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[null,"1.","Record Nr.",null,"UNINA9910831036703321"]
[null,null,"Titolo",null,"Dielectric films for advanced microelectronics [[electronic resource] /] / edited by Mikhail Baklanov, Martin Green, and Karen Maex"]
[null,null,"Pubbl/distr/stampa",null,"Chichester, England ; ; Hoboken, NJ, : John Wiley & Sons, c2007"]
[null,null,"ISBN",null,"1-282-34620-2"]
[{"$nulls":4},"9786612346200"]
[{"$nulls":4},"0-470-01794-5"]
[{"$nulls":4},"0-470-06541-9"]
[null,null,"Descrizione fisica",null,"1 online resource (510 p.)"]
[null,null,"Collana",null,"Wiley series in materials for electronic and optoelectronic applications"]
[null,null,"Disciplina",null,"621.381"]
[null,null,"Soggetti",null,"Dielectric films"]
[{"$nulls":4},"Microelectronics - Materials"]
[null,null,"Lingua di pubblicazione",null,"Inglese"]
[null,null,"Formato",null,"Materiale a stampa"]
[null,null,null,"Livello bibliografico","Monografia"]
[null,null,null,"Note generali","Description based upon print version of record."]
[null,null,null,"Nota di bibliografia","Includes bibliographical references and index."]
[null,null,"Nota di contenuto",null,"Low and ultralow dielectric constant films prepared by plasma-enhanced chemical vapor deposition / A. Grill -- Spin-on dielectric materials / Geraud Dubois, Robert D. Miller, Willi Volksen -- Positron annihilation spectroscopy / David W. Gidley, Hua-Gen Peng, Richard Vallery -- Structure characterization of nanoporous interlevel dielectric thin films with x-ray and neutron radiation / Christopher L. Soles ... [et al.] -- Ellipsometric porosimetry / Mikhail R. Baklanov -- Mechanical and transport properties of low-k dielectrics / J. L. Plawsky ... [et al.] -- Integration of low-k dielectric films in damascene processes / R. J. O. M. Hoofman ... [et al.] -- ONO structures and oxynitrides in modern microelectronics : material science, characterization and application / Yakov Roizin, Vladimir Gritsenko -- Material engineering of high-k gate dielectrics / Akira Toriumi, Koji Kita -- Physical characterization of ultra-thin high-k dielectric / T. Conard, H. Bender, W. Vandervorst -- Electrical characterization of advanced gate dielectrics / Robin Degraeve ... [et al.] -- Integration issues of high-k gate dielectrics / Yasuo Nara -- Anisotropic conductive film (ACF) for advanced microelectronic interconnects / Yi Li, C. P. Wong."]
[null,null,null,"Sommario/riassunto","The topic of thin films is an area of increasing importance in materials science, electrical engineering and applied solid state physics; with both research and industrial applications in microelectronics, computer manufacturing, and physical devices. Advanced, high-performance "]
[{"$nulls":4},"computers, high-definition TV, broadband imaging systems, flat-panel displays, robotic systems, and medical electronics and diagnostics are a few examples of the miniaturized device technologies that depend on the utilization of thin film materials. This book presents an in-depth overview of the novel developments mad"]