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It introduces laser heat-mode lithography, where the resist thin films are essentially an opto-thermal response to the laser beam with changeable wavelength and are not sensitive to laser wavelength. Laser heat-mode lithography techniques greatly simplify production procedures because they require neither a particular light source nor a particular environment; further, there are no pre-baking and post-baking steps required for organic photoresists. The pattern feature size can be either larger or smaller than the laser spot by adjusting the writing strategy. The lithographic feature size can also be arbitrarily tuned from nanoscale to micrometer without changing the laser spot size. Lastly, the line edge roughness can be controlled at a very low value because the etching process is a process of breaking bonds among atoms. The book offers an invaluable reference guide for all advanced undergraduates, graduate students, researchers and engineers working in the fields of nanofabrication, lithography techniques and systems, phase change materials, etc. 410 0$aSpringer Series in Materials Science,$x0933-033X ;$v291 606 $aSurfaces (Physics) 606 $aInterfaces (Physical sciences) 606 $aThin films 606 $aLasers 606 $aPhotonics 606 $aMicrowaves 606 $aOptical engineering 606 $aOptical materials 606 $aElectronics$xMaterials 606 $aSurface and Interface Science, Thin Films$3https://scigraph.springernature.com/ontologies/product-market-codes/P25160 606 $aOptics, Lasers, Photonics, Optical Devices$3https://scigraph.springernature.com/ontologies/product-market-codes/P31030 606 $aMicrowaves, RF and Optical Engineering$3https://scigraph.springernature.com/ontologies/product-market-codes/T24019 606 $aOptical and Electronic Materials$3https://scigraph.springernature.com/ontologies/product-market-codes/Z12000 615 0$aSurfaces (Physics) 615 0$aInterfaces (Physical sciences) 615 0$aThin films. 615 0$aLasers. 615 0$aPhotonics. 615 0$aMicrowaves. 615 0$aOptical engineering. 615 0$aOptical materials. 615 0$aElectronics$xMaterials. 615 14$aSurface and Interface Science, Thin Films. 615 24$aOptics, Lasers, Photonics, Optical Devices. 615 24$aMicrowaves, RF and Optical Engineering. 615 24$aOptical and Electronic Materials. 676 $a530.417 700 $aWei$b Jingsong$4aut$4http://id.loc.gov/vocabulary/relators/aut$0792199 801 0$bMiAaPQ 801 1$bMiAaPQ 801 2$bMiAaPQ 906 $aBOOK 912 $a9910373933503321 996 $aLaser Heat-Mode Lithography$92527167 997 $aUNINA