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[null,"1.","Record Nr.",null,"UNINA9910826847403321"]
[null,null,"Titolo",null,"Directed self-assembly of block co-polymers for nano-manufacturing / / edited by Roel Gronheid and Paul Nealey"]
[null,null,"Pubbl/distr/stampa",null,"Amsterdam, Netherlands : , : Woodhead Publishing, , 2015"]
[{"$nulls":4},"©2015"]
[null,null,"ISBN",null,"0-08-100261-0"]
[{"$nulls":4},"0-08-100250-5"]
[null,null,"Descrizione fisica",null,"1 online resource (328 p.)"]
[null,null,"Collana",null,"Woodhead Publishing series in electronic and optical materials ; ; Number 83"]
[null,null,"Disciplina",null,"547.84"]
[null,null,"Soggetti",null,"Block copolymers"]
[{"$nulls":4},"Self-assembly (Chemistry)"]
[{"$nulls":4},"Nanomanufacturing"]
[null,null,"Lingua di pubblicazione",null,"Inglese"]
[null,null,"Formato",null,"Materiale a stampa"]
[null,null,null,"Livello bibliografico","Monografia"]
[null,null,null,"Note generali","Description based upon print version of record."]
[null,null,null,"Nota di bibliografia","Includes bibliographical references at the end of each chapters and index."]
[null,null,"Nota di contenuto",null,"Front Cover; Directed Self-assembly of Block Copolymers for Nano-manufacturing; Copyright; Contents; List of contributors; Woodhead Publishing Series in Electronic and Optical Materials; Part One: Physics and chemistry of block copolymer (BCP) materials ; Chapter 1: Physics of block copolymers from bulk to thin films; 1.1 . Introduction; 1.2 . Order-disorder transition of block copolymers; 1.2.1 . Disordered state; 1.2.2 . Weak segregation limit in ordered state; 1.2.3 . Strong segregation limit in ordered state; 1.2.4 . Phase diagram obtained by using self-consistent field theory"]
[{"$nulls":4},"1.3 . Morphologies of diblock copolymer/homopolymer mixtures1.4 . Dynamics of phase transition in block copolymers; 1.5 . Structures of block copolymer in thin films; 1.5.1 . Free energy of block copolymer thin film; 1.5.2 . Effect of surface energy term;  F surface ; 1.5.3 . Effect of bulk energy term F bulk ; 1.6 . Conclusion; References; Chapter 2: RAFT synthesis of block copolymers and their self-assembly properties; 2.1 . RAFT process description; 2.2 . Polymerization process details; 2.2.1 . In situ process analysis; 2.3 . RAFT end-group catalytic radical reduction"]
[{"$nulls":4},"2.4 . Block Copolymer In situ Topcoat Applications2.5 . DSA Applications; 2.6 . High chi block copolymers; 2.7 . Conclusions; Acknowledgments; References; Chapter 3: Thermal and solvent "]
[{"$nulls":4},"annealing of block copolymer films; 3.1 . Introduction; 3.2 . Thermal annealing of BCPs films; 3.2.1 . Fundamental consideration; 3.2.2 . Film thickness effect and temperature gradient; 3.2.3 . Crystallization behavior induced by thermal annealing; 3.3 . Solvent annealing of BCPs films; 3.3.1 . Fundamental consideration; 3.3.2 . Factors affecting the annealing process"]
[{"$nulls":4},"3.3.3 . Combination of solvent annealing and thermal annealing3.4 . Summary and outlook; References; Chapter 4: Field-theoretic simulations and self-consistent field theory for studying block copolymer directed self-assembly; 4.1  Introduction; 4.2  Overview of field-theory-based simulations of block copolymer DSA; 4.3  Chemoepitaxy modeling; 4.4  Graphoepitaxy modeling; 4.4.1  Cylinders in a rectangular trench; 4.4.2  Contact hole shrink; 4.5  Summary and outlook; References; Part Two: Templates and patterning for directed self-assembly"]
[{"$nulls":4},"Chapter 5: Directed self-oriented self-assembly of block copolymers using topographical surfaces5.1 . Introduction; 5.2 . Control of interfacial interactions; 5.3 . Graphoepitaxy; 5.3.1 . Fabrication of topographical surfaces; 5.3.2 . Geometry with deep patterning; 5.3.2.1 . Deep trench surfaces; 5.3.2.2 . Post surfaces; 5.3.2.3 . Other surfaces; 5.3.3 . Geometry with minimal patterning; 5.3.3.1 . Faceted surfaces; 5.3.3.2 . Shallow trench surfaces; 5.4 . Application of BCPs guided by topographical surfaces; 5.5 . Summary and outlook; References"]
[{"$nulls":4},"Chapter 6: Directed self-oriented self-assembly of block copolymers using chemically modified surfaces"]
[null,null,null,"Sommario/riassunto","The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology.   Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new"]