{"text_format":"2","workbook":"xls","n_sheets":1,"sheets":["report2"],"not_rendered":{"charts":0,"images":0,"macros":0,"external_links":1,"defined_names":1,"comments":0,"pivot_tables":0},"unopened":[],"bounds":{"document_bytes":16777216,"sheet_cells":100000,"run_cost":"one","rows_first":2000,"rows_last":500,"rows_between":2000,"halvings":0,"cell_chars":16384,"cell_head_chars":4096},"cells_cut":0,"cells_raw":0,"read":"whole","date_system":"1900","formulas":"cached_only"}

{"sheet":"report2","index":0,"n_rows":23,"n_cols":5,"rows_kept":23,"cut":false,"hidden":false,"merged":[[0,2,0,3],[0,4,0,5],[1,2,1,3],[1,4,1,5],[2,2,2,3],[3,2,3,3],[4,2,4,3],[5,2,5,3],[7,2,7,3],[8,2,8,3],[11,2,11,3],[12,2,12,3],[16,2,16,3]],"flags":["formulas_cached_only"]}
[null,"1.","Record Nr.",null,"UNINA9910461456403321"]
[null,null,"Titolo",null,"Lithography [[electronic resource] ] : principles, processes and materials / / Theodore C. Hennessy, editor"]
[null,null,"Pubbl/distr/stampa",null,"New York, : Nova Science, c2011"]
[null,null,"ISBN",null,"1-61122-123-4"]
[null,null,"Descrizione fisica",null,"1 online resource (299 p.)"]
[null,null,"Collana",null,"Engineering tools, techniques and tables"]
[{"$nulls":4},"Nanotechnology science and technology"]
[null,null,"Disciplina",null,"621.3815/31"]
[null,null,"Soggetti",null,"Microlithography"]
[{"$nulls":4},"Microfabrication"]
[{"$nulls":4},"Electronic books."]
[null,null,"Lingua di pubblicazione",null,"Inglese"]
[null,null,"Formato",null,"Materiale a stampa"]
[null,null,null,"Livello bibliografico","Monografia"]
[null,null,null,"Note generali","Description based upon print version of record."]
[null,null,null,"Nota di bibliografia","Includes bibliographical references and index."]
[null,null,"Nota di contenuto",null,"\"\"LITHOGRAPHY:PRINCIPLES, PROCESSES AND MATERIALS\"\"; \"\"CONTENTS\"\"; \"\"PREFACE\"\"; \"\"PRINCIPLE, PROCESSES AND MATERIALS FOR NANO IMPRINT LITHOGRAPHY\"\"; \"\"1. INTRODUCTION\"\"; \"\"2. PRINCIPLE AND FUNDAMENTAL PROCESS FOR NIL\"\"; \"\"2.1. Principle of NIL\"\"; \"\"2.2. Theoretical Analysis for NIL\"\"; \"\"2.3. Fundamental Process for NIL\"\"; \"\"3. VARIATIONS OF NIL PROCESSES\"\"; \"\"3.1. Combined Thermal and UV-NIL\"\"; \"\"3.2. Reverse Imprint Process\"\"; \"\"3.3. Laser-Assisted Direct Imprint\"\"; \"\"3.4. Roll Imprint Process\"\"; \"\"3.5. Substrate Conformal Imprint Lithography (SCIL)\"\"; \"\"3.6. Large Area Imprint\"\""]
[{"$nulls":4},"\"\"3.7. Nanoelectrode Lithography\"\"\"\"3.8. Hybrid NIL Process\"\"; \"\"3.9. Metal Nanoparticle Nanoimprinting Process\"\"; \"\"3.10. High Resolution NIL\"\"; \"\"3.11. Other NIL Processes\"\"; \"\"4. NIL MATERIALS\"\"; \"\"4.1. NIL Resists\"\"; \"\"4.2. Functional Materials and Other Imprintable Materials\"\"; \"\"4.3. Mold Materials\"\"; \"\"5. PROSPECTS AND CHALLENGES IN NIL\"\"; \"\"6. CONCLUSION\"\"; \"\"ACKNOWLEDGMENTS\"\"; \"\"REFERENCES\"\"; \"\"NANOFABRICATION IN ELECTRONBEAM LITHOGRAPHY\"\"; \"\"1. ELECTRON BEAM LITHOGRAPHY OVERVIEW\"\"; \"\"1.1. Introduction to the Electron Beam Lithography System\"\"; \"\"1.2. Proximity Effect\"\""]
[{"$nulls":4},"\"\"1.3. Numerical Calculation of the E-beam (Monte Carlo Method)\"\"\"\"2. CARBON NANOTUBE (CNT) BASED DEVICES\"\"; \"\"2.1.Introduction to carbon nanotubes \"\"; \"\"2.2. VACNT Based FE Device with Individual Cathode Structures\"\"; \"\"2.3. Field Emission Properties of Single Vertically Aligned Carbon Nanotubes\"\"; \"\"2. VARIO\"\"; \"\"2.4. Application "]
[{"$nulls":4},"in Micro CNT Column System\"\"; \"\"3. FABRICATION OF 3D NANOSTRUCTURES ON CYLINDRICAL ROLLERS\"\"; \"\"3.1. Introduction to Nanolithography\"\"; \"\"3.2. In-House Field Emission Measurement Facility\"\"; \"\"4. CONCLUSIONS\"\"; \"\"ACKNOWLEDGMENT\"\"; \"\"REFERENCES\"\""]
[{"$nulls":4},"\"\"GENERATION OF MICRO PATTERNS ONSIDE SURFACES OF POLYMER AND SISUBSTRATES USING A MICROPUNCHING LITHOGRAPHY APPROACH\"\"\"\"ABSTRACT\"\"; \"\"1. INTRODUCTION\"\"; \"\"2. MACROPUNCHING METHOD AND MPL\"\"; \"\"3. AU SIDEWALL PATTERNS ON HDPE CHANNELS\"\"; \"\"3.1. Fabrication Procedure\"\"; \"\"3.2. Experimental Results and Discussions\"\"; \"\"4. SUPER HYDROPHOBIC PDMS CHANNELS\"\"; \"\"4.1. Fabrication Process\"\"; \"\"4.2. Experimental Results and Discussions\"\"; \"\"5. FABRICATION OF AU DOTS ON SI SIDEWALLS\"\"; \"\"5.1. Fabrication Procedures\"\"; \"\"5.2. Results and Discussions\"\"; \"\"6. SUMMARY AND CONCLUSIONS\"\"; \"\"ACKNOWLEDGMENTS\"\""]
[{"$nulls":4},"\"\"REFERENCES\"\"\"\"LITHOGRAPHY: PRINCIPLES,PROCESSES AND MATERIALS\"\"; \"\"ABSTRACT\"\"; \"\"1. INTRODUCTION\"\"; \"\"2. PRINCIPLE OF LITHOGRAPHY\"\"; \"\"3. PROCESSES OF LITHOGRAPHY\"\"; \"\"3.1. RIE-NSL Lithography [32]\"\"; \"\"3.2. FIB Lithography\"\"; \"\"3.3. Laser Interference Lithography\"\"; \"\"4. MATERIALS OF LITHOGRAPHY\"\"; \"\"4.1. Materials of RIE-NSL Lithography\"\"; \"\"4.2. Materials of FIB Lithography\"\"; \"\"4.3. Materials of Laser Interference Lithography\"\"; \"\"5. CONCLUSIONS\"\"; \"\"REFERENCES\"\"; \"\"LASER INTERFERENCE LITHOGRAPHY\"\"; \"\"ABSTRACT\"\"; \"\"1. INTRODUCTION\"\"; \"\"2. THEORY\"\"; \"\"3. INSTRUMENTATION\"\""]
[{"$nulls":4},"\"\"3.1. Choice of Laser\"\""]