{"text_format":"2","workbook":"xls","n_sheets":1,"sheets":["report2"],"not_rendered":{"charts":0,"images":0,"macros":0,"external_links":1,"defined_names":2,"comments":0,"pivot_tables":0},"unopened":[],"bounds":{"document_bytes":16777216,"sheet_cells":100000,"run_cost":"one","rows_first":2000,"rows_last":500,"rows_between":2000,"halvings":0,"cell_chars":16384,"cell_head_chars":4096},"cells_cut":0,"cells_raw":0,"read":"whole","date_system":"1900","formulas":"cached_only"}

{"sheet":"report2","index":0,"n_rows":43,"n_cols":5,"rows_kept":43,"cut":false,"hidden":false,"merged":[[0,2,0,3],[0,4,0,5],[1,2,1,3],[1,4,1,5],[2,2,2,3],[3,2,3,3],[4,2,4,3],[8,2,8,3],[9,2,9,3],[15,2,15,3],[15,4,15,5],[16,2,16,3],[16,4,16,5],[17,2,17,3],[18,2,18,3],[24,2,24,3],[25,2,25,3],[26,2,26,3],[27,2,27,3],[30,2,30,3],[31,2,31,3],[35,2,35,3]],"flags":["formulas_cached_only"]}
[null,"1.","Record Nr.",null,"UNINA9910708163903321"]
[null,null,"Titolo",null,"Oversight of the federal government's year 2000 efforts : joint hearing before the Subcommittee on Government Management, Information, and Technology of the Committee on Government Reform and Oversight and the Subcommittee on Technology of the Committee on Science, House of Representatives, One Hundred Fifth Congress, second session, March 18, 1998"]
[null,null,"Pubbl/distr/stampa",null,"Washington : , : U.S. Government Printing Office, , 1998"]
[null,null,"Descrizione fisica",null,"1 online resource (v, 172 pages) : illustrations"]
[null,null,"Soggetti",null,"Year 2000 date conversion (Computer systems) - Government policy - United States"]
[{"$nulls":4},"Year 2000 date conversion (Computer systems) - Government policy"]
[{"$nulls":4},"Legislative hearings."]
[{"$nulls":4},"United States"]
[null,null,"Lingua di pubblicazione",null,"Inglese"]
[null,null,"Formato",null,"Materiale a stampa"]
[null,null,null,"Livello bibliografico","Monografia"]
[null,null,null,"Note generali","Title from title screen (viewed on Nov. 2, 2015)."]
[{"$nulls":4},"\"Committee on Government Reform and Oversight serial no. 105-153.\""]
[{"$nulls":4},"\"Committee on Science serial no. 105-55.\""]
[null,null,null,"Nota di bibliografia","Includes bibliographical references."]
[null,"2.","Record Nr.",null,"UNINA9910826057803321"]
[null,null,"Titolo",null,"Trace analysis of specialty and electronic gases / / edited by William M. Geiger, Mark W. Raynor"]
[null,null,"Pubbl/distr/stampa",null,"Hoboken, N.J., : John Wiley & Sons, Inc., 2013"]
[null,null,"ISBN",null,"9781118642573"]
[{"$nulls":4},"1118642570"]
[{"$nulls":4},"9781118642771"]
[{"$nulls":4},"1118642775"]
[{"$nulls":4},"9781118642566"]
[{"$nulls":4},"1118642562"]
[null,null,"Edizione",null,"[1st ed.]"]
[null,null,"Descrizione fisica",null,"1 online resource (387 p.)"]
[null,null,"Disciplina",null,"543"]
[null,null,"Soggetti",null,"Gases - Analysis"]
[{"$nulls":4},"Trace elements - Analysis"]
[{"$nulls":4},"Gases - Spectra"]
[null,null,"Lingua di pubblicazione",null,"Inglese"]
[null,null,"Formato",null,"Materiale a stampa"]
[null,null,null,"Livello bibliografico","Monografia"]
[null,null,null,"Note generali","Description based upon print version of record."]
[null,null,null,"Nota di bibliografia","Includes bibliographical references and index."]
[null,null,"Nota di contenuto",null,"Cover; Title Page; Copyright Page; CONTENTS; List of Figures; List of Tables; Foreword; Acknowledgments; Acronyms; 1 Introduction to Gas Analysis: Past and Future; 1.1 The Beginning; 1.2 Gas Chromatography; 1.3 Ion Chromatography; 1.4 Mass Spectrometry; 1.5 Ion Mobility Spectrometry; 1.6 Optical Spectroscopy; 1.7 Metals Analysis; 1.8 Species-Specific Analyzers; 1.8.1 Oxygen Analyzers; 1.8.2 Paramagnetic Analyzers; 1.8.3 Moisture Analyzers; 1.9 Sensors; 1.10 The Future; References; 2 Sample Preparation and ICP-MS Analysis of Gases for Metals; 2.1 Introduction"]
[{"$nulls":4},"2.2 Extraction of Impurities Before Analysis2.2.1 Filtration Method; 2.2.2 Hydrolysis Method; 2.2.3 Residue Method; 2.2.4 Choice of Sampling Method; 2.2.5 ICP-MS Analysis; 2.3 Direct Analysis of ESGs; 2.3.1 Calibration; 2.3.2 Analysis of Carbon Monoxide; 2.4 Conclusions; References; 3 Novel Improvements in FTIR Analysis of Specialty Gases; 3.1 Gas-Phase Analysis Using FTIR Spectroscopy; 3.2 Gas-Phase Effects on Spectral Line Shape; 3.2.1 External Effects on Line Shapes; 3.2.2 Matrix Gas Effects on Line Shapes; 3.3 Factors That Greatly Affect Quantification; 3.3.1 Isotope Abundance Ratios"]
[{"$nulls":4},"3.3.2 Hydrogen Bonding3.3.3 Alternative Background Removal "]
[{"$nulls":4},"Strategies; 3.3.4 Automatic Region Selection for CLS Methods; 3.4 Future Applications; References; 4 Emerging Infrared Laser Absorption Spectroscopic Techniques for Gas Analysis; 4.1 Introduction; 4.2 Laser Absorption Spectroscopic Techniques; 4.2.1 Quantum and Interband Cascade Lasers; 4.2.2 Cavity-Enhanced Spectroscopy: CRDS and ICOS; 4.2.3 Conventional and Quartz-Enhanced Photoacoustic Spectroscopy; 4.2.4 Cavity-Enhanced Direct Frequency-Comb Spectroscopy; 4.3 Applications of Semiconductor LAS-Based Trace Gas Sensor Systems"]
[{"$nulls":4},"4.3.1 OA-ICOS Online Measurement of Acetylene in an Industrial Hydrogenation Reactor4.3.2 Multicomponent Impurity Analysis in Hydrogen Process Gas Using a Compact QEPAS Sensor; 4.3.3 Analysis of Trace Impurities in Arsine by CE-DFCS at 1.75 to 1.95 mm; 4.4 Conclusions and Future Trends; References; 5 Atmospheric Pressure lonization Mass Spectrometry for Bulk and Electronic Gas Analysis; 5.1 Introduction; 5.2 APIMS Operating Principle; 5.3 Point-to-Plane Corona Discharge lonization; 5.4 Factors Affecting Sensitivity in Point-to-Plane Corona Discharge APIMS; 5.4.1 Effects of Pressure"]
[{"$nulls":4},"5.4.2 Effects of Declustering Lens Voltage5.4.3 Effects of Coexisting Analytes; 5.4.4 Isotopic Dilution APIMS Measurements; 5.5 Applications of Point-to-Plane Corona Discharge APIMS; 5.5.1 Bulk Gas Analysis; 5.5.2 Electronic Specialty Gas Analysis; 5.6 Nickel-63 Beta Emitter APIMS; 5.6.1 Nickel-63 Source Design; 5.6.2 Ion Formation from a Nickel-63 Source; 5.6.3 Importance of the Declustering Region for Nickel-63 Sources; 5.6.4 Overcoming Competing Positive-Ion Proton Affinities; 5.6.5 Negative-Ion Cluster Formation"]
[{"$nulls":4},"5.7 Specialty Gas Analysis Application: Determination of Oxygenated Impurities in High-Purity Ammonia"]
[null,null,null,"Sommario/riassunto","Explores the latest advances and applications of specialty and electronic gas analysis  The semiconductor industry depends upon a broad range of instrumental techniques in order to detect and analyze impurities that may be present in specialty and electronic gases, including permanent gases, water vapor, reaction by-products, and metal species. Trace Analysis of Specialty and Electronic Gases draws together all the latest advances in analytical chemistry, providing researchers with both the theory and the operating principles of the full spectrum of instrumental technique"]