{"text_format":"2","workbook":"xls","n_sheets":1,"sheets":["report2"],"not_rendered":{"charts":0,"images":0,"macros":0,"external_links":1,"defined_names":1,"comments":0,"pivot_tables":0},"unopened":[],"bounds":{"document_bytes":16777216,"sheet_cells":100000,"run_cost":"one","rows_first":2000,"rows_last":500,"rows_between":2000,"halvings":0,"cell_chars":16384,"cell_head_chars":4096},"cells_cut":0,"cells_raw":0,"read":"whole","date_system":"1900","formulas":"cached_only"}

{"sheet":"report2","index":0,"n_rows":21,"n_cols":5,"rows_kept":21,"cut":false,"hidden":false,"merged":[[0,2,0,3],[0,4,0,5],[1,2,1,3],[1,4,1,5],[2,2,2,3],[2,4,2,5],[3,2,3,3],[5,2,5,3],[9,2,9,3],[10,2,10,3],[11,2,11,3],[12,2,12,3],[13,2,13,3],[14,2,14,3],[15,2,15,3],[19,2,19,3]],"flags":["formulas_cached_only"]}
[null,"1.","Record Nr.",null,"UNINA9910830314403321"]
[null,null,"Autore",null,"Landis Stefan"]
[null,null,"Titolo",null,"Nano-lithography [[electronic resource] /] / edited by Stefan Landis"]
[null,null,"Pubbl/distr/stampa",null,"London, : ISTE"]
[{"$nulls":4},"Hoboken, N.J., : Wiley, 2011"]
[null,null,"ISBN",null,"1-118-62170-0"]
[{"$nulls":4},"1-118-62258-8"]
[{"$nulls":4},"1-299-31558-5"]
[{"$nulls":4},"1-118-62162-X"]
[null,null,"Edizione",null,"[1st edition]"]
[null,null,"Descrizione fisica",null,"1 online resource (353 p.)"]
[null,null,"Collana",null,"ISTE"]
[null,null,"Disciplina",null,"621.381531"]
[null,null,"Soggetti",null,"Nanolithography"]
[null,null,"Lingua di pubblicazione",null,"Inglese"]
[null,null,"Formato",null,"Materiale a stampa"]
[null,null,null,"Livello bibliografico","Monografia"]
[null,null,null,"Note generali","\"Adapted and updated from La nanolithographie published 2010 in France by Hermes Science/Lavoisier\"--t.p. verso."]
[null,null,null,"Nota di bibliografia","Includes bibliographical references and index."]
[null,null,"Nota di contenuto",null,"Ch. 1. X-ray lithography : fundamentals and applications -- ch. 2. NanoImprint lithography -- ch. 3. Lithography techniques using scanning probe microscopy -- ch. 4. Lithography and manipulation based on the optical properties of metal nanostructures -- ch. 5. Patterning with self-assembling block copolymers -- ch. 6. Metrology for lithography."]
[null,null,null,"Sommario/riassunto","Lithography is an extremely complex tool - based on the concept of \"imprinting\" an original template version onto mass output - originally using relatively simple optical exposure, masking, and etching techniques, and now extended to include exposure to X-rays, high energy UV light, and electron beams - in processes developed to manufacture everyday products including those in the realms of consumer electronics, telecommunications, entertainment, and transportation, to name but a few. In the last few years, researchers and engineers have pushed the envelope of fields including optics, physics,"]