams; 5. Scanning Methods; 5.1 Beam deflection and wafer motion in orthogonal directions; 5.2 Spinning wheel and pendulum wafer scanning; 6. New Directions: Gas Cluster Ions, Photovoltaic Cell Doping, and MeV Protons for Si Membrane Cutting; 6.1 Gas cluster ions; 6.2 Doping of Si-based photovoltaic cells 6.2.1 Alternatives to implant doping for PV cells 6.2.2 Advanced PV cells; 6.3 High-current, multi-MeV proton beams for fabrication of thin Si PV membranes; 7. Implantation into Metals and Biomaterials; 7.1 Metals: hardness, friction, and corrosion; 7.2 Biomaterials treated by plasma immersion implantation and deposition; 8. Summary; Acknowledgements; References; Chapter 2. Electron Beam Materials Processing Donald E. Powers; 1. Introduction; 2. Electron Beam Equipment; 3. Electron Beam Welding; 3.1 Large steam turbines; 3.2 High efficiency impellers; 3.3 Speed gears; 3.4 Drive rings 4. EB Cutting and Drilling 5. EB Heat Treating; 6. EB Melting and Casting; 7. Summary and Future Trends; Acknowledgements; References; Chapter 3. Electron Beam Materials Irradiators Marshall R. Cleland; 1. Introduction; 2. Physical Properties of High-Energy Electrons and X-Rays; 2.1 High-energy electrons; 2.2 High-energy X-rays; 2.3 Radiation dosimetry; 2.4 Dose versus electron beam power; 2.5 Dose versus electron beam current; 3. Industrial Electron Accelerators; 3.1 Low-energy accelerators; 3.2 Medium-energy accelerators; 3.3 High-energy accelerators 4. Major Applications of Industrial EB Irradiators4.1 Cross-linking of materials; 4.1.1 Wire and cable insulation; 4.1.2 Heat-shrinkable plastic tubing and film; 4.1.3 Curing of inks, coatings, and adhesives; 4.1.4 Automobile tires; 4.1.5 Polyethylene foam; 4.2 Radiation sterilization of medical devices; 4.3 Irradiation of foods; 5. Other EB Irradiation Applications; 5.1 Treatment of waste materials; 5.2 Cleaning of stack gases; 5.3 Curing of composite materials; 5.4 Silicon-carbide fiber manufacturing; 5.5 Production of fuel cells; 5.6 Cross-linking of PTFE and rubber sheeting 5.7 Seed and soil disinfestation |
| Record Nr. | UNINA-9910792082603321 |
| Hackensack, NJ, : World Scientific Pub., 2012 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
Industrial accelerators and their applications [[electronic resource] /] / edited by Robert W. Hamm, Marianne E. Hamm
| Industrial accelerators and their applications [[electronic resource] /] / edited by Robert W. Hamm, Marianne E. Hamm |
| Pubbl/distr/stampa | Hackensack, NJ, : World Scientific Pub., 2012 |
| Descrizione fisica | 1 online resource (436 p.) |
| Disciplina | 539.73 |
| Altri autori (Persone) |
HammRobert Wray
HammMarianne Elizabeth |
| Soggetto topico |
Electron accelerators - Industrial applications
Ionizing radiation - Industrial applications Electron beams - Industrial applications |
| ISBN |
1-283-59361-0
9786613906069 981-4307-05-X |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
Dedication; CONTENTS; 1. Introduction; Introduction to the Beam Business Robert W. Hamm and Marianne E. Hamm; Chapter 1. Ion Implantation for Fabrication of Semiconductor Devices and Materials Michael I. Current; 1. Introduction; 2. Applications of Ion Implantation: Devices and Materials; 2.1 Pre-amorphization; 2.2 Cocktail implants; 2.3 Carbon implants for tensile strained nMOS; 2.4 Oxygen implants for direct formation of Silicon-on-Insulator (SOI) wafers; 2.5 Hydrogen implants for formation of SOI wafers by layer transfer; 3. Accelerator Designs; 3.1 Beamline system types
3.2 Accel-decel beamlines 3.3 MeV beamlines; 3.4 Plasma immersion and ion shower implanters; 3.5 SIMOX high-current, high-temperature implanters; 4. Ion Source Designs; 4.1 Special ion sources: SIMOX, molecular ions, non-volatile elements, and large-area beams; 5. Scanning Methods; 5.1 Beam deflection and wafer motion in orthogonal directions; 5.2 Spinning wheel and pendulum wafer scanning; 6. New Directions: Gas Cluster Ions, Photovoltaic Cell Doping, and MeV Protons for Si Membrane Cutting; 6.1 Gas cluster ions; 6.2 Doping of Si-based photovoltaic cells 6.2.1 Alternatives to implant doping for PV cells 6.2.2 Advanced PV cells; 6.3 High-current, multi-MeV proton beams for fabrication of thin Si PV membranes; 7. Implantation into Metals and Biomaterials; 7.1 Metals: hardness, friction, and corrosion; 7.2 Biomaterials treated by plasma immersion implantation and deposition; 8. Summary; Acknowledgements; References; Chapter 2. Electron Beam Materials Processing Donald E. Powers; 1. Introduction; 2. Electron Beam Equipment; 3. Electron Beam Welding; 3.1 Large steam turbines; 3.2 High efficiency impellers; 3.3 Speed gears; 3.4 Drive rings 4. EB Cutting and Drilling 5. EB Heat Treating; 6. EB Melting and Casting; 7. Summary and Future Trends; Acknowledgements; References; Chapter 3. Electron Beam Materials Irradiators Marshall R. Cleland; 1. Introduction; 2. Physical Properties of High-Energy Electrons and X-Rays; 2.1 High-energy electrons; 2.2 High-energy X-rays; 2.3 Radiation dosimetry; 2.4 Dose versus electron beam power; 2.5 Dose versus electron beam current; 3. Industrial Electron Accelerators; 3.1 Low-energy accelerators; 3.2 Medium-energy accelerators; 3.3 High-energy accelerators 4. Major Applications of Industrial EB Irradiators4.1 Cross-linking of materials; 4.1.1 Wire and cable insulation; 4.1.2 Heat-shrinkable plastic tubing and film; 4.1.3 Curing of inks, coatings, and adhesives; 4.1.4 Automobile tires; 4.1.5 Polyethylene foam; 4.2 Radiation sterilization of medical devices; 4.3 Irradiation of foods; 5. Other EB Irradiation Applications; 5.1 Treatment of waste materials; 5.2 Cleaning of stack gases; 5.3 Curing of composite materials; 5.4 Silicon-carbide fiber manufacturing; 5.5 Production of fuel cells; 5.6 Cross-linking of PTFE and rubber sheeting 5.7 Seed and soil disinfestation |
| Record Nr. | UNINA-9910813686603321 |
| Hackensack, NJ, : World Scientific Pub., 2012 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
International conference on mesons and recently discovered particles : 43. congresso nazionale di fisica : comunicazioni : Padova-Venezia, 22-28 settembre 1957
| International conference on mesons and recently discovered particles : 43. congresso nazionale di fisica : comunicazioni : Padova-Venezia, 22-28 settembre 1957 |
| Autore | International conference on mesons and recently discovered particles : <1957 |
| Pubbl/distr/stampa | Bologna : Società italiana di fisica, 1957 |
| Disciplina |
539.72
539.73 |
| Soggetto non controllato |
Particelle elementari
Raggi cosmici Acceleratori |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNINA-990001061490403321 |
|
International conference on mesons and recently discovered particles : <1957
|
||
| Bologna : Società italiana di fisica, 1957 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
An introduction to the physics of high energy accelerators [[electronic resource] /] / D.A. Edwards, M.J. Syphers
| An introduction to the physics of high energy accelerators [[electronic resource] /] / D.A. Edwards, M.J. Syphers |
| Autore | Edwards D. A (Donald A.), <1927-> |
| Pubbl/distr/stampa | New York, : Wiley, c1993 |
| Descrizione fisica | 1 online resource (306 p.) |
| Disciplina |
530.416
539.73 |
| Altri autori (Persone) | SyphersM. J. <1957-> |
| Collana | Wiley series in beam physics and accelerator technology |
| Soggetto topico |
Particle accelerators
Particles (Nuclear physics) |
| Soggetto genere / forma | Electronic books. |
| ISBN |
1-282-01049-2
9786612010491 3-527-61727-2 3-527-61728-0 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
An Introduction to the Physics of High Energy Accelerators; Contents; Series Preface; Preface; 1 Introduction; 1.1 Prerequisites; 1.2 Uses of Accelerators; 1.2.1 Luminosity of a High Energy Collider; 1.2.2 Synchrotron Radiation Sources; Problems; 2 Acceleration and Phase Stability; 2.1 Acceleration Methods; 2.1.1 DC Accelerators; 2.1.2 Time Varying Electromagnetic Fields; 2.1.3 Resonant Cavities; 2.1.4 Accelerating Structures; 2.2 Phase Stability; 2.2.1 Synchrotron Oscillations; 2.2.2 Adiabatic Damping and Longitudinal Emmittance; 2.2.3 Transition Crossing
2.3 The Need for Transverse FocusingProblems; 3 Transverse Linear Motion; 3.1 Stability of Transverse Oscillations; 3.1.1 Weak Focusing; 3.1.2 Strong Focusing; 3.1.3 Stability Criterion; 3.2 Equation of Motion; 3.2.1 Piecewise Method of Solution; 3.2.2 Closed Form Solution; 3.2.3 Courant-Snyder Parameters; 3.2.4 Emittance and Admittance; 3.2.5 Adiabatic Damping of Betatron Oscillations; 3.3 Momentum Dispersion; 3.3.1 Equation of Motion for an Off-Momentum Particle; 3.3.2 Solution of Equation of Motion; 3.4 Linear Deviations from the Ideal Lattice; 3.4.1 Steering Errors and Corrections 3.4.2 Focusing Errors and Corrections3.4.3 Chromaticity; Problems; 4 Resonances and Transverse Nonlinear Motion; 4.1 Transverse Resonances; 4.1.1 Floquet Transformation; 4.1.2 Multipole Expansion; 4.1.3 The Driven Oscillator and Rational Numbers; 4.2 A Third-Integer Resonance; 4.2.1 Equation of Motion; 4.2.2 Recognition of the Sextupole Resonance; 4.2.3 First Integral and the Separatrix; 4.2.4 Application to Resonant Extraction; 4.2.5 Comments on Correction Systems; 4.3 The Hamiltonian Formalism; 4.3.1 Review of Hamiltonian Dynamics; 4.3.2 The Hamiltonian for Small Transverse Oscillations 4.3.3 Transformations of the Hamiltonian4.3.4 The Third-Integer Resonance Revisited; Problems; 5 Transverse Coupled Motion; 5.1 Linear Coupling; 5.1.1 Coupled Harmonic Oscillators; 5.1.2 Perturbation Treatment of a Single Skew Quadrupole; 5.1.3 Matrix Treatment of a Single Skew Quadrupole; 5.1.4 Matrix Formalism of Linear Coupling; 5.2 Nonlinear Coupling; 5.2.1 Two-Degree-of-Freedom Sum Resonance Due to Distribution of Sextupoles; 5.2.2 Multipoles and Resonance Lines; Problems; 6 Intensity Dependent Effects; 6.1 Space Charge; 6.1.1 The Transverse Space Charge Force 6.1.2 Equation of Motion in the Presence of Space Charge6.1.3 Incoherent Tune Shift; 6.1.4 The Beam-Beam Tune Shift; 6.1.5 Image Charge and Image Current Effects; 6.2 The Negative Mass Instability; 6.2.1 The Longitudinal Space Charge Field; 6.2.2 Perturbation of the Line Density; 6.3 Wake Fields and Impedance; 6.3.1 Field of a Relativistic Charge in Vacuum; 6.3.2 Wake Field for a Resistive Wall; 6.3.3 Wake Functions; 6.3.4 Impedance; 6.4 Macroparticle Models of Coherent Instabilities; 6.4.1 Beam Breakup in Linacs; 6.4.2 The Strong Head-Tail Instability; 6.4.3 The Head-Tail Instability 6.5 Evolution of the Distribution Function |
| Record Nr. | UNINA-9910144742003321 |
|
Edwards D. A (Donald A.), <1927->
|
||
| New York, : Wiley, c1993 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
An introduction to the physics of high energy accelerators [[electronic resource] /] / D.A. Edwards, M.J. Syphers
| An introduction to the physics of high energy accelerators [[electronic resource] /] / D.A. Edwards, M.J. Syphers |
| Autore | Edwards D. A (Donald A.), <1927-> |
| Pubbl/distr/stampa | New York, : Wiley, c1993 |
| Descrizione fisica | 1 online resource (306 p.) |
| Disciplina |
530.416
539.73 |
| Altri autori (Persone) | SyphersM. J. <1957-> |
| Collana | Wiley series in beam physics and accelerator technology |
| Soggetto topico |
Particle accelerators
Particles (Nuclear physics) |
| ISBN |
1-282-01049-2
9786612010491 3-527-61727-2 3-527-61728-0 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
An Introduction to the Physics of High Energy Accelerators; Contents; Series Preface; Preface; 1 Introduction; 1.1 Prerequisites; 1.2 Uses of Accelerators; 1.2.1 Luminosity of a High Energy Collider; 1.2.2 Synchrotron Radiation Sources; Problems; 2 Acceleration and Phase Stability; 2.1 Acceleration Methods; 2.1.1 DC Accelerators; 2.1.2 Time Varying Electromagnetic Fields; 2.1.3 Resonant Cavities; 2.1.4 Accelerating Structures; 2.2 Phase Stability; 2.2.1 Synchrotron Oscillations; 2.2.2 Adiabatic Damping and Longitudinal Emmittance; 2.2.3 Transition Crossing
2.3 The Need for Transverse FocusingProblems; 3 Transverse Linear Motion; 3.1 Stability of Transverse Oscillations; 3.1.1 Weak Focusing; 3.1.2 Strong Focusing; 3.1.3 Stability Criterion; 3.2 Equation of Motion; 3.2.1 Piecewise Method of Solution; 3.2.2 Closed Form Solution; 3.2.3 Courant-Snyder Parameters; 3.2.4 Emittance and Admittance; 3.2.5 Adiabatic Damping of Betatron Oscillations; 3.3 Momentum Dispersion; 3.3.1 Equation of Motion for an Off-Momentum Particle; 3.3.2 Solution of Equation of Motion; 3.4 Linear Deviations from the Ideal Lattice; 3.4.1 Steering Errors and Corrections 3.4.2 Focusing Errors and Corrections3.4.3 Chromaticity; Problems; 4 Resonances and Transverse Nonlinear Motion; 4.1 Transverse Resonances; 4.1.1 Floquet Transformation; 4.1.2 Multipole Expansion; 4.1.3 The Driven Oscillator and Rational Numbers; 4.2 A Third-Integer Resonance; 4.2.1 Equation of Motion; 4.2.2 Recognition of the Sextupole Resonance; 4.2.3 First Integral and the Separatrix; 4.2.4 Application to Resonant Extraction; 4.2.5 Comments on Correction Systems; 4.3 The Hamiltonian Formalism; 4.3.1 Review of Hamiltonian Dynamics; 4.3.2 The Hamiltonian for Small Transverse Oscillations 4.3.3 Transformations of the Hamiltonian4.3.4 The Third-Integer Resonance Revisited; Problems; 5 Transverse Coupled Motion; 5.1 Linear Coupling; 5.1.1 Coupled Harmonic Oscillators; 5.1.2 Perturbation Treatment of a Single Skew Quadrupole; 5.1.3 Matrix Treatment of a Single Skew Quadrupole; 5.1.4 Matrix Formalism of Linear Coupling; 5.2 Nonlinear Coupling; 5.2.1 Two-Degree-of-Freedom Sum Resonance Due to Distribution of Sextupoles; 5.2.2 Multipoles and Resonance Lines; Problems; 6 Intensity Dependent Effects; 6.1 Space Charge; 6.1.1 The Transverse Space Charge Force 6.1.2 Equation of Motion in the Presence of Space Charge6.1.3 Incoherent Tune Shift; 6.1.4 The Beam-Beam Tune Shift; 6.1.5 Image Charge and Image Current Effects; 6.2 The Negative Mass Instability; 6.2.1 The Longitudinal Space Charge Field; 6.2.2 Perturbation of the Line Density; 6.3 Wake Fields and Impedance; 6.3.1 Field of a Relativistic Charge in Vacuum; 6.3.2 Wake Field for a Resistive Wall; 6.3.3 Wake Functions; 6.3.4 Impedance; 6.4 Macroparticle Models of Coherent Instabilities; 6.4.1 Beam Breakup in Linacs; 6.4.2 The Strong Head-Tail Instability; 6.4.3 The Head-Tail Instability 6.5 Evolution of the Distribution Function |
| Record Nr. | UNISA-996203218803316 |
|
Edwards D. A (Donald A.), <1927->
|
||
| New York, : Wiley, c1993 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. di Salerno | ||
| ||
An introduction to the physics of high energy accelerators [[electronic resource] /] / D.A. Edwards, M.J. Syphers
| An introduction to the physics of high energy accelerators [[electronic resource] /] / D.A. Edwards, M.J. Syphers |
| Autore | Edwards D. A (Donald A.), <1927-> |
| Pubbl/distr/stampa | New York, : Wiley, c1993 |
| Descrizione fisica | 1 online resource (306 p.) |
| Disciplina |
530.416
539.73 |
| Altri autori (Persone) | SyphersM. J. <1957-> |
| Collana | Wiley series in beam physics and accelerator technology |
| Soggetto topico |
Particle accelerators
Particles (Nuclear physics) |
| ISBN |
1-282-01049-2
9786612010491 3-527-61727-2 3-527-61728-0 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
An Introduction to the Physics of High Energy Accelerators; Contents; Series Preface; Preface; 1 Introduction; 1.1 Prerequisites; 1.2 Uses of Accelerators; 1.2.1 Luminosity of a High Energy Collider; 1.2.2 Synchrotron Radiation Sources; Problems; 2 Acceleration and Phase Stability; 2.1 Acceleration Methods; 2.1.1 DC Accelerators; 2.1.2 Time Varying Electromagnetic Fields; 2.1.3 Resonant Cavities; 2.1.4 Accelerating Structures; 2.2 Phase Stability; 2.2.1 Synchrotron Oscillations; 2.2.2 Adiabatic Damping and Longitudinal Emmittance; 2.2.3 Transition Crossing
2.3 The Need for Transverse FocusingProblems; 3 Transverse Linear Motion; 3.1 Stability of Transverse Oscillations; 3.1.1 Weak Focusing; 3.1.2 Strong Focusing; 3.1.3 Stability Criterion; 3.2 Equation of Motion; 3.2.1 Piecewise Method of Solution; 3.2.2 Closed Form Solution; 3.2.3 Courant-Snyder Parameters; 3.2.4 Emittance and Admittance; 3.2.5 Adiabatic Damping of Betatron Oscillations; 3.3 Momentum Dispersion; 3.3.1 Equation of Motion for an Off-Momentum Particle; 3.3.2 Solution of Equation of Motion; 3.4 Linear Deviations from the Ideal Lattice; 3.4.1 Steering Errors and Corrections 3.4.2 Focusing Errors and Corrections3.4.3 Chromaticity; Problems; 4 Resonances and Transverse Nonlinear Motion; 4.1 Transverse Resonances; 4.1.1 Floquet Transformation; 4.1.2 Multipole Expansion; 4.1.3 The Driven Oscillator and Rational Numbers; 4.2 A Third-Integer Resonance; 4.2.1 Equation of Motion; 4.2.2 Recognition of the Sextupole Resonance; 4.2.3 First Integral and the Separatrix; 4.2.4 Application to Resonant Extraction; 4.2.5 Comments on Correction Systems; 4.3 The Hamiltonian Formalism; 4.3.1 Review of Hamiltonian Dynamics; 4.3.2 The Hamiltonian for Small Transverse Oscillations 4.3.3 Transformations of the Hamiltonian4.3.4 The Third-Integer Resonance Revisited; Problems; 5 Transverse Coupled Motion; 5.1 Linear Coupling; 5.1.1 Coupled Harmonic Oscillators; 5.1.2 Perturbation Treatment of a Single Skew Quadrupole; 5.1.3 Matrix Treatment of a Single Skew Quadrupole; 5.1.4 Matrix Formalism of Linear Coupling; 5.2 Nonlinear Coupling; 5.2.1 Two-Degree-of-Freedom Sum Resonance Due to Distribution of Sextupoles; 5.2.2 Multipoles and Resonance Lines; Problems; 6 Intensity Dependent Effects; 6.1 Space Charge; 6.1.1 The Transverse Space Charge Force 6.1.2 Equation of Motion in the Presence of Space Charge6.1.3 Incoherent Tune Shift; 6.1.4 The Beam-Beam Tune Shift; 6.1.5 Image Charge and Image Current Effects; 6.2 The Negative Mass Instability; 6.2.1 The Longitudinal Space Charge Field; 6.2.2 Perturbation of the Line Density; 6.3 Wake Fields and Impedance; 6.3.1 Field of a Relativistic Charge in Vacuum; 6.3.2 Wake Field for a Resistive Wall; 6.3.3 Wake Functions; 6.3.4 Impedance; 6.4 Macroparticle Models of Coherent Instabilities; 6.4.1 Beam Breakup in Linacs; 6.4.2 The Strong Head-Tail Instability; 6.4.3 The Head-Tail Instability 6.5 Evolution of the Distribution Function |
| Record Nr. | UNINA-9910830068603321 |
|
Edwards D. A (Donald A.), <1927->
|
||
| New York, : Wiley, c1993 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
| ||
An introduction to the physics of high energy accelerators [[electronic resource] /] / D.A. Edwards, M.J. Syphers
| An introduction to the physics of high energy accelerators [[electronic resource] /] / D.A. Edwards, M.J. Syphers |
| Autore | Edwards D. A (Donald A.), <1927-> |
| Pubbl/distr/stampa | New York, : Wiley, c1993 |
| Descrizione fisica | 1 online resource (306 p.) |
| Disciplina |
530.416
539.73 |
| Altri autori (Persone) | SyphersM. J. <1957-> |
| Collana | Wiley series in beam physics and accelerator technology |
| Soggetto topico |
Particle accelerators
Particles (Nuclear physics) |
| ISBN |
1-282-01049-2
9786612010491 3-527-61727-2 3-527-61728-0 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Nota di contenuto |
An Introduction to the Physics of High Energy Accelerators; Contents; Series Preface; Preface; 1 Introduction; 1.1 Prerequisites; 1.2 Uses of Accelerators; 1.2.1 Luminosity of a High Energy Collider; 1.2.2 Synchrotron Radiation Sources; Problems; 2 Acceleration and Phase Stability; 2.1 Acceleration Methods; 2.1.1 DC Accelerators; 2.1.2 Time Varying Electromagnetic Fields; 2.1.3 Resonant Cavities; 2.1.4 Accelerating Structures; 2.2 Phase Stability; 2.2.1 Synchrotron Oscillations; 2.2.2 Adiabatic Damping and Longitudinal Emmittance; 2.2.3 Transition Crossing
2.3 The Need for Transverse FocusingProblems; 3 Transverse Linear Motion; 3.1 Stability of Transverse Oscillations; 3.1.1 Weak Focusing; 3.1.2 Strong Focusing; 3.1.3 Stability Criterion; 3.2 Equation of Motion; 3.2.1 Piecewise Method of Solution; 3.2.2 Closed Form Solution; 3.2.3 Courant-Snyder Parameters; 3.2.4 Emittance and Admittance; 3.2.5 Adiabatic Damping of Betatron Oscillations; 3.3 Momentum Dispersion; 3.3.1 Equation of Motion for an Off-Momentum Particle; 3.3.2 Solution of Equation of Motion; 3.4 Linear Deviations from the Ideal Lattice; 3.4.1 Steering Errors and Corrections 3.4.2 Focusing Errors and Corrections3.4.3 Chromaticity; Problems; 4 Resonances and Transverse Nonlinear Motion; 4.1 Transverse Resonances; 4.1.1 Floquet Transformation; 4.1.2 Multipole Expansion; 4.1.3 The Driven Oscillator and Rational Numbers; 4.2 A Third-Integer Resonance; 4.2.1 Equation of Motion; 4.2.2 Recognition of the Sextupole Resonance; 4.2.3 First Integral and the Separatrix; 4.2.4 Application to Resonant Extraction; 4.2.5 Comments on Correction Systems; 4.3 The Hamiltonian Formalism; 4.3.1 Review of Hamiltonian Dynamics; 4.3.2 The Hamiltonian for Small Transverse Oscillations 4.3.3 Transformations of the Hamiltonian4.3.4 The Third-Integer Resonance Revisited; Problems; 5 Transverse Coupled Motion; 5.1 Linear Coupling; 5.1.1 Coupled Harmonic Oscillators; 5.1.2 Perturbation Treatment of a Single Skew Quadrupole; 5.1.3 Matrix Treatment of a Single Skew Quadrupole; 5.1.4 Matrix Formalism of Linear Coupling; 5.2 Nonlinear Coupling; 5.2.1 Two-Degree-of-Freedom Sum Resonance Due to Distribution of Sextupoles; 5.2.2 Multipoles and Resonance Lines; Problems; 6 Intensity Dependent Effects; 6.1 Space Charge; 6.1.1 The Transverse Space Charge Force 6.1.2 Equation of Motion in the Presence of Space Charge6.1.3 Incoherent Tune Shift; 6.1.4 The Beam-Beam Tune Shift; 6.1.5 Image Charge and Image Current Effects; 6.2 The Negative Mass Instability; 6.2.1 The Longitudinal Space Charge Field; 6.2.2 Perturbation of the Line Density; 6.3 Wake Fields and Impedance; 6.3.1 Field of a Relativistic Charge in Vacuum; 6.3.2 Wake Field for a Resistive Wall; 6.3.3 Wake Functions; 6.3.4 Impedance; 6.4 Macroparticle Models of Coherent Instabilities; 6.4.1 Beam Breakup in Linacs; 6.4.2 The Strong Head-Tail Instability; 6.4.3 The Head-Tail Instability 6.5 Evolution of the Distribution Function |
| Record Nr. | UNINA-9910840683603321 |
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Edwards D. A (Donald A.), <1927->
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| New York, : Wiley, c1993 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. Federico II | ||
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An introduction to the physics of particle accelerators [e-book] / Mario Conte, William W. MacKay
| An introduction to the physics of particle accelerators [e-book] / Mario Conte, William W. MacKay |
| Autore | Conte, Mario |
| Pubbl/distr/stampa | Singapore ; River Edge, NJ : World Scientific, c1994 |
| Descrizione fisica | 1 online resource (xii, 250 p.) : ill. |
| Disciplina | 539.73 |
| Altri autori (Persone) | MacKay, William W. |
| Altri autori (Enti) | EBSCOhost (Online service) |
| Soggetto topico |
Particle accelerators
Nuclear physics - Instruments |
| ISBN | 9789814439633 |
| Classificazione |
LC QC787.P3
53.0.671 |
| Formato | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione | eng |
| Record Nr. | UNISALENTO-991002641579707536 |
|
Conte, Mario
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| Singapore ; River Edge, NJ : World Scientific, c1994 | ||
| Materiale a stampa | ||
| Lo trovi qui: Univ. del Salento | ||
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