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[null,"1.","Record Nr.",null,"UNINA990000040850403321"]
[null,null,"Autore",null,"Baldi, Cesare"]
[null,null,"Titolo",null,"Manuale pratico di diritto industriale : in ordine alfabetico : sulle disposizioni dei codici e delle altre leggi eregolamenti relativi all'esercizio delle industrie, con brevi illustrazioni di dottrina e giurisprudenza, corredato da un copioso indice alfabetico analitico delle materie / Cesare Baldi"]
[null,null,"Pubbl/distr/stampa",null,"Milano-Torino : Fratelli Bocca, 1916"]
[null,null,"Descrizione fisica",null,"1046 p. ; 22 cm"]
[null,null,"Disciplina",null,"343.07"]
[null,null,"Locazione",null,"FINBC"]
[null,null,"Collocazione",null,"13 F 42 16"]
[null,null,"Lingua di pubblicazione",null,"Italiano"]
[null,null,"Formato",null,"Materiale a stampa"]
[null,null,null,"Livello bibliografico","Monografia"]
[null,"2.","Record Nr.",null,"UNINA9910144329403321"]
[null,null,"Autore",null,"Köhler J. M (J. Michael), <1956->"]
[null,null,"Titolo",null,"Nanotechnology : an introduction to nanostructuring techniques / / Michael Köhler, Wolfgang Fritzsche"]
[null,null,"Pubbl/distr/stampa",null,"Weinheim, [Germany] : , : Wiley-VCH Verlag GmbH & Co. KGaA, , 2004"]
[{"$nulls":4},"©2004"]
[null,null,"ISBN",null,"1-281-31172-3"]
[{"$nulls":4},"9786611311728"]
[{"$nulls":4},"3-527-61236-X"]
[{"$nulls":4},"3-527-61238-6"]
[null,null,"Descrizione fisica",null,"1 online resource (284 p.)"]
[null,null,"Disciplina",null,"620.5"]
[{"$nulls":4},"620/.5"]
[null,null,"Soggetti",null,"Nanotechnology"]
[{"$nulls":4},"Nanostructures"]
[null,null,"Lingua di pubblicazione",null,"Inglese"]
[null,null,"Formato",null,"Materiale a stampa"]
[null,null,null,"Livello bibliografico","Monografia"]
[null,null,null,"Note generali","Description based upon print version of record."]
[null,null,null,"Nota di bibliografia","Includes bibliographical references and index."]
[null,null,"Nota di contenuto",null,"Nanotechnology; Contents; 1 Introduction; 1.1 The Way into the Nanoworld; 1.1.1 From Micro- to Nanotechniques; 1.1.2 Definition of Nanostructures; 1.1.3 Insight into the Nanoworld; 1.1.4 Intervention into the Nanoworld; 1.2 Building Blocks of Nanotechnology; 1.3 Interactions and Topology; 1.4 The Microscopic Environment of the Nanoworld; 2 Molecular Basics; 2.1 Particles and Bonds; 2.1.1 Chemical Bonds in Nanotechnology; 2.1.2 Van der Waals Interactions; 2.1.3 Dipole-Dipole Interactions; 2.1.4 Ionic Interactions; 2.1.5 Metal Bonds; 2.1.6 Covalent Bonds; 2.1.7 Coordinative Bonds"]
[{"$nulls":4},"2.1.8 Hydrogen Bridge Bonds2.1.9 Polyvalent Bonds; 2.2 Chemical Structure; 2.2.1 Binding Topologies; 2.2.2 Building Blocks of Covalent Architecture; 2.2.3 Units for a Coordinated Architecture; 2.2.4 Building Blocks for Weakly Bound Aggregates; 2.2.5 Assembly of Complex Structures through the Internal Hierarchy of Binding Strengths; 2.2.6 Reaction Probability and Reaction Equilibrium; 3 Microtechnological Foundations; 3.1 Planar Technology; 3.2 Preparation of Thin Layers; 3.2.1 Condition and Preprocessing of the Substrate Surface; 3.2.2 Layer Deposition from the Gas Phase; 3.2.3 Evaporation"]
[{"$nulls":4},"3.2.4 Sputtering3.2.5 Chemical Vapor Deposition; 3.2.6 Galvanic Deposition; 3.2.7 Deposition by Spinning (Spin Coating); 3.2.8 Shadow-"]
[{"$nulls":4},"mask Deposition Techniques; 3.3 Preparation of Ultrathin Inorganic Layers and Surface-bound Nanoparticles; 3.3.1 Ultrathin Layers by Vacuum Deposition Processes; 3.3.2 Deposition of Ultrathin Films from the Liquid Phase; 3.3.3 In Situ Generation of Ultrathin Inorganic Films by Chemical Surface Modification; 3.3.4 In Situ Formation of Ultrathin Inorganic Layers on Heteroorganic Materials; 3.3.5 Immobilization of Nanoparticles"]
[{"$nulls":4},"3.3.6 In Situ Formation of Inorganic Nanoparticles3.4 Structure Generation and Fabrication of Lithographic Masks; 3.4.1 Adhesive Mask Technique; 3.4.2 Role of Resist in Photolithography; 3.4.3 Serial Pattern Transfer; 3.4.4 Group Transfer Processes; 3.4.5 Maskless Structure Generation; 3.4.6 Soft Lithography; 3.5 Etching Processes; 3.5.1 Etching Rate and Selectivity; 3.5.2 Isotropic and Anisotropic Etching Processes; 3.5.3 Lithographic Resolution in Etching Processes; 3.5.4 Wet Etching Processes; 3.5.5 Dry Etching Processes; 3.5.6 High-resolution Dry Etching Techniques"]
[{"$nulls":4},"3.5.7 Choice of Mask for Nanolithographic Etching Processes3.6 Packaging; 3.7 Biogenic and Bioanalogue Molecules in Technical Microstructures; 4 Preparation of Nanostructures; 4.1 Principles of Fabrication; 4.1.1 Subtractive and Additive Creation of Nanostructures; 4.1.2 Nanostructure Generation by Lift-off Processes; 4.1.3 Principles of Nanotechnical Shape-definition and Construction; 4.2 Nanomechanical Structure Generation; 4.2.1 Scaling Down of Mechanical Processing Techniques; 4.2.2 Local Mechanical Cutting Processes; 4.2.3 Surface Transport Methods; 4.2.4 Reshaping Processes"]
[{"$nulls":4},"4.2.5 Printing Processes"]
[null,null,null,"Sommario/riassunto","This revised and up-to-date translation of the very successful German original accompanies the reader from the introductory level right up to in-depth knowledge, backed by numerous literature references. It begins with the most important fundamentals of microtechnology and chemistry on which an understanding of shaping nanoscale structures is based. It then goes on to describe a variety of examples to illustrate the fabrication of nanostructures from different materials, before presenting readers with a wide range of methods for characterization of the generated structures. Thanks to i"]