LEADER 03196nam a2200325Ii 4500 001 991003233349707536 008 070802s2005 ne a sb 001 0 eng d 020 $a9780080447230 020 $a0080447236 035 $ab13652710-39ule_inst 040 $aBibl. Dip.le Aggr. Ingegneria Innovazione - Sez. Ingegneria Innovazione$beng 082 04$a666.88$222 100 1 $aKobashi, Koji$0627406 245 10$aDiamond films$h[e-book] :$bchemical vapor deposition for oriented and heteroepitaxial growth /$cKoji Kobashi 260 $aAmsterdam ; :$bLondon :$bElsevier,$c2005 300 $axii, 336 p. :$bill. ;$c25 cm 504 $aIncludes bibliographical references (p. 319-334) and indexes 505 0 $a1. Overview of Oriented Growth -- 2. Diamond - Structure and CVD Growth -- 3. Microwave Plasma CVD Reactors -- 4. Other CVD Reactors -- 5. Crystal Orientations and Film Surface Morphology -- 6. Formation of Twins -- 7. Homoepitaxial Growth -- 8. Surface Reconstruction -- 9. Epitaxial Growth on cBN, Ni, and Other Substrates -- 10. Diamond Nucleation -- 11. HOD Film Growth -- 12. Oriented Growth on Noble Metals -- 13. Properties and Applications of Heteroepitaxial Diamond Films -- 14. Conclusion -- APPENDICES --
  • Notations and units
    • --
  • Plasma
    • --
  • Properties of diamond and other semiconducting materials
    • --
  • Reconstruction of diamond surfaces
    • --
  • Materials constants
    • --
  • Phase diagrams of carbon and metals
    • --
  • Carbon solubilities in metals
    • --
  • Biasing and growth conditions for diamond growth
    • 520 $a
  • Discusses the most advanced techniques for diamond growth
  • Assists diamond researchers in deciding on the most suitable process conditions
  • Inspires readers to devise new CVD (chemical vapor deposition
    • Ever since the early 1980s, and the discovery of the vapour growth methods of diamond film, heteroexpitaxial growth has become one of the most important and heavily discussed topics amongst the diamond research community. Kobashi has documented such discussions with a strong focus on how diamond films can be best utilised as an industrial material, working from the premise that crystal diamond films can be made by chemical vapour disposition. Kobashi provides information on the process and characterization technologies of oriented and heteroepitaxial growth of diamond films 533 $aElectronic reproduction.$bAmsterdam :$cElsevier Science & Technology,$d2007.$nMode of access: World Wide Web.$nSystem requirements: Web browser.$nTitle from title screen (viewed on July 25, 2007).$nAccess may be restricted to users at subscribing institutions 650 0$aDiamonds, Artificial 650 0$aDiamond thin films 655 7$aElectronic books.$2local 776 1 $cOriginal$z0080447236$z9780080447230$w(OCoLC)63185437 856 40$3Referex$uhttp://www.sciencedirect.com/science/book/9780080447230$zAn electronic book accessible through the World Wide Web; click for information 907 $a.b13652710$b03-03-22$c24-01-08 912 $a991003233349707536 996 $aDiamond films$91212843 997 $aUNISALENTO 998 $ale026$b24-01-08$cm$d@ $e-$feng$gne $h0$i0