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[null,"1.","Record Nr.",null,"UNINA990009377080403321"]
[null,null,"Autore",null,"Chiasson, Robert B."]
[null,null,"Titolo",null,"Laboratory anatomy of the white rat / Robert B. Chiasson"]
[null,null,"Pubbl/distr/stampa",null,"Dubuque, Iowa : W. C. Brown company publishers, 1958"]
[null,null,"Descrizione fisica",null,"48 p. : ill. ; 28 cm"]
[null,null,"Disciplina",null,"591.4"]
[null,null,"Locazione",null,"DMVSF"]
[null,null,"Collocazione",null,"IIIc C 151"]
[null,null,"Lingua di pubblicazione",null,"Inglese"]
[null,null,"Formato",null,"Materiale a stampa"]
[null,null,null,"Livello bibliografico","Monografia"]
[null,"2.","Record Nr.",null,"UNINA9910460527703321"]
[null,null,"Autore",null,"Stringam Betsy Bender"]
[null,null,"Titolo",null,"A profile of the hospitality industry / / Betsy Bender Stringam and Charles G. Partlow"]
[null,null,"Pubbl/distr/stampa",null,"New York, New York (222 East 46th Street, New York, NY 10017) : , : Business Expert Press, , 2016"]
[null,null,"ISBN",null,"1-78684-371-4"]
[{"$nulls":4},"1-60649-919-X"]
[null,null,"Edizione",null,"[First edition.]"]
[null,null,"Descrizione fisica",null,"1 online resource (vi, 170 pages)"]
[null,null,"Collana",null,"Industry profiles collection, , 2331-0073"]
[null,null,"Disciplina",null,"647.9573"]
[null,null,"Soggetti",null,"Hospitality industry"]
[{"$nulls":4},"Electronic books."]
[null,null,"Lingua di pubblicazione",null,"Inglese"]
[null,null,"Formato",null,"Materiale a stampa"]
[null,null,null,"Livello bibliografico","Monografia"]
[null,null,null,"Nota di bibliografia","Includes bibliographical references (pages 131-164) and index."]
[null,null,"Nota di contenuto",null,"1. Introduction -- 2. How the industry operates -- 3. Industry organization and competition -- 4. Uniqueness of the hospitality product -- 5. Competitive strategies -- 6. Outside market forces -- 7. Challenges and opportunities for the industry -- Resources for further study -- References -- Endnotes -- Index."]
[null,null,null,"Sommario/riassunto","The hospitality industry is generally referred to as businesses that provide accommodation and foodservice. Traditionally an entrepreneurial business, it now includes organizations ranging from small independent cafes to large multinational corporations. Businesses in the hospitality industry have many organizational structures to include whole ownership, franchising, consortia, and management contracts as key configurations. Affected by capital investment, travel and tourism trends, threats and opportunities, the hospitality industry has proved resilient."]
[null,"3.","Record Nr.",null,"UNINA9910827311103321"]
[null,null,"Autore",null,"Kääriäinen Tommi"]
[null,null,"Titolo",null,"Atomic layer deposition : principles, characteristics, and nanotechnology applications / / Tommi Kaariainen ... [et al.]"]
[null,null,"Pubbl/distr/stampa",null,"Hoboken, NJ, : John Wiley & Sons, c2013"]
[null,null,"ISBN",null,"9781118747407"]
[{"$nulls":4},"1118747402"]
[{"$nulls":4},"9781118747421"]
[{"$nulls":4},"1118747429"]
[{"$nulls":4},"9781118747384"]
[{"$nulls":4},"1118747380"]
[null,null,"Edizione",null,"[2nd ed.]"]
[null,null,"Descrizione fisica",null,"1 online resource (272 p.)"]
[null,null,"Disciplina",null,"620/.5"]
[null,null,"Soggetti",null,"Chemical vapor deposition"]
[{"$nulls":4},"Epitaxy"]
[{"$nulls":4},"Microelectronics"]
[{"$nulls":4},"Nanotechnology"]
[null,null,"Lingua di pubblicazione",null,"Inglese"]
[null,null,"Formato",null,"Materiale a stampa"]
[null,null,null,"Livello bibliografico","Monografia"]
[null,null,null,"Note generali","Description based upon print version of record."]
[null,null,null,"Nota di bibliografia","Includes bibliographical references and index."]
[null,null,"Nota di contenuto",null,"Cover; Title Page; Copyright Page; Contents; Acknowledgements; Foreword; Preface; 1 Fundamentals of Atomic Layer Deposition; 1.1 Chemical Vapour Deposition; 1.1.1 Thermal CVD; 1.1.2 Plasma Enhanced CVD (PECVD); 1.2 Vapour Adsorption; 1.2.1 Physisorption; 1.2.2 Chemisorption; 1.3 Atomic Layer Deposition (ALD); 1.3.1 Thermal ALD Processes; 1.3.2 Radical Enhanced ALD (REALD); 1.3.3 Spatial ALD (SALD); References; 2 Elemental Semiconductor Epitaxial Films; 2.1 Epitaxial Silicon; 2.1.1 Dichlorosilane Processes; 2.1.2 Other Processes; 2.1.3 Epitaxial Germanium; References"]
[{"$nulls":4},"3 III-V Semiconductor Films3.1 Gallium Arsenide; 3.1.1 Organometallic Precursors; 3.1.2 Halogen Precursors; 3.2 Other III-V Semiconductor Films; 3.3 Applications; 3.3.1 Photonic Structures; 3.3.2 Transistors; References; 4 Oxide films; 4.1 Introduction; 4.2 Aluminum Oxide; 4.2.1 Processes and Properties of Aluminum Oxide; 4.3 Titanium Dioxide; 4.3.1 Processes and Properties of TiO2; 4.4 Zinc Oxide; 4.4.1 Processes and Properties of ZnO; 4.5 Zirconium Dioxide; 4.5.1 Processes and Properties of ZrO2; 4.6 Hafnium Dioxide; 4.6.1 Processes and "]
[{"$nulls":4},"Properties of HfO2; 4.7 Other Oxides; 4.7.1 Tin Oxide"]
[{"$nulls":4},"4.7.2 Indium Oxide4.7.3 Tantalum Oxide; 4.8 Mixed Oxides and Nanolaminates; 4.8.1 Mixed Oxide Processes; 4.8.2 Nanolaminate Oxides; 4.9 Multilayers; References; 5 Nitrides and Other Compounds; 5.1 Introduction; 5.2 Nitrides; 5.2.1 Transition Metal Nitrides; 5.2.2 Group III Nitrides; 5.2.3 Group IV Nitrides; 5.2.4 Mixed Nitrides; 5.3 Chalcogenides; 5.4 Other Compounds; References; 6 Metals; 6.1 Introduction; 6.2 Noble Metals; 6.2.1 Silver Processes and Applications; 6.2.2 Ruthenium Processes and Applications; 6.2.3 Platinum and Palladium Processes and Applications"]
[{"$nulls":4},"6.2.4 Rhrodium Processes and Applications6.2.5 Iridium Processes and Applications; 6.3 Titanium; 6.4 Tantalum; 6.5 Aluminum; 6.6 Copper; 6.7 Other Transition Metals; References; 7 Organic and Hybrid Materials; 7.1 Introduction; 7.2 Organic layers; 7.3 Hybrid Organic-inorganic Layers.; 7.4 Applications of Organic and Hybrid Films; References; 8 ALD Applications and Industry; 8.1 Introduction; 8.2 MEMS/NEMS; 8.3 Thin Film Magnetic Heads; 8.4 Coating Nanoparticles, Nanomaterials and Porous Objects; 8.5 Optical Coatings; 8.6 Thin Film Electroluminescent Displays; 8.7 Solar Cells"]
[{"$nulls":4},"8.8 Anti-corrosion Layers8.9 Opportunities in Organic Electronics; 8.10 ALD Tool Manufacturers and Coating Providers; References; Index"]
[null,null,null,"Sommario/riassunto","Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials."]