{"text_format":"2","workbook":"xls","n_sheets":1,"sheets":["report2"],"not_rendered":{"charts":0,"images":0,"macros":0,"external_links":1,"defined_names":1,"comments":0,"pivot_tables":0},"unopened":[],"bounds":{"document_bytes":16777216,"sheet_cells":100000,"run_cost":"one","rows_first":2000,"rows_last":500,"rows_between":2000,"halvings":0,"cell_chars":16384,"cell_head_chars":4096},"cells_cut":0,"cells_raw":0,"read":"whole","date_system":"1900","formulas":"cached_only"}

{"sheet":"report2","index":0,"n_rows":26,"n_cols":5,"rows_kept":26,"cut":false,"hidden":false,"merged":[[0,2,0,3],[0,4,0,5],[1,2,1,3],[1,4,1,5],[2,2,2,3],[3,2,3,3],[6,2,6,3],[7,2,7,3],[8,2,8,3],[9,2,9,3],[11,2,11,3],[13,2,13,3],[14,2,14,3],[18,2,18,3]],"flags":["formulas_cached_only"]}
[null,"1.","Record Nr.",null,"UNINA9911006673703321"]
[null,null,"Titolo",null,"Handbook of deposition technologies for films and coatings : science, technology, and applications / / edited by Rointan F. Bunshah"]
[null,null,"Pubbl/distr/stampa",null,"Park Ridge, N.J., : Noyes Publications, c1994"]
[null,null,"ISBN",null,"1-282-00262-7"]
[{"$nulls":4},"0-08-094588-0"]
[{"$nulls":4},"0-8155-1746-7"]
[null,null,"Edizione",null,"[2nd ed.]"]
[null,null,"Descrizione fisica",null,"1 online resource (887 p.)"]
[null,null,"Collana",null,"Materials science and process technology seriess"]
[null,null,"Disciplina",null,"620.1"]
[{"$nulls":4},"667/.9"]
[null,null,"Soggetti",null,"Coating processes"]
[{"$nulls":4},"Surfaces (Technology)"]
[null,null,"Lingua di pubblicazione",null,"Inglese"]
[null,null,"Formato",null,"Materiale a stampa"]
[null,null,null,"Livello bibliografico","Monografia"]
[null,null,null,"Note generali","Rev. ed. of: Deposition technologies for films and coatings. c1982."]
[null,null,null,"Nota di bibliografia","Includes bibliographical references and index."]
[null,null,"Nota di contenuto",null,"Front Cover; Handbook of Ellipsometry; Copyright Page; Contents; Part 1: Theory of Ellipsometry; Chapter 1. Polarized Light and Ellipsometry; 1.1 A Quick Guide to Ellipsometry; 1.2 Maxwell and Wave Equations; 1.3 Representations of Polarization; 1.4 Propagation of Polarized Light; 1.5 Reflection and Transmission of Polarized Light at Planar Interfaces; 1.6 References; Chapter 2. Optical Physics of Materials; 2.1 Introduction; 2.2 Propagation of Light in Solids; 2.3 Classical Theories of the Optical Properties of Solids; 2.4 Quantum Mechanical Theories of the Optical Properties of Solids"]
[{"$nulls":4},"2.5 Modeling the Optical Properties of Solids2.6 Overview and Concluding Remarks; 2.7 References and Bibliography; Chapter 3. Data Analysis for Spectroscopic Ellipsometry; 3.1 Introduction; 3.2 Ellipsometry Parameters; 3.3 Calculation of Complex Reflection Coefficients; 3.4 Models for Dielectric Functions; 3.5 Fitting Models to Data; 3.6 Determination of Optical Functions from Spectroscopic Ellipsometry Data; 3.7 Depolarization; 3.8 Further Reading and References; Part 2: Instrumentation; Chapter 4. Optical Components and the Simple PCSA (Polarizer, Compensator, Sample, Analyzer) Ellipsometer"]
[{"$nulls":4},"4.1 General4.2 The Components; 4.3 Ellipsometer Component Configurations; 4.4 References; Chapter 5. Rotating Polarizer and Analyzer Ellipsometry; 5.1 Introduction; 5.2 Comparison of "]
[{"$nulls":4},"Ellipsometers; 5.3 Instrumentation Issues; 5.4 Data Reduction for the Rotating Polarizer and Analyzer Ellipsometers; 5.5 Precision Considerations; 5.6 Calibration Procedures; 5.7 Summary: Recent and Future Directions; 5.8 References; Chapter 6. Polarization Modulation Ellipsometry; 6.1 Introduction; 6.2 The Photoelastic Modulator (PEM); 6.3 Experimental Configurations of Polarization Modulation Ellipsometers"]
[{"$nulls":4},"6.4 Light Intensity Through a Polarization Modulation Ellipsometer6.5 Waveform Analysis; 6.6 Calibration Procedures; 6.7 Errors; 6.8 Further Reading and References; Chapter 7. Multichannel Ellipsometry; 7.1 Introduction; 7.2 Overview of Instrumentation; 7.3 Rotating-Element Designs; 7.4 Concluding Remarks; 7.5 References; Part 3: Critical Reviews of Some Applications; Chapter 8. SiO2 Films; 8.1 Introduction; 8.2 Historical Perspective - Prior to 1970; 8.3 Modern Studies - Since 1970; 8.4 Conclusions; 8.5 References; Chapter 9. Theory and Application of Generalized Ellipsometry"]
[{"$nulls":4},"9.1 Introduction9.2 The Generalized Ellipsometry Concept; 9.3 Theory of Generalized Ellipsometry; 9.4 Special Generalized Ellipsometry Solutions; 9.5 Strategies in Generalized Ellipsometry; 9.6 Generalized Ellipsometry Applications; 9.7 Conclusions; 9.8 Further Reading and References; Part 4: Emerging Areas in Ellipsometry; Chapter 10. VUV Ellipsometry; 10.1 Introduction; 10.2 Historical Review of Short Wavelength Ellipsometry; 10.3 VUV Ellipsometry Today; 10.4 Importance of VUV Ellipsometry; 10.5 Survey of Applications; 10.6 Future of VUV Ellipsometry; 10.7 Acknowledgments; 10.8 References"]
[{"$nulls":4},"Chapter 11. Spectroscopic Infrared Ellipsometry"]
[null,null,null,"Sommario/riassunto","This second edition, edited by the world-renowned Dr. Rointain Bunshah, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications.  Considerably more material was added in Plasma Assisted Vapor Deposition processes, as well as Metallurgical Coating Applications."]