{"text_format":"2","workbook":"xls","n_sheets":1,"sheets":["report2"],"not_rendered":{"charts":0,"images":0,"macros":0,"external_links":1,"defined_names":1,"comments":0,"pivot_tables":0},"unopened":[],"bounds":{"document_bytes":16777216,"sheet_cells":100000,"run_cost":"one","rows_first":2000,"rows_last":500,"rows_between":2000,"halvings":0,"cell_chars":16384,"cell_head_chars":4096},"cells_cut":0,"cells_raw":0,"read":"whole","date_system":"1900","formulas":"cached_only"}

{"sheet":"report2","index":0,"n_rows":22,"n_cols":5,"rows_kept":22,"cut":false,"hidden":false,"merged":[[0,2,0,3],[0,4,0,5],[1,2,1,3],[1,4,1,5],[2,2,2,3],[2,4,2,5],[3,2,3,3],[5,2,5,3],[6,2,6,3],[7,2,7,3],[8,2,8,3],[9,2,9,3],[10,2,10,3],[11,2,11,3],[12,2,12,3],[15,2,15,3]],"flags":["formulas_cached_only"]}
[null,"1.","Record Nr.",null,"UNINA9910488693403321"]
[null,null,"Autore",null,"Suga Shigemasa"]
[null,null,"Titolo",null,"Photoelectron spectroscopy : bulk and surface electronic structures / / Shigemasa Suga, Akira Sekiyama, Christian Tusche"]
[null,null,"Pubbl/distr/stampa",null,"Cham, Switzerland : , : Springer, , [2021]"]
[{"$nulls":4},"©2021"]
[null,null,"ISBN",null,"3-030-64073-6"]
[null,null,"Edizione",null,"[Second edition.]"]
[null,null,"Descrizione fisica",null,"1 online resource (529 pages)"]
[null,null,"Collana",null,"Springer series in surface sciences ; ; Volume 72"]
[null,null,"Disciplina",null,"543.0858"]
[null,null,"Soggetti",null,"Photoelectron spectroscopy"]
[null,null,"Lingua di pubblicazione",null,"Inglese"]
[null,null,"Formato",null,"Materiale a stampa"]
[null,null,null,"Livello bibliografico","Monografia"]
[null,null,null,"Nota di bibliografia","Includes bibliographical references and index."]
[null,null,"Nota di contenuto",null,"Intro -- Preface -- Acknowledgements -- Contents -- About the Authors -- Acronyms -- Symbols -- 1 Introduction -- References -- 2 Theoretical Background -- 2.1 Photoemission Process as One of the Optical Processes -- 2.2 Three-Step Model -- 2.2.1 Introduction of Three-Step Model -- 2.2.2 Step-1: Photoexitations in Solids -- 2.2.3 Step-2: Travel of Photoelectrons to the Surface -- 2.2.4 Step-3: Emission of Photoelectrons into the Vacuum -- 2.3 Matrix Element Effects -- 2.3.1 Momentum Conservation Law for Valence-Band Excitations -- 2.3.2 Photoionization Cross-Sections (PICS) -- 2.3.3 Photoelectron Angular Distribution and Polarization Dependence -- 2.3.4 Polarization Dependence in Angle-Resolved Photoemission -- 2.3.5 Other Remarks -- 2.4 Valence-Band Photoexcitation Process  for Non-interacting Systems -- 2.4.1 Koopmans' Theorem -- 2.4.2 Formulation of Angle-Integrated Photoemission for Non-interacting Systems -- 2.4.3 Formulation of Angle-Resolved Photoemission for Non-interacting Systems -- 2.5 Valence-Band Photoexcitation Process for Strongly Correlated Electrons Systems -- 2.5.1 Effects of Coulomb Repulsions -- 2.5.2 Formulations of ARPES Spectra of Strongly Correlated Electron Systems -- 2.5.3 Quasiparticles and Incoherent Part in the PES Spectra -- 2.5.4 Energy Scale of the Self-energy -- 2.6 Core-Level Photoexcitation Process for Strongly Correlated Electrons Systems -- 2.6.1 Core-Level PES Spectra Reflecting the Outer Strongly Correlated Electronic States -- 2.6.2 Formulations of Core-Level PES -- 2.6.3 Intra-atomic Multiplet Structure in the Core-Level PES Spectra -- 2.7 Theoretical Models to Describe the Spectra of Strongly Correlated Electron Systems -- 2.7.1 Overview -- 2.7.2 Periodic Anderson Model "]
[{"$nulls":4},"(PAM) and d-p Model -- 2.7.3 Single Impurity Anderson Model -- 2.7.4 Configuration-Interaction Cluster Model -- 2.7.5 Hubbard Model."]
[{"$nulls":4},"2.7.6 Dynamical Mean Field Theory -- 2.7.7 Some Remarks -- References -- 3 Instrumentation and Methodology -- 3.1 Synchrotron Radiation and Undulator Radiation -- 3.2 Principle of Grating and Crystal Monochromators -- 3.2.1 Grating Monochromators -- 3.2.2 Crystal Monochromators -- 3.2.3 Focusing Mirrors -- 3.3 Examples of Light Sources -- 3.3.1 High Resolution Vacuum Ultraviolet Synchrotron Radiation Beam Lines -- 3.3.2 High Resolution Soft X-ray Beam Lines -- 3.3.3 High Resolution Hard X-ray Beam Lines -- 3.3.4 Laboratory Vacuum Ultraviolet Sources -- 3.3.5 Laser Sources -- 3.3.6 Miscellaneous Subjects -- 3.4 Electron Spectrometers -- 3.4.1 Hemispherical Analyzers -- 3.4.2 Cylindrical Mirror Analyzers -- 3.4.3 Two-Dimensional Analyzers -- 3.4.4 Time-of-Flight Analyzers -- 3.5 Sample Preparation and Characterization -- 3.5.1 Ion Sputtering, Scraping, Fracturing and Cleavage -- 3.5.2 In-Situ Sample Growth and Surface Analysis -- 3.5.3 Samples at Low Temperatures or at Ambient Pressure -- 3.6 Methodology -- 3.6.1 Angle-Integrated Photoelectron Spectroscopy -- 3.6.2 Resonance Photoemission and Constant Initial State Spectrum -- 3.6.3 Angle-Resolved Photoelectron Spectroscopy -- 3.6.4 Photoelectron Spectroscopy in the μm and nm Regions -- 3.6.5 Momentum Microscope -- References -- 4 Bulk and Surface Sensitivity of Photoelectron Spectroscopy -- 4.1 Concept of Inelastic Mean Free Path -- 4.2 How to Separate the Bulk and Surface Contributions in the Spectra -- References -- 5 Examples of Angle-Integrated Photoelectron Spectroscopy -- 5.1 Valence Band Spectra -- 5.2 Core Level Spectra -- 5.3 Multiplet Structures -- References -- 6 Angle Resolved Photoelectron Spectroscopy in the hν Region of 15 to 200 eV -- 6.1 General -- 6.2 Layered Materials -- 6.3 Rare Earth Compounds -- 6.4 One Dimensional Materials -- 6.5 Topological Insulators -- 6.6 Superconductors."]
[{"$nulls":4},"6.7 Quantum Well States -- References -- 7 High-Resolution Soft X-ray Angle-Integrated and -Resolved Photoelectron Spectroscopy of Correlated Electron Systems -- 7.1 Angle-Integrated Soft X-ray Photoelectron Spectroscopy -- 7.1.1 Ce Compounds -- 7.1.2 Yb Compounds -- 7.1.3 Transition Metal Compounds -- 7.2 Angle-Resolved Soft X-ray Photoelectron Spectroscopy -- 7.2.1 Ce Compounds -- 7.2.2 La2−xSrxCuO4 and Nd2−xCexCuO4 -- 7.2.3 Layered Ruthenates Sr2−xCaxRuO4 -- 7.2.4 V6O13 and SrCuO2 -- 7.2.5 Other Materials (VSe2, LaRu2P2, BiTeI) -- 7.3 Standing Wave -- References -- 8 Hard X-ray Photoelectron Spectroscopy -- 8.1 La1−xSrxMnO3, La2−xSrxCuO4 and Nd2-xCexCuO4 -- 8.2 Sm Compounds -- 8.3 Pr Compounds -- 8.4 Yb Compounds -- 8.5 V Oxides -- 8.6 Recoil Effects -- 8.7 Angle-Resolved Hard X-ray Photoelectron Spectroscopy -- 8.8 Polarization Dependence of Hard X-ray Photoelectron Spectroscopy -- 8.9 Linear Dichroism in Angle-Resolved Core-Level Photoemission -- 8.9.1 Formulations and Simulations of Polarization-Dependent Angle-Resolved Core-Level Photoemission Spectra -- 8.9.2 Partially Filled 4f States Under Crystalline Electric Fields -- 8.9.3 Tetragonal and Cubic Yb Compounds -- 8.9.4 Tetragonal Sm Compounds -- 8.9.5 Cubic Pr Compounds -- 8.9.6 Tetragonal Ce Compounds -- References -- 9 Very Low Photon Energy Photoelectron Spectroscopy -- 9.1 Angle Integrated and Resolved ELEPES by Laser Excitation -- 9.1.1 Angle-Integrated Measurements -- 9.1.2 Angle-Resolved Measurements -- 9.2 ELEPES by Synchrotron Radiation -- 9.3 ELEPES by Microwave-Excited Rare Gas Lamp -- 9.4 Two-Photon Excitation Photoelectron Spectroscopy -- "]
[{"$nulls":4},"References -- 10 Magnetic Dichroism and Spin Polarization in Photoelectron Spectroscopy -- 10.1 Magnetic Circular and Linear Dichroism in Photoelectron Spectroscopy."]
[{"$nulls":4},"10.2 Principle and Instrumentation for Spin Polarized Photoelectron Spectroscopy -- 10.3 Spin Polarized Photoelectron Spectroscopy for Non-magnetic Materials -- 10.3.1 Pt -- 10.3.2 High-Tc Cuprate -- 10.3.3 Rashba Effect and Topological Insulators -- 10.4 Spin Polarized Photoelectron Spectroscopy of Magnetic Materials -- References -- 11 Momentum Microscopy -- 11.1 The Concept of Momentum Space Imaging -- 11.1.1 Instrumental Aspects -- 11.1.2 Energy and Momentum Resolution -- 11.2 Evolution and Applications of Momentum Microscopy -- 11.2.1 Fermi Surface Mapping with a High-Pass Energy Filter -- 11.2.2 Aberration Compensated Energy Filter -- 11.2.3 Electronic Structure of Noble Metals -- 11.2.4 High-Resolution Spectroscopy of Layered Semiconductors -- 11.2.5 Double-Pass Energy Filter -- 11.2.6 Other Dispersive Energy Filters -- 11.3 Time-of-Flight Momentum Microscopy -- 11.3.1 Time-of-Flight Electron Energy Analysis -- 11.3.2 Energy Resolution of a Time-of-Flight Spectrometer -- 11.3.3 Rapid Band Structure Mapping -- 11.3.4 Time-Resolved Spectroscopy -- 11.4 High-Energy Momentum Microscopy -- 11.4.1 Hard X-ray Photoemission Microscopy and Spectroscopy -- 11.4.2 Bulk Fermi Surface Tomography -- 11.5 Spin-Resolved Momentum Microscopy -- 11.5.1 Working Principle of Imaging Spin Filters -- 11.5.2 Properties of the Spin-Filter Crystal -- 11.5.3 Measurements Principles -- 11.5.4 Spin-Resolved ToF Momentum Microscopy -- 11.5.5 Imaging Complex Spin Textures -- 11.5.6 Electronic Structure of Ferromagnets -- 11.5.7 Efficiency of Multichannel Spin Filters -- 11.6 Spin-Resolved Photoelectron Microscopy -- 11.7 Laser Excited Momentum Microscopy -- 11.7.1 Spin Texture of Topological Insulators -- 11.7.2 Surface Doping Effects -- References -- 12 Photoelectron Diffraction and Photoelectron Holography -- References -- 13 Inverse Photoemission -- 13.1 General Concept."]
[{"$nulls":4},"13.2 Isochromat IPES -- 13.3 Angle-Resolved IPES -- 13.4 IPES with a Fixed Incident Electron Energy -- 13.5 IPES of Quantum Well States -- 13.6 Spin Polarized Inverse Photoemission Spectroscopy (SP-IPES) -- 13.6.1 Principle and Instrumentation -- 13.6.2 Several SP-IPES Studies -- References -- 14 Complementary Techniques for Studying Bulk Electronic States -- 14.1 Core Absorption Spectroscopy -- 14.2 Infrared and Far-Infrared Spectroscopy -- 14.3 Resonance Inelastic X-ray Scattering -- 14.4 Magneto Optical Studies: Core Absorption and Soft X-ray Resonance Inelastic Scattering -- References -- 15 Surface Spectroscopy by Scanning Tunneling Microscope -- 15.1 Scanning Tunneling Spectroscopy by Scanning Tunneling Microscope -- 15.2 Scanning Tunneling Spectroscopy and Momentum Microscopy of SmB6 -- References -- 16 Summary and Outlook -- 16.1 Bulk Sensitive Electronic Structure Investigation: HAXARPES -- 16.2 Advances of Photoelectron Analyzers for ARPES and Momentum Microscopy -- 16.3 Electronic Structure Investigation of Micro-Nano Regions -- 16.4 Investigation of Complex Spin Textures in k-Space -- 16.5 Miscellaneous -- 16.6 Outlook -- References -- List of Samples -- Index."]