Thin Film Processes

• Autore: Jung Hyun Wook
• Pubblicazione: Basel, Switzerland, : MDPI - Multidisciplinary Digital Publishing Institute, 2020
• Descrizione fisica: 1 electronic resource (172 p.)
• Soggetto topico: History of engineering & technology
• Soggetto non controllato: electrode; layer-by-layer; liquid crystal device; thin film; 6082-T6 aluminum alloy; Plasma Electrolytic Oxidation (PEO); Plasma Spray Ceramic (PSC); Hard Anodizing (HA); anodic polarization; corrosion resistance; lemongrass; Cymbopogon citratus; convection drying; mathematical modeling; moisture diffusivity; activation energy; Jeffrey, Maxwell, Oldroyed-B fluids; unsteady stretching surface; magnetic field; homotropy analysis method (HAM); entropy generation; second-grade fluid; nanofluid; liquid films; time depending stretching surface; HAM; Al(OH)3; BaSO4; filler; ultrafine powder coatings; Sisko fluid; unsteady stretching sheet; thin films; MHD; HAM and numerical method; coatings industry; digitalization; development process; technical enabler; process analysis; process simulation; hydrocarbon fuel; coke; anti-coking coating; growth characteristics
• Persona (resp. second.): JungHyun Wook
• Sommario/riassunto: Thin film processes are significantly incorporated in manufacturing display panels, secondary batteries, fuel/solar cells, catalytic films, membranes, adhesives, and other commodity films. This Special Issue on “Thin Film Processes” of Processes listed recent progress on thin-film processes, covering theoretical considerations, experimental observations, and computational techniques. Articles in this Issue consider comprehensive studies on thin film processes and related materials.
• Titolo autorizzato: Thin Film Processes
• Formato: Materiale a stampa
• Livello bibliografico: Monografia
• Lingua di pubblicazione: Inglese
• Record Nr.: 9910557115703321
• Lo trovi qui: Univ. Federico II