LEADER 01406aam 2200385I 450 001 9910711384303321 005 20160309011337.0 024 8 $aGOVPUB-C13-4510bec1e240a9f3d69a9ae100089593 035 $a(CKB)5470000002482185 035 $a(OCoLC)944188208 035 $a(EXLCZ)995470000002482185 100 $a20160309d2000 ua 0 101 0 $aeng 181 $2rdacontent 182 $2rdamedia 183 $2rdacarrier 200 10$aNIST's ultrasonic technology assessment program to improve flow measurements /$fG. E. Mattingly, T. T. Yeh 210 1$aGaithersburg, MD :$cU.S. Dept. of Commerce, National Institute of Standards and Technology,$d2000. 215 $a1 online resource 225 1 $aNIST technical note ;$v1429 300 $a2000. 300 $aContributed record: Metadata reviewed, not verified. Some fields updated by batch processes. 300 $aTitle from PDF title page (viewed December 31, 2015). 320 $aIncludes bibliographical references. 700 $aMattingly$b G. E$01390867 701 $aMattingly$b G. E$01390867 701 $aYeh$b T. T$01390868 712 02$aNational Institute of Standards and Technology (U.S.) 801 0$bNBS 801 1$bNBS 801 2$bGPO 906 $aBOOK 912 $a9910711384303321 996 $aNIST's ultrasonic technology assessment program to improve flow measurements$93444002 997 $aUNINA LEADER 01220nam0 22003253i 450 001 MIL0503209 005 20251003044234.0 010 $a0521624606$bhbk 010 $a0521785006$bpbk 010 $a9780521785006$bhbk 100 $a20090113d2000 ||||0itac50 ba 101 | $aeng 102 $agb 181 1$6z01$ai $bxxxe 182 1$6z01$an 200 1 $aIntroduction to surface and thin film processes$fJohn A. Venables 210 $aCambridge$cCambridge university press$d2000 215 $aXVI, 372 p.$cill.$d25 cm. 606 $aFilm sottili$2FIR$3MILC047786$9I 676 $a530.4$9Fisica. Stati della materia$v14 676 $a530.4275$9FISICA dello stato liquido. Fisica superficiale. Film sottili$v22 700 1$aVenables$b, John A.$f <1936- >$3MILV251425$4070$0770594 801 3$aIT$bIT-000000$c20090113 850 $aIT-BN0095 901 $bNAP 01$cSALA DING $n$ 912 $aMIL0503209 950 0$aBiblioteca Centralizzata di Ateneo$b1 v.$c1 v.$d 01SALA DING 530.4 VEN.in$e 0102 0000054825 VMA A4 1 v.$fY $h20040719$i20040719 977 $a 01 996 $aIntroduction to surface and thin film processes$91572467 997 $aUNISANNIO