LEADER 02436nam a2200325Ii 4500
001 991003233199707536
008 070806s2006    ne a   fsb    001 0 eng d
020   $a9780080446998
020   $a008044699X
035   $ab13652692-39ule_inst
040   $aBibl. Dip.le Aggr. Ingegneria Innovazione - Sez. Ingegneria Innovazione$beng
082 04$a621.38152$222
100 1 $aSreeHarsha, K. S.$0627405
245 10$aPrinciples of physical vapor deposition of thin films$h[e-book] /$cK.S. Sree Harsha
260   $aAmsterdam ;$aBoston ;$aLondon :$bElsevier,$c2006
300   $axi, 1160 p. :$bill. ;$c25 cm
504   $aIncludes bibliographical references and index
520   $aThe goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology. Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible. * Offers detailed derivation of important formulae. * Thoroughly covers the basic principles of materials science that are important to any thin film preparation. * Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text
533   $aElectronic reproduction.$bAmsterdam :$cElsevier Science & Technology,$d2007.$nMode of access: World Wide Web.$nSystem requirements: Web browser.$nTitle from title screen (viewed on Aug. 2, 2007).$nAccess may be restricted to users at subscribing institutions
650  0$aThin films
650  0$aVapor-plating
655  7$aElectronic books.$2local
776 1 $cOriginal$z008044699X$z9780080446998$w(DLC)  2005937842$w(OCoLC)61217411
856 40$3Referex$uhttp://www.sciencedirect.com/science/book/9780080446998$zAn electronic book accessible through the World Wide Web; click for information
856 42$zPublisher description$uhttp://catdir.loc.gov/catdir/enhancements/fy0664/2005937842-d.html
907   $a.b13652692$b03-03-22$c24-01-08
912   $a991003233199707536
996   $aPrinciples of physical vapor deposition of thin films$91212864
997   $aUNISALENTO
998   $ale026$b24-01-08$cm$d@  $e-$feng$gne $h0$i0