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[null,"1.","Record Nr.",null,"UNINA9910144100903321"]
[null,null,"Titolo",null,"Advances in electrochemical science and engineering . Volume 3 [[electronic resource] /] / edited by Heinz Gerischer and Charles W. Tobias ; contributions from W.P. Gomes ... [et al.]"]
[null,null,"Pubbl/distr/stampa",null,"Weinheim [Germany], : VCH, 1994"]
[null,null,"ISBN",null,"1-281-84296-6"]
[{"$nulls":4},"9786611842963"]
[{"$nulls":4},"3-527-61677-2"]
[{"$nulls":4},"3-527-61686-1"]
[null,null,"Descrizione fisica",null,"1 online resource (343 p.)"]
[null,null,"Collana",null,"Advances in electrochemical science and engineering, , 0938-5193 ; ; v. 3"]
[null,null,"Disciplina",null,"541.3/7"]
[{"$nulls":4},"541.37"]
[null,null,"Soggetti",null,"Electrochemistry"]
[{"$nulls":4},"Electronic books."]
[null,null,"Lingua di pubblicazione",null,"Inglese"]
[null,null,"Formato",null,"Materiale a stampa"]
[null,null,null,"Livello bibliografico","Monografia"]
[null,null,null,"Note generali","Description based upon print version of record."]
[null,null,null,"Nota di bibliografia","Includes bibliographical references and index."]
[null,null,"Nota di contenuto",null,"Advances in Electrochemical Science and Engineering; Contents; Electrochemistry of III-V Compound Semiconductors: Dissolution Kinetics and Etching; Electroless Deposition Processes: Fundamentals and Applications; Current Distribution and Shape Change in Electrodeposition of Thin Films for Microelectronic Fabrication.; The Principles and Techniques of Electrolytic Aluminum Deposition and Dissolution in Organoaluminum Electrolytes; Magnetically Soft Materials in Data Storage: Their Properties and Electrochemistry; Index"]
[null,null,null,"Sommario/riassunto","Like its predecessors, volume three of this meanwhile well-established series covers selected topics from electrochemical science and its applications.The authors have been carefully selected among the leaders in the respective fields. Their authoritative and comprehensive contributions represent the latest state-of-the-art. Special attention is paid to recent developments, which are critically and thoroughly discussed. Each contribution of the present volume continues the high standards of this series.This new series has been warmly welcomed by scientists world-wide, which is"]