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[null,"1.","Record Nr.",null,"UNINA9910459972603321"]
[null,null,"Titolo",null,"Ultra clean processing of semiconductor surfaces XII : selected, peer reviewed papers from the 12th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS) September 21-24, 2014, Brussels, Belgium / / edited by Paul Mertens, Marc Meuris and Marc Heyns"]
[null,null,"Pubbl/distr/stampa",null,"Pfaffikon, Switzerland : , : TTP, , 2014"]
[{"$nulls":4},"Enfield, New Hampshire : , : Trans Tech Publications Ltd, , [date of distribution not identified]"]
[{"$nulls":4},"©2014"]
[null,null,"ISBN",null,"3-03826-626-4"]
[null,null,"Descrizione fisica",null,"1 online resource (331 p.)"]
[null,null,"Collana",null,"Solid State Phenomena, , 1662-7799 ; ; Volume 219"]
[null,null,"Disciplina",null,"621.38152"]
[null,null,"Soggetti",null,"Semiconductors"]
[{"$nulls":4},"Electronic books."]
[null,null,"Lingua di pubblicazione",null,"Inglese"]
[null,null,"Formato",null,"Materiale a stampa"]
[null,null,null,"Livello bibliografico","Monografia"]
[null,null,null,"Note generali","Description based upon print version of record."]
[null,null,null,"Nota di bibliografia","Includes bibliographical references at the end of each chapters and index."]
[null,null,"Nota di contenuto",null,"Ultra Clean Processing of Semiconductor Surfaces XII; Preface, Committee and Acknowledgement; Table of Contents; Chapter 1: Cleaning for FEOL Applications; Necessity of Cleaning and its Application in Future Memory Devices; Removal of Interfacial Layer in HfO2 Gate Stack by Post-Gate Cleaning Using NF3/NH3 Dry Cleaning Technique; Catalyst Assisted Low Temperature Pre Epitaxial Cleaning for Si and SiGe Surfaces; HF-Last Wet Clean in Combination with a Low Temperature GeH4-Assisted HCl In Situ Clean Prior to Si0.8Ge0.2-on-Si Epitaxial Growth"]
[{"$nulls":4},"Retardation Phenomenon of Oxide Removal during the Formation of Dual Gate Oxide via PR-Mask Wet Etching Aluminum Reduction in SC1; Metal Removal Efficiency in Deep Submicron Trenches by Wet Chemicals; Impact of Surface Treatment of Si3N4 on Subsequent SiO2 Deposition; Operation of a New Electrolyzed Cell Using Boron Doped Diamond Electrodes ; Chapter 2: Cleaning for FEOL Applications: Beyond-Si Active Area; InGaAs (110) Surface Cleaning Using Atomic Hydrogen; Surface Chemistry of GaAs(100) and InAs(100) Etching with Tartaric Acid; Nanoscale Etching and Reoxidation of InAs"]
[{"$nulls":4},"Passivation of In Sb(100) with 1-Eicosanethiol Self-Assembled "]
[{"$nulls":4},"Monolayers Cross-Contamination Risk Evaluation during Fabrication of III-V Devices in a Silicon Processing Environment; Surface Cleaning of Graphene by CO2 Cluster; Chapter 3: Wet Etching for FEOL Applications; Process Control Challenges of Wet Etching Large MEMS Si Cavities; Wet Etch Rate Behavior of Poly-Si in TMAH Solution at Various Ambient Gas Conditions; Advanced Monitoring of TMAH Solution; Effect of Dissolved Oxygen for Advanced Wet Processing; Watermark Formation on Bare Silicon: Impact of Illumination and Substrate Doping"]
[{"$nulls":4},"Selective Nitride Etching with Phosphoric and Sulfuric Acid Mixtures Using a Single-Wafer Wet Processor Single Wafer Selective Silicon Nitride Removal with Phosphoric Acid and Steam; Pt Etching Method at Low Temperature Using Electrolyzed Sulfuric Acid Solution; Nickel Selective Etch for Contacts on Ge Based Devices; Chapter 4: Wet Processing of High Aspect Ratio Structures; Study of Wetting of Nanostructures Using Decoration by Etching; Impact of Electrostatic Effects on Wet Etching Phenomenon in Nanoscale Region; Freeze Drying of High Aspect Ratio Structures"]
[{"$nulls":4},"Chapter 5: Fluid Dynamics, Cleaning Mechanics Effect of DI-Water Dilution and Etchant Arm Movement on Spinning Type Wet Etch; Effect of Nozzle Distance and Fluid Flow Rate in Jet Spray Wafer Cleaning Process; Effects of Chamber Pressure on the Performance of CO2 Beam Cleaning; Physical Chemistry of Water Droplets in Wafer Cleaning with Low Water Use; Metal Etch in Advanced Immersion Tank with Precision Uniformity Using Agitation and Wafer Rotation; Novel Slurry Injection System for Improved Slurry Flow and Reduced Defects in CMP"]
[{"$nulls":4},"Effect of Viscoelasticity of PVA Brush on Friction during Post-CMP Cleaning: A Guideline for Nodule Configuration"]
[null,null,null,"Sommario/riassunto","Collection of selected, peer reviewed papers from the 12th InternationalSymposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), September 21-24, 2014, Brussels, Belgium. The 71 papers are grouped as follows: Chapter 1: Cleaning for FEOL Applications, Chapter 2: Cleaning for FEOL Applications: Beyond-Si Active Area, Chapter 3: Wet Etching for FEOL Applications, Chapter 4: Wet Processing of High Aspect Ratio Structures, Chapter 5: Fluid Dynamics, Cleaning Mechanics, Chapter 6: Photo Resist Performance and Rework, Chapter 7: Cleaning for BEOL Interconnect Applications, Chapter 8: C"]
[null,"2.","Record Nr.",null,"UNINA9910798709303321"]
[null,null,"Autore",null,"Waldstreicher David"]
[null,null,"Titolo",null,"John Quincy Adams and the politics of slavery : selections from the diary / / David Waldstreicher, Matthew Mason"]
[null,null,"Pubbl/distr/stampa",null,"Oxford, [England] ; ; New York, New York : , : Oxford University Press, , 2017"]
[{"$nulls":4},"©2017"]
[null,null,"ISBN",null,"0-19-062461-2"]
[{"$nulls":4},"0-19-994796-1"]
[null,null,"Descrizione fisica",null,"1 online resource (337 pages)"]
[null,null,"Classificazione",null,"HIS036040HIS036030"]
[null,null,"Disciplina",null,"973.5/5092"]
[null,null,"Soggetti",null,"Slavery - Political aspects - United States - History - 19th century"]
[{"$nulls":4},"United States Politics and government 1783-1865"]
[null,null,"Lingua di pubblicazione",null,"Inglese"]
[null,null,"Formato",null,"Materiale a stampa"]
[null,null,null,"Livello bibliografico","Monografia"]
[null,null,null,"Note generali","Includes index."]
[null,null,"Nota di contenuto",null,"Machine generated contents note: -- Introduction -- Chapter 1: Rising Son of the Young Republic (1785-1809) -- Chapter 2: American Diplomat (1809-17) -- Chapter 3: Secretary of State (1817-24) -- Chapter 4: The Making and Unmaking of a President (1824-29) -- Chapter 5: The Making of an Antislavery Congressman (1829-36) -- Chapter 6: Antislavery Whig Congressman (1836-46) -- Acknowledgments -- Index."]
[null,null,null,"Sommario/riassunto","\" In the later years of his political career, President John Quincy Adams was well known for his objections to slavery, with one rival going so far as to label him \"the acutest, the astutest, the archest enemy of southern slavery that ever existed.\" As a young statesman, however, he supported slavery.  How did the man who in 1795 told a British cabinet officer not to speak to him of \"the Virginians, the Southern people, the democrats,\" whom he considered \"in no other light than as Americans,\" come to foretell \"a grand struggle between slavery and freedom\"? How could a committed expansionist, who would rather abandon his party and lose his US Senate seat than attack Jeffersonian slave power, later come to declare the Mexican War the \"apoplexy of the Constitution,\" a hijacking of the republic by slaveholders? What changed? Entries from Adams's personal diary, more extensive than that of any American statesman, reveal a highly dynamic and accomplished politician in engagement with one of his generation's most challenging national "]
[{"$nulls":4},"dilemmas.  Expertly edited by David Waldstreicher and Matthew Mason, John Quincy Adams and the Politics of Slavery offers an unusual perspective on the dramatic and shifting politics of slavery in the early republic, as it moved from the margins to the center of public life and from the shadows to the substance of Adams's politics. The editors provide a lucid introduction to the diary as a whole and frame the individual entries with brief and engaging insights. By juxtaposing Adams's personal reflections on slavery with what he said--and did not say--publicly on the issue, the editors offer a nuanced portrait of how he interacted with prevailing ideologies during his consequential career and life. John Quincy Adams and the Politics of Slavery is an invaluable contribution to our understanding of the complicated politics of slavery that set the groundwork for the Civil War. \""]
[{"$nulls":4},"\"This edition of John Quincy Adams's diary focuses on the dramatic politics of slavery as it moved from the margins to the center of American public life. The editors selected the most important and representative entries relating to slavery. They render both Adams' life and the controversies over slavery into a mutually illuminating narrative\"--"]