1998 3rd International Symposium on Plasma Process-Induced Damage : June 4-5, 1998, Honolulu, Hawaii, USA
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| Titolo: |
1998 3rd International Symposium on Plasma Process-Induced Damage : June 4-5, 1998, Honolulu, Hawaii, USA
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| Pubblicazione: | [Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 1998 |
| Disciplina: | 621.3815/2 |
| Soggetto topico: | Semiconductor wafers - Defects |
| Semiconductors - Effect of radiation on | |
| Plasma etching | |
| Electrical & Computer Engineering | |
| Engineering & Applied Sciences | |
| Electrical Engineering | |
| Persona (resp. second.): | HookTerence |
| NakamuraMoritaka | |
| DaoLeanne Thuy Lien | |
| Note generali: | Bibliographic Level Mode of Issuance: Monograph |
| Titolo autorizzato: | 1998 3rd International Symposium on Plasma Process-Induced Damage : June 4-5, 1998, Honolulu, Hawaii, USA |
| Formato: | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione: | Inglese |
| Record Nr.: | 9910872956003321 |
| Lo trovi qui: | Univ. Federico II |
| Opac: | Controlla la disponibilità qui |