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005 20021122115200.0
008 020320s1999    uk            ||| | eng  
020   $a0471973866$c392900
035   $ab11750571-39ule_inst
035   $aLE00646097$9ExL
040   $aDip.to Fisica$bita
082 0 $a53.6.5
082 0 $a660.044
082 0 $aTA2020
100 1 $aBouchoule, André$0530310
245 10$aDusty plasmas :$bphysics, chemistry, and technological impacts in plasma processing /$cedited by André Bouchoule
260   $aChichester, England ; New York :$bJohn Wiley & Sons,$cc1999
300   $aviii, 408 p. :$bill. ;$c24 cm.
500   $aIncludes bibliographical references and indexes.
650  4$aDusty plasmas
650  4$aPlasma chemistry
650  4$aPlasma engineering
650  4$aPlasma enhanced chemical vapor deposition
650  4$aPlasma (Ionized gases)-Industrial applications
907   $a.b11750571$b02-04-14$c22-11-02
912   $a991003071579707536
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996   $aDusty plasmas$9905597
997   $aUNISALENTO
998   $ale006$b01-01-02$cm$da  $e-$feng$guk $h0$i1